S. A. Rishton

4.0k total citations
76 papers, 3.1k citations indexed

About

S. A. Rishton is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Biomedical Engineering. According to data from OpenAlex, S. A. Rishton has authored 76 papers receiving a total of 3.1k indexed citations (citations by other indexed papers that have themselves been cited), including 62 papers in Electrical and Electronic Engineering, 30 papers in Atomic and Molecular Physics, and Optics and 22 papers in Biomedical Engineering. Recurrent topics in S. A. Rishton's work include Semiconductor materials and devices (22 papers), Advancements in Photolithography Techniques (21 papers) and Integrated Circuits and Semiconductor Failure Analysis (16 papers). S. A. Rishton is often cited by papers focused on Semiconductor materials and devices (22 papers), Advancements in Photolithography Techniques (21 papers) and Integrated Circuits and Semiconductor Failure Analysis (16 papers). S. A. Rishton collaborates with scholars based in United States, Germany and Israel. S. A. Rishton's co-authors include D. P. Kern, T. H. P. Chang, Jane M. Shaw, N. LaBianca, R. A. Altman, A. C. Marley, Gang Xiao, C. C. Williams, W. J. Gallagher and S. Parkin and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Journal of The Electrochemical Society.

In The Last Decade

S. A. Rishton

73 papers receiving 2.9k citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
S. A. Rishton 2.1k 1.5k 901 474 357 76 3.1k
M. Levy 2.3k 1.1× 2.0k 1.4× 594 0.7× 527 1.1× 359 1.0× 143 3.0k
Haiyan Ou 3.4k 1.6× 2.0k 1.4× 576 0.6× 895 1.9× 268 0.8× 208 4.3k
E. van der Drift 1.3k 0.6× 692 0.5× 541 0.6× 475 1.0× 171 0.5× 112 2.1k
John N. Randall 1.6k 0.7× 1.3k 0.9× 554 0.6× 612 1.3× 99 0.3× 131 2.5k
Kamil Postava 924 0.4× 863 0.6× 423 0.5× 410 0.9× 566 1.6× 149 1.6k
B. E. Weir 3.1k 1.5× 1.6k 1.1× 522 0.6× 776 1.6× 154 0.4× 96 3.6k
Suzanne Martin 2.1k 1.0× 1.7k 1.2× 281 0.3× 217 0.5× 344 1.0× 186 3.0k
Naoki Ikeda 2.4k 1.1× 2.1k 1.4× 826 0.9× 576 1.2× 382 1.1× 202 3.0k
E. A. Dobisz 1.4k 0.7× 1.5k 1.0× 1.2k 1.3× 1.9k 4.0× 546 1.5× 97 3.8k
D. C. Flanders 1.1k 0.5× 713 0.5× 476 0.5× 371 0.8× 171 0.5× 55 1.6k

Countries citing papers authored by S. A. Rishton

Since Specialization
Citations

This map shows the geographic impact of S. A. Rishton's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. A. Rishton with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. A. Rishton more than expected).

Fields of papers citing papers by S. A. Rishton

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. A. Rishton. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. A. Rishton. The network helps show where S. A. Rishton may publish in the future.

Co-authorship network of co-authors of S. A. Rishton

This figure shows the co-authorship network connecting the top 25 collaborators of S. A. Rishton. A scholar is included among the top collaborators of S. A. Rishton based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. A. Rishton. S. A. Rishton is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yoffe, Gideon, et al.. (2008). Widely-tunable 30mW laser source with sub-500kHz linewidth using DFB array. 27. 892–893. 8 indexed citations
2.
Pezeshki, B., E.C. Vail, Gideon Yoffe, et al.. (2004). Narrowly Spaced DFB Array With Integrated Heaters for Rapid Tuning Applications. IEEE Photonics Technology Letters. 16(5). 1239–1241. 3 indexed citations
3.
Tang, D.D., et al.. (2002). An IC process compatible nonvolatile magnetic RAM. 997–1000. 4 indexed citations
4.
Veneklasen, Lee H., et al.. (2001). High-throughput electron-beam lithography with a raster-scanned, variably shaped beam. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2455–2458. 2 indexed citations
5.
Terris, B. D., S. A. Rishton, H. J. Mamin, R.P. Ried, & D. Rugar. (1998). Atomic force microscope-based data storage: track servo and wear study. Applied Physics A. 66(7). S809–S813. 42 indexed citations
6.
Jordan, Rebecca H., Dennis G. Hall, O. King, G. W. Wicks, & S. A. Rishton. (1997). Lasing behavior of circular grating surface-emitting semiconductor lasers. Journal of the Optical Society of America B. 14(2). 449–449. 40 indexed citations
7.
Lu, Yu, R. A. Altman, A. C. Marley, et al.. (1997). Shape-anisotropy-controlled magnetoresistive response in magnetic tunnel junctions. Applied Physics Letters. 70(19). 2610–2612. 105 indexed citations
8.
Chang, T. H. P., M. G. R. Thomson, Mingzhu Yu, et al.. (1996). Electron beam technology—SEM to microcolumn. Microelectronic Engineering. 32(1-4). 113–130. 35 indexed citations
9.
Taur, Y., Y. J. Mii, D.J. Frank, et al.. (1995). CMOS scaling into the 21st century: 0.1 µm and beyond. IBM Journal of Research and Development. 39(1.2). 245–260. 82 indexed citations
10.
Kratschmer, E., et al.. (1994). Sub-40 nm resolution 1 keV scanning tunneling microscope field-emission microcolumn. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 12(6). 3503–3507. 19 indexed citations
11.
Chu, Sai T., Henry I. Smith, S. A. Rishton, D. P. Kern, & Mark L. Schattenburg. (1992). Fabrication of 50 nm line-and-space x-ray masks in thick Au using a 50 keV electron beam system. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 10(1). 118–121. 8 indexed citations
12.
Rishton, S. A., et al.. (1991). Latent image measurements in electron beam exposed polymethylmethacrylate. Applied Physics Letters. 58(3). 310–312. 2 indexed citations
13.
Sai-Halasz, G.A., M.R. Wordeman, D. P. Kern, et al.. (1990). Experimental technology and performance of 0.1-µm-gate-length FETs operated at liquid-nitrogen temperature. IBM Journal of Research and Development. 34(4). 452–465. 31 indexed citations
14.
Hatzakis, M., et al.. (1990). New high resolution and high sensitivity deep UV, x-ray, and electron beam resists. Microelectronic Engineering. 11(1-4). 487–489. 5 indexed citations
15.
Rishton, S. A., D. P. Kern, E. Kratschmer, & T. H. P. Chang. (1989). Electron beam lithography of sub-0.1μm circuits. Microelectronic Engineering. 9(1-4). 183–186. 3 indexed citations
16.
Williams, C. C., et al.. (1989). Scanning capacitance microscopy on a 25 nm scale. Applied Physics Letters. 55(2). 203–205. 156 indexed citations
17.
Wetzel, J. T., Marko Jošt, S. A. Rishton, et al.. (1989). On the preparation of cross-sectional TEM samples using lithographic processing and reactive ion-etching. Ultramicroscopy. 29(1-4). 110–114. 3 indexed citations
18.
Kern, D. P., S. A. Rishton, T. H. P. Chang, et al.. (1988). Lithography issues in fabricating high-performance sub-100-nm channel metal–oxide semiconductor field effect transistors. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 1836–1840. 2 indexed citations
19.
Sai-Halasz, G.A., M.R. Wordeman, D. P. Kern, et al.. (1988). Inverter performance of deep-submicrometer MOSFETs. IEEE Electron Device Letters. 9(12). 633–635. 11 indexed citations
20.
Kratschmer, E., S. A. Rishton, D. P. Kern, & T. H. P. Chang. (1988). Quantitative analysis of resolution and stability in nanometer electron beam lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(6). 2074–2079. 27 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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