Eelco van Setten

1.3k citations

88 papers · 970 indexed · h-index 20

Impact in

Surfaces, Coatings and Films top 1%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
Electrical and Electronic Engineering top 5%
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices

Papers in

Surfaces, Coatings and Films 60
- Electron and X-Ray Spectroscopy Techniques 53
- Optical Coatings and Gratings 7
Electrical and Electronic Engineering 80
- Advancements in Photolithography Techniques 78
- Integrated Circuits and Semiconductor Failure Analysis 50
- Semiconductor materials and devices 5

Co-authors: Jan van Schoot Judon Stoeldraijer Jo Finders Kars Troost Rudy Peeters Peter Kuerz Sjoerd Lok H. Meiling
Journals: Journal of Crystal Growth (1 paper)Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)Review of Scientific Instruments (1 paper)Applied Physics A (1 paper)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (43 papers)
Partner nations: Netherlands Germany Belgium

In The Last Decade

Eelco van Setten

83 papers receiving 847 citations

Peers

Countries citing papers authored by Eelco van Setten

Since Specialization

Citations

This map shows the geographic impact of Eelco van Setten's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Eelco van Setten with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Eelco van Setten more than expected).

Fields of papers citing papers by Eelco van Setten

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Eelco van Setten. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Eelco van Setten. The network helps show where Eelco van Setten may publish in the future.

Co-authors

The 25 scholars most cited alongside Eelco van Setten, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Eelco van Setten Line = papers co-authored together Eelco van Setten links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Progress towards adoption of high-NA EUV lithography in pilot manufacturing 敏子米川, Eelco van Setten, Sjoerd Lok, Jan van Schoot, Ana Carolina Poton de Abreu, Jay Varner, Rudy Peeters, Stephane Assadourian, 田紀子相野, 秋田将行, N. G. Smirnova, Oleksandra Dmytrenko, Peter Vanoppen	2025	0
2	High-NA EUV imaging in action: tackling the depth-of-focus challenge for superior resolution and LCDU Eelco van Setten, Shuang Jiao, (unknown), طلال الزهيري, (unknown), 博史小山, Rashid Ghorbani Afkhami, Jan van Schoot, Jo Finders, 敏子米川, I. F. Nazmiev, Lang Zhang, Stephen Hsu, Martin Duffy	2025	0
3	Improving EUV sub-40nm via single patterning using wavefront and pupil co-optimization Soojung Kim, Anish Kotecha, Zhao-cai Yu Yue-qing Su, 熊青松, Muhammad M. Almatroud, Srinivasa Subramanyam Katreddy, Jae Hyoung Kim, Insung Kim, Eelco van Setten, 戸川達男, Stefan Würges, Shigeyuki TAMURA, Jung‐Tae Lee, Kiseok Kim, James Lee, Diana Álvarez Ramírez, Зимин Анатолий Иванович, Stephen D. H. Hsu, Youping Zhang, Martin Duffy	2024	1
4	Exploring the limits of high contrast contact imaging using split pupil exposures in high-NA EUV lithography Fraunhofer-Publica (Fraunhofer-Gesellschaft) ·Andreas Erdmann, Cennard Davies, Peter Evanschitzky, 泰彦渡會, N I Jincheng, Eelco van Setten, Claire van Lare, Mark van de Kerkhof	2024	1
5	Holistic assessment and control of total CDU Jo Finders, Т. В. Ицкович, G. G. Sahasrabudhe, Ruben Maas, Matteo Iervolino, C. Cassadou, S. Ulbrand, Eelco van Setten, Claire van Lare	2024	1
6	Resolution enhancement for high-numerical aperture extreme ultraviolet lithography by split pupil exposures: a modeling perspective Journal of Micro/Nanopatterning Materials and Metrology ·Andreas Erdmann, Cennard Davies, Peter Evanschitzky, 泰彦渡會, N I Jincheng, Eelco van Setten, M.-Claire van Lare, Mark van de Kerkhof	2024	0
7	Stitching for high-NA: zooming in on CDU budget Natalia Davydova, Lieve Van Look, S. Vidaurre Mendes, Vincent Wiaux, 森若葉, P. RAMDANI, A. Laradi, Frank Timmermans, 罗哲, Eelco van Setten, Daniel W. Wilson	2023	2
8	EUV mask absorber induced best focus shifts Cennard Davies, Peter Evanschitzky, 泰彦渡會, Eelco van Setten, Claire van Lare, N I Jincheng, Mark van de Kerkhof, Andreas Erdmann	2022	1
9	Evolutionary step in EUV technology with high NA Xiaofei Cui, John D. Amaral, Oleksandra Dmytrenko, Stephane Assadourian, Jara G. Santaclara, Marieni A., Eelco van Setten, F. Fontanelli	2022	1
10	High-NA EUV lithography exposure tool: key advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Thomas Stammler	2021	16
11	Fundamental understanding and experimental verification of bright versus dark field imaging Natalia Davydova, Jo Finders, J. Zgadzaj, Eelco van Setten, Claire van Lare, Joern-Holger Franke, Andreas Frommhold, 昇松村, Aphroditi Avdelidou, Andreas Verch, Tetsuhiko Maeda, L® thi Bich-Thuy, Timon Fliervoet	2020	12
12	High-NA EUV imaging: challenges and outlook Bartosz Bilski, J. Zimmermann, Fairuz Nabil Izdihar, Christelle de Vallière, Eelco van Setten, 泰彦渡會, Jan van Schoot	2019	8
13	3D mask effects in high NA EUV imaging Publikationsdatenbank der Fraunhofer-Gesellschaft (Fraunhofer-Gesellschaft) ·Andreas Erdmann, Peter Evanschitzky, 泰彦渡會, Eelco van Setten, Timon Fliervoet	2019	19
14	Alternative absorber materials for mitigation of mask 3D effects in high NA EUV lithography Claire van Lare, Frank Timmermans, Jo Finders, J. Zgadzaj, Eelco van Setten	2018	4
15	Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·泰彦渡會, 光晴伊東, R. H. Finch, Eelco van Setten, Gijsbert Rispens, Jan van Schoot, Koen van Ingen Schenau	2016	6
16	Impact of an etched EUV mask black border on imaging and overlay Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Natalia Davydova, Francisco Javier González Eslait, M Siedlicki, 籏智武志, Vicky Philipsen, Eelco van Setten, 啓泉田, Jane M. Rollins, Т. В. Ицкович, 俊哉山岸, Noreen Harned	2012	13
17	EUVL: towards implementation in production Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, 曺溶常, K. D. Cummings, Noreen Harned, Zanab Shahbuddin, W. W. Gill, Julie Pallant, Peter Kürz, Sjoerd Lok, Martin Lowisch, Lei Axn, J P Bongard, Christian Wagner, Natasha Affolder, Eelco van Setten, 俊哉山岸, Nurhidayati Kartika Dewi, D. F. Rubin	2009	3
18	MacroCD contact ellipticity measurement for lithography tool qualification Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Moch Aziz Burhanudin, Eelco van Setten, Il-Chool Kim, Peter Vanoppen, Batir Hasanov, T Leonard, Karl Storck, Muhammed Khmas Khalaf, L. Gershtein, Gavin Robson	2007	1
19	Miniature Nernstian oxygen sensor for deposition and growth environments Review of Scientific Instruments ·Eelco van Setten, T. M. Gür, David H.A. Blank, J. C. Bravman, M. R. Beasley	2002	20
20	Epitaxial growth of oxides with pulsed laser interval deposition Journal of Crystal Growth ·Dave H. A. Blank, Gertjan Koster, Christine Punzo, Eelco van Setten, Yuusaku Yamashita, Horst Rogalla	2000	40

About Eelco van Setten

Eelco van Setten is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Radiation, Biomedical Engineering and Industrial and Manufacturing Engineering, having authored 88 papers that have together received 970 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (78 papers), Electron and X-Ray Spectroscopy Techniques (53 papers), Integrated Circuits and Semiconductor Failure Analysis (50 papers), Advanced Surface Polishing Techniques (8 papers), Optical Coatings and Gratings (7 papers), Advanced X-ray Imaging Techniques (5 papers), Advanced optical system design (5 papers) and Semiconductor materials and devices (5 papers). The work is most often cited by research in Surfaces, Coatings and Films (494 citations), Electrical and Electronic Engineering (849 citations), Radiation (121 citations), Structural Biology (9 citations) and Industrial and Manufacturing Engineering (50 citations). Eelco van Setten has collaborated with scholars based in Netherlands, Germany and Belgium. Frequent co-authors include Jan van Schoot, Judon Stoeldraijer, Jo Finders, Kars Troost, Rudy Peeters, Peter Kuerz, Sjoerd Lok, H. Meiling, Winfried Kaiser and Noreen Harned. Their work appears in journals such as Journal of Crystal Growth, Journal of Micro/Nanolithography MEMS and MOEMS, Review of Scientific Instruments, Applied Physics A and Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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