O.F.J. Noordman
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- Nonlinear Optical Materials Research 4
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- Crystallography and molecular interactions 3
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- Photorefractive and Nonlinear Optics 7
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- Advancements in Photolithography Techniques 7
- Integrated Circuits and Semiconductor Failure Analysis 6
- Photonic and Optical Devices 5
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- Surface Roughness and Optical Measurements 3
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- Advanced Surface Polishing Techniques 3
- Co-authors
- N.F. van HulstB. BölgerM.H.P. MoersF. B. SegerinkJohan F. J. EngbersenDavid N. ReinhoudtPaul J. A. KenisSybolt Harkema
- Cited by
- Electronic, Optical and Magnetic MaterialsPhysical and Theoretical ChemistryAcoustics and Ultrasonics
- Journals
- Journal of the American Chemical Society (1 paper)Applied Physics Letters (1 paper)Chemistry of Materials (1 paper)
- Partner nations
- NetherlandsUnited StatesGermany
In The Last Decade
O.F.J. Noordman
22 papers receiving 463 citations
Peers
Comparison fields: 5 of 50
- Electronic, Optical and Magnetic Materials 125
- Physical and Theoretical Chemistry 58
- Acoustics and Ultrasonics 5
- Surfaces, Coatings and Films 38
- Atomic and Molecular Physics, and Optics 162
Countries citing papers authored by O.F.J. Noordman
This map shows the geographic impact of O.F.J. Noordman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by O.F.J. Noordman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites O.F.J. Noordman more than expected).
Fields of papers citing papers by O.F.J. Noordman
This network shows the impact of papers produced by O.F.J. Noordman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by O.F.J. Noordman. The network helps show where O.F.J. Noordman may publish in the future.
Co-authorship network
The 25 scholars most cited alongside O.F.J. Noordman, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2010 | 21 | |
| 2 | 2009 | 12 | |
| 3 | 2009 | 19 | |
| 4 | 2009 | 4 | |
| 5 | 2005 | 0 | |
| 6 | 2005 | 7 | |
| 7 | 2005 | 0 | |
| 8 | 2003 | 18 | |
| 9 | 1998 | 58 | |
| 10 | 1998 | 30 | |
| 11 | 1997 | 13 | |
| 12 | 1997 | 7 | |
| 13 | 1996 | 4 | |
| 14 | 1996 | 90 | |
| 15 | Second Harmonic Generation using Organic Materials | 1996 | 2 |
| 16 | 1995 | 8 | |
| 17 | Second harmonic generation in organic Cerenkov-type and modematching devices | 1995 | 1 |
| 18 | 1993 | 83 | |
| 19 | 1992 | 21 | |
| 20 | 1991 | 10 |
About O.F.J. Noordman
O.F.J. Noordman is a scholar working on Physical and Theoretical Chemistry, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials, having authored 24 papers that have together received 490 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (7 papers), Photorefractive and Nonlinear Optics (7 papers), Integrated Circuits and Semiconductor Failure Analysis (6 papers), Photonic and Optical Devices (5 papers), Nonlinear Optical Materials Research (4 papers), Surface Roughness and Optical Measurements (3 papers), Crystallography and molecular interactions (3 papers) and Advanced Surface Polishing Techniques (3 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (125 citations), Physical and Theoretical Chemistry (58 citations) and Acoustics and Ultrasonics (5 citations). O.F.J. Noordman has collaborated with scholars based in Netherlands, United States and Germany. Frequent co-authors include N.F. van Hulst, B. Bölger, M.H.P. Moers, F. B. Segerink, Johan F. J. Engbersen, David N. Reinhoudt, Paul J. A. Kenis, Sybolt Harkema, G. J. VAN HUMMEL and Koen Clays. Their work appears in journals such as Journal of the American Chemical Society, Applied Physics Letters and Chemistry of Materials.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.