Jonathan Cobb

407 total citations
41 papers, 312 citations indexed

About

Jonathan Cobb is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Jonathan Cobb has authored 41 papers receiving a total of 312 indexed citations (citations by other indexed papers that have themselves been cited), including 41 papers in Electrical and Electronic Engineering, 16 papers in Surfaces, Coatings and Films and 8 papers in Biomedical Engineering. Recurrent topics in Jonathan Cobb's work include Advancements in Photolithography Techniques (38 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Jonathan Cobb is often cited by papers focused on Advancements in Photolithography Techniques (38 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Jonathan Cobb collaborates with scholars based in United States, France and South Korea. Jonathan Cobb's co-authors include Robert L. Brainard, Neil M. Zimmerman, A. F. Clark, Charlotte Cutler, Scott D. Hector, Uzodinma Okoroanyanwu, Frances A. Houle, Veena Rao, Craig C. Henderson and Gregg M. Gallatin and has published in prestigious journals such as Physical review. B, Condensed matter, Journal of Photopolymer Science and Technology and Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena.

In The Last Decade

Jonathan Cobb

39 papers receiving 284 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jonathan Cobb United States 9 282 106 92 54 21 41 312
Alessandro Vaglio Pret Belgium 12 389 1.4× 98 0.9× 184 2.0× 29 0.5× 11 0.5× 64 408
Mark D. Smith United States 11 411 1.5× 127 1.2× 208 2.3× 23 0.4× 11 0.5× 65 429
Jan Hermans Belgium 11 273 1.0× 96 0.9× 140 1.5× 17 0.3× 22 1.0× 43 306
Neal Lafferty United States 11 293 1.0× 155 1.5× 129 1.4× 20 0.4× 13 0.6× 42 368
Koen van Ingen Schenau Netherlands 10 318 1.1× 119 1.1× 152 1.7× 16 0.3× 45 2.1× 28 339
John J. Biafore United States 13 470 1.7× 139 1.3× 284 3.1× 21 0.4× 11 0.5× 68 486
Paul Graeupner Germany 10 261 0.9× 80 0.8× 140 1.5× 30 0.6× 33 1.6× 25 292
Soichi Inoue Japan 11 344 1.2× 125 1.2× 144 1.6× 16 0.3× 25 1.2× 96 412
T. R. Groves United States 9 207 0.7× 117 1.1× 110 1.2× 36 0.7× 14 0.7× 31 258
E.J. Walker United States 7 511 1.8× 130 1.2× 59 0.6× 59 1.1× 4 0.2× 9 548

Countries citing papers authored by Jonathan Cobb

Since Specialization
Citations

This map shows the geographic impact of Jonathan Cobb's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jonathan Cobb with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jonathan Cobb more than expected).

Fields of papers citing papers by Jonathan Cobb

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jonathan Cobb. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jonathan Cobb. The network helps show where Jonathan Cobb may publish in the future.

Co-authorship network of co-authors of Jonathan Cobb

This figure shows the co-authorship network connecting the top 25 collaborators of Jonathan Cobb. A scholar is included among the top collaborators of Jonathan Cobb based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jonathan Cobb. Jonathan Cobb is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Aboud, Shela, et al.. (2021). Ab initio for design-technology co-optimization. 27–27. 4 indexed citations
2.
Markussen, Troels, Shela Aboud, Anders Blom, et al.. (2020). Grain boundary scattering in Ru and Cu interconnects. 76–78. 3 indexed citations
3.
Cobb, Jonathan, et al.. (2011). Investigation of EUV tapeout flow issues, requirements, and options for volume manufacturing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 79690S–79690S. 3 indexed citations
4.
Zhang, Yunqiang, et al.. (2008). 32nm design rule and process exploration flow. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71223Z–71223Z. 8 indexed citations
5.
Lucas, Kevin, Jonathan Cobb, Brian Ward, et al.. (2007). Patterning control budgets for the 32-nm generation incorporating lithography, design, and RET variations. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65200N–65200N. 3 indexed citations
6.
Conley, Will, et al.. (2005). Applications of CPL mask technology for sub-65nm gate imaging. 160–160. 3 indexed citations
7.
Peters, Richard D., et al.. (2005). Reduction of line edge roughness and post resist trim pattern collapse for sub 60 nm gate patterns using gas-phase resist fluorination. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5753. 1024–1024. 4 indexed citations
8.
Conley, Will, et al.. (2005). Tunable transmission phase mask options for 65/45nm node gate and contact processing. 161–161. 2 indexed citations
9.
Peters, Richard D., Jonathan Cobb, & Colita Parker. (2004). Ultra-Thin Resists for Advanced Lithography. Journal of Photopolymer Science and Technology. 17(3). 465–473. 2 indexed citations
10.
Cobb, Jonathan, et al.. (2004). Process latitude measurements and their implications for CD control in EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 43–43. 1 indexed citations
11.
Hector, Scott D., et al.. (2004). Evaluation of the critical dimension control requirements in the ITRS using statistical simulation and error budgets. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 555–555. 9 indexed citations
12.
Peters, Richard D., et al.. (2004). Single-layer and bilayer resist processes for EUV-type integrations. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 746–746. 2 indexed citations
13.
Brainard, Robert L., Jonathan Cobb, & Charlotte Cutler. (2003). Current Status of EUV Photoresists. Journal of Photopolymer Science and Technology. 16(3). 401–410. 33 indexed citations
14.
Cobb, Jonathan, Frances A. Houle, & Gregg M. Gallatin. (2003). Estimated impact of shot noise in extreme-ultraviolet lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5037. 397–397. 7 indexed citations
15.
Cobb, Jonathan, Shahid Rauf, Aaron Thean, et al.. (2003). Controlling line-edge rougness to within reasonable limits. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 376–376. 4 indexed citations
16.
Peters, Richard D., et al.. (2002). Development and characterization of 193-nm ultra-thin resist process. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 287–287. 4 indexed citations
17.
Cobb, Jonathan, Colita Parker, E. Luckowski, et al.. (2002). Integration of UTR processes into MPU IC manufacturing flows. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 277–277. 5 indexed citations
18.
Hector, Scott D., et al.. (2001). <title>Bremsstrahlung emission and absorption in electron projection lithography</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 95–106. 1 indexed citations
19.
Okoroanyanwu, Uzodinma, Jonathan Cobb, Paul M. Dentinger, et al.. (2000). <title>Defects and metrology of ultrathin resist films</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3998. 515–526. 3 indexed citations
20.
Zimmerman, Neil M., Jonathan Cobb, & A. F. Clark. (1997). Modulation of the charge of a single-electron transistor by distant defects. Physical review. B, Condensed matter. 56(12). 7675–7678. 45 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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