Cyrus Tabery
- Electrical and Electronic Engineering top 5%
- Biomedical Engineering
- Surfaces, Coatings and Films top 10%
- Industrial and Manufacturing Engineering top 10%
- Materials Chemistry
- Co-authors
- Qian XiangMing-Ren LinJeffrey BokorSuzanne O. BellChenming HuDavid F. KyserLeland ChangTsu-Jae King
- Topics
- Advancements in Photolithography Techniques (44 papers)Industrial Vision Systems and Defect Detection (14 papers)Integrated Circuits and Semiconductor Failure Analysis (13 papers)
- Cited by
- Electrical and Electronic EngineeringSurfaces, Coatings and FilmsIndustrial and Manufacturing Engineering
- Journals
- Journal of The Electrochemical SocietyIEEE Transactions on Computer-Aided Design of Integrated Circuits and SystemsJournal of Micro/Nanopatterning Materials and Metrology
- Partner nations
- United StatesNetherlandsBelgium
In The Last Decade
Cyrus Tabery
43 papers receiving 650 citations
Hit Papers
Peers
Comparison fields: 5 of 34
- Electrical and Electronic Engineering 668
- Biomedical Engineering 119
- Surfaces, Coatings and Films 63
- Industrial and Manufacturing Engineering 52
- Materials Chemistry 50
Countries citing papers authored by Cyrus Tabery
This map shows the geographic impact of Cyrus Tabery's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Cyrus Tabery with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Cyrus Tabery more than expected).
Fields of papers citing papers by Cyrus Tabery
This network shows the impact of papers produced by Cyrus Tabery. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Cyrus Tabery. The network helps show where Cyrus Tabery may publish in the future.
Co-authorship network of co-authors of Cyrus Tabery
This figure shows the co-authorship network connecting the top 25 collaborators of Cyrus Tabery. A scholar is included among the top collaborators of Cyrus Tabery based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Cyrus Tabery. Cyrus Tabery is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 2 | |
| 2 | 0 | |
| 3 | 0 | |
| 4 | 1 | |
| 5 | 0 | |
| 6 | 1 | |
| 7 | 1 | |
| 8 | 0 | |
| 9 | 0 | |
| 10 | 14 | |
| 11 | 16 | |
| 12 | 1 | |
| 13 | 5 | |
| 14 | 2 | |
| 15 | 11 | |
| 16 | FinFET scaling to 10 nm gate lengthbreakdown → | 462 |
| 17 | 0 | |
| 18 | 0 | |
| 19 | 2 | |
| 20 | 1 |
About Cyrus Tabery
Cyrus Tabery is a scholar working on Surfaces, Coatings and Films, Industrial and Manufacturing Engineering and Electrical and Electronic Engineering, having authored 50 papers that have together received 704 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (44 papers), Industrial Vision Systems and Defect Detection (14 papers) and Integrated Circuits and Semiconductor Failure Analysis (13 papers). The work is most often cited by research in Electrical and Electronic Engineering (668 citations), Surfaces, Coatings and Films (63 citations) and Industrial and Manufacturing Engineering (52 citations). Cyrus Tabery has collaborated with scholars based in United States, Netherlands and Belgium. Frequent co-authors include Qian Xiang, Ming-Ren Lin, Jeffrey Bokor, Suzanne O. Bell, Chenming Hu, David F. Kyser, Leland Chang, Tsu-Jae King, Bin Yu and Safayet Ahmed. Their work appears in journals such as Journal of The Electrochemical Society, IEEE Transactions on Computer-Aided Design of Integrated Circuits and Systems and Journal of Micro/Nanopatterning Materials and Metrology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.