Ryoichi Hirano
- Electrical and Electronic Engineering top 10%
- Surfaces, Coatings and Films top 2%
- Atomic and Molecular Physics, and Optics
- Biomedical Engineering
- Mechanical Engineering
- Co-authors
- Hidehiro WatanabeTsuyoshi AmanoS. IidaTsuneo TerasawaTakeshi MurakamiHirofumi KanShoji YoshikawaH Hashimoto
- Topics
- Advancements in Photolithography Techniques (49 papers)Electron and X-Ray Spectroscopy Techniques (37 papers)Integrated Circuits and Semiconductor Failure Analysis (29 papers)
- Partner nations
- JapanUnited KingdomUnited States
In The Last Decade
Ryoichi Hirano
51 papers receiving 214 citations
Peers
Comparison fields: 5 of 20
- Electrical and Electronic Engineering 333
- Surfaces, Coatings and Films 235
- Atomic and Molecular Physics, and Optics 54
- Biomedical Engineering 39
- Mechanical Engineering 35
Countries citing papers authored by Ryoichi Hirano
This map shows the geographic impact of Ryoichi Hirano's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ryoichi Hirano with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ryoichi Hirano more than expected).
Fields of papers citing papers by Ryoichi Hirano
This network shows the impact of papers produced by Ryoichi Hirano. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ryoichi Hirano. The network helps show where Ryoichi Hirano may publish in the future.
Co-authorship network of co-authors of Ryoichi Hirano
This figure shows the co-authorship network connecting the top 25 collaborators of Ryoichi Hirano. A scholar is included among the top collaborators of Ryoichi Hirano based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Ryoichi Hirano. Ryoichi Hirano is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 3 | |
| 2 | 2 | |
| 3 | 3 | |
| 4 | 1 | |
| 5 | 2 | |
| 6 | 1 | |
| 7 | 8 | |
| 8 | 6 | |
| 9 | 12 | |
| 10 | 16 | |
| 11 | 5 | |
| 12 | 13 | |
| 13 | 1 | |
| 14 | 2 | |
| 15 | 1 | |
| 16 | 1 | |
| 17 | 3 | |
| 18 | 1 | |
| 19 | 3 | |
| 20 | 2 |
About Ryoichi Hirano
Ryoichi Hirano is a scholar working on Surfaces, Coatings and Films, Structural Biology and Electrical and Electronic Engineering, having authored 58 papers that have together received 342 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (49 papers), Electron and X-Ray Spectroscopy Techniques (37 papers) and Integrated Circuits and Semiconductor Failure Analysis (29 papers). The work is most often cited by research in Surfaces, Coatings and Films (235 citations), Electrical and Electronic Engineering (333 citations) and Radiation (19 citations). Ryoichi Hirano has collaborated with scholars based in Japan, United Kingdom and United States. Frequent co-authors include Hidehiro Watanabe, Tsuyoshi Amano, S. Iida, Tsuneo Terasawa, Takeshi Murakami, Takeshi Murakami, Hirofumi Kan, Shoji Yoshikawa, H Hashimoto and W. Susaki. Their work appears in journals such as Applied Physics Letters, Applied Surface Science and Japanese Journal of Applied Physics.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.