Peter Evanschitzky
- Surfaces, Coatings and Films top 1%
- Electron and X-Ray Spectroscopy Techniques 44
- Optical Coatings and Gratings 27
- Radiation top 5%
- Advanced X-ray Imaging Techniques 15
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- Advancements in Photolithography Techniques 81
- Integrated Circuits and Semiconductor Failure Analysis 19
- Advancements in Semiconductor Devices and Circuit Design 7
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- Welding Techniques and Residual Stresses 8
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- Surface Roughness and Optical Measurements 6
- Co-authors
- Andreas ErdmannTim FühnerVicky PhilipsenEric HendrickxFeng ShaoDongbo XuPeter De BisschopJens Timo Neumann
- Journals
- Journal of Micro/Nanolithography MEMS and MOEMS (8 papers)Microelectronic Engineering (4 papers)Thin Solid Films (1 paper)
- Partner nations
- GermanyBelgiumNetherlands
In The Last Decade
Peter Evanschitzky
84 papers receiving 763 citations
Peers
Comparison fields: 5 of 46
- Surfaces, Coatings and Films 476
- Radiation 176
- Electrical and Electronic Engineering 790
- Structural Biology 9
- Industrial and Manufacturing Engineering 63
Countries citing papers authored by Peter Evanschitzky
This map shows the geographic impact of Peter Evanschitzky's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Peter Evanschitzky with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Peter Evanschitzky more than expected).
Fields of papers citing papers by Peter Evanschitzky
This network shows the impact of papers produced by Peter Evanschitzky. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Peter Evanschitzky. The network helps show where Peter Evanschitzky may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Peter Evanschitzky, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2024 | 2 | |
| 2 | 2024 | 1 | |
| 3 | 2024 | 0 | |
| 4 | 2022 | 1 | |
| 5 | 2019 | 19 | |
| 6 | 2018 | 19 | |
| 7 | 2018 | 17 | |
| 8 | 2018 | 13 | |
| 9 | 2015 | 0 | |
| 10 | 2013 | 16 | |
| 11 | 2012 | 10 | |
| 12 | 2012 | 2 | |
| 13 | 2012 | 2 | |
| 14 | 2011 | 10 | |
| 15 | 2011 | 4 | |
| 16 | 2010 | 4 | |
| 17 | 2008 | 11 | |
| 18 | 2007 | 9 | |
| 19 | 2006 | 3 | |
| 20 | 2006 | 18 |
About Peter Evanschitzky
Peter Evanschitzky is a scholar working on Surfaces, Coatings and Films, Radiation, Electrical and Electronic Engineering, Structural Biology and Industrial and Manufacturing Engineering, having authored 93 papers that have together received 840 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (81 papers), Electron and X-Ray Spectroscopy Techniques (44 papers), Optical Coatings and Gratings (27 papers), Integrated Circuits and Semiconductor Failure Analysis (19 papers), Advanced X-ray Imaging Techniques (15 papers), Welding Techniques and Residual Stresses (8 papers), Advancements in Semiconductor Devices and Circuit Design (7 papers) and Surface Roughness and Optical Measurements (6 papers). The work is most often cited by research in Surfaces, Coatings and Films (476 citations), Radiation (176 citations), Electrical and Electronic Engineering (790 citations), Structural Biology (9 citations) and Industrial and Manufacturing Engineering (63 citations). Peter Evanschitzky has collaborated with scholars based in Germany, Belgium and Netherlands. Frequent co-authors include Andreas Erdmann, Tim Fühner, Vicky Philipsen, Eric Hendrickx, Feng Shao, Dongbo Xu, Peter De Bisschop, Jens Timo Neumann, J. Lorenz and M. Bauer. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Microelectronic Engineering, Thin Solid Films, IEEE Transactions on Electron Devices and Journal of Computational Electronics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.