Cyrus Tabery

973 total citations · 1 hit paper
50 papers, 704 citations indexed

About

Cyrus Tabery is a scholar working on Electrical and Electronic Engineering, Industrial and Manufacturing Engineering and Biomedical Engineering. According to data from OpenAlex, Cyrus Tabery has authored 50 papers receiving a total of 704 indexed citations (citations by other indexed papers that have themselves been cited), including 48 papers in Electrical and Electronic Engineering, 16 papers in Industrial and Manufacturing Engineering and 15 papers in Biomedical Engineering. Recurrent topics in Cyrus Tabery's work include Advancements in Photolithography Techniques (44 papers), Industrial Vision Systems and Defect Detection (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (13 papers). Cyrus Tabery is often cited by papers focused on Advancements in Photolithography Techniques (44 papers), Industrial Vision Systems and Defect Detection (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (13 papers). Cyrus Tabery collaborates with scholars based in United States, Netherlands and Belgium. Cyrus Tabery's co-authors include Qian Xiang, Ming-Ren Lin, Jeffrey Bokor, Suzanne O. Bell, Chenming Hu, David F. Kyser, Leland Chang, Tsu-Jae King, Bin Yu and Safayet Ahmed and has published in prestigious journals such as Journal of The Electrochemical Society, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems and Journal of Micro/Nanopatterning Materials and Metrology.

In The Last Decade

Cyrus Tabery

43 papers receiving 650 citations

Hit Papers

FinFET scaling to 10 nm gate length 2003 2026 2010 2018 2003 100 200 300 400
What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

  1. FinFET scaling to 10 nm gate length
    2003 462 citations Bin Yu, Leland Chang et al. profile →

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Cyrus Tabery United States 11 668 119 63 52 50 50 704
Jongwook Kye United States 11 368 0.6× 130 1.1× 35 0.6× 24 0.5× 15 0.3× 56 395
Mircea Dusa Netherlands 14 635 1.0× 270 2.3× 221 3.5× 48 0.9× 23 0.5× 109 710
Germain Fenger United States 11 309 0.5× 83 0.7× 75 1.2× 46 0.9× 95 1.9× 73 352
Stewart A. Robertson United States 11 427 0.6× 135 1.1× 239 3.8× 30 0.6× 18 0.4× 66 479
Jason P. Cain United States 10 432 0.6× 64 0.5× 81 1.3× 59 1.1× 17 0.3× 36 492
Geng Han United States 11 228 0.3× 96 0.8× 91 1.4× 20 0.4× 19 0.4× 24 288
John L. Sturtevant United States 11 346 0.5× 119 1.0× 135 2.1× 66 1.3× 12 0.2× 88 396
Ki‐Ho Baik United States 10 399 0.6× 177 1.5× 96 1.5× 45 0.9× 28 0.6× 90 435
John A. Allgair United States 15 424 0.6× 187 1.6× 274 4.3× 49 0.9× 20 0.4× 64 566
Neal Lafferty United States 11 293 0.4× 155 1.3× 129 2.0× 16 0.3× 68 1.4× 42 368

Countries citing papers authored by Cyrus Tabery

Since Specialization
Citations

This map shows the geographic impact of Cyrus Tabery's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Cyrus Tabery with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Cyrus Tabery more than expected).

Fields of papers citing papers by Cyrus Tabery

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Cyrus Tabery. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Cyrus Tabery. The network helps show where Cyrus Tabery may publish in the future.

Co-authorship network of co-authors of Cyrus Tabery

This figure shows the co-authorship network connecting the top 25 collaborators of Cyrus Tabery. A scholar is included among the top collaborators of Cyrus Tabery based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Cyrus Tabery. Cyrus Tabery is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Wang, Miao, Cyrus Tabery, V. M. Blanco, & Binshan Lin. (2025). Via to metal line end process margin calibration by voltage contrast-based EPE process margin. 138–138. 2 indexed citations
2.
3.
4.
Davydova, Natalia, Vincent Wiaux, Frank Timmermans, et al.. (2024). High NA EUV stitching: mask performance is a key. 9256. 36–36. 1 indexed citations
5.
Rio, David del, et al.. (2024). EUV OPC modeling of dry photoresist system for pitch 32nm BEOL. 18–18.
6.
Tabery, Cyrus, Jiuning Hu, Rongkuo Zhao, et al.. (2024). Computational lithography and patterning evaluation to support EUV high-NA stitching. 28–28. 1 indexed citations
7.
Rio, David del, et al.. (2024). Benefits of using advanced sub-resolution features for 0.55NA brightfield imaging. 12–12. 1 indexed citations
8.
Moussa, Alain, et al.. (2023). Alignment and overlay through opaque metal layers. 15–15.
9.
10.
Zou, Yi, et al.. (2011). Optimization of mask shot count using MB-MDP and lithography simulation. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8166. 816632–816632. 14 indexed citations
11.
Deng, Yunfei, Yi Zou, Kenji Yoshimoto, et al.. (2010). Considerations in source-mask optimization for logic applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7640. 76401J–76401J. 16 indexed citations
12.
Zou, Yi, Luigi Capodieci, & Cyrus Tabery. (2009). A novel methodology for hybrid mask AF generation for 22 and 15nm technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72741B–72741B. 1 indexed citations
13.
Yang, Jie, et al.. (2006). An up-stream design auto-fix flow for manufacturability enhancement. 73–73. 5 indexed citations
14.
Tabery, Cyrus, et al.. (2006). Wafer fab mask qualification techniques and limitations. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6349. 63490U–63490U. 2 indexed citations
15.
Tabery, Cyrus, et al.. (2006). Process Window and Device Variations Evaluation using Array-Based Characterization Circuits. 260–265. 11 indexed citations
16.
Yu, Bin, Leland Chang, Safayet Ahmed, et al.. (2003). FinFET scaling to 10 nm gate length. 251–254. 462 indexed citations breakdown →
17.
Tabery, Cyrus, et al.. (2002). Comparison of DUV Wafer and Reticle Lithography: What is the Resolution Limit?. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 177–177.
18.
Tabery, Cyrus, et al.. (2001). Evaluation of 3D alternating PSM structures using mask topography simulation, and AIMS at λ=193nm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 429–429.
19.
Tabery, Cyrus, et al.. (2000). Simulation-based formulation of a nonchemically amplified resist for 257-nm laser mask fabrication. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 598–598. 2 indexed citations
20.
Tabery, Cyrus, et al.. (1999). Lithography simulation of sub-0.30-μm resist features for photomask fabrication using i-line optical pattern generators. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3873. 484–484. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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