Patrick Jaenen

1.3k total citations
47 papers, 966 citations indexed

About

Patrick Jaenen is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Patrick Jaenen has authored 47 papers receiving a total of 966 indexed citations (citations by other indexed papers that have themselves been cited), including 46 papers in Electrical and Electronic Engineering, 19 papers in Biomedical Engineering and 11 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Patrick Jaenen's work include Advancements in Photolithography Techniques (23 papers), 3D IC and TSV technologies (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Patrick Jaenen is often cited by papers focused on Advancements in Photolithography Techniques (23 papers), 3D IC and TSV technologies (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (12 papers). Patrick Jaenen collaborates with scholars based in Belgium, Netherlands and United States. Patrick Jaenen's co-authors include Pieter Dumon, Wim Bogaerts, Dries Van Thourhout, Roel Baets, Johan Wouters, Dirk Taillaert, S. Beckx, Vincent Wiaux, Shankar Kumar Selvaraja and S. Beckx and has published in prestigious journals such as Optics Express, Japanese Journal of Applied Physics and Journal of Lightwave Technology.

In The Last Decade

Patrick Jaenen

47 papers receiving 919 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Patrick Jaenen Belgium 12 926 446 173 151 51 47 966
Marc Zussy France 17 678 0.7× 250 0.6× 195 1.1× 44 0.3× 89 1.7× 37 751
Tolga Tekin Germany 14 820 0.9× 315 0.7× 280 1.6× 62 0.4× 28 0.5× 66 899
G. M. Cohen United States 17 1.1k 1.2× 191 0.4× 446 2.6× 38 0.3× 198 3.9× 61 1.2k
Theodor Nielsen Denmark 13 958 1.0× 617 1.4× 174 1.0× 85 0.6× 48 0.9× 44 1.2k
David N. Hutchison United States 6 445 0.5× 230 0.5× 132 0.8× 62 0.4× 78 1.5× 7 577
Hans Loeschner Austria 12 384 0.4× 98 0.2× 264 1.5× 121 0.8× 61 1.2× 73 534
Benjamin Vincent Belgium 20 1.4k 1.5× 473 1.1× 436 2.5× 15 0.1× 212 4.2× 87 1.5k
Mikhail Haurylau United States 11 684 0.7× 280 0.6× 113 0.7× 34 0.2× 98 1.9× 20 749
P. Spirito Italy 22 1.2k 1.3× 239 0.5× 52 0.3× 17 0.1× 93 1.8× 109 1.2k
Craig Armiento United States 17 743 0.8× 534 1.2× 117 0.7× 20 0.1× 125 2.5× 70 910

Countries citing papers authored by Patrick Jaenen

Since Specialization
Citations

This map shows the geographic impact of Patrick Jaenen's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Patrick Jaenen with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Patrick Jaenen more than expected).

Fields of papers citing papers by Patrick Jaenen

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Patrick Jaenen. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Patrick Jaenen. The network helps show where Patrick Jaenen may publish in the future.

Co-authorship network of co-authors of Patrick Jaenen

This figure shows the co-authorship network connecting the top 25 collaborators of Patrick Jaenen. A scholar is included among the top collaborators of Patrick Jaenen based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Patrick Jaenen. Patrick Jaenen is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Wise, Rich, Liesbeth Reijnen, Patrick Jaenen, et al.. (2016). Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9780. 978007–978007. 3 indexed citations
2.
Civale, Yann, Stefaan Van Huylenbroeck, A. Redolfi, et al.. (2013). Via-middle through-silicon via with integrated airgap to zero TSV-induced stress impact on device performance. 1420–1424. 10 indexed citations
3.
Suhard, Samuel, K. Vandersmissen, Patrick Jaenen, et al.. (2012). 3D integration challenges for fine pitch back side micro-bumping on ZoneBOND™ wafers. 1–5. 1 indexed citations
4.
Potoms, Goedele, Alain Phommahaxay, Patrick Jaenen, et al.. (2011). Integration challenges of Cu pillars with extreme wafer thinning for 3D stacking and packaging. 25–28. 4 indexed citations
5.
Civale, Yann, Deniz Sabuncuoglu Tezcan, Harold Philipsen, et al.. (2009). Die stacking using 3D-wafer level packaging copper/polymer through-si via technology and Cu/Sn interconnect bumping. 1–4. 20 indexed citations
6.
Dal, M.J.H. van, M. Demand, Denis Shamiryan, et al.. (2007). Metal Inserted Poly-Si (MIPS) and FUSI dual metal (TaN and NiSi) CMOS integration. 1–2. 1 indexed citations
7.
Dumon, Pieter, Wim Bogaerts, Dries Van Thourhout, et al.. (2006). A nanophotonic 4/spl times/4 wavelength router in silicon-on-insulator. Ghent University Academic Bibliography (Ghent University). 3 pp.–3 pp.. 1 indexed citations
8.
Dumon, Pieter, Wim Bogaerts, Dries Van Thourhout, et al.. (2006). Compact wavelength router based on a Silicon-on-insulator arrayed waveguide grating pigtailed to a fiber array. Optics Express. 14(2). 664–664. 104 indexed citations
9.
Dumon, Pieter, Wim Bogaerts, Dries Van Thourhout, et al.. (2005). Compact arrayed waveguide grating devices in Silicon-on-insulator. Ghent University Academic Bibliography (Ghent University). 105–108. 2 indexed citations
10.
Bogaerts, Wim, Pieter Dumon, Patrick Jaenen, et al.. (2005). Silicon-on-insulator nanophotonics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5956. 59560R–59560R. 10 indexed citations
11.
Jenei, S., Stefaan Decoutere, Gillis Winderickx, et al.. (2001). High Q inductor add-on module in thick Cu/SiLK/sup TM/ single damascene. 107–109. 17 indexed citations
12.
Vandenberghe, Geert, et al.. (2001). (Sub-) 100-nm gate patterning using 248-nm alternating PSM. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4409. 61–61. 1 indexed citations
13.
Pollentier, Ivan, et al.. (2001). Front-end-of-line process development using 193-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4404. 56–56. 1 indexed citations
14.
Roey, Frieda Van, et al.. (2000). Implementation of ArF Resist Processes for 130nm and below.. Journal of Photopolymer Science and Technology. 13(4). 635–644. 1 indexed citations
15.
Jaenen, Patrick, et al.. (1999). Recent advancements in 193 nm step and scan lithography.. Journal of Photopolymer Science and Technology. 12(3). 445–455. 1 indexed citations
16.
Beeck, Maaike Op de, Geert Vandenberghe, Patrick Jaenen, et al.. (1998). Bottom-ARC optimization methodology for 0.25-μm lithography and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3334. 322–322. 2 indexed citations
17.
Beeck, Maaike Op de, Kurt Ronse, Kouros Ghandehari, et al.. (1997). NA/σ optimization strategies for an advanced DUV stepper applied to 0.25-μm and sub-0.25-μm critical levels. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3051. 320–320. 4 indexed citations
18.
Jonckheere, R., Wolfgang Henke, Kurt Ronse, et al.. (1993). New resolution-enhancing mask for projection lithography based on in-situ off-axis illumination. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1927. 190–190. 2 indexed citations
19.
Jaenen, Patrick, et al.. (1991). <title>Improving the performance and usability of a wet-developable DUV resist for sub-500nm lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1463. 16–29. 5 indexed citations
20.
Jaenen, Patrick, et al.. (1990). Enhanced I-line resist profiles through the use of an intermediate development bake. Microelectronic Engineering. 11(1-4). 147–152. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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