John L. Sturtevant

521 total citations
88 papers, 396 citations indexed

About

John L. Sturtevant is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, John L. Sturtevant has authored 88 papers receiving a total of 396 indexed citations (citations by other indexed papers that have themselves been cited), including 83 papers in Electrical and Electronic Engineering, 31 papers in Surfaces, Coatings and Films and 25 papers in Industrial and Manufacturing Engineering. Recurrent topics in John L. Sturtevant's work include Advancements in Photolithography Techniques (83 papers), Integrated Circuits and Semiconductor Failure Analysis (29 papers) and Electron and X-Ray Spectroscopy Techniques (25 papers). John L. Sturtevant is often cited by papers focused on Advancements in Photolithography Techniques (83 papers), Integrated Circuits and Semiconductor Failure Analysis (29 papers) and Electron and X-Ray Spectroscopy Techniques (25 papers). John L. Sturtevant collaborates with scholars based in United States, Belgium and Japan. John L. Sturtevant's co-authors include John S. Petersen, Jeff D. Byers, Thuy Do, Edita Tejnil, Chris A. Mack, James Word, Daniel A. Miller, Peter De Bisschop, Steven J. Holmes and S. E. Webber and has published in prestigious journals such as Macromolecules, Journal of Chemical Education and Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena.

In The Last Decade

John L. Sturtevant

79 papers receiving 365 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
John L. Sturtevant United States 11 346 135 119 66 58 88 396
Han-Ku Cho South Korea 9 381 1.1× 141 1.0× 140 1.2× 36 0.5× 28 0.5× 111 421
Ki‐Ho Baik United States 10 399 1.2× 96 0.7× 177 1.5× 45 0.7× 26 0.4× 90 435
Mark D. Smith United States 11 411 1.2× 208 1.5× 127 1.1× 33 0.5× 23 0.4× 65 429
Dieter Van den Heuvel Belgium 13 430 1.2× 237 1.8× 112 0.9× 66 1.0× 23 0.4× 57 501
Soichi Inoue Japan 11 344 1.0× 144 1.1× 125 1.1× 57 0.9× 20 0.3× 96 412
Germain Fenger United States 11 309 0.9× 75 0.6× 83 0.7× 46 0.7× 49 0.8× 73 352
Frieda Van Roey Belgium 12 403 1.2× 191 1.4× 159 1.3× 36 0.5× 18 0.3× 45 463
Mireille Maenhoudt Belgium 12 419 1.2× 105 0.8× 211 1.8× 18 0.3× 27 0.5× 47 457
Naoya Hayashi Japan 11 438 1.3× 208 1.5× 165 1.4× 36 0.5× 62 1.1× 132 526
Daniel Corliss United States 8 212 0.6× 73 0.5× 72 0.6× 19 0.3× 23 0.4× 23 311

Countries citing papers authored by John L. Sturtevant

Since Specialization
Citations

This map shows the geographic impact of John L. Sturtevant's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by John L. Sturtevant with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites John L. Sturtevant more than expected).

Fields of papers citing papers by John L. Sturtevant

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by John L. Sturtevant. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by John L. Sturtevant. The network helps show where John L. Sturtevant may publish in the future.

Co-authorship network of co-authors of John L. Sturtevant

This figure shows the co-authorship network connecting the top 25 collaborators of John L. Sturtevant. A scholar is included among the top collaborators of John L. Sturtevant based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with John L. Sturtevant. John L. Sturtevant is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Wang, Shu‐Ling, et al.. (2024). An integrated verification flow for curvilinear mask. 39–39. 1 indexed citations
2.
3.
Lafferty, Neal, et al.. (2023). EUV full-chip curvilinear mask options for logic via and metal patterning. 18–18. 3 indexed citations
4.
Gillijns, Werner, et al.. (2023). Compact modeling of stochastics and application in OPC. 26–26.
5.
Do, Thuy, et al.. (2015). Finding practical phenomenological models that include both photoresist behavior and etch process effects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9428. 94280I–94280I. 3 indexed citations
6.
Fryer, David, et al.. (2015). Akaike information criterion to select well-fit resist models. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9427. 94270J–94270J. 5 indexed citations
7.
Fryer, David S., et al.. (2014). Rapid, accurate improvement in 3D mask representation via input geometry optimization and crosstalk. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9052. 905216–905216. 2 indexed citations
8.
Sturtevant, John L., et al.. (2009). Process variability band analysis for quantitative optimization of exposure conditions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7275. 72751Q–72751Q. 3 indexed citations
9.
Do, Thuy, et al.. (2009). Contour quality assessment for OPC model calibration. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7272. 72722Q–72722Q. 9 indexed citations
10.
Shindo, Hiroyuki, Hitoshi Komuro, John L. Sturtevant, et al.. (2009). High-precision contouring from SEM image in 32-nm lithography and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7275. 72751F–72751F. 13 indexed citations
11.
Sturtevant, John L., et al.. (2008). Exposure tool specific post-OPC verification. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6925. 69250T–69250T. 4 indexed citations
12.
Do, Thuy, et al.. (2007). Circuit-based SEM contour OPC model calibration. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6521. 65211N–65211N.
13.
Sturtevant, John L.. (2004). Advances in Resist Technology and Processing XXI. 5376. 3 indexed citations
14.
Sturtevant, John L., et al.. (2001). Toward 0.1-μm contact hole process by using water-soluble organic overcoating material (WASOOM)-- Resist flow technology III: study on WASOOM, top flare, and etch characterization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 647–647. 1 indexed citations
15.
Cave, N., et al.. (2001). Theoretical and experimental optimization of numerical aperture and partial coherence for complementary phase-shift processes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4346. 755–755. 3 indexed citations
16.
Sturtevant, John L., et al.. (1995). <title>Antireflection coating process characterization and improvement for DUV lithography at 0.25 um: ground rules</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2440. 582–593. 3 indexed citations
17.
Petersen, John S., Theodore H. Fedynyshyn, James W. Thackeray, et al.. (1995). Survey of processing affects on substrate compatibility of chemically amplified resists.. Journal of Photopolymer Science and Technology. 8(4). 571–597. 2 indexed citations
18.
Sturtevant, John L., et al.. (1994). <title>Use of scatterometric latent-image detector in closed-loop feedback control of linewidth</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2196. 352–359. 3 indexed citations
19.
Moreau, Wayne M., et al.. (1994). Design of a bottom antireflective layer for optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2195. 422–422. 7 indexed citations
20.
Conley, Will, et al.. (1994). Improved reflectivity control of APEX-E positive tone deep-UV photoresist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2195. 461–461.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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