Robert Socha

969 total citations
92 papers, 707 citations indexed

About

Robert Socha is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Robert Socha has authored 92 papers receiving a total of 707 indexed citations (citations by other indexed papers that have themselves been cited), including 82 papers in Electrical and Electronic Engineering, 37 papers in Biomedical Engineering and 30 papers in Surfaces, Coatings and Films. Recurrent topics in Robert Socha's work include Advancements in Photolithography Techniques (79 papers), Integrated Circuits and Semiconductor Failure Analysis (36 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Robert Socha is often cited by papers focused on Advancements in Photolithography Techniques (79 papers), Integrated Circuits and Semiconductor Failure Analysis (36 papers) and Electron and X-Ray Spectroscopy Techniques (18 papers). Robert Socha collaborates with scholars based in United States, Netherlands and Belgium. Robert Socha's co-authors include Xuelong Shi, Stephen Hsu, Mircea Dusa, Andrew R. Neureuther, Thomas V. Pistor, Jo Finders, Donis G. Flagello, Huayu Liu, Zhipan Li and Will Conley and has published in prestigious journals such as SHILAP Revista de lepidopterología, Sustainability and Japanese Journal of Applied Physics.

In The Last Decade

Robert Socha

80 papers receiving 610 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Robert Socha United States 14 636 280 150 124 75 92 707
Yuri Granik United States 16 798 1.3× 314 1.1× 131 0.9× 208 1.7× 56 0.7× 79 848
Nicolas B. Cobb United States 14 577 0.9× 192 0.7× 110 0.7× 166 1.3× 77 1.0× 31 606
Linyong Pang United States 14 608 1.0× 229 0.8× 132 0.9× 176 1.4× 9 0.1× 79 676
Tim Fühner Germany 12 367 0.6× 120 0.4× 114 0.8× 55 0.4× 8 0.1× 48 455
Jongwook Kye United States 11 368 0.6× 130 0.5× 35 0.2× 25 0.2× 59 0.8× 56 395
Cyrus Tabery United States 11 668 1.1× 119 0.4× 63 0.4× 17 0.1× 32 0.4× 50 704
Luigi Capodieci United States 12 473 0.7× 124 0.4× 37 0.2× 29 0.2× 132 1.8× 58 513
Andreas Fuchs Germany 11 272 0.4× 179 0.6× 81 0.5× 13 0.1× 17 0.2× 35 414
Jason P. Cain United States 10 432 0.7× 64 0.2× 81 0.5× 7 0.1× 160 2.1× 36 492
Shayak Banerjee United States 12 389 0.6× 61 0.2× 9 0.1× 54 0.4× 44 0.6× 44 454

Countries citing papers authored by Robert Socha

Since Specialization
Citations

This map shows the geographic impact of Robert Socha's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Robert Socha with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Robert Socha more than expected).

Fields of papers citing papers by Robert Socha

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Robert Socha. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Robert Socha. The network helps show where Robert Socha may publish in the future.

Co-authorship network of co-authors of Robert Socha

This figure shows the co-authorship network connecting the top 25 collaborators of Robert Socha. A scholar is included among the top collaborators of Robert Socha based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Robert Socha. Robert Socha is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Socha, Robert, et al.. (2022). The Covid-19 Pandemic and the Impact of Passenger air Transport in Europe on Crude Oil Prices in Terms of Economic Security. Journal of Security and Sustainability Issues. 5–16.
2.
3.
Socha, Robert, et al.. (2019). Safety of mass sports events. SHILAP Revista de lepidopterología. 23(1). 42–44. 1 indexed citations
4.
Socha, Robert, et al.. (2012). "Zarządzanie kryzysowe. Teoria, praktyka, konteksty, badania", red. nauk. Jadwiga Stawnicka, Bernard Wiśniewski, Robert Socha, Szczytno 2011 : [recenzja] / Andrzej Chodyński.. 6(3). 109–111. 2 indexed citations
5.
Smayling, Michael C., Robert Socha, & Mircea Dusa. (2010). 22nm logic lithography in the presence of local interconnect. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7640. 764019–764019. 13 indexed citations
6.
Hsu, Stephen, Zhipan Li, Sean S. Park, et al.. (2008). An innovative Source-Mask co-Optimization (SMO) method for extending low k1 imaging. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7140. 714010–714010. 42 indexed citations
7.
Hsu, Stephen, et al.. (2006). Process results using automatic pitch decomposition and double patterning technology (DPT) at k1eff <0.20. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6349. 634910–634910. 13 indexed citations
8.
Hollerbach, Uwe, et al.. (2005). Model-based scattering bars implementation for 65nm and 45nm nodes using IML technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5853. 659–659. 6 indexed citations
9.
Socha, Robert, Stephen D. H. Hsu, Noel Corcoran, et al.. (2004). Contact hole reticle optimization by using interference mapping lithography (IML). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 222–222. 9 indexed citations
10.
Flagello, Donis G., et al.. (2004). Optical lithography in the sub-50-nm regime. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 21–21. 9 indexed citations
11.
Flagello, Donis G., Robert Socha, Xuelong Shi, et al.. (2003). Optimizing and enhancing optical systems to meet the low k 1 challenge. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 139–139. 18 indexed citations
12.
Hsu, Stephen D. H., et al.. (2003). 65-nm full-chip implementation using double dipole lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 215–215. 7 indexed citations
13.
Socha, Robert, Will Conley, Wei Wu, et al.. (2002). Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 446–446. 1 indexed citations
14.
Hsu, Stephen D. H., et al.. (2002). Complex 2D pattern lithography at λ/4 resolution using chromeless phase lithography (CPL). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 196–196. 6 indexed citations
15.
Wu, Wei, et al.. (2002). Application of Chromeless Phase Lithography (CPL) masks in ArF lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 1189–1189.
16.
Socha, Robert, Xuelong Shi, Mircea Dusa, et al.. (1999). Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3679. 38–38. 1 indexed citations
17.
Socha, Robert, et al.. (1997). Simulating photomask edge roughness and corner rounding. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3050. 215–215. 2 indexed citations
18.
Socha, Robert, et al.. (1997). Effect of the partial coherence on reflective notching. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3051. 479–479. 1 indexed citations
19.
Socha, Robert & Andrew R. Neureuther. (1997). Filter design methodology for defect detection in wafer inspection. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 15(6). 2718–2724. 2 indexed citations
20.
Socha, Robert & Andrew R. Neureuther. (1995). <title>Role of illumination and thin film layers on the printability of defects</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2440. 532–540. 2 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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