Will Conley

1.0k citations

123 papers · 753 indexed · h-index 15

Impact in

Surfaces, Coatings and Films top 5%
Electrical and Electronic Engineering top 10%
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- 3D IC and TSV technologies

Papers in ⓘ

Surfaces, Coatings and Films 36
- Electron and X-Ray Spectroscopy Techniques 25
- Optical Coatings and Gratings 10
Electrical and Electronic Engineering 121
- Advancements in Photolithography Techniques 117
- Integrated Circuits and Semiconductor Failure Analysis 31
- 3D IC and TSV technologies 17
- Semiconductor materials and devices 11

Co-authors: Paul Zimmerman (17 shared papers)C. Grant Willson (16 shared papers)Takashi Chiba (10 shared papers)Raymond Hung (9 shared papers)Brian C. Trinque (11 shared papers)Ralph R. Dammel (12 shared papers)Shintaro Yamada (6 shared papers)Daniel P. Sanders (4 shared papers)
Journals: Journal of Photopolymer Science and Technology (13 papers)Microelectronic Engineering (3 papers)Macromolecules (2 papers)Chemistry of Materials (2 papers)Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)
Partner nations: United States Netherlands Belgium

In The Last Decade

Will Conley

110 papers receiving 657 citations

Peers

Countries citing papers authored by Will Conley

Since Specialization

Citations

This map shows the geographic impact of Will Conley's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Will Conley with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Will Conley more than expected).

Fields of papers citing papers by Will Conley

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Will Conley. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Will Conley. The network helps show where Will Conley may publish in the future.

Co-authors

The 25 scholars most cited alongside Will Conley, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Will Conley Line = papers co-authored together Will Conley links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 123 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes: Synthesis, Polymerization, and Initial Imaging Results Macromolecules ·Hoang V. Tran, Raymond Hung, Takashi Chiba, Shintaro Yamada, Thomas Mrozek, Yu‐Tsai Hsieh, Charles R. Chambers, Brian Osborn, Brian C. Trinque, M.J. Pinnow, Scott Macdonald, C. Grant Willson, Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, Will Conley	2002	52
2	Metal-Catalyzed Addition Polymers for 157 nm Resist Applications. Synthesis and Polymerization of Partially Fluorinated, Ester-Functionalized Tricyclo[4.2.1.0^2,5]non-7-enes Macromolecules ·Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, Raymond Hung, Brian Osborn, Takashi Chiba, Scott Macdonald, C. Grant Willson, Will Conley	2003	48
3	157 nm Resist Materials: A Progress Report. Journal of Photopolymer Science and Technology ·Takashi Chiba, Raymond Hung, Shintaro Yamada, Brian C. Trinque, Miko Yamachika, Colin J. Brodsky, Kyle Patterson, Anthony Vander Heyden, Andrew C. Jamison, Shang-Ho Lin, Mark Somervell, Jeffrey D. Byers, Will Conley, C. Grant Willson	2000	32
4	New Strategies for High Resolution Photoresists. Journal of Photopolymer Science and Technology ·Christopher K. Ober, Katsuji Douki, Vaishali R. Vohra, Young‐Je Kwark, Xiangqian Liu, Will Conley, Daniel A. Miller, Paul Zimmerman	2002	26
5	157 nm resist materials: Progress report Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Colin J. Brodsky, Jeff D. Byers, Will Conley, Raymond Hung, Shintaro Yamada, Kyle Patterson, Mark Somervell, Brian C. Trinque, Hoang V. Tran, Sungseo Cho, Takashi Chiba, Shang-Ho Lin, Andrew Jamieson, Heather F. Johnson, Tony Vander Heyden, C. Grant Willson	2000	23
6	Polycycloalkanes as Potential Third-Generation Immersion Fluids for Photolithography at 193 nm Chemistry of Materials ·Juan López‐Gejo, Joy T. Kunjappu, Jianming Zhou, Bruce W. Smith, Paul Zimmerman, Will Conley, Nicholas J. Turro	2007	23
7	Tailoring Transparency of Imageable Fluoropolymers at 157 nm by Incorporation of Hexafluoroisopropyl Alcohol to Photoresist Backbones Chemistry of Materials ·Young Chan Bae, Katsuji Douki, Tianyue Yu, Jun Yan Dai, Dirk Schmaljohann, Hilmar Koerner, Christopher K. Ober, Will Conley	2002	20
8	Polymers for 157-nm photoresist applications: a progress report Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Kyle Patterson, Mikio Yamachika, Raymond Hung, Colin J. Brodsky, Shintaro Yamada, Mark Somervell, Brian Osborn, Daniel S. Hall, Gordana Duković, Jeff D. Byers, Will Conley, C. Grant Willson	2000	19
9	Imaging capabilities of resist in deep ultraviolet liquid immersion interferometric lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Alex K. Raub, A. Frauenglass, S. R. J. Brueck, Will Conley, Ralph R. Dammel, Andy Romano, Mitsuru Satô, William D. Hinsberg	2004	18
10	Lithographic performance of an environmentally stable chemically amplified photoresist (ESCAP) Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Will Conley, Gregory Breyta, William R. Brunsvold, Richard A. Di Pietro, Donald C. Hofer, Steven J. Holmes, Hiroshi Itô, Ronald Nunes, Gabrielle Fichtl, Peter Hagerty, James W. Thackeray	1996	17
11	Effective decomposition algorithm for self-aligned double patterning lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Hongbo Zhang, Yuelin Du, Martin D. F. Wong, Rasit Onur Topaloglu, Will Conley	2011	16
12	Understanding the photoresist surface-liquid interface for ArF immersion lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Will Conley, Robert J. LeSuer, Frank F. Fan, Allen J. Bard, Chris Taylor, Pavlos C. Tsiartas, Grant Willson, Andrew R. Romano, Ralph R. Dammel	2005	16
13	Amplification of the index of refraction of aqueous immersion fluids by ionic surfactants Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Kwangjoo Lee, Joy T. Kunjappu, Steffen Jockusch, Nicholas J. Turro, Tatjana Widerschpan, Jianming Zhou, Bruce W. Smith, Paul Zimmerman, Will Conley	2005	15
14	Resist materials for 157-nm microlithography: an update Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Raymond Hung, Hoang V. Tran, Brian C. Trinque, Takashi Chiba, Shintaro Yamada, Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, John M. Klopp, Jean M. J. Fréchet, Brian H. Thomas, Gregory J. Shafer, Darryl D. DesMarteau, Will Conley, C. Grant Willson	2001	15
15	Highly transparent resist platforms for 157-nm microlithography: an update Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Vaishali R. Vohra, Katsuji Douki, Young‐Je Kwark, Xiangqian Liu, Christopher K. Ober, Young Chan Bae, Will Conley, Daniel A. Miller, Paul Zimmerman	2002	15
16	Deep-UV immersion interferometric lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Alex K. Raub, A. Frauenglass, S. R. J. Brueck, Will Conley, Ralph R. Dammel, Andy Romano, Mitsuru Satô, William D. Hinsberg	2004	14
17	Fluoropolymer Resist Materials for 157nm Microlithography. Journal of Photopolymer Science and Technology ·Hoang V. Tran, Raymond Hung, Takashi Chiba, Shintaro Yamada, Thomas Mrozek, Yu‐Tsai Hsieh, Charles R. Chambers, Brian Osborn, Brian C. Trinque, M.J. Pinnow, Daniel P. Sanders, Eric F. Connor, Robert H. Grubbs, Will Conley, Scott Macdonald, C. Grant Willson	2001	14
18	Novel high-index resists for 193-nm immersion lithography and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu, Andrew K. Whittaker, Will Conley, Emil C. Piscani, Georgia K. Rich, Alvina M. Williams, Paul Zimmerman	2007	13
19	High-RI resist polymers for 193 nm immersion lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andrew K. Whittaker, Idriss Blakey, Heping Liu, David J. T. Hill, Graeme A. George, Will Conley, Paul Zimmerman	2005	12
20	Recent advances in resists for 157 nm microlithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Brian C. Trinque, Takashi Chiba, Raymond Hung, Charles R. Chambers, M.J. Pinnow, Brian Osborn, Hoang V. Tran, Jennifer Wunderlich, Yu-Tsai Hsieh, Brian H. Thomas, Gregory J. Shafer, Darryl D. DesMarteau, Will Conley, C. Grant Willson	2002	11

About Will Conley

Will Conley is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Biomedical Engineering, Industrial and Manufacturing Engineering and Polymers and Plastics, having authored 123 papers that have together received 753 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (117 papers), Nanofabrication and Lithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (31 papers), Electron and X-Ray Spectroscopy Techniques (25 papers), Advanced Surface Polishing Techniques (22 papers), 3D IC and TSV technologies (17 papers), Semiconductor materials and devices (11 papers) and Optical Coatings and Gratings (10 papers). The work is most often cited by research in Surfaces, Coatings and Films (106 citations), Electrical and Electronic Engineering (528 citations), Process Chemistry and Technology (24 citations), Biomedical Engineering (363 citations) and Pharmaceutical Science (48 citations). Will Conley has collaborated with scholars based in United States, Netherlands and Belgium. Frequent co-authors include Paul Zimmerman, C. Grant Willson, Takashi Chiba, Raymond Hung, Brian C. Trinque, Ralph R. Dammel, Shintaro Yamada, Daniel P. Sanders, Eric F. Connor and Robert H. Grubbs. Their work appears in journals such as Journal of Photopolymer Science and Technology, Microelectronic Engineering, Macromolecules, Chemistry of Materials and Journal of Micro/Nanolithography MEMS and MOEMS.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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