Hilde Tielens

415 total citations
30 papers, 296 citations indexed

About

Hilde Tielens is a scholar working on Electrical and Electronic Engineering, Materials Chemistry and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Hilde Tielens has authored 30 papers receiving a total of 296 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Electrical and Electronic Engineering, 20 papers in Materials Chemistry and 6 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Hilde Tielens's work include Semiconductor materials and devices (24 papers), Ferroelectric and Piezoelectric Materials (9 papers) and Electronic and Structural Properties of Oxides (9 papers). Hilde Tielens is often cited by papers focused on Semiconductor materials and devices (24 papers), Ferroelectric and Piezoelectric Materials (9 papers) and Electronic and Structural Properties of Oxides (9 papers). Hilde Tielens collaborates with scholars based in Belgium, United Kingdom and Japan. Hilde Tielens's co-authors include Sven Van Elshocht, Christoph Adelmann, Johan Swerts, J. A. Kittl, Annelies Delabie, Marlies K. Van Bael, Thierry Conard, M. Popovici, An Hardy and Alexis Franquet and has published in prestigious journals such as Journal of The Electrochemical Society, Applied Surface Science and Thin Solid Films.

In The Last Decade

Hilde Tielens

29 papers receiving 292 citations

Peers

Countries citing papers authored by Hilde Tielens

Since Specialization

Citations

This map shows the geographic impact of Hilde Tielens's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Hilde Tielens with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Hilde Tielens more than expected).

Fields of papers citing papers by Hilde Tielens

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Hilde Tielens. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Hilde Tielens. The network helps show where Hilde Tielens may publish in the future.

Co-authorship network of co-authors of Hilde Tielens

This figure shows the co-authorship network connecting the top 25 collaborators of Hilde Tielens. A scholar is included among the top collaborators of Hilde Tielens based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Hilde Tielens. Hilde Tielens is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Medium energy ion scattering for the high depth resolution characterisation of high-k dielectric layers of nanometer thickness 2013 ·Applied Surface Science ·Jaap van den Berg, (unknown), Paul Bailey, T.C.Q. Noakes, Christoph Adelmann, M. Popovici, Hilde Tielens, Thierry Conard, Stefan De Gendt, Sven Van Elshocht	5
2	Chemisorption of ALD precursors in and on porous low-k films 2013 ·Microelectronic Engineering ·Patrick Verdonck, Annelies Delabie, Johan Swerts, (unknown), Mikhaı̈l R. Baklanov, Hilde Tielens, Els Van Besien, T. Witters, Laura Nyns, Sven Van Elshocht	16
3	Process-improved RRAM cell performance and reliability and paving the way for manufacturability and scalability for high density memory application 2012 ·Gouri Sankar Kar, A. Fantini, YY Chen, Vasile Paraschiv, B. Govoreanu, Hubert Hody, N. Jossart, Hilde Tielens, S. Brus, Olivier Richard, T. Vandeweyer, Dirk J. Wouters, L. Altimime, M. Jurczak	12
4	NiO Thin Films Synthesized by Atomic Layer Deposition using Ni(dmamb)₂ and Ozone as Precursors 2012 ·Chemical Vapor Deposition ·Peter Antony Premkumar, (unknown), Christoph Adelmann, Johan Meersschaut, Alexis Franquet, Olivier Richard, Hilde Tielens, Bert Brijs, Alain Moussa, Thierry Conard, H. Bender, Marc Schaekers, J. A. Kittl, M. Jurczak, Sven Van Elshocht	25
5	TDEAH/TDEAZとH 2 Oを用いたALD HfZrO x の開発 2011 ·Journal of The Electrochemical Society ·(unknown), Hilde Tielens, Shinji Takeoka, (unknown), Laura Nyns, Christoph Adelmann, Annelies Delabie, T. Schram, Lars‐Åke Ragnarsson, (unknown), L. Daté, R. Schreutelkamp, Sven Van Elshocht	8
6	(Invited) Vanadium Oxide as a Memory Material 2011 ·ECS Transactions ·Iuliana Radu, Koen Martens, S. Mertens, Christoph Adelmann, (unknown), Hilde Tielens, Marc Schaekers, Geoffrey Pourtois, Sven Van Elshocht, Stefan De Gendt, Marc Heyns, J. A. Kittl	16
7	Fundamental study of atomic layer deposition in and on porous low-k films 2011 ·Patrick Verdonck, Annelies Delabie, Johan Swerts, (unknown), Mikhaı̈l R. Baklanov, Hilde Tielens, Els Van Besien, J. Witters, Laura Nyns, Sven Van Elshocht	2
8	A comparative study of the microstructure–dielectric properties of crystalline SrTiO₃ ALD films obtained via seed layer approach 2011 ·physica status solidi (a) ·M. Popovici, Kazuyuki Tomida, Johan Swerts, Paola Favia, Annelies Delabie, H. Bender, Christoph Adelmann, Hilde Tielens, Bert Brijs, B. Kaczer, Małgorzata Pawlak, Minsoo Kim, L. Altimime, Sven Van Elshocht, J. A. Kittl	19
9	Lanthanide Aluminates as Dielectrics for Non-Volatile Memory Applications: Material Aspects 2011 ·Journal of The Electrochemical Society ·Christoph Adelmann, Johan Swerts, Olivier Richard, Thierry Conard, M. Popovici, Johan Meersschaut, V. V. Afanas’ev, L. Breuil, A. Cacciato, Karl Opsomer, Bert Brijs, Hilde Tielens, G. Pourtois, H. Bender, M. Jurczak, Jan Van Houdt, Sven Van Elshocht, J. A. Kittl	7
10	Vanadium Dioxide as a Memory Material 2011 ·Iuliana Radu, Koen Martens, S. Mertens, Christoph Adelmann, (unknown), Hilde Tielens, Marc Schaekers, Geoffrey Pourtois, Sven Van Elshocht, Stefan De Gendt, Marc Heyns, J. A. Kittl	3
11	Atomic-Layer Deposition of Lutetium Aluminate Thin Films for Non-Volatile Memory Applications 2011 ·ECS Transactions ·Christoph Adelmann, Johan Swerts, Thierry Conard, Bert Brijs, Alexis Franquet, An Hardy, Hilde Tielens, Karl Opsomer, Alain Moussa, Marlies K. Van Bael, M. Jurczak, J. A. Kittl, Sven Van Elshocht	3
12	Process study of gadolinium aluminate atomic layer deposition fromthegadolinium tris-di-isopropylacetamidinate precursor 2011 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·(unknown), Alexis Franquet, Bert Brijs, Hilde Tielens, Christoph Adelmann	1
13	Improved EOT and leakage current for metal–insulator–metal capacitor stacks with rutile TiO2 2011 ·Microelectronic Engineering ·M. Popovici, Minsoo Kim, Kazuyuki Tomida, Johan Swerts, Hilde Tielens, Alain Moussa, Olivier Richard, H. Bender, Alexis Franquet, Thierry Conard, L. Altimime, Sven Van Elshocht, J. A. Kittl	22
14	An X-ray photoelectron spectroscopy study of strontium-titanate-based high-k film stacks 2011 ·Microelectronic Engineering ·Labrini Sygellou, Hilde Tielens, Christoph Adelmann, S. Ladas	7
15	ALD Barrier Deposition on Porous Low-k Dielectric Materials for Interconnects 2011 ·ECS Transactions ·Sven Van Elshocht, Annelies Delabie, (unknown), Johan Meersschaut, Johan Swerts, Hilde Tielens, Patrick Verdonck, T. Witters, E. Vancoille	7
16	Ozone-Based Metal Oxide Atomic Layer Deposition: Impact of N[sub 2]/O[sub 2] Supply Ratio in Ozone Generation 2010 ·Electrochemical and Solid-State Letters ·Annelies Delabie, Matty Caymax, (unknown), Jan Willem Maes, Laura Nyns, M. Popovici, Johan Swerts, Hilde Tielens, Jozef Peeters, Sven Van Elshocht	15
17	Development of ALD HfZrO_x with TDEAH, TDEAZ and H₂O 2010 ·ECS Transactions ·(unknown), Hilde Tielens, Shinji Takeoka, (unknown), Laura Nyns, Christoph Adelmann, Annelies Delabie, T. Schram, Lars‐Åke Ragnarsson, Marc Schaekers, L. Daté, R. Schreutelkamp, Sven Van Elshocht	3
18	(Invited) Introducing Lanthanide Aluminates as Dielectrics for Nonvolatile Memory Applications: A Material Scientist's View 2010 ·ECS Transactions ·Christoph Adelmann, Johan Swerts, Olivier Richard, Thierry Conard, M. Popovici, Valeri Afanas’ev, L. Breuil, A. Cacciato, Karl Opsomer, Bert Brijs, Hilde Tielens, Geoffrey Pourtois, H. Bender, Christophe Detavernier, M. Jurczak, Sven Van Elshocht, J. A. Kittl	7
19	Development of ALD HfZrO[sub x] with TDEAH/TDEAZ and H[sub 2]O 2010 ·Journal of The Electrochemical Society ·Xiaodong Shi, Hilde Tielens, Shinji Takeoka, Takakazu Nakabayashi, Laura Nyns, Christoph Adelmann, Annelies Delabie, T. Schram, L.-Å. Ragnarsson, Marc Schaekers, L. Daté, R. Schreutelkamp, Sven Van Elshocht	12
20	Rare Earth Materials for Semiconductor Applications 2010 ·ECS Meeting Abstracts ·Sven Van Elshocht, Christoph Adelmann, M. Popovici, Johan Swerts, Annelies Delabie, Laura Nyns, (unknown), Hilde Tielens, Geoffrey Pourtois, T. Schram, Dieter Pierreux, (unknown), An Hardy, Marlies K. Van Bael, J. A. Kittl	1

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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