Robert Socha

969 citations

92 papers · 707 indexed · h-index 14

Impact in

Surfaces, Coatings and Films top 5%
- Optical Coatings and Gratings
Media Technology top 5%
- Image Processing Techniques and Applications

Papers in ⓘ

Surfaces, Coatings and Films 30
- Electron and X-Ray Spectroscopy Techniques 18
- Optical Coatings and Gratings 12
Electrical and Electronic Engineering 82
- Advancements in Photolithography Techniques 79
- Integrated Circuits and Semiconductor Failure Analysis 36
- 3D IC and TSV technologies 13

Co-authors: Xuelong Shi (20 shared papers)Stephen Hsu (20 shared papers)Mircea Dusa (22 shared papers)Andrew R. Neureuther (9 shared papers)Thomas V. Pistor (4 shared papers)Donis G. Flagello (10 shared papers)Jo Finders (11 shared papers)Huayu Liu (5 shared papers)
Journals: Microelectronic Engineering (3 papers)Japanese Journal of Applied Physics (2 papers)IEEE Transactions on Semiconductor Manufacturing (1 paper)Sustainability (1 paper)EUROPEAN RESEARCH STUDIES JOURNAL (1 paper)
Partner nations: United States Netherlands Belgium

In The Last Decade

Robert Socha

80 papers receiving 610 citations

Peers

Countries citing papers authored by Robert Socha

Since Specialization

Citations

This map shows the geographic impact of Robert Socha's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Robert Socha with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Robert Socha more than expected).

Fields of papers citing papers by Robert Socha

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Robert Socha. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Robert Socha. The network helps show where Robert Socha may publish in the future.

Co-authors

The 25 scholars most cited alongside Robert Socha, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Robert Socha Line = papers co-authored together Robert Socha links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 92 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Simultaneous source mask optimization (SMO) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Socha, Xuelong Shi, David LeHoty	2005	60
2	An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Stephen Hsu, Luoqi Chen, Zhipan Li, Sean S. Park, Keith Gronlund, Huayu Liu, Neal P. Callan, Robert Socha, Steve Hansen	2008	42
3	Modeling oblique incidence effects in photomasks Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Thomas V. Pistor, Andrew R. Neureuther, Robert Socha	2000	40
4	Performance of FlexRay: a fully programmable illumination system for generation of freeform sources on high NA immersion systems Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Melchior Mulder, André Engelen, O.F.J. Noordman, Gert Streutker, Bert van Drieenhuizen, Cas van Nuenen, Wilfred Endendijk, J. Verbeeck, Wim Bouman, Anita Bouma, Robert Kazinczi, Robert Socha, Dirk Jürgens, J. Zimmermann, Bastian Trauter, Joost Bekaert, Bart Laenens, Daniel Corliss, Greg McIntyre	2010	40
5	Urban Video Surveillance as a Tool to Improve Security in Public Spaces Sustainability ·Robert Socha, Bogusław Kogut	2020	32
6	Development of layout split algorithms and printability evaluation for double patterning technology Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Tsann-Bim Chiou, Robert Socha, Hong Chen, Luoqi Chen, Stephen Hsu, Peter Nikolsky, Anton van Oosten, Alek C. Chen	2008	32
7	Application challenges with double patterning technology (DPT) beyond 45 nm Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jungchul Park, Stephen Hsu, Douglas Van Den Broeke, J. Fung Chen, Mircea Dusa, Robert Socha, Jo Finders, Bert Vleeming, Anton van Oosten, Peter Nikolsky, Vincent Wiaux, Eric Hendrickx, Joost Bekaert, Geert Vandenberghe	2006	32
8	Understanding the forbidden pitch phenomenon and assist feature placement Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Xuelong Shi, Stephen Hsu, Jiarui Chen, Chungwei Michael Hsu, Robert Socha, Mircea Dusa	2002	31
9	Forbidden pitches for 130-nm lithography and below Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Socha, Mircea Dusa, Luigi Capodieci, Jo Finders, J. Fung Chen, Donis G. Flagello, K. D. Cummings	2000	24
10	Contact hole reticle optimization by using interference mapping lithography (IML) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Socha, Douglas J. Van Den Broeke, Stephen Hsu, J. Fung Chen, Thomas L. Laidig, Noel Corcoran, Uwe Hollerbach, Kurt E. Wampler, Xuelong Shi, Willard E. Conley	2004	22
11	Optimizing and enhancing optical systems to meet the low k 1 challenge Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Donis G. Flagello, Robert Socha, Xuelong Shi, Jan B. van Schoot, Jan Baselmans, Mark van de Kerkhof, Wim de Boeij, André Engelen, Rene Carpaij, O.F.J. Noordman, M.H.P. Moers, Melchior Mulder, Jo Finders, Henk van Greevenbroek, Martin Schriever, Manfred Maul, H. Haidner, Markus Goeppert, Ulrich Wegmann, Paul Graeupner	2003	18
12	Source-mask co-optimization: optimize design for imaging and impact of source complexity on lithography performance Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Stephen Hsu, Zhipan Li, Luoqi Chen, Keith Gronlund, Huayu Liu, Robert Socha	2009	17
13	Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20 Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Judy Huckabay, Wolf Staud, Robert J. Naber, Anton van Oosten, Peter Nikolski, Stephen Hsu, Robert Socha, Mircea Dusa, Donis G. Flagello	2006	13
14	22nm logic lithography in the presence of local interconnect Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Michael C. Smayling, Robert Socha, Mircea Dusa	2010	13
15	Assessment of a hypothetical roadmap that extends optical lithography through the 70-nm technology node Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John S. Petersen, Martin McCallum, Nishrin Kachwala, Robert Socha, J. Fung Chen, Thomas L. Laidig, Bruce W. Smith, Ronald L. Gordon, Chris A. Mack	1998	12
16	Computational scanner wafer mark alignment Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Boris Menchtchikov, Robert Socha, Sudharshanan Raghunathan, Irina Lyulina, Hielke Schoonewelle, Patrick Tinnemans, Paul Tuffy, Philippe Leray, Christiane Jehoul	2017	12
17	Dipole decomposition mask design for full-chip implementation at 100-nm technology node and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Stephen Hsu, Noel Corcoran, Mark Eurlings, William T. Knose, Thomas L. Laidig, Kurt E. Wampler, Sabita Roy, Xuelong Shi, Chungwei Michael Hsu, J. Fung Chen, Jo Finders, Robert Socha, Mircea Dusa	2002	10
18	Improving scanner wafer alignment performance by target optimization Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Philippe Leray, Christiane Jehoul, Robert Socha, Boris Menchtchikov, Sudhar Raghunathan, E. R. Kent, Hielke Schoonewelle, Patrick Tinnemans, Paul Tuffy, Jun Belen, Rich Wise	2016	10
19	Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask through simulation I Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Socha, John S. Petersen, J. Fung Chen, Thomas L. Laidig, Kurt E. Wampler, Roger F. Caldwell	1998	10
20	Contact hole reticle optimization by using interference mapping lithography (IML) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Robert Socha, Douglas J. Van Den Broeke, Stephen D. H. Hsu, J. Fung Chen, Thomas L. Laidig, Noel Corcoran, Uwe Hollerbach, Kurt E. Wampler, Xuelong Shi, Will Conley	2004	9

About Robert Socha

Robert Socha is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Industrial and Manufacturing Engineering, Biomedical Engineering and Computational Mechanics, having authored 92 papers that have together received 707 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (79 papers), Integrated Circuits and Semiconductor Failure Analysis (36 papers), Electron and X-Ray Spectroscopy Techniques (18 papers), Advanced Surface Polishing Techniques (16 papers), Industrial Vision Systems and Defect Detection (14 papers), 3D IC and TSV technologies (13 papers), Nanofabrication and Lithography Techniques (13 papers) and Optical Coatings and Gratings (12 papers). The work is most often cited by research in Surfaces, Coatings and Films (150 citations), Media Technology (124 citations), Hardware and Architecture (75 citations), Electrical and Electronic Engineering (636 citations) and Industrial and Manufacturing Engineering (67 citations). Robert Socha has collaborated with scholars based in United States, Netherlands and Belgium. Frequent co-authors include Xuelong Shi, Stephen Hsu, Mircea Dusa, Andrew R. Neureuther, Thomas V. Pistor, Donis G. Flagello, Jo Finders, Huayu Liu, Zhipan Li and Will Conley. Their work appears in journals such as Microelectronic Engineering, Japanese Journal of Applied Physics, IEEE Transactions on Semiconductor Manufacturing, Sustainability and EUROPEAN RESEARCH STUDIES JOURNAL.

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