Jan van Schoot

992 citations

50 papers · 722 indexed · h-index 16

Impact in

Surfaces, Coatings and Films top 2%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
Radiation top 5%
- Advanced X-ray Imaging Techniques

Papers in

Surfaces, Coatings and Films 30
- Electron and X-Ray Spectroscopy Techniques 29
Electrical and Electronic Engineering 48
- Advancements in Photolithography Techniques 47
- Integrated Circuits and Semiconductor Failure Analysis 31
- Semiconductor materials and devices 2

Co-authors: Winfried Kaiser Koen van Ingen Schenau Bernhard Kneer Jens Timo Neumann Kars Troost Eelco van Setten Judon Stoeldraijer Peter Kuerz
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)Nature Reviews Methods Primers (1 paper)IEEE Spectrum (1 paper)Advanced Optical Technologies (1 paper)SPIE Newsroom (1 paper)
Partner nations: Netherlands Germany Belgium

In The Last Decade

Jan van Schoot

48 papers receiving 639 citations

Peers

Countries citing papers authored by Jan van Schoot

Since Specialization

Citations

This map shows the geographic impact of Jan van Schoot's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jan van Schoot with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jan van Schoot more than expected).

Fields of papers citing papers by Jan van Schoot

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jan van Schoot. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jan van Schoot. The network helps show where Jan van Schoot may publish in the future.

Co-authors

The 25 scholars most cited alongside Jan van Schoot, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Jan van Schoot Line = papers co-authored together Jan van Schoot links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Progress towards adoption of high-NA EUV lithography in pilot manufacturing 敏子米川, Eelco van Setten, Sjoerd Lok, Jan van Schoot, Ana Carolina Poton de Abreu, Jay Varner, Rudy Peeters, Stephane Assadourian, 田紀子相野, 秋田将行, N. G. Smirnova, Oleksandra Dmytrenko, Peter Vanoppen	2025	0
2	High-NA EUV imaging in action: tackling the depth-of-focus challenge for superior resolution and LCDU Eelco van Setten, Shuang Jiao, (unknown), طلال الزهيري, (unknown), 博史小山, Rashid Ghorbani Afkhami, Jan van Schoot, Jo Finders, 敏子米川, I. F. Nazmiev, Lang Zhang, Stephen Hsu, Martin Duffy	2025	0
3	The next step in Moore’s law: high-NA EUV introduction at the customer Moreno Mondragón Daniela, Rudy Peeters, Marieni A., Sjoerd Lok, Jan van Schoot, Paul Gräupner, Peter Kuerz, N. G. Smirnova, Oleksandra Dmytrenko, Peter Vanoppen	2024	4
4	Extreme ultraviolet lithography Nature Reviews Methods Primers ·Dimitrios Kazazis, Jara G. Santaclara, Jan van Schoot, Iacopo Mochi, Yasin Ekinci	2024	32
5	Exposure Tool Development Toward Advanced EUV Lithography: A Journey of 40 Years Driving Moore’s Law Jan van Schoot	2024	10
6	Emergence of next generation EUV optics: status, outlook and future D. Golde, Björn Butscher, Paul Gräupner, Peter Kürz, Josef Chladil, Boris Chobrutskiy Chobrutskiy, Jan van Schoot, Judon Stoeldraijer	2023	2
7	High NA EUV: progress update and mask impact Jan van Schoot	2023	2
8	High-NA EUV imaging: the quest for resolution, depth-of-focus, and productivity Eelco van Setten, طلال الزهيري, Claire van Lare, Jan van Schoot, Jo Finders, Xiaofei Cui	2022	3
9	High-NA EUV lithography exposure tool: key advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Thomas Stammler	2021	16
10	High-NA EUVL exposure tool: key advantages and program status Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Thomas Stammler, Kars Troost	2021	5
11	High-NA EUV imaging: from system introduction towards low-k1 extension Eelco van Setten, Jan van Schoot, Ic Bosenbruoh, Claire van Lare, 罗哲, Gijsbert Rispens, 泰彦渡會, J. Zgadzaj, Natalia Davydova, Jo Finders, J. Zimmermann, Bartosz Bilski, Paul Graeupner	2021	2
12	High NA EUV scanner: obscuration and wavefront description Л. І. Гребеник, 陈良中, Jan van Schoot, Kars Troost, Keith B. Oldham, Stephen D. H. Hsu, Toralf Gruner, Juergen Mueller, Karl Friedrich Hermann, Bartosz Bilski, J. Zimmermann, Paul Graeupner	2020	8
13	High-NA EUV imaging: challenges and outlook Bartosz Bilski, J. Zimmermann, Fairuz Nabil Izdihar, Christelle de Vallière, Eelco van Setten, 泰彦渡會, Jan van Schoot	2019	8
14	High NA EUV lithography: Next step in EUV imaging Eelco van Setten, 泰彦渡會, J. Zgadzaj, Jan van Schoot, Kars Troost, L® thi Bich-Thuy, Timon Fliervoet, Stephen Hsu, J. Zimmermann, Fairuz Nabil Izdihar, Bartosz Bilski, Paul Graeupner	2019	45
15	High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation) Jan van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, J. Zimmermann, Paul Graeupner, Peter Kuerz, Winfried Kaiser	2019	1
16	The future of EUV lithography: continuing Moore's Law into the next decade Jan van Schoot, Kars Troost, R. Wentorp, Marieni A., Sjoerd Lok, M. G. Cavalcante, Judon Stoeldraijer, Jos Benschop, Jo Finders, H. Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Tim Crich	2018	9
17	Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·泰彦渡會, 光晴伊東, R. H. Finch, Eelco van Setten, Gijsbert Rispens, Jan van Schoot, Koen van Ingen Schenau	2016	6
18	Improving the resolution of extreme-UV lithography scanners SPIE Newsroom ·Jan van Schoot, Kars Troost, Tim Crich, Bernhard Kneer	2016	1
19	Utilization of Insitu Metrology Capability of ASML Lithography Scanner to Improve Overall Process Control Dini Pujiani, Mircea Dusa, Jan van Schoot, Syuan-Rong Dai, Maurice H. M. Janssen, Koen van Ingen Schenau, Rupali B Patle	2006	1
20	Etch, reticle, and track CD fingerprint corrections with local dose compensation Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Rupali B Patle, Tetsuhiko Maeda, Jianmei Mo, O.F.J. Noordman, 韩新年, Jan van Schoot, H Griffiths, María Trillini, Bezuayehu Tadesse Negussie, G. M Arogna, 武彰橋本, Matraszek, A. H. Gholizadeh	2005	7

About Jan van Schoot

Jan van Schoot is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Radiation, Biomedical Engineering and Hardware and Architecture, having authored 50 papers that have together received 722 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (47 papers), Integrated Circuits and Semiconductor Failure Analysis (31 papers), Electron and X-Ray Spectroscopy Techniques (29 papers), Advanced X-ray Imaging Techniques (7 papers), Advanced Surface Polishing Techniques (6 papers), Nanofabrication and Lithography Techniques (6 papers), Advanced Measurement and Metrology Techniques (2 papers) and Semiconductor materials and devices (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (345 citations), Radiation (106 citations), Electrical and Electronic Engineering (612 citations), Structural Biology (10 citations) and Biomedical Engineering (216 citations). Jan van Schoot has collaborated with scholars based in Netherlands, Germany and Belgium. Frequent co-authors include Winfried Kaiser, Koen van Ingen Schenau, Bernhard Kneer, Jens Timo Neumann, Kars Troost, Eelco van Setten, Judon Stoeldraijer, Peter Kuerz, Paul Graeupner and Jos Benschop. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Nature Reviews Methods Primers, IEEE Spectrum, Advanced Optical Technologies and SPIE Newsroom.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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