Ruben Maas

917 total citations · 1 hit paper
23 papers, 714 citations indexed

About

Ruben Maas is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Ruben Maas has authored 23 papers receiving a total of 714 indexed citations (citations by other indexed papers that have themselves been cited), including 12 papers in Electrical and Electronic Engineering, 8 papers in Biomedical Engineering and 7 papers in Surfaces, Coatings and Films. Recurrent topics in Ruben Maas's work include Advancements in Photolithography Techniques (9 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Metamaterials and Metasurfaces Applications (5 papers). Ruben Maas is often cited by papers focused on Advancements in Photolithography Techniques (9 papers), Integrated Circuits and Semiconductor Failure Analysis (8 papers) and Metamaterials and Metasurfaces Applications (5 papers). Ruben Maas collaborates with scholars based in Netherlands, United States and Germany. Ruben Maas's co-authors include Albert Polman, Nader Engheta, J. Parsons, N.M. White, Michael Koch, A G R Evans, Nick Harris, A Brunnschweiler, Sander F. Wuister and Jo Finders and has published in prestigious journals such as Nano Letters, Nature Photonics and New Journal of Physics.

In The Last Decade

Ruben Maas

20 papers receiving 672 citations

Hit Papers

Experimental realization of an epsilon-near-zero metamate... 2013 2026 2017 2021 2013 100 200 300

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Ruben Maas Netherlands 9 371 335 331 210 150 23 714
Lei Sun China 16 242 0.7× 388 1.2× 257 0.8× 319 1.5× 161 1.1× 78 781
Piotr Kropelnicki Singapore 17 356 1.0× 389 1.2× 316 1.0× 225 1.1× 203 1.4× 37 748
Alan Zhan United States 13 291 0.8× 279 0.8× 628 1.9× 332 1.6× 370 2.5× 25 923
Kuo‐Bin Hong Taiwan 17 333 0.9× 652 1.9× 225 0.7× 475 2.3× 82 0.5× 72 1.0k
Hsiao L. Chung South Korea 14 166 0.4× 332 1.0× 327 1.0× 233 1.1× 175 1.2× 44 673
Alan She United States 6 335 0.9× 232 0.7× 629 1.9× 277 1.3× 367 2.4× 12 852
Dingbo Chen China 17 580 1.6× 723 2.2× 452 1.4× 376 1.8× 166 1.1× 55 1.1k
J. Valente United Kingdom 13 273 0.7× 286 0.9× 312 0.9× 291 1.4× 132 0.9× 33 730
Seong‐Won Moon South Korea 15 247 0.7× 219 0.7× 549 1.7× 309 1.5× 288 1.9× 24 815

Countries citing papers authored by Ruben Maas

Since Specialization
Citations

This map shows the geographic impact of Ruben Maas's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ruben Maas with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ruben Maas more than expected).

Fields of papers citing papers by Ruben Maas

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Ruben Maas. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ruben Maas. The network helps show where Ruben Maas may publish in the future.

Co-authorship network of co-authors of Ruben Maas

This figure shows the co-authorship network connecting the top 25 collaborators of Ruben Maas. A scholar is included among the top collaborators of Ruben Maas based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ruben Maas. Ruben Maas is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Bigwood, R., Kedong Zhang, Stephen Hsu, et al.. (2025). Accelerating high-NA introduction with RET innovations. 10–10.
3.
Finders, Jo, et al.. (2024). Holistic assessment and control of total CDU. 2–2. 1 indexed citations
4.
Schoot, Jan van, Sjoerd Lok, Eelco van Setten, et al.. (2021). High-NA EUV lithography exposure tool: key advantages and program progress. 3–3. 16 indexed citations
5.
Schoot, Jan van, Sjoerd Lok, Eelco van Setten, et al.. (2021). High-NA EUVL exposure tool: key advantages and program status. 26–26. 5 indexed citations
6.
Schoot, Jan van, Sjoerd Lok, Eelco van Setten, et al.. (2020). High-NA EUV lithography exposure tool: advantages and program progress. 31 indexed citations
7.
Maas, Ruben, M.-Claire van Lare, Gijsbert Rispens, & Sander F. Wuister. (2018). Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists. Journal of Micro/Nanolithography MEMS and MOEMS. 17(4). 1–1. 21 indexed citations
8.
Maas, Ruben, Sander A. Mann, Dimitrios L. Sounas, et al.. (2016). Generalized antireflection coatings for complex bulk metamaterials. Physical review. B.. 93(19). 6 indexed citations
9.
Haar, Marie Anne van de, Ruben Maas, Benjamin J. M. Brenny, & Albert Polman. (2016). Surface plasmon polariton modes in coaxial metal-dielectric-metal waveguides. New Journal of Physics. 18(4). 43016–43016. 5 indexed citations
10.
Maas, Ruben, Jorik van de Groep, & Albert Polman. (2016). Planar metal/dielectric single-periodic multilayer ultraviolet flat lens. Optica. 3(6). 592–592. 13 indexed citations
11.
Haar, Marie Anne van de, et al.. (2014). Experimental Realization of a Polarization-Independent Ultraviolet/Visible Coaxial Plasmonic Metamaterial. Nano Letters. 14(11). 6356–6360. 14 indexed citations
12.
Maas, Ruben, J. Parsons, Nader Engheta, & Albert Polman. (2013). Experimental realization of an epsilon-near-zero metamaterial at visible wavelengths. Nature Photonics. 7(11). 907–912. 391 indexed citations breakdown →
13.
Wallow, Tom, et al.. (2012). EUV resist performance: current assessment for sub-22-nm half-pitch patterning on NXE:3300. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83221J–83221J. 25 indexed citations
14.
Enomoto, Masashi, et al.. (2011). Investigation of processing performance and requirements for next generation lithography cluster tools. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79722X–79722X. 1 indexed citations
15.
Tanaka, Hiromitsu, et al.. (2010). Simplified "Litho-Cluster-Only" solution for double patterning. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 76391V–76391V. 1 indexed citations
16.
Nafus, Kathleen, et al.. (2009). Improvements in process performance for immersion technology high volume manufacturing. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7273. 727338–727338. 2 indexed citations
17.
Enomoto, Masashi, et al.. (2008). Process manufacturability evaluation for next generation immersion technology node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6923. 69231W–69231W. 1 indexed citations
18.
Maas, Ruben, Michael Koch, Nick Harris, N.M. White, & A G R Evans. (1997). Thick-film printing of PZT onto silicon. Materials Letters. 31(1-2). 109–112. 77 indexed citations
19.
Bakker, R.J., Ruben Maas, G. Luijckx, et al.. (1995). Expected performance of FELINA, the Dutch VUV-FEL in Amsterdam. Nuclear Instruments and Methods in Physics Research Section A Accelerators Spectrometers Detectors and Associated Equipment. 358(1-3). 358–361. 2 indexed citations
20.
Maas, Ruben, et al.. (1988). New layout of Amsterdam pulse stretcher. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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