Gijsbert Rispens

497 total citations
41 papers, 390 citations indexed

About

Gijsbert Rispens is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Gijsbert Rispens has authored 41 papers receiving a total of 390 indexed citations (citations by other indexed papers that have themselves been cited), including 39 papers in Electrical and Electronic Engineering, 19 papers in Surfaces, Coatings and Films and 11 papers in Biomedical Engineering. Recurrent topics in Gijsbert Rispens's work include Advancements in Photolithography Techniques (39 papers), Integrated Circuits and Semiconductor Failure Analysis (28 papers) and Electron and X-Ray Spectroscopy Techniques (16 papers). Gijsbert Rispens is often cited by papers focused on Advancements in Photolithography Techniques (39 papers), Integrated Circuits and Semiconductor Failure Analysis (28 papers) and Electron and X-Ray Spectroscopy Techniques (16 papers). Gijsbert Rispens collaborates with scholars based in Netherlands, Belgium and Switzerland. Gijsbert Rispens's co-authors include Yasin Ekinci, Sander F. Wuister, Eelco van Setten, Elizabeth Buitrago, Michaela Vockenhuber, Jo Finders, Jan van Schoot, Jens Timo Neumann, Bernhard Kneer and Andreas Frommhold and has published in prestigious journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Photopolymer Science and Technology and DORA PSI (Paul Scherrer Institute).

In The Last Decade

Gijsbert Rispens

37 papers receiving 357 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Gijsbert Rispens Netherlands 12 372 223 100 42 25 41 390
Adam R. Pawloski United States 12 376 1.0× 199 0.9× 133 1.3× 23 0.5× 21 0.8× 30 432
Tom Wallow United States 10 255 0.7× 129 0.6× 91 0.9× 17 0.4× 14 0.6× 32 286
John J. Biafore United States 13 470 1.3× 284 1.3× 139 1.4× 11 0.3× 24 1.0× 68 486
Mark D. Smith United States 11 411 1.1× 208 0.9× 127 1.3× 11 0.3× 33 1.3× 65 429
Hideo Hada Japan 12 490 1.3× 223 1.0× 204 2.0× 25 0.6× 5 0.2× 50 515
Ryoichi Hirano Japan 12 333 0.9× 235 1.1× 39 0.4× 19 0.5× 18 0.7× 58 342
Warren Montgomery United States 10 409 1.1× 187 0.8× 186 1.9× 14 0.3× 12 0.5× 34 463
Peng Xie China 10 230 0.6× 44 0.2× 60 0.6× 3 0.1× 3 0.1× 34 444
Atsuro Nakano Japan 13 678 1.8× 381 1.7× 272 2.7× 4 0.1× 4 0.2× 13 687
Erin Mclellan United States 5 95 0.3× 46 0.2× 54 0.5× 1 0.0× 5 0.2× 8 126

Countries citing papers authored by Gijsbert Rispens

Since Specialization
Citations

This map shows the geographic impact of Gijsbert Rispens's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Gijsbert Rispens with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Gijsbert Rispens more than expected).

Fields of papers citing papers by Gijsbert Rispens

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Gijsbert Rispens. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Gijsbert Rispens. The network helps show where Gijsbert Rispens may publish in the future.

Co-authorship network of co-authors of Gijsbert Rispens

This figure shows the co-authorship network connecting the top 25 collaborators of Gijsbert Rispens. A scholar is included among the top collaborators of Gijsbert Rispens based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Gijsbert Rispens. Gijsbert Rispens is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Román, P., et al.. (2025). Stable stitching: impact and mitigation of environment on metal-oxide resist imaging. Journal of Micro/Nanopatterning Materials and Metrology. 24(1).
2.
Erdmann, Andreas, et al.. (2024). Imaging effects of particles on the surface of EUV mask and wafer. Fraunhofer-Publica (Fraunhofer-Gesellschaft). 6–6.
3.
4.
Franke, Joern-Holger, et al.. (2022). Elucidating the role of imaging metrics for variability and after etch defectivity. Journal of Micro/Nanopatterning Materials and Metrology. 21(2). 2 indexed citations
5.
Franke, Joern-Holger, Andreas Frommhold, Natalia Davydova, et al.. (2021). Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align. 27–27. 8 indexed citations
6.
Frommhold, Andreas, et al.. (2021). Pupil optimization for after etch defectivity: what imaging metrics matter?. 11517. 33–33. 2 indexed citations
7.
Setten, Eelco van, Jan van Schoot, Claire van Lare, et al.. (2021). High-NA EUV imaging: from system introduction towards low-k1 extension. 31–31. 2 indexed citations
8.
Santaclara, Jara G., et al.. (2020). One metric to rule them all: new k4 definition for photoresist characterization. 41–41. 11 indexed citations
9.
Santaclara, Jara G., et al.. (2020). Image blur investigation using EUV-interference lithography. DORA PSI (Paul Scherrer Institute). 11323. 16–16. 5 indexed citations
10.
Frommhold, Andreas, et al.. (2019). Predicting stochastic defects across the process window. 10959. 6–6. 2 indexed citations
11.
Vanelderen, Pieter, Víctor Blanco, Ming Mao, et al.. (2019). Impact of sequential infiltration synthesis (SIS) on roughness and stochastic nano-failures for EUVL patterning. 23–23. 4 indexed citations
12.
Yaegashi, Hidetami, Andreas Frommhold, Gijsbert Rispens, et al.. (2019). Impact of local variability on defect-aware process windows. 16. 13–13. 6 indexed citations
13.
Look, Lieve Van, et al.. (2018). Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300. 20–20. 15 indexed citations
14.
15.
Buitrago, Elizabeth, Gijsbert Rispens, Michaela Vockenhuber, et al.. (2017). State-of-the-art EUV materials and processes for the 7nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101430T–101430T. 15 indexed citations
16.
Setten, Eelco van, et al.. (2016). Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10032. 100320B–100320B. 6 indexed citations
17.
Nakagawa, Hisashi, Seiichi Tagawa, Akihiro Oshima, et al.. (2016). Novel high sensitivity EUV photoresist for sub-7nm node. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9779. 977908–977908. 10 indexed citations
18.
Nakagawa, Hisashi, Seiichi Tagawa, Akihiro Oshima, et al.. (2016). Novel High Sensitivity EUV Photoresist for Sub-7 nm Node. Journal of Photopolymer Science and Technology. 29(3). 475–478. 13 indexed citations
19.
Buitrago, Elizabeth, Seiji Nagahara, Hisashi Nakagawa, et al.. (2016). Sensitivity enhancement of chemically amplified resists and performance study using EUV interference lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97760Z–97760Z. 6 indexed citations
20.
Buitrago, Elizabeth, et al.. (2015). Evaluation of EUV resist performance using interference lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9422. 94221S–94221S. 13 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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