Gijsbert Rispens

497 citations

41 papers · 390 indexed · h-index 12

Impact in

Surfaces, Coatings and Films top 2%
- Electron and X-Ray Spectroscopy Techniques
Electrical and Electronic Engineering top 10%
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices

Papers in ⓘ

Electrical and Electronic Engineering 39
- Advancements in Photolithography Techniques 39
- Integrated Circuits and Semiconductor Failure Analysis 28
Surfaces, Coatings and Films 19
- Electron and X-Ray Spectroscopy Techniques 16
- Optical Coatings and Gratings 3

Co-authors: Yasin Ekinci (13 shared papers)Sander F. Wuister (3 shared papers)Eelco van Setten (6 shared papers)Elizabeth Buitrago (7 shared papers)Michaela Vockenhuber (8 shared papers)Jo Finders (5 shared papers)Jan van Schoot (4 shared papers)Bernhard Kneer (2 shared papers)
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (3 papers)Journal of Photopolymer Science and Technology (1 paper)DORA PSI (Paul Scherrer Institute) (6 papers)Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE (9 papers)Fraunhofer-Publica (Fraunhofer-Gesellschaft) (1 paper)
Partner nations: Netherlands Belgium Switzerland

In The Last Decade

Gijsbert Rispens

37 papers receiving 357 citations

Peers

Countries citing papers authored by Gijsbert Rispens

Since Specialization

Citations

This map shows the geographic impact of Gijsbert Rispens's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Gijsbert Rispens with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Gijsbert Rispens more than expected).

Fields of papers citing papers by Gijsbert Rispens

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Gijsbert Rispens. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Gijsbert Rispens. The network helps show where Gijsbert Rispens may publish in the future.

Co-authors

The 25 scholars most cited alongside Gijsbert Rispens, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Gijsbert Rispens Line = papers co-authored together Gijsbert Rispens links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 41 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Improvements in resist performance towards EUV HVM Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Oktay Yildirim, Elizabeth Buitrago, Rik Hoefnagels, Marieke Meeuwissen, Sander F. Wuister, Gijsbert Rispens, Anton van Oosten, Paul Derks, Jo Finders, Michaela Vockenhuber, Yasin Ekinci	2017	54
2	High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond Journal of Micro/Nanolithography MEMS and MOEMS ·Jan van Schoot, Eelco van Setten, Gijsbert Rispens, Kars Troost, Bernhard Kneer, Sascha Migura, Jens Timo Neumann, Winfried Kaiser	2017	44
3	Contrast optimization for 0.33NA EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jo Finders, Sander F. Wuister, Thorsten Last, Gijsbert Rispens, Eleni Psari, Jan Lubkoll, Eelco van Setten, Friso Wittebrood	2016	30
4	Stochastics in extreme ultraviolet lithography: investigating the role of microscopic resist properties for metal-oxide-based resists Journal of Micro/Nanolithography MEMS and MOEMS ·Ruben Maas, M.-Claire van Lare, Gijsbert Rispens, Sander F. Wuister	2018	21
5	Edge placement error control and Mask3D effects in High-NA anamorphic EUV lithography Eelco van Setten, Gerardo Bottiglieri, Laurens de Winter, Jan Lubkoll, John McNamara, P. Rusu, Gijsbert Rispens, Jan van Schoot, Jens Timo Neumann, Matthias Roesch, Bernhard Kneer	2017	20
6	State-of-the-art EUV materials and processes for the 7nm node and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Elizabeth Buitrago, Marieke Meeuwissen, Oktay Yildirim, Rolf Custers, Rik Hoefnagels, Gijsbert Rispens, Michaela Vockenhuber, Iacopo Mochi, Roberto Fallica, Zuhal Taşdemir, Yasin Ekinci	2017	15
7	Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300 Lieve Van Look, Joost Bekaert, Andreas Frommhold, Eric Hendrickx, Gijsbert Rispens, Guido Schiffelers	2018	15
8	Sensitivity enhancement of chemically amplified resists and performance study using extreme ultraviolet interference lithography Journal of Micro/Nanolithography MEMS and MOEMS ·Elizabeth Buitrago, Seiji Nagahara, Oktay Yildirim, Hisashi Nakagawa, Seiichi Tagawa, Marieke Meeuwissen, Tomoki Nagai, Takehiko Naruoka, Coen Verspaget, Rik Hoefnagels, Gijsbert Rispens, Gosuke Shiraishi, Yuichi Terashita, Yukie Minekawa, Kosuke Yoshihara, Akihiro Oshima, Michaela Vockenhuber, Yasin Ekinci	2016	15
9	Progress in EUV resists towards high-NA EUV lithography DORA PSI (Paul Scherrer Institute) ·Xiaolong Wang, Zuhal Taşdemir, Iacopo Mochi, Michaela Vockenhuber, Lidia van Lent-Protasova, Marieke Meeuwissen, Rolf Custers, Gijsbert Rispens, Rik Hoefnagels, Yasin Ekinci	2019	14
10	Evaluation of EUV resist performance using interference lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Elizabeth Buitrago, Oktay Yildirim, Coen Verspaget, Naoko Tsugama, Rik Hoefnagels, Gijsbert Rispens, Yasin Ekinci	2015	13
11	Novel High Sensitivity EUV Photoresist for Sub-7 nm Node Journal of Photopolymer Science and Technology ·Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka, Satoshi Dei, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara, Gosuke Shiraishi, Kosuke Yoshihara, Yuichi Terashita, Yukie Minekawa, Elizabeth Buitrago, Yasin Ekinci, Oktay Yildirim, Marieke Meeuwissen, Rik Hoefnagels, Gijsbert Rispens, Coen Verspaget, Raymond Maas	2016	13
12	One metric to rule them all: new k4 definition for photoresist characterization Jara G. Santaclara, Bernd Geh, Anthony Yen, Timothy A. Brunner, Danilo De Simone, Joren Severi, Gijsbert Rispens	2020	11
13	Influence of etch process on contact hole local critical dimension uniformity in extreme-ultraviolet lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gian F. Lorusso, Ming Mao, Liesbeth Reijnen, Katja Viatkina, Roel Knops, Gijsbert Rispens, Timon Fliervoet	2015	11
14	Novel high sensitivity EUV photoresist for sub-7nm node Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Tomoki Nagai, Hisashi Nakagawa, Takehiko Naruoka, Seiichi Tagawa, Akihiro Oshima, Seiji Nagahara, Gosuke Shiraishi, Kosuke Yoshihara, Yuichi Terashita, Yukie Minekawa, Elizabeth Buitrago, Yasin Ekinci, Oktay Yildirim, Marieke Meeuwissen, Rik Hoefnagels, Gijsbert Rispens, Coen Verspaget, Raymond Maas	2016	10
15	Evaluation of EUV resists for 5nm technology node and beyond DORA PSI (Paul Scherrer Institute) ·Zuhal Taşdemir, Iacopo Mochi, Lidia van Lent-Protasova, Marieke Meeuwissen, Rolf Custers, Gijsbert Rispens, Rik Hoefnagels, Yasin Ekinci, Xiaolong Wang	2018	10
16	Chemically-amplified EUV resists approaching 11 nm half-pitch DORA PSI (Paul Scherrer Institute) ·Iacopo Mochi, Karen Garrido Olvera, Marieke Meeuwissen, Oktay Yildirim, Rolf Custers, Rik Hoefnagels, Gijsbert Rispens, Michaela Vockenhuber, Yasin Ekinci, Zuhal Taşdemir	2018	9
17	Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align Joern-Holger Franke, Andreas Frommhold, Natalia Davydova, Remko Aubert, Vineet Vijayakrishnan Nair, Tatiana Kovalevich, David del Rio, Joost Bekaert, Erik Wang, Gijsbert Rispens, Mark J. Maslow, Eric Hendrickx	2021	8
18	Today’s scorecard for tomorrow’s photoresist: progress and outlook towards High-NA EUV lithography Jara G. Santaclara, Gijsbert Rispens, Joost Bekaert, Arame Thiam, Mark J. Maslow, Rik Hoefnagels, Nadia Zuurbier, Lidia van Lent-Protasova, Yin Fong Choi	2021	7
19	Anamorphic imaging at high-NA EUV: mask error factor and interaction between demagnification and lithographic metrics Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Gerardo Bottiglieri, Thorsten Last, Alberto Colina, Eelco van Setten, Gijsbert Rispens, Jan van Schoot, Koen van Ingen Schenau	2016	6
20	Impact of local variability on defect-aware process windows Mark J. Maslow, Hidetami Yaegashi, Andreas Frommhold, Guido Schiffelers, Felix Wählisch, Gijsbert Rispens, Bram Slachter, Keisuke Yoshida, Arisa Hara, Noriaki Oikawa, Abhinav Pathak, Dorin Cerbu, Eric Hendrickx, Joost Bekaert	2019	6

About Gijsbert Rispens

Gijsbert Rispens is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films, Biomedical Engineering, Industrial and Manufacturing Engineering and Radiation, having authored 41 papers that have together received 390 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (39 papers), Integrated Circuits and Semiconductor Failure Analysis (28 papers), Electron and X-Ray Spectroscopy Techniques (16 papers), Advanced Surface Polishing Techniques (8 papers), Advanced X-ray Imaging Techniques (4 papers), Industrial Vision Systems and Defect Detection (3 papers), Optical Coatings and Gratings (3 papers) and Image Processing Techniques and Applications (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (223 citations), Electrical and Electronic Engineering (372 citations), Radiation (42 citations), Structural Biology (6 citations) and Industrial and Manufacturing Engineering (25 citations). Gijsbert Rispens has collaborated with scholars based in Netherlands, Belgium and Switzerland. Frequent co-authors include Yasin Ekinci, Sander F. Wuister, Eelco van Setten, Elizabeth Buitrago, Michaela Vockenhuber, Jo Finders, Jan van Schoot, Bernhard Kneer, Jens Timo Neumann and Winfried Kaiser. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Photopolymer Science and Technology, DORA PSI (Paul Scherrer Institute), Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE and Fraunhofer-Publica (Fraunhofer-Gesellschaft).

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