Katherina Babich

559 total citations
26 papers, 294 citations indexed

About

Katherina Babich is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Katherina Babich has authored 26 papers receiving a total of 294 indexed citations (citations by other indexed papers that have themselves been cited), including 25 papers in Electrical and Electronic Engineering, 10 papers in Biomedical Engineering and 7 papers in Surfaces, Coatings and Films. Recurrent topics in Katherina Babich's work include Advancements in Photolithography Techniques (17 papers), Semiconductor materials and devices (12 papers) and Nanofabrication and Lithography Techniques (6 papers). Katherina Babich is often cited by papers focused on Advancements in Photolithography Techniques (17 papers), Semiconductor materials and devices (12 papers) and Nanofabrication and Lithography Techniques (6 papers). Katherina Babich collaborates with scholars based in United States, Switzerland and Germany. Katherina Babich's co-authors include Daniele Caimi, J. Fompeyrine, R. Germann, Jean‐Pierre Locquet, D. J. Webb, H. Siegwart, M. Sousa, Chiara Marchiori, Ch. Dieker and Karen Petrillo and has published in prestigious journals such as Journal of Applied Physics, Journal of materials research/Pratt's guide to venture capital sources and Journal of Vacuum Science & Technology A Vacuum Surfaces and Films.

In The Last Decade

Katherina Babich

23 papers receiving 266 citations

Peers

Countries citing papers authored by Katherina Babich

Since Specialization

Citations

This map shows the geographic impact of Katherina Babich's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Katherina Babich with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Katherina Babich more than expected).

Fields of papers citing papers by Katherina Babich

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Katherina Babich. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Katherina Babich. The network helps show where Katherina Babich may publish in the future.

Co-authorship network of co-authors of Katherina Babich

This figure shows the co-authorship network connecting the top 25 collaborators of Katherina Babich. A scholar is included among the top collaborators of Katherina Babich based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Katherina Babich. Katherina Babich is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Magnetic and photocatalytic properties of BiFeO3 nanoparticles formed during the heat treatment of hydroxides coprecipitated in a microreactor with intense swirling flows 2024 ·Nanosystems Physics Chemistry Mathematics ·О. В. Проскурина, Katherina Babich, (unknown), K.D. Martinson, V. N. Nevedomskiy, В. Г. Семенов, Р. Ш. Абиев, В. В. Гусаров	3
2	A multi-factorial approach for middle-of-line design rule validation and optimization in 22FDX® 2018 ·(unknown), (unknown), (unknown), Katherina Babich, (unknown), (unknown), Oliver D. Patterson	2
3	Pattern Matching Rule Ranking Through Design of Experiments and Silicon Validation 2018 ·Proceedings - International Symposium for Testing and Failure Analysis ·(unknown), (unknown), Katherina Babich, Yiorgos Makris	1
4	Design space analysis of novel interconnect constructs for 22nm FDX technology 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Piyush Chandra Verma, (unknown), Andrey A. Lutich, (unknown), (unknown), (unknown), (unknown), Juhan Kim, Thomas Herrmann, (unknown), Katherina Babich, David Pritchard, M. Rashed	1
5	Optical properties of epitaxial SrHfO3 thin films grown on Si 2007 ·Journal of Applied Physics ·M. Sousa, C. Rossel, Chiara Marchiori, H. Siegwart, Daniele Caimi, Jean‐Pierre Locquet, D. J. Webb, R. Germann, J. Fompeyrine, Katherina Babich, Jin Won Seo, Ch. Dieker	68
6	SrHfO3 as gate dielectric for future CMOS technology 2007 ·Microelectronic Engineering ·C. Rossel, M. Sousa, Chiara Marchiori, J. Fompeyrine, D. J. Webb, Daniele Caimi, B. Mereu, Adriana Ispas, Jean‐Pierre Locquet, H. Siegwart, R. Germann, (unknown), Katherina Babich	63
7	Silicon containing polymer in applications for 193 nm high NA lithography processes 2006 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Sean Burns, Dirk Pfeiffer, Arpan P. Mahorowala, Karen Petrillo, (unknown), Katherina Babich, David R. Medeiros, Scott D. Allen, Steven J. Holmes, Michael Crouse, (unknown), (unknown), (unknown), (unknown), N. Lustig, Allen H. Gabor, (unknown), Phillip J. Brock, Carl E. Larson	12
8	Investigation of FinFET Devices for 32nm Technologies and Beyond 2006 ·Huiling Shang, L. Chang, X. Wang, M. J. Rooks, Y. Zhang, B. To, Katherina Babich, (unknown), Yu‐Chih Sun, E. Kiewra, M. Ieong, Wilfried Haensch	46
9	Mobility and CMOS devices/circuits on sub-10nm [110] ultra thin body SOI 2005 ·Huiling Shang, J. Germán Rubino, B. Doris, Anna W. Topol, J.W. Sleight, J. Cai, L. Chang, J. A. Ott, J. Kedzierski, K. Chan, Liang Shi, Katherina Babich, J. Newbury, E. Sikorski, B. To, Y. Zhang, K.W. Guarini, M. Ieong	5
10	A novel graded antireflective coating with built-in hardmask properties enabling 65nm and below CMOS device patterning 2004 ·Katherina Babich, (unknown), Arpan P. Mahorowala, Scott Halle, (unknown), Douglas R. Pfeiffer, (unknown), (unknown), Ao Xia, Marie Angelopoulos	1
11	Hardmask technology for sub-100 nm lithographic imaging 2003 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Katherina Babich, Arpan P. Mahorowala, David R. Medeiros, Dirk Pfeiffer, Karen Petrillo, Marie Angelopoulos, A. Grill, V. Patel, Scott Halle, Timothy A. Brunner, Rena M. Conti, Scott D. Allen, Richard Wise	20
12	<title>Tunable antireflective coatings with built-in hard mask properties facilitating thin-resist processing</title> 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Arpan P. Mahorowala, Katherina Babich, Karen Petrillo, John P. Simons, Marie Angelopoulos, V. Patel, A. Grill, Scott Halle, Rena M. Conti, (unknown), Richard Wise, Linda Chen, Alan C. Thomas, (unknown), (unknown)	2
13	When is bilayer thin-film imaging suitable: comparison with single-layer resists 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Scott Halle, Alan C. Thomas, (unknown), T. Dalton, Xiaochun Chen, (unknown), (unknown), (unknown), (unknown), Zheng Chen, Richard A. Ferguson, Eric N. Coker, (unknown), Qinghuang Lin, Arpan P. Mahorowala, Katherina Babich, Karen Petrillo, Marie Angelopoulos, (unknown), (unknown)	4
14	Evaluation of molybdenum silicide for use as a 193-nm phase-shifting absorber in photomask manufacturing 2001 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·M. Hibbs, (unknown), Katherina Babich, Hideaki Mitsui, (unknown)	0
15	High-resolution 248-nm bilayer resist 1999 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Qinghuang Lin, Karen Petrillo, Katherina Babich, (unknown), David R. Medeiros, Arpan P. Mahorowala, John P. Simons, Marie Angelopoulos, Gregory M. Wallraff, Carl E. Larson, (unknown), Ratnam Sooriyakumaran, Gregory Breyta, Phillip J. Brock, (unknown), Donald C. Hofer	8
16	Lithographic evaluation of a DUV carbon attenuated phase shift mask 1998 ·Microelectronic Engineering ·Agnese Callegari, Katherina Babich, S. Purushothaman, Scott Mansfield, Richard A. Ferguson, Alexander S. Wong, (unknown), (unknown), (unknown)	4
17	Extension of 248-nm optical lithography: a thin film imaging approach 1998 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Qinghuang Lin, (unknown), Timothy A. Brunner, (unknown), (unknown), (unknown), John P. Simons, Karen Petrillo, Katherina Babich, David E. Seeger, Marie Angelopoulos, Ratnam Sooriyakumaran, Gregory M. Wallraff, Donald C. Hofer	6
18	Effects of underlayer on performance of bilayer resists for 248-nm lithography 1998 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Katherina Babich, Alessandro Callegari, Karen Petrillo, John P. Simons, (unknown), Marie Angelopoulos, Qinghuang Lin	1
19	Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems. 1998 ·Journal of Photopolymer Science and Technology ·Gregory M. Wallraff, Carl E. Larson, Ratnam Sooriyakumaran, (unknown), (unknown), Richard A. DiPietro, D. D. Hofer, Greg Breyta, Mark Sherwood, (unknown), Qinghuang Lin, (unknown), John P. Simons, Katherina Babich, Karen Petrillo, Marie Angelopoulos	3
20	Optical characterization of attenuated phase shifters 1997 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Alessandro Callegari, Katherina Babich	2

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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