Kars Troost

813 total citations
32 papers, 644 citations indexed

About

Kars Troost is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Kars Troost has authored 32 papers receiving a total of 644 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Electrical and Electronic Engineering, 19 papers in Surfaces, Coatings and Films and 7 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Kars Troost's work include Advancements in Photolithography Techniques (21 papers), Electron and X-Ray Spectroscopy Techniques (19 papers) and Integrated Circuits and Semiconductor Failure Analysis (16 papers). Kars Troost is often cited by papers focused on Advancements in Photolithography Techniques (21 papers), Electron and X-Ray Spectroscopy Techniques (19 papers) and Integrated Circuits and Semiconductor Failure Analysis (16 papers). Kars Troost collaborates with scholars based in Netherlands, Germany and Belgium. Kars Troost's co-authors include P. van der Sluis, Jan van Schoot, F.H.P.M. Habraken, W. F. van der Weg, Eelco van Setten, Winfried Kaiser, Paul Graeupner, Judon Stoeldraijer, Bernhard Kneer and Jos Benschop and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

Kars Troost

30 papers receiving 591 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name	h						Papers	Cites
Kars Troost Netherlands	14	483	184	164	135	79	32	644
Anthony Yen United States	12	518 1.1×	167 0.9×	118 0.7×	219 1.6×	41 0.5×	92	723
Dorian Minkov Spain	17	510 1.1×	67 0.4×	445 2.7×	139 1.0×	86 1.1×	54	808
H.‐L. Huber Germany	11	241 0.5×	89 0.5×	88 0.5×	102 0.8×	58 0.7×	54	423
Manish Chandhok United States	16	597 1.2×	249 1.4×	77 0.5×	182 1.3×	16 0.2×	51	666
Obert R. Wood United States	18	717 1.5×	412 2.2×	52 0.3×	166 1.2×	54 0.7×	92	860
N. Hayasaka Japan	13	415 0.9×	55 0.3×	108 0.7×	88 0.7×	75 0.9×	32	494
Robert Kirchner Germany	16	312 0.6×	89 0.5×	75 0.5×	456 3.4×	44 0.6×	66	638
H. Paetzelt Germany	13	207 0.4×	31 0.2×	228 1.4×	241 1.8×	45 0.6×	24	492
Hans Loeschner Austria	12	384 0.8×	121 0.7×	61 0.4×	264 2.0×	49 0.6×	73	534
Armin Klumpp Germany	17	714 1.5×	25 0.1×	88 0.5×	162 1.2×	37 0.5×	44	781

Countries citing papers authored by Kars Troost

Since Specialization

Citations

This map shows the geographic impact of Kars Troost's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kars Troost with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kars Troost more than expected).

Fields of papers citing papers by Kars Troost

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Kars Troost. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kars Troost. The network helps show where Kars Troost may publish in the future.

Co-authorship network of co-authors of Kars Troost

This figure shows the co-authorship network connecting the top 25 collaborators of Kars Troost. A scholar is included among the top collaborators of Kars Troost based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Kars Troost. Kars Troost is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

Lok, Sjoerd, et al.. (2022). High NA EUV enabling cost efficient scaling for N+1 technology nodes. 6–6. 5 indexed citations

Schoot, Jan van, Sjoerd Lok, Eelco van Setten, et al.. (2021). High-NA EUV lithography exposure tool: key advantages and program progress. 3–3. 16 indexed citations

Schoot, Jan van, Sjoerd Lok, Eelco van Setten, et al.. (2021). High-NA EUVL exposure tool: key advantages and program status. 26–26. 5 indexed citations

Schoot, Jan van, Kars Troost, Stephen D. H. Hsu, et al.. (2020). High NA EUV scanner: obscuration and wavefront description. 38–38. 8 indexed citations

Schoot, Jan van, Sjoerd Lok, Eelco van Setten, et al.. (2020). High-NA EUV lithography exposure tool: advantages and program progress. 31 indexed citations

Setten, Eelco van, Jan van Schoot, Kars Troost, et al.. (2019). High NA EUV lithography: Next step in EUV imaging. 5–5. 45 indexed citations

Schoot, Jan van, Eelco van Setten, Kars Troost, et al.. (2019). High-NA EUV Lithography exposure tool: program progress and mask impact (Conference Presentation). 34–34. 1 indexed citations

Schoot, Jan van, Eelco van Setten, Kars Troost, et al.. (2019). High-NA EUV lithography exposure tool progress. 3–3. 11 indexed citations

Schoot, Jan van, Kars Troost, Sjoerd Lok, et al.. (2018). The future of EUV lithography: continuing Moore's Law into the next decade. 23–23. 9 indexed citations

10.

Schoot, Jan van, Kars Troost, Judon Stoeldraijer, et al.. (2017). The future of EUV lithography: enabling Moore's Law in the next decade. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10143. 101430G–101430G. 48 indexed citations

11.

Schoot, Jan van, et al.. (2016). Improving the resolution of extreme-UV lithography scanners. SPIE Newsroom. 1 indexed citations

12.

Schoot, Jan van, Koen van Ingen Schenau, Kars Troost, et al.. (2016). EUV high-NA scanner and mask optimization for sub-8nm resolution. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 97761I–97761I. 11 indexed citations

13.

Liu, Xiaofeng, Stephen D. H. Hsu, Kaiyu Yang, et al.. (2014). EUV source-mask optimization for 7nm node and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9048. 90480Q–90480Q. 24 indexed citations

14.

Troost, Kars. (1993). Assessment of implantation damage by backscatter Kikuchi diffraction in the scanning electron microscope. Applied Physics Letters. 63(7). 958–960. 4 indexed citations

15.

Wolters, R.A.M., et al.. (1993). Correlation between stress voiding of Al(Si)(Cu) metallizations and crystal orientation of aluminum grains. Journal of Applied Physics. 74(9). 5391–5394. 19 indexed citations

16.

Troost, Kars, et al.. (1993). Microscale elastic-strain determination by backscatter Kikuchi diffraction in the scanning electron microscope. Applied Physics Letters. 62(10). 1110–1112. 104 indexed citations

17.

Troost, Kars, M.J. van Dort, J. I. Dijkhuis, & H. W. de Wijn. (1991). High-resolution optical study of a point-contact-induced phonon hot spot in ruby. Physical review. B, Condensed matter. 43(1). 98–105. 3 indexed citations

18.

Troost, Kars, M.J. van Dort, J. I. Dijkhuis, & H. W. de Wijn. (1990). High-resolution optical study of a point-contact-induced hot spot in ruby. Journal of Luminescence. 45(1-6). 141–143. 1 indexed citations

19.

Dort, M.J. van, Kars Troost, J. I. Dijkhuis, & H. W. de Wijn. (1990). The phonon spectrum injected by a metallic point contact : an FLN study. Journal of Physics Condensed Matter. 2(32). 6721–6729. 1 indexed citations

20.

Troost, Kars, et al.. (1986). Annealing of plasma silicon oxynitride films. Journal of Applied Physics. 60(7). 2543–2547. 63 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact