Will Conley

1.0k total citations
123 papers, 753 citations indexed

About

Will Conley is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Will Conley has authored 123 papers receiving a total of 753 indexed citations (citations by other indexed papers that have themselves been cited), including 121 papers in Electrical and Electronic Engineering, 64 papers in Biomedical Engineering and 36 papers in Surfaces, Coatings and Films. Recurrent topics in Will Conley's work include Advancements in Photolithography Techniques (117 papers), Nanofabrication and Lithography Techniques (42 papers) and Integrated Circuits and Semiconductor Failure Analysis (31 papers). Will Conley is often cited by papers focused on Advancements in Photolithography Techniques (117 papers), Nanofabrication and Lithography Techniques (42 papers) and Integrated Circuits and Semiconductor Failure Analysis (31 papers). Will Conley collaborates with scholars based in United States, Netherlands and Belgium. Will Conley's co-authors include Paul Zimmerman, C. Grant Willson, Takashi Chiba, Raymond Hung, Brian C. Trinque, Daniel A. Miller, Ralph R. Dammel, Robert H. Grubbs, Eric F. Connor and Daniel P. Sanders and has published in prestigious journals such as Chemistry of Materials, Macromolecules and Microelectronic Engineering.

In The Last Decade

Will Conley

110 papers receiving 657 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Will Conley United States 15 528 363 139 106 78 123 753
Masaru Sasago Japan 15 670 1.3× 473 1.3× 97 0.7× 106 1.0× 120 1.5× 137 912
Raymond Hung United States 14 276 0.5× 144 0.4× 121 0.9× 31 0.3× 77 1.0× 33 442
Hoa D. Truong United States 12 392 0.7× 275 0.8× 138 1.0× 89 0.8× 273 3.5× 33 590
Franz Schrank Austria 16 633 1.2× 161 0.4× 100 0.7× 43 0.4× 173 2.2× 63 828
Xuanxuan Chen United States 14 122 0.2× 125 0.3× 161 1.2× 75 0.7× 284 3.6× 27 476
Hyung-Jong Lee South Korea 16 528 1.0× 104 0.3× 56 0.4× 20 0.2× 98 1.3× 44 714
Anuja De Silva United States 12 395 0.7× 213 0.6× 53 0.4× 130 1.2× 108 1.4× 47 501
Mitsunori Sugimoto Japan 17 653 1.2× 489 1.3× 76 0.5× 37 0.3× 77 1.0× 29 946
Paul Saville United Kingdom 13 194 0.4× 101 0.3× 179 1.3× 63 0.6× 161 2.1× 27 642

Countries citing papers authored by Will Conley

Since Specialization
Citations

This map shows the geographic impact of Will Conley's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Will Conley with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Will Conley more than expected).

Fields of papers citing papers by Will Conley

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Will Conley. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Will Conley. The network helps show where Will Conley may publish in the future.

Co-authorship network of co-authors of Will Conley

This figure shows the co-authorship network connecting the top 25 collaborators of Will Conley. A scholar is included among the top collaborators of Will Conley based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Will Conley. Will Conley is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Wong, Patrick, et al.. (2016). Lower BW and its impact on the patterning performance. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9780. 978008–978008. 2 indexed citations
2.
Conley, Will, et al.. (2015). Impact of bandwidth on contrast sensitive structures for low k1 lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9426. 942607–942607. 6 indexed citations
3.
López‐Gejo, Juan, Joy T. Kunjappu, Junli Zhou, et al.. (2007). Outlook for potential third-generation immersion fluids. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6519. 651921–651921. 7 indexed citations
4.
Socha, Robert, Stephen D. H. Hsu, Noel Corcoran, et al.. (2004). Contact hole reticle optimization by using interference mapping lithography (IML). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 222–222. 9 indexed citations
5.
Hsu, Stephen D. H., et al.. (2003). 65-nm full-chip implementation using double dipole lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5040. 215–215. 7 indexed citations
6.
Houlihan, Francis M., Ralph R. Dammel, Will Conley, et al.. (2003). Evaluation of novel fluorinated resist matrices for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 22–22. 3 indexed citations
7.
Bae, Young Chan, Tianyue Yu, Jun Yan Dai, et al.. (2002). Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones. Chemistry of Materials. 14(3). 1306–1313. 20 indexed citations
8.
Conley, Will, Daniel A. Miller, Brian C. Trinque, et al.. (2002). Dissolution Inhibitors for 157 nm Lithography: A Progress Report.. Journal of Photopolymer Science and Technology. 15(4). 613–617. 9 indexed citations
9.
Socha, Robert, Will Conley, Wei Wu, et al.. (2002). Extending KrF to 100-nm imaging with high-NA- and chromeless phase lithography technology. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 446–446. 1 indexed citations
10.
Tran, Hoang V., Raymond Hung, Takashi Chiba, et al.. (2002). Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes:  Synthesis, Polymerization, and Initial Imaging Results. Macromolecules. 35(17). 6539–6549. 52 indexed citations
11.
Wu, Wei, et al.. (2002). Application of Chromeless Phase Lithography (CPL) masks in ArF lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4889. 1189–1189.
12.
Hung, Raymond, Shintaro Yamada, Mark Somervell, et al.. (2000). Polymers for 157-nm photoresist applications: a progress report. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 365–365. 19 indexed citations
13.
Socha, Robert, Xuelong Shi, Mircea Dusa, et al.. (1999). Design of 200-nm, 170-nm, and 140-nm DUV contact sweeper high-transmission attenuating phase-shift mask: II. Experimental results. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3679. 38–38. 1 indexed citations
14.
Conley, Will, et al.. (1998). Comparisons of critical parameters for high- and low-activation-energy deep-UV photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3333. 357–357. 2 indexed citations
15.
Brunsvold, William R., et al.. (1997). PHS with inert blocking groups for DUV negative resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3049. 372–372. 3 indexed citations
16.
Itô, Hiroshi, et al.. (1996). Lithographic Feasibility of ESCAP Beyond Quarter Micron.. Journal of Photopolymer Science and Technology. 9(4). 557–572. 2 indexed citations
17.
Conley, Will, et al.. (1995). <title>New positive-tone deep-UV photoresist based on poly(4-hydroxystyrene) and an acid labile protecting group</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2438. 125–142. 1 indexed citations
18.
Conley, Will. (1995). <title>Considerations in the development of deep-UV photoresist materials and processes</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2438. 40–52. 6 indexed citations
19.
Conley, Will, et al.. (1994). Improved reflectivity control of APEX-E positive tone deep-UV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2195. 461–461.
20.
Brunsvold, William R., et al.. (1989). Polyhydroxystyrene Carbonate Esters for High Sensitivity Photoresists Having Autodecomposition Temperatures > 160°. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1086. 357–357. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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