Mikhaı̈l R. Baklanov

10.3k total citations · 1 hit paper
334 papers, 8.3k citations indexed

About

Mikhaı̈l R. Baklanov is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials and Mechanics of Materials. According to data from OpenAlex, Mikhaı̈l R. Baklanov has authored 334 papers receiving a total of 8.3k indexed citations (citations by other indexed papers that have themselves been cited), including 256 papers in Electrical and Electronic Engineering, 246 papers in Electronic, Optical and Magnetic Materials and 136 papers in Mechanics of Materials. Recurrent topics in Mikhaı̈l R. Baklanov's work include Copper Interconnects and Reliability (243 papers), Semiconductor materials and devices (232 papers) and Metal and Thin Film Mechanics (123 papers). Mikhaı̈l R. Baklanov is often cited by papers focused on Copper Interconnects and Reliability (243 papers), Semiconductor materials and devices (232 papers) and Metal and Thin Film Mechanics (123 papers). Mikhaı̈l R. Baklanov collaborates with scholars based in Belgium, Russia and United States. Mikhaı̈l R. Baklanov's co-authors include Karen Maex, Denis Shamiryan, K. P. Mogilnikov, Sywert Brongersma, Z. Sh. Yanovitskaya, T. I. Baturina, V. M. Vinokur, F. N. Dultsev, V. G. Polovinkin and Kris Vanstreels and has published in prestigious journals such as Nature, Journal of the American Chemical Society and Physical Review Letters.

In The Last Decade

Mikhaı̈l R. Baklanov

317 papers receiving 8.2k citations

Hit Papers

Low dielectric constant materials for microelectronics 2003 2026 2010 2018 2003 400 800 1.2k

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Mikhaı̈l R. Baklanov Belgium 42 5.2k 4.7k 2.9k 2.4k 1.3k 334 8.3k
Walter R. L. Lambrecht United States 57 5.5k 1.1× 3.5k 0.8× 8.9k 3.1× 1.9k 0.8× 3.2k 2.5× 293 13.2k
F. Lévy Switzerland 52 4.3k 0.8× 1.2k 0.2× 7.7k 2.6× 3.4k 1.4× 1.5k 1.2× 265 10.8k
Carsten Ronning Germany 52 5.0k 1.0× 2.2k 0.5× 6.5k 2.2× 1.1k 0.5× 1.7k 1.4× 331 9.8k
Paul Erhart Sweden 54 3.0k 0.6× 1.6k 0.4× 7.8k 2.6× 793 0.3× 1.3k 1.0× 188 9.9k
Tilmann Hickel Germany 46 2.0k 0.4× 1.6k 0.4× 6.4k 2.2× 896 0.4× 1.4k 1.1× 162 9.1k
J. D. Budai United States 53 3.6k 0.7× 4.0k 0.9× 8.1k 2.8× 836 0.3× 1.7k 1.3× 266 12.2k
John A. Woollam United States 43 3.8k 0.7× 1.4k 0.3× 3.9k 1.3× 1.0k 0.4× 2.3k 1.8× 340 8.2k
K. Ueda Japan 45 4.6k 0.9× 2.4k 0.5× 5.3k 1.8× 616 0.3× 2.6k 2.1× 303 8.4k
Atsushi Togo Japan 31 5.9k 1.1× 4.0k 0.9× 17.5k 6.0× 948 0.4× 3.0k 2.4× 52 20.6k
M. S. Ramachandra Rao India 45 2.1k 0.4× 3.0k 0.6× 5.0k 1.7× 519 0.2× 1.1k 0.8× 349 7.8k

Countries citing papers authored by Mikhaı̈l R. Baklanov

Since Specialization
Citations

This map shows the geographic impact of Mikhaı̈l R. Baklanov's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mikhaı̈l R. Baklanov with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mikhaı̈l R. Baklanov more than expected).

Fields of papers citing papers by Mikhaı̈l R. Baklanov

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mikhaı̈l R. Baklanov. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mikhaı̈l R. Baklanov. The network helps show where Mikhaı̈l R. Baklanov may publish in the future.

Co-authorship network of co-authors of Mikhaı̈l R. Baklanov

This figure shows the co-authorship network connecting the top 25 collaborators of Mikhaı̈l R. Baklanov. A scholar is included among the top collaborators of Mikhaı̈l R. Baklanov based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mikhaı̈l R. Baklanov. Mikhaı̈l R. Baklanov is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Vishnevskiy, Alexey S., et al.. (2025). Investigating the Impact of the Spatial Arrangement of the Terminal Methyl Group Relative to the Bridging Ethylene Group on the Properties of PMO Films. The Journal of Physical Chemistry B. 129(15). 3902–3917.
2.
Zhang, Jinming, Jinming Zhang, D. Spassky, et al.. (2023). UV-Excited Luminescence in Porous Organosilica Films with Various Organic Components. Nanomaterials. 13(8). 1419–1419. 1 indexed citations
3.
Zhang, Jinming, Jinming Zhang, Alexey S. Vishnevskiy, et al.. (2023). Structural and Luminescence Properties of Eu-Doped PMO Films with Ethylene Bridge and Methyl Terminal Groups. Coatings. 13(9). 1656–1656. 1 indexed citations
4.
Zhang, Jinming, K. P. Mogilnikov, Alexey S. Vishnevskiy, et al.. (2021). Effect of methyl terminal and ethylene bridging groups on porous organosilicate glass films: FTIR, ellipsometric porosimetry, luminescence dataset. SHILAP Revista de lepidopterología. 35. 106895–106895. 5 indexed citations
5.
Mironov, A. Yu., J. G. Rodrigo, Hermann Suderow, et al.. (2020). Superconductivity in a disordered metal with unscreened Coulomb interactions. arXiv (Cornell University). 1 indexed citations
6.
Pal’, A. F., D. V. Lopaev, Yu. A. Mankelevich, et al.. (2020). VUV radiation flux from argon DC magnetron plasma. Journal of Physics D Applied Physics. 53(29). 295202–295202. 3 indexed citations
7.
Wang, Yongping, et al.. (2018). Characterization of PECVD ultralow dielectric constant porous SiOCH films using triethoxymethylsilane precursor and cinene porogen. Journal of Physics D Applied Physics. 51(11). 115103–115103. 16 indexed citations
8.
Zhang, Liping, Jean‐François de Marneffe, A. Leśniewska, et al.. (2016). Cu passivation for integration of gap-filling ultralow-k dielectrics. Applied Physics Letters. 109(23). 3 indexed citations
9.
Baklanov, Mikhaı̈l R., Jean‐François de Marneffe, Daniel I. Benjamin, et al.. (2016). Influence of porosity on electrical properties of low-k dielectrics irradiated with vacuum-ultraviolet radiation. Applied Physics Letters. 109(12). 4 indexed citations
10.
Marneffe, Jean‐François de, N. Heylen, Gayle Murdoch, et al.. (2015). Damage free integration of ultralow-k dielectrics by template replacement approach. Applied Physics Letters. 107(9). 25 indexed citations
11.
Baklanov, Mikhaı̈l R., Jean‐François de Marneffe, Liping Zhang, Ivan Ciofi, & Zsolt Tökei. (2014). Cryogenic etching reduces plasma-induced damage of ultralow-k dielectrics. Solid State Technology. 57(5). 2 indexed citations
12.
Goethals, Frederik, Els De Canck, Mikhaı̈l R. Baklanov, et al.. (2013). Pore Narrowing of Mesoporous Silica Materials. Materials. 6(2). 570–579. 3 indexed citations
13.
Baklanov, Mikhaı̈l R., et al.. (2012). Materials, processes, and reliability for advanced interconnects for micro- and nanoelectronics--2011 : symposium held April 25-29, 2011, San Francisco, California, U.S.A.. Cambridge University Press eBooks.
14.
Zhao, Larry, et al.. (2011). Direct observation of the 1/E dependence of time dependent. Applied Physics Letters. 98(3). 32107. 5 indexed citations
15.
Urbanowicz, Adam, et al.. (2010). Mechanism of k-value Reduction of PECVD Low-k Films Treated with He/H2 Ash Plasma. Lirias (KU Leuven). 2 indexed citations
16.
Sacépé, Benjamin, C. Chapelier, T. I. Baturina, et al.. (2009). Fluctuation-induced pseudogap in thin conventional superconducting films. arXiv (Cornell University). 1 indexed citations
17.
Himcinschi, Cameliu, M. Friedrich, Stefan E. Schulz, et al.. (2002). Ellipsometric study of the change in the porosity of silica xerogels after chemical modification of the surface with hexamethyldisilazane. Analytical and Bioanalytical Chemistry. 374(4). 654–657. 12 indexed citations
18.
Baklanov, Mikhaı̈l R. & K. P. Mogilnikov. (2000). Characterization of porous dielectric films by ellipsometric porosimetry.. Optica Applicata. 30. 491–494. 6 indexed citations
19.
Baklanov, Mikhaı̈l R., et al.. (1996). The role of the negatively charged (Si3−Si−F2)− complexes in interactions of fluorine with the (111) surface of silicon. Journal of Structural Chemistry. 37(1). 11–17. 1 indexed citations
20.
Baklanov, Mikhaı̈l R., et al.. (1974). Initiation of a surface chemical reaction between single-crystal germanium and bromine gas by using a powerful argon laser. Soviet physics. Doklady. 19. 312. 2 indexed citations

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