Jos Benschop
- Electrical and Electronic Engineering top 10%
- Biomedical Engineering
- Surfaces, Coatings and Films top 5%
- Atomic and Molecular Physics, and Optics
- Mechanics of Materials
- Co-authors
- Vadim BanineSjoerd LokPeter KuerzH. MeilingWinfried KaiserMark van de KerkhofEelco van SettenKars Troost
- Topics
- Advancements in Photolithography Techniques (30 papers)Electron and X-Ray Spectroscopy Techniques (16 papers)Integrated Circuits and Semiconductor Failure Analysis (16 papers)
- Partner nations
- NetherlandsGermanyUnited States
In The Last Decade
Jos Benschop
40 papers receiving 552 citations
Peers
Comparison fields: 5 of 59
- Electrical and Electronic Engineering 413
- Biomedical Engineering 182
- Surfaces, Coatings and Films 154
- Atomic and Molecular Physics, and Optics 121
- Mechanics of Materials 86
Countries citing papers authored by Jos Benschop
This map shows the geographic impact of Jos Benschop's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jos Benschop with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jos Benschop more than expected).
Fields of papers citing papers by Jos Benschop
This network shows the impact of papers produced by Jos Benschop. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jos Benschop. The network helps show where Jos Benschop may publish in the future.
Co-authorship network of co-authors of Jos Benschop
This figure shows the co-authorship network connecting the top 25 collaborators of Jos Benschop. A scholar is included among the top collaborators of Jos Benschop based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jos Benschop. Jos Benschop is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 5 | |
| 2 | 5 | |
| 3 | 16 | |
| 4 | 5 | |
| 5 | 1 | |
| 6 | 11 | |
| 7 | 2 | |
| 8 | 31 | |
| 9 | 39 | |
| 10 | 1 | |
| 11 | 8 | |
| 12 | 9 | |
| 13 | 48 | |
| 14 | 27 | |
| 15 | 70 | |
| 16 | 24 | |
| 17 | 4 | |
| 18 | EUCLIDES: European EUV lithography milestones | 3 |
| 19 | 4 | |
| 20 | 1 |
About Jos Benschop
Jos Benschop is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Media Technology, having authored 42 papers that have together received 604 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (30 papers), Electron and X-Ray Spectroscopy Techniques (16 papers) and Integrated Circuits and Semiconductor Failure Analysis (16 papers). The work is most often cited by research in Surfaces, Coatings and Films (154 citations), Electrical and Electronic Engineering (413 citations) and Radiation (52 citations). Jos Benschop has collaborated with scholars based in Netherlands, Germany and United States. Frequent co-authors include Vadim Banine, Sjoerd Lok, Peter Kuerz, H. Meiling, Winfried Kaiser, Mark van de Kerkhof, Eelco van Setten, Kars Troost, F. Bijkerk and Judon Stoeldraijer. Their work appears in journals such as Scientific Reports, Journal of Physics D Applied Physics and Sensors and Actuators A Physical.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.