Peter Kuerz

683 citations

27 papers · 516 indexed · h-index 16

Impact in

Surfaces, Coatings and Films top 2%
- Electron and X-Ray Spectroscopy Techniques
- Optical Coatings and Gratings
Electrical and Electronic Engineering top 10%
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis

Papers in

Surfaces, Coatings and Films 18
- Electron and X-Ray Spectroscopy Techniques 17
Electrical and Electronic Engineering 24
- Advancements in Photolithography Techniques 24
- Integrated Circuits and Semiconductor Failure Analysis 16
- Silicon and Solar Cell Technologies 2
- Semiconductor materials and devices 2

Co-authors: H. Meiling Judon Stoeldraijer Noreen Harned Martin Lowisch Eelco van Setten Jan van Schoot Rudy Peeters Sjoerd Lok
Journals: Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (13 papers)
Partner nations: Germany Netherlands United States

In The Last Decade

Peter Kuerz

26 papers receiving 423 citations

Peers

Countries citing papers authored by Peter Kuerz

Since Specialization

Citations

This map shows the geographic impact of Peter Kuerz's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Peter Kuerz with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Peter Kuerz more than expected).

Fields of papers citing papers by Peter Kuerz

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Peter Kuerz. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Peter Kuerz. The network helps show where Peter Kuerz may publish in the future.

Co-authors

The 25 scholars most cited alongside Peter Kuerz, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Peter Kuerz Line = papers co-authored together Peter Kuerz links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	EUV optics at ZEISS: status, outlook, and future J. Kalden, Jens Timo Neumann, Lars Samuelson, Paul Gräupner, Wolfgang Seitz, Peter Kuerz	2024	2
2	The next step in Moore’s law: high-NA EUV introduction at the customer Moreno Mondragón Daniela, Rudy Peeters, Marieni A., Sjoerd Lok, Jan van Schoot, Paul Gräupner, Peter Kuerz, N. G. Smirnova, Oleksandra Dmytrenko, Peter Vanoppen	2024	4
3	High-NA EUV platform realization as next step in EUV technology Moreno Mondragón Daniela, Rudy Peeters, Jeroen van Dongen, Marieni A., Sjoerd Lok, Jan van Schoot, Paul Gräupner, Peter Kuerz, M. Carlos Galindo Pérez, H. W. Paine, Peter Vanoppen	2023	4
4	EUV optics: status, outlook and future Paul Graeupner, Peter Kuerz, Thomas Stammler, Jan van Schoot, Judon Stoeldraijer	2022	17
5	High-NA EUV lithography exposure tool: key advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Thomas Stammler	2021	16
6	High-NA EUVL exposure tool: key advantages and program status Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Thomas Stammler, Kars Troost	2021	5
7	High-NA EUV lithography exposure tool: advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser	2020	31
8	High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation) Jan van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, J. Zimmermann, Paul Graeupner, Peter Kuerz, Winfried Kaiser	2019	1
9	High-NA EUV lithography exposure tool progress Jan van Schoot, Eelco van Setten, Kars Troost, R. Wentorp, Marieni A., Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, J. Zimmermann, Peter Kuerz, Brooklyn G. Sloss, Winfried Kaiser	2019	11
10	High-NA EUV lithography: pushing the limits 澄子宮田, Paul Gräupner, Jan van Schoot, Peter Kuerz, Judon Stoeldraijer, Winfried Kaiser	2019	29
11	The future of EUV lithography: continuing Moore's Law into the next decade Jan van Schoot, Kars Troost, R. Wentorp, Marieni A., Sjoerd Lok, M. G. Cavalcante, Judon Stoeldraijer, Jos Benschop, Jo Finders, H. Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Tim Crich	2018	9
12	High-NA EUV lithography enabling Moore’s law in the next decade Jan van Schoot, Kars Troost, R. Wentorp, Marieni A., Sjoerd Lok, M. G. Cavalcante, Judon Stoeldraijer, Matthew Davies, Jos Benschop, Jo Finders, H. Meiling, Eelco van Setten, Bernhard Kneer, Winfried Kaiser, Tilmann Heil, Tim Crich, Peter Kuerz, Jens Timo Neumann	2017	15
13	EUV lithography: NXE platform performance overview Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Rudy Peeters, Sjoerd Lok, Lei Axn, Marilene Neves Silva, Noreen Harned, Peter Kuerz, Martin Lowisch, Eelco van Setten, Dan Yang, Y. Page, Judon Stoeldraijer, David C. Brandt, Nigel R. Farrar, Igor V. Fomenkov, H.B.K. Boom, H. Meiling, Dei Testi	2014	41
14	ASML's NXE platform performance and volume introduction Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Rudy Peeters, Sjoerd Lok, Earl Kellis Burton, Noreen Harned, Peter Kuerz, Martin Lowisch, H.C. Meijer, Mehmet Eray Atalay, Eelco van Setten, Dan Yang, Takashi Ichiki, Judon Stoeldraijer, A. V. Flotow, Richard Droste, H. Meiling, Dei Testi	2013	56
15	Optics for ASML's NXE:3300B platform Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Martin Lowisch, Peter Kuerz, Boris Chobrutskiy Chobrutskiy, Gero Wittich, Wolfgang Seitz, Winfried Kaiser	2013	20
16	EUV into production with ASML's NXE platform Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christian Wagner, Noreen Harned, Peter Kuerz, Martin Lowisch, H. Meiling, Mehmet Eray Atalay, Rudy Peeters, Wei Xinhong, Eelco van Setten, Judon Stoeldraijer, Oscar Julián Alvarado Laurín	2010	31
17	EUV lithography with the Alpha Demo Tools: status and challenges Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Noreen Harned, Paula Keyla Bezerra Silva, Feng Lin-li, Peter Kuerz, Martin Lowisch, H.C. Meijer, H. Meiling, Kurt Ronse, J. Ryan, سعاد تامي, C M Barbosa de Lemos, 俊哉山岸, Tong-Qi Yuan, Sjoerd Lok	2007	36
18	Development of the ASML EUV alpha demo tool Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, Vadim Banine, Noreen Harned, A. Garai, Peter Kuerz, H.C. Meijer	2005	22
19	Progress in the ASML EUV program Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, Vadim Banine, Peter Kuerz, Noreen Harned	2004	18
20	<title>Progress of the EUVL alpha tool</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, Jos Benschop, Udo Dinger, Peter Kuerz	2001	24

About Peter Kuerz

Peter Kuerz is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Radiation, Marketing and Electronic, Optical and Magnetic Materials, having authored 27 papers that have together received 516 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (24 papers), Electron and X-Ray Spectroscopy Techniques (17 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers), Advanced X-ray Imaging Techniques (2 papers), Silicon and Solar Cell Technologies (2 papers), Semiconductor materials and devices (2 papers), Adaptive optics and wavefront sensing (1 paper) and Copper Interconnects and Reliability (1 paper). The work is most often cited by research in Surfaces, Coatings and Films (219 citations), Electrical and Electronic Engineering (449 citations), Radiation (61 citations), Biomedical Engineering (151 citations) and Structural Biology (4 citations). Peter Kuerz has collaborated with scholars based in Germany, Netherlands and United States. Frequent co-authors include H. Meiling, Judon Stoeldraijer, Noreen Harned, Martin Lowisch, Eelco van Setten, Jan van Schoot, Rudy Peeters, Sjoerd Lok, Winfried Kaiser and Jos Benschop. Their work appears in journals such as Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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