M. Gribelyuk

4.4k total citations · 1 hit paper
63 papers, 2.9k citations indexed

About

M. Gribelyuk is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Surfaces, Coatings and Films. According to data from OpenAlex, M. Gribelyuk has authored 63 papers receiving a total of 2.9k indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 19 papers in Atomic and Molecular Physics, and Optics and 13 papers in Surfaces, Coatings and Films. Recurrent topics in M. Gribelyuk's work include Semiconductor materials and devices (38 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Advancements in Semiconductor Devices and Circuit Design (14 papers). M. Gribelyuk is often cited by papers focused on Semiconductor materials and devices (38 papers), Integrated Circuits and Semiconductor Failure Analysis (24 papers) and Advancements in Semiconductor Devices and Circuit Design (14 papers). M. Gribelyuk collaborates with scholars based in United States, Japan and Germany. M. Gribelyuk's co-authors include M. Copel, E. Cartier, Evgeni Gusev, E. P. Gusev, H. Schmidt, D. A. Buchanan, I. J. R. Baumvol, C. Krug, C. D’Emic and T. Zabel and has published in prestigious journals such as Physical Review Letters, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

M. Gribelyuk

57 papers receiving 2.8k citations

Hit Papers

Structure and stability o... 2000 2026 2008 2017 2000 100 200 300 400 500

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
M. Gribelyuk 2.7k 1.4k 549 294 185 63 2.9k
Nobuyuki Ikarashi 1.3k 0.5× 503 0.4× 453 0.8× 325 1.1× 165 0.9× 134 1.7k
Dmitri O. Klenov 631 0.2× 1.5k 1.1× 265 0.5× 422 1.4× 199 1.1× 30 1.9k
H. Cerva 994 0.4× 613 0.4× 590 1.1× 241 0.8× 252 1.4× 91 1.5k
Toru Tatsumi 1.7k 0.6× 1.1k 0.8× 827 1.5× 286 1.0× 363 2.0× 104 2.3k
Bo Da 973 0.4× 832 0.6× 375 0.7× 138 0.5× 178 1.0× 129 1.8k
A. Armigliato 1.2k 0.5× 538 0.4× 737 1.3× 69 0.2× 254 1.4× 129 1.7k
A. Fissel 2.1k 0.8× 1.2k 0.9× 509 0.9× 467 1.6× 157 0.8× 135 2.4k
Shigetaka Tomiya 1.1k 0.4× 978 0.7× 820 1.5× 396 1.3× 763 4.1× 94 2.1k
Markus Lentzen 467 0.2× 712 0.5× 270 0.5× 212 0.7× 175 0.9× 48 1.4k
T. Wágner 484 0.2× 579 0.4× 300 0.5× 214 0.7× 282 1.5× 62 1.2k

Countries citing papers authored by M. Gribelyuk

Since Specialization
Citations

This map shows the geographic impact of M. Gribelyuk's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by M. Gribelyuk with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites M. Gribelyuk more than expected).

Fields of papers citing papers by M. Gribelyuk

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by M. Gribelyuk. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by M. Gribelyuk. The network helps show where M. Gribelyuk may publish in the future.

Co-authorship network of co-authors of M. Gribelyuk

This figure shows the co-authorship network connecting the top 25 collaborators of M. Gribelyuk. A scholar is included among the top collaborators of M. Gribelyuk based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with M. Gribelyuk. M. Gribelyuk is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Shirokura, Takanori, Pham Nam Hai, Brian York, et al.. (2024). High spin Hall angle in BiSb topological insulator and perpendicularly magnetized CoFeB/MgO multilayers with metallic interfacial layers. Applied Physics Letters. 124(7). 5 indexed citations
2.
York, Brian, C. Hwang, Xiaoyong Liu, et al.. (2024). Transport and material properties of doped BiSbX topological insulator films grown by physical vapor deposition. Japanese Journal of Applied Physics. 63(12). 123001–123001. 1 indexed citations
4.
Hai, Pham Nam, Brian York, C. Hwang, et al.. (2023). Large inverse spin Hall effect in BiSb topological insulator for 4 Tb/in2 magnetic recording technology. Applied Physics Letters. 122(5). 8 indexed citations
5.
York, Brian, Hai Van Pham, C. Hwang, et al.. (2022). High Spin Hall Angle doped BiSbX Topological Insulators using novel high resistive growth and migration barrier layers. 1–2. 1 indexed citations
6.
Hai, Pham Nam, Brian York, C. Hwang, et al.. (2022). Large Spin Hall Angle in Sputtered BiSb Topological Insulator on Top of Various Ferromagnets With In-Plane Magnetization for SOT Reader Application. IEEE Transactions on Magnetics. 59(3). 1–4. 5 indexed citations
7.
Gribelyuk, M., et al.. (2022). Two-dimensional dopant potential mapping in a fin field effect transistor by off-axis electron holography. Journal of Applied Physics. 132(4). 1 indexed citations
8.
Gribelyuk, M., et al.. (2019). Measurement of SiGe composition in 3-D semiconductor Fin Field Effect Transistor devices. Journal of Applied Physics. 125(16). 3 indexed citations
9.
Gribelyuk, M., et al.. (2018). 3D analysis of semiconductor devices: A combination of 3D imaging and 3D elemental analysis. Journal of Applied Physics. 123(16). 4 indexed citations
10.
Gribelyuk, M., et al.. (2016). The Influence of Beam Convergence Angle on Channeling Effect during STEM/EDS Quantification of SiGe Concentration. Microscopy and Microanalysis. 22(S3). 1618–1619. 3 indexed citations
11.
Clark, Robert D., Cory S. Wajda, Gert J. Leusink, et al.. (2007). Process and Electrical Characteristics of MO-ALD HfO2 Films for High-k Gate Applications Grown in a Production Worthy 300 mm Deposition System. ECS Transactions. 11(3). 55–69. 12 indexed citations
12.
Kawasaki, Masahiro, et al.. (2004). Off-axis electron holography with a dual-lens imaging system and its usefulness in 2-D potential mapping of semiconductor devices. Ultramicroscopy. 101(2-4). 63–72. 30 indexed citations
13.
Gusev, E. P., Huiling Shang, M. Copel, et al.. (2004). Microstructure and thermal stability of HfO2 gate dielectric deposited on Ge(100). Applied Physics Letters. 85(12). 2334–2336. 79 indexed citations
14.
Gusev, E. P., C. Cabral, M. Copel, C. D’Emic, & M. Gribelyuk. (2003). Ultrathin HfO2 films grown on silicon by atomic layer deposition for advanced gate dielectrics applications. Microelectronic Engineering. 69(2-4). 145–151. 270 indexed citations
15.
Gribelyuk, M., Martha R. McCartney, Jing Li, et al.. (2002). Mapping of Electrostatic Potential in Deep Submicron CMOS Devices by Electron Holography. Physical Review Letters. 89(2). 25502–25502. 88 indexed citations
16.
Callegari, Agnese, et al.. (2002). Thermal stability of polycrystalline silicon/metal oxide interfaces. Applied Physics Letters. 81(22). 4157–4158. 3 indexed citations
17.
Gribelyuk, M., Agnese Callegari, E. P. Gusev, M. Copel, & D. A. Buchanan. (2002). Interface reactions in ZrO2 based gate dielectric stacks. Journal of Applied Physics. 92(3). 1232–1237. 33 indexed citations
18.
Filippi, R. G., M. Gribelyuk, T. Sullivan, et al.. (2001). Electromigration in AlCu lines: comparison of Dual Damascene and metal reactive ion etching. Thin Solid Films. 388(1-2). 303–314. 5 indexed citations
19.
Smith, Ryan C., C. James Taylor, Stephen A. Campbell, et al.. (2000). Low Temperature Chemical Vapor Deposition of ZrO[sub 2] on Si(100) Using Anhydrous Zirconium (IV) Nitrate. Journal of The Electrochemical Society. 147(9). 3472–3472. 33 indexed citations
20.
Gilmer, D. C., C. James Taylor, Greg Haugstad, et al.. (1998). Low Temperature CVD of Crystalline Titanium Dioxide Films Using Tetranitratotitanium(IV. Chemical Vapor Deposition. 4(1). 9–11. 45 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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