H. Meiling

1.7k citations

64 papers · 1.1k indexed · h-index 21

Impact in

Surfaces, Coatings and Films top 2%
- Electron and X-Ray Spectroscopy Techniques
Electrical and Electronic Engineering top 5%
- Thin-Film Transistor Technologies
- Advancements in Photolithography Techniques
- Silicon and Solar Cell Technologies
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
- Plasma Diagnostics and Applications

Papers in ⓘ

Surfaces, Coatings and Films 17
- Electron and X-Ray Spectroscopy Techniques 16
Electrical and Electronic Engineering 61
- Thin-Film Transistor Technologies 34
- Advancements in Photolithography Techniques 26
- Silicon and Solar Cell Technologies 18
- Integrated Circuits and Semiconductor Failure Analysis 17
- Semiconductor materials and devices 11

Co-authors: R.E.I. Schropp (21 shared papers)J.K. Rath (3 shared papers)Noreen Harned (15 shared papers)J.K. Rath (7 shared papers)Peter Kuerz (13 shared papers)W. F. van der Weg (13 shared papers)Jeff Bezemer (9 shared papers)Eelco van Setten (12 shared papers)
Journals: Applied Physics Letters (4 papers)Philosophical Magazine B (2 papers)Journal of Non-Crystalline Solids (2 papers)Solar Energy Materials and Solar Cells (2 papers)Japanese Journal of Applied Physics (1 paper)
Partner nations: Netherlands Germany United States

In The Last Decade

H. Meiling

64 papers receiving 1.0k citations

Peers

Countries citing papers authored by H. Meiling

Since Specialization

Citations

This map shows the geographic impact of H. Meiling's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by H. Meiling with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites H. Meiling more than expected).

Fields of papers citing papers by H. Meiling

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by H. Meiling. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by H. Meiling. The network helps show where H. Meiling may publish in the future.

Co-authors

The 25 scholars most cited alongside H. Meiling, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with H. Meiling Line = papers co-authored together H. Meiling links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 64 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Device-quality polycrystalline and amorphous silicon films by hot-wire chemical vapour deposition Philosophical Magazine B ·R.E.I. Schropp, K. F. Feenstra, Edith C. Molenbroek, H. Meiling, J.K. Rath	1997	112
2	First performance results of the ASML alpha demo tool Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, H.C. Meijer, Vadim Banine, Roel Moors, Rogier Groeneveld, Harm-Jan Voorma, Uwe Mickan, B. T. Wolschrijn, B. Mertens, Gregor van Baars, Peter Kürz, Noreen Harned	2006	58
3	Hot-Wire CVD Poly-Silicon Films for Thin Film Devices MRS Proceedings ·J.K. Rath, F. D. Tichelaar, H. Meiling, R.E.I. Schropp	1998	56
4	ASML's NXE platform performance and volume introduction Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Rudy Peeters, Sjoerd Lok, Erwin van Alphen, Noreen Harned, Peter Kuerz, Martin Lowisch, H.C. Meijer, David Ockwell, Eelco van Setten, Guido Schiffelers, Jan-Willem van der Horst, Judon Stoeldraijer, Robert Kazinczi, Richard Droste, H. Meiling, Ron Kool	2013	56
5	The future of EUV lithography: enabling Moore's Law in the next decade Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Alberto Pirati, Jan van Schoot, Kars Troost, Rob van Ballegoij, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, H. Meiling, Eelco van Setten, Niclas Mika, Jeannot Dredonx, Uwe Stamm, Bernhard Kneer, Bernd Thuering, Winfried Kaiser, Tilmann Heil, Sascha Migura	2017	48
6	Stable amorphous-silicon thin-film transistors Applied Physics Letters ·H. Meiling, R.E.I. Schropp	1997	42
7	Purely Intrinsic Poly-silicon Films for n-i-p Solar Cells Japanese Journal of Applied Physics ·J.K. Rath, H. Meiling, R.E.I. Schropp	1997	42
8	EUV lithography: NXE platform performance overview Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Rudy Peeters, Sjoerd Lok, Joerg Mallman, Martijn van Noordenburg, Noreen Harned, Peter Kuerz, Martin Lowisch, Eelco van Setten, Guido Schiffelers, Alberto Pirati, Judon Stoeldraijer, David C. Brandt, Nigel R. Farrar, Igor V. Fomenkov, H.B.K. Boom, H. Meiling, Ron Kool	2014	41
9	Structural properties of a-Si:H related to ion energy distributions in VHF silane deposition plasmas Journal of Non-Crystalline Solids ·E. A. G. Hamers, Wilfried van Sark, Jeff Bezemer, H. Meiling, W. F. van der Weg	1998	39
10	EUV lithography with the Alpha Demo Tools: status and challenges Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Noreen Harned, M. Goethals, Rogier Groeneveld, Peter Kuerz, Martin Lowisch, H.C. Meijer, H. Meiling, Kurt Ronse, J. Ryan, Michael Tittnich, H.-J. Voorma, John Zimmerman, Uwe Mickan, Sjoerd Lok	2007	36
11	EUV for HVM: towards an industrialized scanner for HVM NXE3400B performance update Mark van de Kerkhof, Arthur Minnaert, Marco Pieters, H. Meiling, Joost Smits, Rudy Peeters, Roderik van Es, Geert Fisser, Jos W. de Klerk, Roel Moors, Eric Verhoeven, Leon Levasier	2018	31
12	EUV into production with ASML's NXE platform Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christian Wagner, Noreen Harned, Peter Kuerz, Martin Lowisch, H. Meiling, David Ockwell, Rudy Peeters, Koen van Ingen-Schenau, Eelco van Setten, Judon Stoeldraijer, Bernd Thuering	2010	31
13	The inverse Meyer–Neldel rule in thin-film transistors with intrinsic heterogeneous silicon Applied Physics Letters ·H. Meiling, R.E.I. Schropp	1999	25
14	Molecular contamination mitigation in EUVL by environmental control Microelectronic Engineering ·N.B. Koster, B. Mertens, R. Jansen, A. van de Runstraat, F. Stietz, Marco Wedowski, H. Meiling, R. Klein, Alexander Gottwald, Frank Scholze, Matthieu Visser, Ralph Kurt, P. C. Zalm, Eric Louis, Andrey Yakshin	2002	25
15	EUV lithography at chipmakers has started: performance validation of ASML's NXE:3100 Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christian Wagner, Jose Bacelar, Noreen Harned, Erik Loopstra, Stef Hendriks, Ivo de Jong, Peter Kuerz, Leon Levasier, Mark van de Kerkhof, Martin Lowisch, H. Meiling, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Stuart Young, John Zimmerman, Ron Kool	2011	25
16	<title>Progress of the EUVL alpha tool</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, Jos Benschop, Udo Dinger, Peter Kuerz	2001	24
17	From performance validation to volume introduction of ASML's NXE platform Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, Wim de Boeij, Frank Bornebroek, Noreen Harned, Ivo de Jong, Peter Kürz, Martin Lowisch, H.C. Meijer, David Ockwell, Rudy Peeters, Eelco van Setten, Judon Stoeldraijer, Christian Wagner, Stuart Young, Ron Kool	2012	24
18	Stability of hot-wire deposited amorphous-silicon thin-film transistors Applied Physics Letters ·H. Meiling, R.E.I. Schropp	1996	24
19	Deposition-rate reduction through improper substrate-to-electrode attachment in very-high-frequency deposition of a-Si:H Journal of Applied Physics ·H. Meiling, Wilfried van Sark, Jeff Bezemer, W. F. van der Weg	1996	23
20	EUVL system: moving towards production Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·H. Meiling, Nico Buzing, K. D. Cummings, Noreen Harned, Bas Hultermans, Roel de Jonge, Bart Kessels, Peter Kürz, Sjoerd Lok, Martin Lowisch, Joerg Mallman, Bill Pierson, Christian Wagner, Andre van Dijk, Eelco van Setten, John Zimmerman	2009	23

About H. Meiling

H. Meiling is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Materials Chemistry, Polymers and Plastics and Biomedical Engineering, having authored 64 papers that have together received 1.1k indexed citations. Recurring topics across this work include Thin-Film Transistor Technologies (34 papers), Advancements in Photolithography Techniques (26 papers), Silicon Nanostructures and Photoluminescence (23 papers), Silicon and Solar Cell Technologies (18 papers), Integrated Circuits and Semiconductor Failure Analysis (17 papers), Electron and X-Ray Spectroscopy Techniques (16 papers), Semiconductor materials and devices (11 papers) and Nanowire Synthesis and Applications (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (223 citations), Electrical and Electronic Engineering (1.0k citations), Materials Chemistry (449 citations), Radiation (82 citations) and Structural Biology (9 citations). H. Meiling has collaborated with scholars based in Netherlands, Germany and United States. Frequent co-authors include R.E.I. Schropp, J.K. Rath, Noreen Harned, J.K. Rath, Peter Kuerz, W. F. van der Weg, Jeff Bezemer, Eelco van Setten, Wilfried van Sark and Jos Benschop. Their work appears in journals such as Applied Physics Letters, Philosophical Magazine B, Journal of Non-Crystalline Solids, Solar Energy Materials and Solar Cells and Japanese Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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