Kars Troost

813 citations

32 papers · 644 indexed · h-index 14

Impact in

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
Electrical and Electronic Engineering top 10%
- Advancements in Photolithography Techniques
- Integrated Circuits and Semiconductor Failure Analysis
- Semiconductor materials and devices
- Thin-Film Transistor Technologies

Papers in ⓘ

Surfaces, Coatings and Films 19
- Electron and X-Ray Spectroscopy Techniques 19
Electrical and Electronic Engineering 25
- Advancements in Photolithography Techniques 21
- Integrated Circuits and Semiconductor Failure Analysis 16
- Semiconductor materials and devices 3
- Thin-Film Transistor Technologies 2

Co-authors: P. van der Sluis (1 shared paper)Jan van Schoot (18 shared papers)F.H.P.M. Habraken (2 shared papers)W. F. van der Weg (2 shared papers)Eelco van Setten (12 shared papers)Winfried Kaiser (12 shared papers)Paul Graeupner (10 shared papers)Judon Stoeldraijer (10 shared papers)
Journals: Journal of Applied Physics (3 papers)Applied Physics Letters (2 papers)Physical review. B, Condensed matter (2 papers)Journal of Micro/Nanolithography MEMS and MOEMS (1 paper)Journal of Physics Condensed Matter (1 paper)
Partner nations: Netherlands Germany Belgium

In The Last Decade

Kars Troost

30 papers receiving 591 citations

Peers

Countries citing papers authored by Kars Troost

Since Specialization

Citations

This map shows the geographic impact of Kars Troost's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Kars Troost with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Kars Troost more than expected).

Fields of papers citing papers by Kars Troost

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Kars Troost. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Kars Troost. The network helps show where Kars Troost may publish in the future.

Co-authors

The 25 scholars most cited alongside Kars Troost, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Kars Troost Line = papers co-authored together Kars Troost links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

Showing the 20 most-cited of 32 papers — load more, or switch the sort, to bring in the rest.

#	Work
1	Microscale elastic-strain determination by backscatter Kikuchi diffraction in the scanning electron microscope Applied Physics Letters ·Kars Troost, P. van der Sluis, Dirk J. Gravesteijn	1993	104
2	Plasma-enhanced growth and composition of silicon oxynitride films Journal of Applied Physics ·C. M. M. Denisse, Kars Troost, J. B. Oude Elferink, F.H.P.M. Habraken, W. F. van der Weg, M. Hendriks	1986	76
3	Annealing of plasma silicon oxynitride films Journal of Applied Physics ·C. M. M. Denisse, Kars Troost, F.H.P.M. Habraken, W. F. van der Weg, M. Hendriks	1986	63
4	The future of EUV lithography: enabling Moore's Law in the next decade Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Alberto Pirati, Jan van Schoot, Kars Troost, Rob van Ballegoij, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, H. Meiling, Eelco van Setten, Niclas Mika, Jeannot Dredonx, Uwe Stamm, Bernhard Kneer, Bernd Thuering, Winfried Kaiser, Tilmann Heil, Sascha Migura	2017	48
5	High NA EUV lithography: Next step in EUV imaging Eelco van Setten, Gerardo Bottiglieri, John McNamara, Jan van Schoot, Kars Troost, Joseph Zekry, Timon Fliervoet, Stephen Hsu, J. Zimmermann, Matthias Roesch, Bartosz Bilski, Paul Graeupner	2019	45
6	High-numerical aperture extreme ultraviolet scanner for 8-nm lithography and beyond Journal of Micro/Nanolithography MEMS and MOEMS ·Jan van Schoot, Eelco van Setten, Gijsbert Rispens, Kars Troost, Bernhard Kneer, Sascha Migura, Jens Timo Neumann, Winfried Kaiser	2017	44
7	High-NA EUV lithography exposure tool: program progress Jan van Schoot, Eelco van Setten, Kars Troost, Sjoerd Lok, Judon Stoeldraijer, Rudy Peeters, Jos Benschop, Joerg Zimmerman, Paul Graeupner, L. Wischmeier, Peter Kuerz, Winfried Kaiser	2020	40
8	High-NA EUV lithography exposure tool: advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser	2020	31
9	EUV source-mask optimization for 7nm node and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Xiaofeng Liu, Rafael C. Howell, Stephen D. H. Hsu, Kaiyu Yang, Keith Gronlund, Frank Driessen, Huayu Liu, Steven G. Hansen, Koen van Ingen Schenau, Thijs Hollink, Paul van Adrichem, Kars Troost, Jörg Zimmermann, O. Schumann, Christoph Hennerkes, Paul Gräupner	2014	24
10	OML: optical maskless lithography for economic design prototyping and small-volume production Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Tor Sandstrom, Arno J. Bleeker, Jason D. Hintersteiner, Kars Troost, Jorge L. Freyer, Karel van der Mast	2004	23
11	Correlation between stress voiding of Al(Si)(Cu) metallizations and crystal orientation of aluminum grains Journal of Applied Physics ·S. Kordić, R.A.M. Wolters, Kars Troost	1993	19
12	EUV High-NA scanner and mask optimization for sub 8 nm resolution Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser	2015	17
13	High-NA EUV lithography exposure tool: key advantages and program progress Jan van Schoot, Sjoerd Lok, Eelco van Setten, Ruben Maas, Kars Troost, Rudy Peeters, Jo Finders, Judon Stoeldraijer, Jos Benschop, Paul Graeupner, Peter Kuerz, Winfried Kaiser, Thomas Stammler	2021	16
14	High-NA EUV lithography enabling Moore’s law in the next decade Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Erik Loopstra, Jos Benschop, Jo Finders, H. Meiling, Eelco van Setten, Bernhard Kneer, Winfried Kaiser, Tilmann Heil, Sascha Migura, Peter Kuerz, Jens Timo Neumann	2017	15
15	High-NA EUV lithography exposure tool progress Jan van Schoot, Eelco van Setten, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Judon Stoeldraijer, Jo Finders, Paul Graeupner, J. Zimmermann, Peter Kuerz, Marco Pieters, Winfried Kaiser	2019	11
16	EUV high-NA scanner and mask optimization for sub-8nm resolution Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jan van Schoot, Koen van Ingen Schenau, Gerardo Bottiglieri, Kars Troost, John Zimmerman, Sascha Migura, Bernhard Kneer, Jens Timo Neumann, Winfried Kaiser	2016	11
17	The future of EUV lithography: continuing Moore's Law into the next decade Jan van Schoot, Kars Troost, Frank Bornebroek, Rob van Ballegoij, Sjoerd Lok, Peter Krabbendam, Judon Stoeldraijer, Jos Benschop, Jo Finders, H. Meiling, Eelco van Setten, Bernhard Kneer, Peter Kuerz, Winfried Kaiser, Tilmann Heil, Sascha Migura	2018	9
18	High NA EUV scanner: obscuration and wavefront description Laurens de Winter, Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra, Stephen D. H. Hsu, Toralf Gruner, Juergen Mueller, Ruediger Mack, Bartosz Bilski, J. Zimmermann, Paul Graeupner	2020	8
19	Stitching enablement for anamorphic imaging: a ~1μm exclusion band and its implications Vincent Wiaux, Joost Bekaert, Tatiana Kovalevich, Julien Ryckaert, Eric Hendrickx, Natalia Davydova, Pieter Wöltgens, Ming-Chun Tien, Laurens de Winter, Mark J. Maslow, Kars Troost	2020	8
20	Extreme ultraviolet scanner with high numerical aperture: obscuration and wavefront description Journal of Micro/Nanopatterning Materials and Metrology ·Laurens de Winter, Timur Tudorovskiy, Jan van Schoot, Kars Troost, Erwin Stinstra, Stephen D. H. Hsu, Toralf Gruner, Juergen Mueller, Ruediger Mack, Bartosz Bilski, J. Zimmermann, Paul Graeupner	2022	6

About Kars Troost

Kars Troost is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering, Radiation, Atomic and Molecular Physics, and Optics and Materials Chemistry, having authored 32 papers that have together received 644 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (21 papers), Electron and X-Ray Spectroscopy Techniques (19 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers), Advanced X-ray Imaging Techniques (3 papers), Semiconductor materials and devices (3 papers), Force Microscopy Techniques and Applications (2 papers), Thermal Radiation and Cooling Technologies (2 papers) and Thin-Film Transistor Technologies (2 papers). The work is most often cited by research in Surfaces, Coatings and Films (184 citations), Electrical and Electronic Engineering (483 citations), Radiation (47 citations), Structural Biology (6 citations) and Materials Chemistry (164 citations). Kars Troost has collaborated with scholars based in Netherlands, Germany and Belgium. Frequent co-authors include P. van der Sluis, Jan van Schoot, F.H.P.M. Habraken, W. F. van der Weg, Eelco van Setten, Winfried Kaiser, Paul Graeupner, Judon Stoeldraijer, Bernhard Kneer and Jos Benschop. Their work appears in journals such as Journal of Applied Physics, Applied Physics Letters, Physical review. B, Condensed matter, Journal of Micro/Nanolithography MEMS and MOEMS and Journal of Physics Condensed Matter.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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