Osamu Suga

571 total citations
70 papers, 463 citations indexed

About

Osamu Suga is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, Osamu Suga has authored 70 papers receiving a total of 463 indexed citations (citations by other indexed papers that have themselves been cited), including 66 papers in Electrical and Electronic Engineering, 37 papers in Surfaces, Coatings and Films and 21 papers in Industrial and Manufacturing Engineering. Recurrent topics in Osamu Suga's work include Advancements in Photolithography Techniques (59 papers), Electron and X-Ray Spectroscopy Techniques (37 papers) and Integrated Circuits and Semiconductor Failure Analysis (33 papers). Osamu Suga is often cited by papers focused on Advancements in Photolithography Techniques (59 papers), Electron and X-Ray Spectroscopy Techniques (37 papers) and Integrated Circuits and Semiconductor Failure Analysis (33 papers). Osamu Suga collaborates with scholars based in Japan. Osamu Suga's co-authors include Toshihiko Tanaka, Tsuneo Terasawa, Takeshi Yamane, Toshihisa Tomie, Hajime Aoyama, Tsuyoshi Amano, Takao Taguchi, Ichiro Mori, Iwao Nishiyama and Toshiro Itani and has published in prestigious journals such as Japanese Journal of Applied Physics, Microelectronic Engineering and Medical Writing.

In The Last Decade

Osamu Suga

66 papers receiving 336 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Osamu Suga Japan 12 443 266 88 67 48 70 463
Soichi Inoue Japan 11 344 0.8× 144 0.5× 125 1.4× 25 0.4× 57 1.2× 96 412
Tsutomu Shoki Japan 13 366 0.8× 232 0.9× 71 0.8× 86 1.3× 19 0.4× 54 414
Koen van Ingen Schenau Netherlands 10 318 0.7× 152 0.6× 119 1.4× 45 0.7× 15 0.3× 28 339
Jan Hermans Belgium 11 273 0.6× 140 0.5× 96 1.1× 22 0.3× 22 0.5× 43 306
Mark D. Smith United States 11 411 0.9× 208 0.8× 127 1.4× 11 0.2× 33 0.7× 65 429
Paul Gräupner Germany 12 305 0.7× 135 0.5× 152 1.7× 48 0.7× 21 0.4× 24 357
Paul Graeupner Germany 10 261 0.6× 140 0.5× 80 0.9× 33 0.5× 15 0.3× 25 292
Ryoichi Hirano Japan 12 333 0.8× 235 0.9× 39 0.4× 19 0.3× 18 0.4× 58 342
Ryoung-Han Kim United States 9 264 0.6× 101 0.4× 71 0.8× 16 0.2× 20 0.4× 54 284
Alessandro Vaglio Pret Belgium 12 389 0.9× 184 0.7× 98 1.1× 11 0.2× 15 0.3× 64 408

Countries citing papers authored by Osamu Suga

Since Specialization
Citations

This map shows the geographic impact of Osamu Suga's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Osamu Suga with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Osamu Suga more than expected).

Fields of papers citing papers by Osamu Suga

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Osamu Suga. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Osamu Suga. The network helps show where Osamu Suga may publish in the future.

Co-authorship network of co-authors of Osamu Suga

This figure shows the co-authorship network connecting the top 25 collaborators of Osamu Suga. A scholar is included among the top collaborators of Osamu Suga based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Osamu Suga. Osamu Suga is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Suga, Osamu, et al.. (2017). Creation of a patient-centric patient lay summary in the local language. Medical Writing. 26. 42–45. 2 indexed citations
2.
Tanaka, Yuusuke, et al.. (2011). Overlay accuracy of EUV1 using compensation method for nonflatness of mask. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 796936–796936. 2 indexed citations
3.
Tanaka, Toshihiko, et al.. (2011). EB defect inspection of EUV resist patterned wafer for hp 32 nm and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7971. 797123–797123. 1 indexed citations
4.
Ogawa, Takashi, et al.. (2011). Development of new FIB technology for EUVL mask repair. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7969. 79691C–79691C. 21 indexed citations
5.
Amano, Tsuyoshi, et al.. (2010). FIB-CVD technology for EUV mask repair. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7748. 77481I–77481I. 1 indexed citations
6.
Taguchi, Takao, et al.. (2010). Evaluation results of a new EUV reticle pod based on SEMI E152. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7636. 76361F–76361F. 2 indexed citations
7.
Nishiyama, Iwao, et al.. (2010). Evaluation of the contamination removal capability and multilayer degradation in various cleaning methods. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 782327–782327. 3 indexed citations
8.
Hirano, Takashi, et al.. (2010). Prospect of EUV mask repair technology using e-beam tool. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7823. 782322–782322. 7 indexed citations
9.
Terasawa, Tsuneo, et al.. (2009). Development of actinic full-field EUV mask blank inspection tool at MIRAI-Selete. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 727122–727122. 36 indexed citations
10.
Taguchi, Takao, et al.. (2009). Experimental evaluation of particulate contamination on backside of EUV reticle. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7271. 72713M–72713M. 1 indexed citations
11.
Aoyama, Hajime, et al.. (2008). Effects of mask absorber thickness on printability in EUV lithography with high resolution resist. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7028. 70281R–70281R. 14 indexed citations
12.
Amano, Tsuyoshi, et al.. (2008). Ga implantation and interlayer mixing during FIB repair of EUV mask defects. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71222J–71222J. 4 indexed citations
13.
Yamane, Takeshi, et al.. (2008). Signal analysis for the actinic full-field EUVL mask blank inspection system. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71222D–71222D. 3 indexed citations
14.
Terasawa, Tsuneo, Toshihiko Tanaka, Osamu Suga, & Toshihisa Tomie. (2007). Multilayer bottom topography effect on actinic mask-blank inspection signal. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6607. 66070K–66070K. 6 indexed citations
15.
Matsunawa, Tetsuaki, Hirokazu Nosato, Hidenori Sakanashi, et al.. (2007). Adaptive Optical Proximity Correction Using an Optimization Method. 853–860. 6 indexed citations
16.
Aoyama, Hajime, et al.. (2007). Impact of mask absorber properties on printability in EUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6730. 673017–673017. 16 indexed citations
17.
Matsunawa, Tetsuaki, Hirokazu Nosato, Hidenori Sakanashi, et al.. (2005). The novel approach for optical proximity correction using genetic algorithms. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5992. 599254–599254. 2 indexed citations
18.
Suga, Osamu, Hidenori Yamaguchi, & Shinji Okazaki. (1991). Profile abnormality in a chemical amplification resist system. Microelectronic Engineering. 14(3-4). 249–258. 4 indexed citations
19.
Suga, Osamu, et al.. (1988). A new contrast enhancement technique for electron-beam lithography. Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena. 6(1). 366–369. 2 indexed citations
20.
Furukawa, Yuji, et al.. (1985). Machining accuracy in creep feed grinding.. Journal of the Japan Society of Precision Engineering. 51(2). 408–414. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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