Jan Mulkens

620 total citations
47 papers, 467 citations indexed

About

Jan Mulkens is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Jan Mulkens has authored 47 papers receiving a total of 467 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 24 papers in Biomedical Engineering and 15 papers in Surfaces, Coatings and Films. Recurrent topics in Jan Mulkens's work include Advancements in Photolithography Techniques (43 papers), Advanced Surface Polishing Techniques (19 papers) and Integrated Circuits and Semiconductor Failure Analysis (15 papers). Jan Mulkens is often cited by papers focused on Advancements in Photolithography Techniques (43 papers), Advanced Surface Polishing Techniques (19 papers) and Integrated Circuits and Semiconductor Failure Analysis (15 papers). Jan Mulkens collaborates with scholars based in Netherlands, Germany and Belgium. Jan Mulkens's co-authors include Paul Hinnen, Donis G. Flagello, Jos Benschop, Christian Wagner, Fred de Jong, Jo Finders, Paul Gräupner, H. Bakker, Toralf Gruner and Youping Zhang and has published in prestigious journals such as Annual Review of Materials Research, IEEE Transactions on Semiconductor Manufacturing and Journal of Micro/Nanolithography MEMS and MOEMS.

In The Last Decade

Jan Mulkens

46 papers receiving 423 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jan Mulkens Netherlands 13 401 218 127 68 45 47 467
Mircea Dusa Netherlands 14 635 1.6× 270 1.2× 221 1.7× 50 0.7× 55 1.2× 109 710
Naoya Hayashi Japan 11 438 1.1× 165 0.8× 208 1.6× 62 0.9× 42 0.9× 132 526
Mireille Maenhoudt Belgium 12 419 1.0× 211 1.0× 105 0.8× 27 0.4× 23 0.5× 47 457
Han-Ku Cho South Korea 9 381 1.0× 140 0.6× 141 1.1× 28 0.4× 25 0.6× 111 421
John A. Allgair United States 15 424 1.1× 187 0.9× 274 2.2× 66 1.0× 96 2.1× 64 566
Jan van Schoot Netherlands 16 612 1.5× 216 1.0× 345 2.7× 37 0.5× 34 0.8× 50 722
Frieda Van Roey Belgium 12 403 1.0× 159 0.7× 191 1.5× 18 0.3× 49 1.1× 45 463
Ki‐Ho Baik United States 10 399 1.0× 177 0.8× 96 0.8× 26 0.4× 24 0.5× 90 435
Alok Vaid United States 11 292 0.7× 184 0.8× 237 1.9× 50 0.7× 105 2.3× 61 448
Donis G. Flagello United States 14 450 1.1× 272 1.2× 172 1.4× 56 0.8× 28 0.6× 60 564

Countries citing papers authored by Jan Mulkens

Since Specialization
Citations

This map shows the geographic impact of Jan Mulkens's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jan Mulkens with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jan Mulkens more than expected).

Fields of papers citing papers by Jan Mulkens

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jan Mulkens. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jan Mulkens. The network helps show where Jan Mulkens may publish in the future.

Co-authorship network of co-authors of Jan Mulkens

This figure shows the co-authorship network connecting the top 25 collaborators of Jan Mulkens. A scholar is included among the top collaborators of Jan Mulkens based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jan Mulkens. Jan Mulkens is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Look, Lieve Van, et al.. (2019). Evaluation of local CD and placement distribution on EUV mask and its impact on wafer. 27–27. 3 indexed citations
2.
Tian, Qing, et al.. (2018). E-beam based EUV mask characterization for studying mask induced wafer effects. 31–31. 2 indexed citations
3.
Mulkens, Jan, et al.. (2017). Patterning control strategies for minimum edge placement error in logic devices. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 1014505–1014505. 31 indexed citations
4.
Mulkens, Jan, et al.. (2016). High-order distortion control using a computational prediction method for device overlay. Journal of Micro/Nanolithography MEMS and MOEMS. 15(2). 21403–21403. 4 indexed citations
5.
Wise, Rich, Liesbeth Reijnen, Patrick Jaenen, et al.. (2016). Ultimate intra-wafer critical dimension uniformity control by using lithography and etch tool corrections. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9780. 978007–978007. 3 indexed citations
6.
Mulkens, Jan, et al.. (2015). Intra-field on-product overlay improvement by application of RegC and TWINSCAN corrections. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9424. 94241K–94241K. 2 indexed citations
7.
Mulkens, Jan, et al.. (2012). Driving imaging and overlay performance to the limits with advanced lithography optimization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8326. 83261I–83261I. 5 indexed citations
8.
Finders, Jo, Mircea Dusa, Jan Mulkens, Yu Cao, & Maryana Escalante. (2011). Solutions for 22-nm node patterning using ArFi technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79730U–79730U. 4 indexed citations
9.
Staals, Frank, H. Bakker, Jo Finders, et al.. (2011). Advanced wavefront engineering for improved imaging and overlay applications on a 1.35 NA immersion scanner. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79731G–79731G. 36 indexed citations
10.
Mulkens, Jan, et al.. (2009). Extending single-exposure patterning towards 38-nm half-pitch using 1.35 NA immersion. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7274. 72741K–72741K. 5 indexed citations
11.
Mulkens, Jan, et al.. (2008). Latest developments on immersion exposure systems. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69241P–69241P. 18 indexed citations
12.
Mulkens, Jan, et al.. (2008). Latest developments on immersion exposure systems - art. no. 69241P. 1 indexed citations
13.
Kerkhof, Mark van de, et al.. (2006). Immersion lithography with an ultrahigh-NA in-line catadioptric lens and a high-transmission flexible polarization illumination system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 61541W–61541W. 7 indexed citations
14.
Kerkhof, Mark van de, et al.. (2005). Imaging enhancements by polarized illumination: theory and experimental verification. 70–70. 8 indexed citations
15.
Mulkens, Jan, et al.. (2005). Immersion lithography exposure systems: today's capabilities and tomorrow’s expectations. 68–68. 2 indexed citations
16.
Flagello, Donis G., et al.. (2004). Optical lithography in the sub-50-nm regime. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 21–21. 9 indexed citations
17.
Mulkens, Jan, et al.. (2004). Extending optical lithography with immersion. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 285–285. 30 indexed citations
18.
Mulkens, Jan, et al.. (2003). Optical lithography solutions for sub-65-nm semiconductor devices. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 753–753. 9 indexed citations
19.
Mulkens, Jan, et al.. (2002). 157-nm technology: Where are we today?. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 613–613. 8 indexed citations
20.
Flagello, Donis G., Jan Mulkens, & Christian Wagner. (2000). Optical lithography into the millennium: sensitivity to aberrations, vibration, and polarization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4000. 172–172. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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