Allen H. Gabor

695 citations

47 papers · 292 indexed · h-index 10

Surfaces, Coatings and Films top 10%
- Electron and X-Ray Spectroscopy Techniques 13
Electrical and Electronic Engineering
- Advancements in Photolithography Techniques 42
- Integrated Circuits and Semiconductor Failure Analysis 16
Biomedical Engineering
- Nanofabrication and Lithography Techniques 9
- Advanced Surface Polishing Techniques 4
Industrial and Manufacturing Engineering
Organic Chemistry
Mechanical Engineering
- Advanced Measurement and Metrology Techniques 5
Electronic, Optical and Magnetic Materials
- Copper Interconnects and Reliability 5
Materials Chemistry
- Block Copolymer Self-Assembly 5

Co-authors: Christopher K. Ober Nelson Felix Robert D. Allen Timothy A. Brunner Richard S. Hutton Francis M. Houlihan Guoping Mao Xuemei Chen
Cited by: Surfaces, Coatings and Films Electrical and Electronic Engineering Biomedical Engineering
Journals: Advanced Materials (1 paper)Chemistry of Materials (3 papers)Microelectronic Engineering (2 papers)
Partner nations: United States Germany Belgium

In The Last Decade

Allen H. Gabor

43 papers receiving 258 citations

Peers

Countries citing papers authored by Allen H. Gabor

Since Specialization

Citations

This map shows the geographic impact of Allen H. Gabor's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Allen H. Gabor with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Allen H. Gabor more than expected).

Fields of papers citing papers by Allen H. Gabor

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Allen H. Gabor. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Allen H. Gabor. The network helps show where Allen H. Gabor may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Allen H. Gabor, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Allen H. Gabor Line = papers co-authored together Allen H. Gabor links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Impact of high-NA half-field to full-field overlay performance by Monte Carlo simulations Romain J. Lallement,Daniel Schmidt,Richard Johnson,Jack Wong,C. Carr,Martin Burkhardt,Jaime Morillo,Allen H. Gabor	2023	0
2	Effect of high NA “half-field” printing on overlay error Allen H. Gabor,Martin Burkhardt,Romain Lallement,Jaime Morillo,Chris Robinson,Daniel Schmidt	2021	1
3	Bayesian dropout approximation in deep learning neural networks: analysis of self-aligned quadruple patterning Scott Halle,Max O. Bloomfield,Allen H. Gabor,Derren Dunn,Mark S. Shephard	2020	3
4	EPE fundamentals and impact of EUV: Will traditional design-rule calculations work in the era of EUV? (Conference Presentation) Allen H. Gabor,Andrew Brendler,Timothy A. Brunner,Xuemei Chen,James Culp,Harry Levinson	2018	2
5	Line-edge roughness performance targets for EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Timothy A. Brunner,Xuemei Chen,Allen H. Gabor,Craig Higgins,Lei Sun,Chris A. Mack	2017	24
6	Mix-and-match considerations for EUV insertion in N7 HVM Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Xuemei Chen,Allen H. Gabor,Pavan Kumar Samudrala,Sheldon Meyers,Erik R. Hosler,Richard Johnson,Nelson Felix	2017	2
7	The GridMapper challenge: how to integrate into manufacturing for reduced overlay error Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Allen H. Gabor,Bernhard Liegl,Michael Pike,Emily Hwang,Timothy J. Wiltshire	2010	6
8	Smaller, smarter, faster, and more accurate: the new overlay metrology Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Nelson Felix,Allen H. Gabor,William A. Muth,Christopher P. Ausschnitt	2010	10
9	Double exposure double etch for dense SRAM: a designer's dream Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chandrasekhar Sarma,Allen H. Gabor,Scott Halle,Henning Haffner,Klaus Herold,L. Tsou,Helen Wang,Haoren Zhuang	2008	1
10	Meeting critical gate linewidth control needs at the 65 nm node Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Arpan P. Mahorowala,Scott Halle,Allen H. Gabor,William Chu,Alexandra Barberet,Donald J. Samuels,Amr Y. Abdo,L. Tsou,Wendy Yan,Seiji Iseda,Kaushal Patel,Bachir Dirahoui,A. Nomura,Ishtiaq Ahsan,Faisal Azam,G.D. Berg,Andrew Brendler,Jeffrey J. Zimmerman,Tom Faure	2006	2
11	High-NA swing curve effects Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Timothy A. Brunner,Allen H. Gabor,ChungHsi J. Wu,Nora Chen	2001	8
12	Probing the limits of optical lithography: The fabrication of sub-100nm devices with 193nm wavelength lithography Microelectronic Engineering ·Raymond A. Cirelli,J. Bude,F. M. Houlihan,Allen H. Gabor,G. P. Watson,Gary R. Weber,F. Klemens,J. E. Sweeney,W Mansfield,O. Nalamasu	2000	1
13	Fundamental Studies of the Effects of Photo-additive Structure on Resist Outgassing. Journal of Photopolymer Science and Technology ·Francis M. Houlihan,Ilya L. Rushkin,Richard S. Hutton,Allen G. Timko,Elsa Reichmanis,O. Nalamasu,Allen H. Gabor,Arturo N. Medina,Sanjay Malik,Matthew Neiser,Roderick R. Kunz,D. K. Downs	1999	3
14	Lithographic Materials Technologies: 193 nm Imaging and Beyond MRS Proceedings ·Elsa Reichmanis,Omkaram Nalamasu,Francis M. Houlihan,Allen H. Gabor,Mark Neisser,M. J. Bowden	1999	1
15	Photogenerators of Sulfamic Acids; Use in Chemically Amplified Single Layer Resists. Journal of Photopolymer Science and Technology ·Francis M. Houlihan,J. M. Kometani,Allen G. Timko,Richard S. Hutton,Allen H. Gabor,Arturo N. Medina,John J. Biafore,Sydney G. Slater	1998	6
16	193-nm single-layer photoresists based on alternating copolymers of cycloolefins: the use of photogenerators of sulfamic acids Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Francis M. Houlihan,J. M. Kometani,Allen G. Timko,Richard S. Hutton,Raymond A. Cirelli,Elsa Reichmanis,Omkaram Nalamasu,Allen H. Gabor,Arturo N. Medina,John J. Biafore,Sydney G. Slater	1998	5
17	Optimization of etch conditions for a silicon-containing methacrylate-based bilayer resist for 193-nm lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Thomas Steinhaeusler,Allen H. Gabor,Daniela White,Andrew J. Blakeney,David R. Stark,Daniel A. Miller,Georgia K. Rich,Victoria L. Graffenberg,Kim Dean	1998	4
18	Imaging polymers with supercritical carbon dioxide Advanced Materials ·Christopher K. Ober,Allen H. Gabor,Paula M. Gallagher-Wetmore,Robert D. Allen	1997	28
19	Block and random copolymer resists designed for 193-nm lithography and environmentally friendly supercritical CO 2 development Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Allen H. Gabor,Robert D. Allen,Paula M. Gallagher-Wetmore,Christopher K. Ober	1996	3
20	Lithographic Properties of Poly(tert-butyl methacrylate)-Based Block and Random Copolymer Resists Designed for 193 nm Wavelength Exposure Tools Chemistry of Materials ·Allen H. Gabor,Laura Pruette,Christopher K. Ober	1996	25

About Allen H. Gabor

Allen H. Gabor is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Bioengineering, having authored 47 papers that have together received 292 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (42 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers), Electron and X-Ray Spectroscopy Techniques (13 papers), Nanofabrication and Lithography Techniques (9 papers), Advanced Measurement and Metrology Techniques (5 papers), Copper Interconnects and Reliability (5 papers), Block Copolymer Self-Assembly (5 papers) and Advanced Surface Polishing Techniques (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (85 citations), Electrical and Electronic Engineering (216 citations) and Biomedical Engineering (110 citations). Allen H. Gabor has collaborated with scholars based in United States, Germany and Belgium. Frequent co-authors include Christopher K. Ober, Nelson Felix, Robert D. Allen, Timothy A. Brunner, Richard S. Hutton, Francis M. Houlihan, Guoping Mao, Xuemei Chen, Allen G. Timko and Chris A. Mack. Their work appears in journals such as Advanced Materials, Chemistry of Materials and Microelectronic Engineering.

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