Oleg Gluschenkov

835 total citations
21 papers, 374 citations indexed

About

Oleg Gluschenkov is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Mechanics of Materials. According to data from OpenAlex, Oleg Gluschenkov has authored 21 papers receiving a total of 374 indexed citations (citations by other indexed papers that have themselves been cited), including 20 papers in Electrical and Electronic Engineering, 6 papers in Biomedical Engineering and 2 papers in Mechanics of Materials. Recurrent topics in Oleg Gluschenkov's work include Semiconductor materials and devices (16 papers), Advancements in Semiconductor Devices and Circuit Design (12 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Oleg Gluschenkov is often cited by papers focused on Semiconductor materials and devices (16 papers), Advancements in Semiconductor Devices and Circuit Design (12 papers) and Integrated Circuits and Semiconductor Failure Analysis (7 papers). Oleg Gluschenkov collaborates with scholars based in United States, Japan and Canada. Oleg Gluschenkov's co-authors include K. Chan, P. Jamison, A. Chou, Min Yang, P. Kozlowski, M. Ieong, C. D’Emic, E. P. Gusev, D. Boyd and Michael Belyansky and has published in prestigious journals such as Journal of Applied Physics, IEEE Electron Device Letters and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

Oleg Gluschenkov

21 papers receiving 349 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Oleg Gluschenkov United States 9 346 66 62 54 20 21 374
M.M. Jevtić Serbia 10 264 0.8× 69 1.0× 55 0.9× 91 1.7× 18 0.9× 55 305
L. Ciampolini France 9 321 0.9× 56 0.8× 115 1.9× 55 1.0× 18 0.9× 35 361
Kihyun Hwang South Korea 9 257 0.7× 40 0.6× 57 0.9× 76 1.4× 16 0.8× 27 289
Alessandro Vaglio Pret Belgium 12 389 1.1× 98 1.5× 29 0.5× 23 0.4× 15 0.8× 64 408
C. Machala United States 11 646 1.9× 77 1.2× 102 1.6× 72 1.3× 13 0.7× 28 707
S. Borel France 14 363 1.0× 131 2.0× 44 0.7× 34 0.6× 12 0.6× 37 383
Jonathan Cobb United States 9 282 0.8× 106 1.6× 54 0.9× 14 0.3× 10 0.5× 41 312
F. Bénistant Singapore 10 260 0.8× 37 0.6× 55 0.9× 34 0.6× 5 0.3× 52 294
Andreas Wettstein Switzerland 9 268 0.8× 43 0.7× 71 1.1× 14 0.3× 31 1.6× 33 328
B. Helbo Denmark 7 268 0.8× 215 3.3× 158 2.5× 24 0.4× 30 1.5× 9 382

Countries citing papers authored by Oleg Gluschenkov

Since Specialization
Citations

This map shows the geographic impact of Oleg Gluschenkov's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Oleg Gluschenkov with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Oleg Gluschenkov more than expected).

Fields of papers citing papers by Oleg Gluschenkov

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Oleg Gluschenkov. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Oleg Gluschenkov. The network helps show where Oleg Gluschenkov may publish in the future.

Co-authorship network of co-authors of Oleg Gluschenkov

This figure shows the co-authorship network connecting the top 25 collaborators of Oleg Gluschenkov. A scholar is included among the top collaborators of Oleg Gluschenkov based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Oleg Gluschenkov. Oleg Gluschenkov is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Uedono, Akira, et al.. (2023). Impact of nanosecond laser annealing on vacancies in electroplated Cu films studied by monoenergetic positron beams. Journal of Applied Physics. 134(13). 2 indexed citations
2.
Gluschenkov, Oleg, et al.. (2023). Improving FinFET Junctions and Contacts via Laser Annealing. 1–4. 2 indexed citations
3.
4.
Frank, Martin M., E. Cartier, C. Lavoie, et al.. (2022). Crystallization of hafnium-oxide-based ferroelectrics for BEOL integration. 316–318. 3 indexed citations
5.
Nogami, T., Oleg Gluschenkov, Son T. Nguyen, et al.. (2022). Advanced BEOL Materials, Processes, and Integration to Reduce Line Resistance of Damascene Cu, Co, and Subtractive Ru Interconnects. 2022 IEEE Symposium on VLSI Technology and Circuits (VLSI Technology and Circuits). 423–424. 6 indexed citations
6.
Gluschenkov, Oleg, Heng Wu, Kevin Brew, et al.. (2018). External Resistance Reduction by Nanosecond Laser Anneal in Si/SiGe CMOS Technology. 35.3.1–35.3.4. 8 indexed citations
7.
Gluschenkov, Oleg & Hemanth Jagannathan. (2018). (Invited)Laser Annealing in CMOS Manufacturing. ECS Transactions. 85(6). 11–23. 12 indexed citations
8.
Gluschenkov, Oleg, Bei Liu, Juntao Li, et al.. (2017). Dual beam laser annealing for contact resistance reduction and its impact on VLSI integrated circuit variability. T212–T213. 7 indexed citations
9.
Gluschenkov, Oleg, Jody Fronheiser, Juntao Li, et al.. (2016). Sub- $10^{-9}~\Omega $ -cm2 n-Type Contact Resistivity for FinFET Technology. IEEE Electron Device Letters. 37(11). 1371–1374. 47 indexed citations
10.
Linder, B.P., Takashi Ando, E. Cartier, et al.. (2016). Process optimizations for NBTI/PBTI for future replacement metal gate technologies. 12 indexed citations
11.
Gluschenkov, Oleg, Shinichi Mochizuki, Jody Fronheiser, et al.. (2016). FinFET performance with Si:P and Ge:Group-III-Metal metastable contact trench alloys. 17.2.1–17.2.4. 30 indexed citations
12.
Brunner, Timothy A., Vinayan C. Menon, Nelson Felix, et al.. (2014). Characterization and mitigation of overlay error on silicon wafers with nonuniform stress. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9052. 90520U–90520U. 15 indexed citations
13.
Brunner, Timothy A., Vinayan C. Menon, Oleg Gluschenkov, et al.. (2013). Characterization of wafer geometry and overlay error on silicon wafers with nonuniform stress. Journal of Micro/Nanolithography MEMS and MOEMS. 12(4). 43002–43002. 36 indexed citations
14.
Adkisson, J., Marwan Khater, Jeff Gambino, et al.. (2013). Improved Frequency Response in a SiGe npn Device through Improved Dopant Activation. ECS Transactions. 50(9). 83–93. 1 indexed citations
15.
Belyansky, Michael, M. A. Chace, Oleg Gluschenkov, et al.. (2008). Methods of producing plasma enhanced chemical vapor deposition silicon nitride thin films with high compressive and tensile stress. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 26(3). 517–521. 26 indexed citations
16.
Liu, Yaocheng, Oleg Gluschenkov, Jinghong Li, et al.. (2007). Strained Si Channel MOSFETs with Embedded Silicon Carbon Formed by Solid Phase Epitaxy. 44–45. 30 indexed citations
17.
Fisher, Philip A., Oleg Gluschenkov, Hideki Kimura, et al.. (2006). High Performance 65nm SOI Transistors Using Laser Spike Annealing. 347–350. 4 indexed citations
18.
Yang, Min, E. P. Gusev, M. Ieong, et al.. (2003). Performance dependence of CMOS on silicon substrate orientation for ultrathin oxynitride and HfO2 gate dielectrics. IEEE Electron Device Letters. 24(5). 339–341. 126 indexed citations
19.
Gluschenkov, Oleg, Bin He, Yujun Li, et al.. (2002). High performance single work-function tungsten gate CMOS devices for gigabit DRAM. 3.3.1–3.3.4. 3 indexed citations
20.
Malik, R., L. A. Clevenger, Oleg Gluschenkov, et al.. (2002). W/WN/poly gate implementation for sub-130 nm vertical cell DRAM. 31–32. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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