H. Meiling

1.7k total citations
64 papers, 1.1k citations indexed

About

H. Meiling is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Surfaces, Coatings and Films. According to data from OpenAlex, H. Meiling has authored 64 papers receiving a total of 1.1k indexed citations (citations by other indexed papers that have themselves been cited), including 61 papers in Electrical and Electronic Engineering, 25 papers in Materials Chemistry and 17 papers in Surfaces, Coatings and Films. Recurrent topics in H. Meiling's work include Thin-Film Transistor Technologies (34 papers), Advancements in Photolithography Techniques (26 papers) and Silicon Nanostructures and Photoluminescence (23 papers). H. Meiling is often cited by papers focused on Thin-Film Transistor Technologies (34 papers), Advancements in Photolithography Techniques (26 papers) and Silicon Nanostructures and Photoluminescence (23 papers). H. Meiling collaborates with scholars based in Netherlands, Germany and United States. H. Meiling's co-authors include R.E.I. Schropp, J.K. Rath, Noreen Harned, J.K. Rath, Peter Kuerz, W. F. van der Weg, Jeff Bezemer, Eelco van Setten, H.C. Meijer and Wilfried van Sark and has published in prestigious journals such as Applied Physics Letters, Journal of Applied Physics and Solar Energy Materials and Solar Cells.

In The Last Decade

H. Meiling

64 papers receiving 1.0k citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
H. Meiling Netherlands 21 1.0k 449 223 183 119 64 1.1k
Noreen Harned Netherlands 14 643 0.6× 121 0.3× 286 1.3× 314 1.7× 206 1.7× 28 930
Anthony Yen United States 12 518 0.5× 118 0.3× 167 0.7× 219 1.2× 162 1.4× 92 723
Tomoaki Kawamura Japan 15 575 0.6× 179 0.4× 120 0.5× 231 1.3× 279 2.3× 83 825
Patrick A. Kearney United States 14 541 0.5× 126 0.3× 361 1.6× 136 0.7× 174 1.5× 78 815
Jos Benschop Netherlands 14 413 0.4× 81 0.2× 154 0.7× 182 1.0× 121 1.0× 42 604
Roxann L. Engelstad United States 10 554 0.5× 82 0.2× 173 0.8× 296 1.6× 162 1.4× 181 842
P. J. McMarr United States 18 962 0.9× 353 0.8× 99 0.4× 306 1.7× 400 3.4× 65 1.3k
Erik M. Secula United States 11 349 0.3× 182 0.4× 124 0.6× 179 1.0× 142 1.2× 156 591
Thomas Käsebier Germany 18 839 0.8× 411 0.9× 281 1.3× 600 3.3× 313 2.6× 58 1.2k
C. Hor United States 11 395 0.4× 264 0.6× 132 0.6× 59 0.3× 142 1.2× 20 542

Countries citing papers authored by H. Meiling

Since Specialization
Citations

This map shows the geographic impact of H. Meiling's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. Meiling with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. Meiling more than expected).

Fields of papers citing papers by H. Meiling

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. Meiling. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. Meiling. The network helps show where H. Meiling may publish in the future.

Co-authorship network of co-authors of H. Meiling

This figure shows the co-authorship network connecting the top 25 collaborators of H. Meiling. A scholar is included among the top collaborators of H. Meiling based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with H. Meiling. H. Meiling is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yen, Anthony, H. Meiling, & Jos Benschop. (2018). EUV Lithography at Threshold of High-Volume Manufacturing. University of Twente Research Information. 10143. 11.6.1–11.6.4. 8 indexed citations
2.
Schoot, Jan van, Kars Troost, Sjoerd Lok, et al.. (2018). The future of EUV lithography: continuing Moore's Law into the next decade. 23–23. 9 indexed citations
3.
Meiling, H., K. D. Cummings, Noreen Harned, et al.. (2009). EUVL: towards implementation in production. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7520. 752008–752008. 3 indexed citations
4.
Meiling, H., K. D. Cummings, Noreen Harned, et al.. (2009). EUVL system: moving towards production. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727102–727102. 23 indexed citations
5.
Harned, Noreen, Peter Kuerz, Martin Lowisch, et al.. (2007). EUV lithography with the Alpha Demo Tools: status and challenges. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6517. 651706–651706. 36 indexed citations
6.
Meiling, H., Vadim Banine, Peter Kuerz, & Noreen Harned. (2004). Progress in the ASML EUV program. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5374. 31–31. 18 indexed citations
7.
Meiling, H., Jos Benschop, Udo Dinger, & Peter Kuerz. (2001). <title>Progress of the EUVL alpha tool</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4343. 38–50. 24 indexed citations
8.
Meiling, H., et al.. (2000). Reticle’s contribution to critical dimension control and overlay in extreme-ultraviolet lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 2921–2925. 4 indexed citations
9.
Meiling, H. & R.E.I. Schropp. (1999). The inverse Meyer–Neldel rule in thin-film transistors with intrinsic heterogeneous silicon. Applied Physics Letters. 74(7). 1012–1014. 25 indexed citations
10.
Meiling, H., et al.. (1998). Transistors with a Profiled Active Layer Made by Hot-Wire Cvd. MRS Proceedings. 507. 8 indexed citations
11.
Rath, J.K., et al.. (1997). Application of Hot Wire Deposited Intrinsic Poly-Silicon Films in N-I-P cells and TFTS. MRS Proceedings. 467. 9 indexed citations
12.
Rath, J.K., H. Meiling, & R.E.I. Schropp. (1997). Low-temperature deposition of polycrystalline silicon thin films by hot-wire CVD. Solar Energy Materials and Solar Cells. 48(1-4). 269–277. 20 indexed citations
13.
Hamers, E. A. G., Jeff Bezemer, H. Meiling, Wilfried van Sark, & W. F. van der Weg. (1997). Ion Bombardment in Silane VHF Deposition Plasmas. MRS Proceedings. 467. 7 indexed citations
14.
Rath, J.K., et al.. (1996). Hot-wire CVD: a one-step process to obtain thin film polycrystalline silicon at a low temperature on cheap substrates. PORTO Publications Open Repository TOrino (Politecnico di Torino). 227–227. 1 indexed citations
15.
Hautala, J., et al.. (1996). High Deposition Rate a-Si:H for the Flat Panel Display Industry. MRS Proceedings. 420. 9 indexed citations
16.
Meiling, H., Wilfried van Sark, Jeff Bezemer, & W. F. van der Weg. (1996). Deposition-rate reduction through improper substrate-to-electrode attachment in very-high-frequency deposition of a-Si:H. Journal of Applied Physics. 80(6). 3546–3551. 23 indexed citations
17.
Schropp, R.E.I., et al.. (1996). Hot-Wire Deposited Amorphous Silicon Thin-Film Transistors. MRS Proceedings. 424. 1 indexed citations
18.
19.
Boogaard, M. J. van den, et al.. (1991). Structural changes in a-Si:H during annealing. Physica B Condensed Matter. 170(1-4). 281–284. 5 indexed citations
20.
Meiling, H., et al.. (1990). The influence of electrode shape and hydrogen dilution of SiH4 on the optical properties of glow-discharge hydrogenated amorphous silicon. Philosophical Magazine B. 62(1). 19–28. 3 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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