Hwan-Seok Seo

422 total citations
25 papers, 377 citations indexed

About

Hwan-Seok Seo is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Mechanics of Materials. According to data from OpenAlex, Hwan-Seok Seo has authored 25 papers receiving a total of 377 indexed citations (citations by other indexed papers that have themselves been cited), including 24 papers in Electrical and Electronic Engineering, 13 papers in Surfaces, Coatings and Films and 6 papers in Mechanics of Materials. Recurrent topics in Hwan-Seok Seo's work include Advancements in Photolithography Techniques (17 papers), Electron and X-Ray Spectroscopy Techniques (12 papers) and Semiconductor materials and devices (7 papers). Hwan-Seok Seo is often cited by papers focused on Advancements in Photolithography Techniques (17 papers), Electron and X-Ray Spectroscopy Techniques (12 papers) and Semiconductor materials and devices (7 papers). Hwan-Seok Seo collaborates with scholars based in South Korea, United States and Japan. Hwan-Seok Seo's co-authors include I. Petrov, J. E. Greene, Taeyoon Lee, Daniel Gall, Jianguo Wen, Richard T. Haasch, P. Desjardins, Y. L. Foo, T. Spila and Han-Ku Cho and has published in prestigious journals such as Journal of Applied Physics, Thin Solid Films and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

Hwan-Seok Seo

25 papers receiving 356 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Hwan-Seok Seo South Korea	9	254	200	179	73	54	25	377
U. Berges Germany	12	163 0.6×	53 0.3×	195 1.1×	63 0.9×	22 0.4×	56	354
Shashank C. Deshmukh United States	7	277 1.1×	81 0.4×	166 0.9×	45 0.6×	50 0.9×	16	374
M. L. Green United States	8	401 1.6×	73 0.4×	189 1.1×	52 0.7×	26 0.5×	9	442
Shanthi Subramanian United States	8	133 0.5×	45 0.2×	148 0.8×	40 0.5×	17 0.3×	14	321
R. R. Kola United States	10	223 0.9×	75 0.4×	80 0.4×	55 0.8×	6 0.1×	40	311
E. F. Krimmel Germany	12	295 1.2×	62 0.3×	131 0.7×	45 0.6×	11 0.2×	43	383
Patricia G. Blauner United States	10	243 1.0×	73 0.4×	87 0.5×	117 1.6×	8 0.1×	30	374
Paihung Pan United States	12	379 1.5×	69 0.3×	181 1.0×	30 0.4×	61 1.1×	18	456
G. Quintana Argentina	10	283 1.1×	45 0.2×	159 0.9×	26 0.4×	26 0.5×	17	364
D. K. Basa India	13	550 2.2×	57 0.3×	503 2.8×	14 0.2×	13 0.2×	40	667

Countries citing papers authored by Hwan-Seok Seo

Since Specialization

Citations

This map shows the geographic impact of Hwan-Seok Seo's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hwan-Seok Seo with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hwan-Seok Seo more than expected).

Fields of papers citing papers by Hwan-Seok Seo

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hwan-Seok Seo. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hwan-Seok Seo. The network helps show where Hwan-Seok Seo may publish in the future.

Co-authorship network of co-authors of Hwan-Seok Seo

This figure shows the co-authorship network connecting the top 25 collaborators of Hwan-Seok Seo. A scholar is included among the top collaborators of Hwan-Seok Seo based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hwan-Seok Seo. Hwan-Seok Seo is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

Seo, Hwan-Seok, et al.. (2015). Development of high-transmittance phase-shifting mask for ArF immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9658. 965808–965808. 2 indexed citations

Lee, Suyong, et al.. (2014). Durability of Ru-based EUV masks and the improvement. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480J–90480J. 1 indexed citations

Lee, Su‐Young, et al.. (2013). Effects of multilayer period on EUVL imaging for 2X node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 867903–867903. 3 indexed citations

Graeupner, Paul, et al.. (2013). Experimental verification of EUV mask limitations at high numerical apertures. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86791M–86791M. 3 indexed citations

Kim, Tae-Geun, et al.. (2012). Printability study of pattern defects in the EUV mask as a function of hp nodes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83220A–83220A. 1 indexed citations

Kang, Hee Young, Sungjin Park, Chang Kwon Hwangbo, et al.. (2012). Optical Performance of Extreme Ultraviolet Lithography Mask with an Indium Tin Oxide Absorber. Journal of Nanoscience and Nanotechnology. 12(4). 3330–3333. 3 indexed citations

Na, Jihoon, et al.. (2012). Printability and inspectability of defects on EUV blank for 2xnm hp HVM application. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8322. 83220K–83220K. 2 indexed citations

Kang, Hee Young, et al.. (2012). Optical properties of TaTe2O7 thin films as absorber materials for extreme ultraviolet lithography binary masks. Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena. 30(6). 4 indexed citations

Seo, Hwan-Seok, et al.. (2010). Absorber stack optimization in EUVL masks: lithographic performances in alpha demo tool and other issues. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76360X–76360X. 8 indexed citations

10.

Ahn, Jong‐Hyun, Kim Js, Nae‐Eung Lee, et al.. (2010). Infinitely high selective inductively coupled plasma etching of an indium tin oxide binary mask structure for extreme ultraviolet lithography. Journal of Vacuum Science & Technology A Vacuum Surfaces and Films. 28(4). 761–765. 2 indexed citations

11.

Seo, Hwan-Seok, Dong‐Gun Lee, Dong‐Wan Kim, et al.. (2010). Printability and inspectability of programmed pit defects on the masks in EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76361B–76361B. 11 indexed citations

12.

Lee, Taeyoon, Hwan-Seok Seo, Helen Hwang, et al.. (2010). Fully strained low-temperature epitaxy of TiN/MgO(001) layers using high-flux, low-energy ion irradiation during reactive magnetron sputter deposition. Thin Solid Films. 518(18). 5169–5172. 18 indexed citations

13.

Seo, Hwan-Seok, Dong‐Gun Lee, Hak-Seung Han, et al.. (2009). Characteristics and issues of an EUVL mask applying phase-shifting thinner absorber for device fabrication. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72710D–72710D. 5 indexed citations

14.

Kim, Hoon, Jaehyuck Choi, Dong‐Gun Lee, et al.. (2008). Lifetime of EUVL masks as a function of degree of carbon contamination and capping materials. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6921. 692115–692115. 9 indexed citations

15.

Lee, Su‐Young, Geun‐Bae Kim, Sang‐Hyeon Lee, et al.. (2008). Analysis of process margin in EUV mask repair with nano-machining. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71222I–71222I. 7 indexed citations

16.

Seo, Hwan-Seok, Dong‐Gun Lee, Hoon Kim, et al.. (2008). Effects of mask absorber structures on the extreme ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 26(6). 2208–2214. 8 indexed citations

17.

Seo, Hwan-Seok, et al.. (2007). Properties of EUVL masks as a function of capping layer and absorber stack structures. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 65171G–65171G. 11 indexed citations

18.

Seo, Hwan-Seok, et al.. (2006). Raman scattering from epitaxial HfN layers grown on MgO(001). Journal of Applied Physics. 99(4). 18 indexed citations

19.

Seo, Hwan-Seok, Taeyoon Lee, I. Petrov, J. E. Greene, & Daniel Gall. (2005). Epitaxial and polycrystalline HfNx (0.8⩽x⩽1.5) layers on MgO(001): Film growth and physical properties. Journal of Applied Physics. 97(8). 97 indexed citations

20.

Seo, Hwan-Seok, Taeyoon Lee, Jianguo Wen, et al.. (2004). Growth and physical properties of epitaxial HfN layers on MgO(001). Journal of Applied Physics. 96(1). 878–884. 90 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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