Claire van Lare
- Electrical and Electronic Engineering top 10%
- Surfaces, Coatings and Films top 5%
- Biomedical Engineering
- Materials Chemistry
- Atomic and Molecular Physics, and Optics
- Co-authors
- Albert PolmanJo FindersFrank TimmermansG. Y. YinM. SchmidPierpaolo SpinelliMarc A. VerschuurenFrank Lenzmann
- Topics
- Advancements in Photolithography Techniques (18 papers)Electron and X-Ray Spectroscopy Techniques (16 papers)Integrated Circuits and Semiconductor Failure Analysis (14 papers)
- Partner nations
- NetherlandsGermanyUnited States
In The Last Decade
Claire van Lare
23 papers receiving 392 citations
Peers
Comparison fields: 5 of 39
- Electrical and Electronic Engineering 334
- Surfaces, Coatings and Films 144
- Biomedical Engineering 132
- Materials Chemistry 112
- Atomic and Molecular Physics, and Optics 69
Countries citing papers authored by Claire van Lare
This map shows the geographic impact of Claire van Lare's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Claire van Lare with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Claire van Lare more than expected).
Fields of papers citing papers by Claire van Lare
This network shows the impact of papers produced by Claire van Lare. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Claire van Lare. The network helps show where Claire van Lare may publish in the future.
Co-authorship network of co-authors of Claire van Lare
This figure shows the co-authorship network connecting the top 25 collaborators of Claire van Lare. A scholar is included among the top collaborators of Claire van Lare based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Claire van Lare. Claire van Lare is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 1 | |
| 2 | 1 | |
| 3 | 1 | |
| 4 | 3 | |
| 5 | 4 | |
| 6 | 2 | |
| 7 | 2 | |
| 8 | 2 | |
| 9 | 14 | |
| 10 | 8 | |
| 11 | 11 | |
| 12 | 12 | |
| 13 | 4 | |
| 14 | 28 | |
| 15 | 24 | |
| 16 | 4 | |
| 17 | 91 | |
| 18 | 59 | |
| 19 | 61 | |
| 20 | 74 |
About Claire van Lare
Claire van Lare is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Media Technology, having authored 25 papers that have together received 427 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (18 papers), Electron and X-Ray Spectroscopy Techniques (16 papers) and Integrated Circuits and Semiconductor Failure Analysis (14 papers). The work is most often cited by research in Surfaces, Coatings and Films (144 citations), Electrical and Electronic Engineering (334 citations) and Radiation (36 citations). Claire van Lare has collaborated with scholars based in Netherlands, Germany and United States. Frequent co-authors include Albert Polman, Jo Finders, Frank Timmermans, G. Y. Yin, M. Schmid, Pierpaolo Spinelli, Marc A. Verschuuren, Frank Lenzmann, Ewold Verhagen and Harry A. Atwater. Their work appears in journals such as Nano Letters, ACS Nano and Applied Physics Letters.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.