Jens Timo Neumann

751 total citations
46 papers, 565 citations indexed

About

Jens Timo Neumann is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Jens Timo Neumann has authored 46 papers receiving a total of 565 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 19 papers in Surfaces, Coatings and Films and 13 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Jens Timo Neumann's work include Advancements in Photolithography Techniques (26 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Jens Timo Neumann is often cited by papers focused on Advancements in Photolithography Techniques (26 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Jens Timo Neumann collaborates with scholars based in Germany, Netherlands and United States. Jens Timo Neumann's co-authors include Winfried Kaiser, Bernhard Kneer, Jan van Schoot, Paul Gräupner, Andreas Erdmann, Peter Evanschitzky, Detlef Kip, Eelco van Setten, Kars Troost and Gijsbert Rispens and has published in prestigious journals such as Physical Review A, Optics Letters and Surface Science.

In The Last Decade

Jens Timo Neumann

41 papers receiving 510 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jens Timo Neumann Germany 16 468 259 139 104 97 46 565
Winfried Kaiser Germany 16 517 1.1× 268 1.0× 225 1.6× 106 1.0× 79 0.8× 35 656
Jan van Schoot Netherlands 16 612 1.3× 345 1.3× 216 1.6× 106 1.0× 56 0.6× 50 722
Eelco van Setten Netherlands 20 849 1.8× 494 1.9× 207 1.5× 121 1.2× 80 0.8× 88 970
Peter Evanschitzky Germany 17 790 1.7× 476 1.8× 162 1.2× 176 1.7× 36 0.4× 93 840
Judon Stoeldraijer Germany 13 378 0.8× 183 0.7× 131 0.9× 50 0.5× 63 0.6× 24 452
Peter Kuerz Germany 16 449 1.0× 219 0.8× 151 1.1× 61 0.6× 73 0.8× 27 516
Jo Finders Netherlands 18 1.0k 2.2× 423 1.6× 318 2.3× 134 1.3× 152 1.6× 128 1.1k
Edita Tejnil United States 11 300 0.6× 125 0.5× 75 0.5× 105 1.0× 100 1.0× 47 421
Donis G. Flagello United States 14 450 1.0× 172 0.7× 272 2.0× 39 0.4× 119 1.2× 60 564
Pawitter J. S. Mangat United States 14 426 0.9× 235 0.9× 112 0.8× 94 0.9× 46 0.5× 61 461

Countries citing papers authored by Jens Timo Neumann

Since Specialization
Citations

This map shows the geographic impact of Jens Timo Neumann's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jens Timo Neumann with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jens Timo Neumann more than expected).

Fields of papers citing papers by Jens Timo Neumann

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jens Timo Neumann. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jens Timo Neumann. The network helps show where Jens Timo Neumann may publish in the future.

Co-authorship network of co-authors of Jens Timo Neumann

This figure shows the co-authorship network connecting the top 25 collaborators of Jens Timo Neumann. A scholar is included among the top collaborators of Jens Timo Neumann based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jens Timo Neumann. Jens Timo Neumann is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Kalden, J., et al.. (2024). EUV optics at ZEISS: status, outlook, and future. 36–36. 2 indexed citations
2.
Neumann, Jens Timo, Abhilash Srikantha, Philipp Hüthwohl, et al.. (2023). Defect detection and classification on imec iN5 node BEoL test vehicle with multibeam scanning electron microscope. Journal of Micro/Nanopatterning Materials and Metrology. 22(2). 1 indexed citations
3.
Zimmermann, Jörg, et al.. (2023). Status and outlook of EUV optics at ZEISS. 12494. 47–47. 5 indexed citations
4.
Neumann, Jens Timo, Tomasz Garbowski, Sandip Halder, et al.. (2017). High-throughput multi-beam SEM: quantitative analysis of imaging capabilities at IMEC-N10 logic node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101451S–101451S. 3 indexed citations
5.
Schoot, Jan van, Eelco van Setten, Gijsbert Rispens, et al.. (2017). High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond. Journal of Micro/Nanolithography MEMS and MOEMS. 16(4). 1–1. 44 indexed citations
6.
Neumann, Jens Timo, et al.. (2015). Imaging performance of EUV lithography optics configuration for sub-9nm resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94221H–94221H. 20 indexed citations
7.
Look, Lieve Van, Vicky Philipsen, Eric Hendrickx, et al.. (2015). Experimental validation of novel EUV mask technology to reduce mask 3D effects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9661. 966109–966109. 2 indexed citations
8.
Schoot, Jan van, Koen van Ingen Schenau, Kars Troost, et al.. (2015). EUV High-NA scanner and mask optimization for sub 8 nm resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9635. 963503–963503. 17 indexed citations
9.
Erdmann, Andreas, et al.. (2013). Modeling studies on alternative EUV mask concepts for higher NA. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86791Q–86791Q. 16 indexed citations
10.
Neumann, Jens Timo, et al.. (2012). Overlay metrology for low-k<sub>1</sub>: challenges and solutions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8326. 832602–832602. 1 indexed citations
11.
Neumann, Jens Timo, et al.. (2012). Interactions of 3D mask effects and NA in EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8522. 852211–852211. 25 indexed citations
12.
Bekaert, Joost, Lieve Van Look, Geert Vandenberghe, et al.. (2011). Characterization and control of dynamic lens heating effects under high volume manufacturing conditions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7973. 79730V–79730V. 11 indexed citations
13.
Neumann, Jens Timo, et al.. (1999). Linear Electrooptic Coefficientr42 of Tetragonal Potassium-Tantalate-Niobate and Barium-Calcium-Titanate. physica status solidi (b). 215(2). R9–R10. 12 indexed citations
14.
Neumann, Jens Timo, et al.. (1999). Direct laser writing of surface reliefs in dry, self-developing photopolymer films. Applied Optics. 38(25). 5418–5418. 34 indexed citations
15.
Neumann, Jens Timo, et al.. (1998). Photorefractive light amplification by forward four-wave mixing in BaTiO3. Optics Communications. 146(1-6). 220–224. 7 indexed citations
16.
Neumann, Jens Timo, et al.. (1996). Holographic scattering lines observed with photorefractive BaTiO3. Applied Physics B. 63(6). 599–604. 3 indexed citations
17.
Neumann, Jens Timo, et al.. (1996). Two examples of mirrorless parametric oscillation in photorefractive barium-titanate. Ferroelectrics. 183(1). 185–194.
18.
Neumann, Jens Timo, et al.. (1995). Multiwave-pumped mirrorless parametric oscillation in BaTiO3. Applied Physics B. 61(5). 415–419.
19.
Schubert, S., Jens Timo Neumann, U. Imke, et al.. (1986). Neutralization and dissociative attachment in molecular ion-surface interaction: Scattering of N2+ and O2+ from Ni(111). Surface Science. 171(1). L375–L378. 23 indexed citations
20.
Neumann, Jens Timo, et al.. (1968). Automatic Interferometer with Digital Readout for Refractometric Analysis. Applied Optics. 7(2). 341–341. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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