Peter Evanschitzky

1.0k total citations
93 papers, 840 citations indexed

About

Peter Evanschitzky is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Peter Evanschitzky has authored 93 papers receiving a total of 840 indexed citations (citations by other indexed papers that have themselves been cited), including 86 papers in Electrical and Electronic Engineering, 63 papers in Surfaces, Coatings and Films and 19 papers in Biomedical Engineering. Recurrent topics in Peter Evanschitzky's work include Advancements in Photolithography Techniques (81 papers), Electron and X-Ray Spectroscopy Techniques (44 papers) and Optical Coatings and Gratings (27 papers). Peter Evanschitzky is often cited by papers focused on Advancements in Photolithography Techniques (81 papers), Electron and X-Ray Spectroscopy Techniques (44 papers) and Optical Coatings and Gratings (27 papers). Peter Evanschitzky collaborates with scholars based in Germany, Belgium and Netherlands. Peter Evanschitzky's co-authors include Andreas Erdmann, Tim Fühner, Vicky Philipsen, Eric Hendrickx, Feng Shao, Dongbo Xu, Peter De Bisschop, Jens Timo Neumann, J. Lorenz and M. Bauer and has published in prestigious journals such as IEEE Transactions on Electron Devices, Thin Solid Films and Advanced Optical Materials.

In The Last Decade

Peter Evanschitzky

84 papers receiving 763 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Peter Evanschitzky Germany 17 790 476 176 162 63 93 840
Jan van Schoot Netherlands 16 612 0.8× 345 0.7× 106 0.6× 216 1.3× 29 0.5× 50 722
Jo Finders Netherlands 18 1.0k 1.3× 423 0.9× 134 0.8× 318 2.0× 62 1.0× 128 1.1k
Jens Timo Neumann Germany 16 468 0.6× 259 0.5× 104 0.6× 139 0.9× 42 0.7× 46 565
Winfried Kaiser Germany 16 517 0.7× 268 0.6× 106 0.6× 225 1.4× 20 0.3× 35 656
Yayi Wei China 13 623 0.8× 175 0.4× 28 0.2× 266 1.6× 75 1.2× 178 769
Tim Fühner Germany 12 367 0.5× 114 0.2× 39 0.2× 120 0.7× 37 0.6× 48 455
Donis G. Flagello United States 14 450 0.6× 172 0.4× 39 0.2× 272 1.7× 20 0.3× 60 564
Benjamin Bunday United States 21 922 1.2× 634 1.3× 25 0.1× 394 2.4× 78 1.2× 102 1.3k
C. W. Gwyn United States 11 547 0.7× 70 0.1× 27 0.2× 91 0.6× 38 0.6× 24 669
Lakshminarayan Hazra India 14 170 0.2× 172 0.4× 10 0.1× 344 2.1× 8 0.1× 62 498

Countries citing papers authored by Peter Evanschitzky

Since Specialization
Citations

This map shows the geographic impact of Peter Evanschitzky's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Peter Evanschitzky with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Peter Evanschitzky more than expected).

Fields of papers citing papers by Peter Evanschitzky

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Peter Evanschitzky. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Peter Evanschitzky. The network helps show where Peter Evanschitzky may publish in the future.

Co-authorship network of co-authors of Peter Evanschitzky

This figure shows the co-authorship network connecting the top 25 collaborators of Peter Evanschitzky. A scholar is included among the top collaborators of Peter Evanschitzky based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Peter Evanschitzky. Peter Evanschitzky is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Evanschitzky, Peter, et al.. (2024). Spectro‐Spatial Unmixing in Optical Microspectroscopy for Thickness Determination of Layered Materials. Advanced Optical Materials. 13(5). 2 indexed citations
2.
Erdmann, Andreas, et al.. (2024). Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 11609. 1–1. 1 indexed citations
3.
Erdmann, Andreas, et al.. (2024). Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split pupil exposures: a modeling perspective. Journal of Micro/Nanopatterning Materials and Metrology. 24(1).
4.
Evanschitzky, Peter, et al.. (2022). EUV mask absorber induced best focus shifts. 10–10. 1 indexed citations
5.
Erdmann, Andreas, et al.. (2019). 3D mask effects in high NA EUV imaging. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 32–32. 19 indexed citations
6.
Erdmann, Andreas, et al.. (2018). Attenuated phase shift mask for extreme ultraviolet: can they mitigate three-dimensional mask effects?. Journal of Micro/Nanolithography MEMS and MOEMS. 18(1). 1–1. 19 indexed citations
7.
Erdmann, Andreas, et al.. (2018). Attenuated PSM for EUV: Can they mitigate 3D mask effects?. Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft). 35–35. 17 indexed citations
8.
Lorenz, J., Eberhard Bär, Sylvain Barraud, et al.. (2018). Process Variability—Technological Challenge and Design Issue for Nanoscale Devices. Micromachines. 10(1). 6–6. 13 indexed citations
9.
Xu, Dongbo, Peter Evanschitzky, & Andreas Erdmann. (2015). Application of Principal Component Analysis to EUV multilayer defect printing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9630. 96300Y–96300Y.
10.
Erdmann, Andreas, et al.. (2013). Modeling studies on alternative EUV mask concepts for higher NA. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86791Q–86791Q. 16 indexed citations
11.
Erdmann, Andreas, Peter Evanschitzky, T. Bret, & R. Jonckheere. (2012). Analysis of EUV mask multilayer defect printing characteristics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83220E–83220E. 10 indexed citations
12.
Erdmann, Andreas & Peter Evanschitzky. (2012). Imaging characteristics of binary and phase shift masks for EUV projection lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8550. 85503K–85503K. 2 indexed citations
13.
Evanschitzky, Peter, et al.. (2012). Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8326. 832609–832609. 2 indexed citations
14.
Erdmann, Andreas, Peter Evanschitzky, Feng Shao, et al.. (2011). Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8171. 81710M–81710M. 10 indexed citations
15.
Evanschitzky, Peter, Feng Shao, Tim Fühner, & Andreas Erdmann. (2011). Compensation of mask induced aberrations by projector wavefront control. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 797329–797329. 4 indexed citations
16.
Aygün, Gülnur, et al.. (2010). Determination of the Dill parameters of thick positive resist for use in modeling applications. Thin Solid Films. 519(9). 2978–2984. 4 indexed citations
17.
Shao, Feng, et al.. (2008). Fast rigorous simulation of mask diffraction using the waveguide method with parallelized decomposition technique. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6792. 679206–679206. 11 indexed citations
18.
Evanschitzky, Peter, et al.. (2007). Simulation of larger mask areas using the waveguide method with fast decomposition technique. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6730. 67301P–67301P. 9 indexed citations
19.
Schermer, J.J., Peter Evanschitzky, & Andreas Erdmann. (2006). Rigorous mask modeling beyond the Hopkins approach. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6281. 62810A–62810A. 3 indexed citations
20.
Erdmann, Andreas, et al.. (2006). Validity of the Hopkins approximation in simulations of hyper-NA (NA>1) line-space structures for an attenuated PSM mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 61540G–61540G. 18 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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