Mireille Maenhoudt

637 total citations
47 papers, 457 citations indexed

About

Mireille Maenhoudt is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Mireille Maenhoudt has authored 47 papers receiving a total of 457 indexed citations (citations by other indexed papers that have themselves been cited), including 46 papers in Electrical and Electronic Engineering, 27 papers in Biomedical Engineering and 14 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Mireille Maenhoudt's work include Advancements in Photolithography Techniques (41 papers), Copper Interconnects and Reliability (14 papers) and Advanced Surface Polishing Techniques (12 papers). Mireille Maenhoudt is often cited by papers focused on Advancements in Photolithography Techniques (41 papers), Copper Interconnects and Reliability (14 papers) and Advanced Surface Polishing Techniques (12 papers). Mireille Maenhoudt collaborates with scholars based in Belgium, United States and Netherlands. Mireille Maenhoudt's co-authors include Herbert Struyf, Geert Vandenberghe, Roel Gronheid, Jo Finders, Vincent Wiaux, Mircea Dusa, M. Van Hove, Janko Versluijs, Kurt Ronse and T. Vandeweyer and has published in prestigious journals such as Journal of The Electrochemical Society, IEEE Transactions on Circuits and Systems I Regular Papers and Microelectronic Engineering.

In The Last Decade

Mireille Maenhoudt

45 papers receiving 414 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Mireille Maenhoudt Belgium 12 419 211 105 61 45 47 457
Yunfei Deng United States 13 389 0.9× 112 0.5× 151 1.4× 158 2.6× 37 0.8× 54 577
Katsuya Okumura Japan 12 374 0.9× 98 0.5× 86 0.8× 21 0.3× 24 0.5× 56 430
Yuansheng Ma United States 12 377 0.9× 158 0.7× 49 0.5× 26 0.4× 20 0.4× 41 436
Mircea Dusa Netherlands 14 635 1.5× 270 1.3× 221 2.1× 31 0.5× 77 1.7× 109 710
T. Vandeweyer Belgium 15 622 1.5× 135 0.6× 52 0.5× 37 0.6× 17 0.4× 43 648
Chris Bencher United States 10 361 0.9× 173 0.8× 65 0.6× 30 0.5× 42 0.9× 22 442
Han-Ku Cho South Korea 9 381 0.9× 140 0.7× 141 1.3× 24 0.4× 8 0.2× 111 421
Ki‐Ho Baik United States 10 399 1.0× 177 0.8× 96 0.9× 21 0.3× 10 0.2× 90 435
Neal Lafferty United States 11 293 0.7× 155 0.7× 129 1.2× 25 0.4× 12 0.3× 42 368
Bhanwar Singh United States 12 271 0.6× 110 0.5× 73 0.7× 25 0.4× 13 0.3× 44 417

Countries citing papers authored by Mireille Maenhoudt

Since Specialization
Citations

This map shows the geographic impact of Mireille Maenhoudt's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Mireille Maenhoudt with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Mireille Maenhoudt more than expected).

Fields of papers citing papers by Mireille Maenhoudt

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Mireille Maenhoudt. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Mireille Maenhoudt. The network helps show where Mireille Maenhoudt may publish in the future.

Co-authorship network of co-authors of Mireille Maenhoudt

This figure shows the co-authorship network connecting the top 25 collaborators of Mireille Maenhoudt. A scholar is included among the top collaborators of Mireille Maenhoudt based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Mireille Maenhoudt. Mireille Maenhoudt is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Halder, Sandip, Andy Miller, Ingrid De Wolf, et al.. (2013). Metrology and inspection challenges for manufacturing 3D stacked IC's. 75–79. 3 indexed citations
2.
Siew, Yong Kong, Janko Versluijs, E. Kunnen, et al.. (2010). Integration of 20nm half pitch single damascene copper trenches by spacer-defined double patterning (SDDP) on metal hard mask (MHM). 1–3. 9 indexed citations
3.
Finders, Jo, Mircea Dusa, Timon Fliervoet, et al.. (2009). Dense lines created by spacer DPT scheme: process control by local dose adjustment using advanced scanner control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72740R–72740R. 6 indexed citations
4.
Ronse, Kurt, et al.. (2008). Lithography options for the 32nm half pitch node and beyond. 6924 24. 371–378. 3 indexed citations
5.
Ward, Brian, et al.. (2008). Checking design conformance and optimizing manufacturability using automated double patterning decomposition. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6925. 69251Q–69251Q. 3 indexed citations
6.
Melvin, Lawrence S., et al.. (2008). Exploration of etch step interactions in the dual patterning process for process modeling. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2434–2440. 1 indexed citations
7.
Maenhoudt, Mireille, et al.. (2008). Alternative process schemes for double patterning that eliminate the intermediate etch step - art. no. 69240P. 2 indexed citations
8.
Maenhoudt, Mireille, et al.. (2008). Alternative process schemes for double patterning that eliminate the intermediate etch step. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69240P–69240P. 20 indexed citations
9.
Lucas, Kevin, et al.. (2008). Printability verification for double-patterning technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71220Q–71220Q. 3 indexed citations
10.
Maenhoudt, Mireille. (2005). Double Patterning scheme for sub-0.25 k1 single damascene structures at NA=0.75, λ=193nm. 5754. 1508–1518. 16 indexed citations
11.
Olmen, J. Van, Wen‐Wei Wu, M. Van Hove, et al.. (2004). Integration of Single Damascene 85/85 nm L/S copper trenches in Black Diamond using 193 nm optical lithography with dipole illumination. 612. 171–173. 1 indexed citations
12.
Gray, William D., Mark J. Loboda, Herbert Struyf, et al.. (2003). Process Optimization and Integration of Trimethylsilane-Deposited α-SiC:H and α-SiCO:H Dielectric Thin Films for Damascene Processing. Journal of The Electrochemical Society. 150(7). G404–G404. 11 indexed citations
13.
Das, Abhishek, Quoc Toan Le, Yuki Furukawa, et al.. (2003). Characterisation of JSR’s spin-on hardmask FF-02. Microelectronic Engineering. 70(2-4). 308–313. 2 indexed citations
14.
Das, Abhishek, Yoshiaki Furukawa, Francesca Iacopi, et al.. (2003). Cu/LKD-5109 damascene integration demonstration using FF-02 low-k spin-on hard-mask and embedded etch-stop. 51–53. 2 indexed citations
15.
Donaton, R. A., Mireille Maenhoudt, Ivan Pollentier, et al.. (2001). Integration of Cu and low-k dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures. Microelectronic Engineering. 55(1-4). 277–283. 12 indexed citations
16.
Chen, Xuemei, et al.. (2001). Automated method for overlay sample plan optimization based on spatial variation modeling. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4344. 257–257. 5 indexed citations
17.
Maenhoudt, Mireille, et al.. (2000). Limits of optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4000. 373–373. 4 indexed citations
18.
Ronse, Kurt, et al.. (1999). <title>Recent trends and progress in deep-UV lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3741. 34–39. 1 indexed citations
19.
Dirksen, Peter, et al.. (1999). Novel aberration monitor for optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3679. 77–77. 25 indexed citations
20.
Beeck, Maaike Op de, Kurt Ronse, Kouros Ghandehari, et al.. (1997). NA/σ optimization strategies for an advanced DUV stepper applied to 0.25-μm and sub-0.25-μm critical levels. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3051. 320–320. 4 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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