David R. Medeiros
- Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques 8
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- Advancements in Photolithography Techniques 35
- Semiconductor materials and devices 10
- Integrated Circuits and Semiconductor Failure Analysis 9
- 3D IC and TSV technologies 5
- Polymers and Plastics top 10%
- Materials Chemistry top 10%
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- Nanofabrication and Lithography Techniques 12
- Advanced Surface Polishing Techniques 7
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- Photopolymerization techniques and applications 5
- Co-authors
- David B. MitziZhengtao XuPatrick R. L. MalenfantJ. RosnerChristos DimitrakopoulosC. Grant WillsonPatrick W. DeHavenRoger F. Sinta
- Journals
- Advanced Materials (1 paper)Chemistry of Materials (7 papers)Journal of Materials Chemistry (1 paper)
- Partner nations
- United StatesBulgariaJapan
In The Last Decade
David R. Medeiros
47 papers receiving 928 citations
Peers
Comparison fields: 5 of 58
- Surfaces, Coatings and Films 105
- Electrical and Electronic Engineering 748
- Polymers and Plastics 149
- Materials Chemistry 442
- Electronic, Optical and Magnetic Materials 137
Countries citing papers authored by David R. Medeiros
This map shows the geographic impact of David R. Medeiros's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David R. Medeiros with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David R. Medeiros more than expected).
Fields of papers citing papers by David R. Medeiros
This network shows the impact of papers produced by David R. Medeiros. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David R. Medeiros. The network helps show where David R. Medeiros may publish in the future.
Co-authorship network
The 25 scholars most cited alongside David R. Medeiros, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2023 | 2 | |
| 2 | 2008 | 3 | |
| 3 | 2007 | 17 | |
| 4 | 2007 | 14 | |
| 5 | 2003 | 20 | |
| 6 | 2002 | 3 | |
| 7 | 2002 | 1 | |
| 8 | 2002 | 144 | |
| 9 | 2002 | 1 | |
| 10 | 2002 | 56 | |
| 11 | 2002 | 6 | |
| 12 | 2002 | 8 | |
| 13 | 2001 | 27 | |
| 14 | 2001 | 12 | |
| 15 | 1999 | 1 | |
| 16 | 1999 | 51 | |
| 17 | 1998 | 40 | |
| 18 | 1997 | 35 | |
| 19 | 1995 | 22 | |
| 20 | 1993 | 2 |
About David R. Medeiros
David R. Medeiros is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Biomedical Engineering, having authored 51 papers that have together received 970 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (35 papers), Nanofabrication and Lithography Techniques (12 papers), Semiconductor materials and devices (10 papers), Integrated Circuits and Semiconductor Failure Analysis (9 papers), Electron and X-Ray Spectroscopy Techniques (8 papers), Advanced Surface Polishing Techniques (7 papers), 3D IC and TSV technologies (5 papers) and Photopolymerization techniques and applications (5 papers). The work is most often cited by research in Surfaces, Coatings and Films (105 citations), Electrical and Electronic Engineering (748 citations) and Polymers and Plastics (149 citations). David R. Medeiros has collaborated with scholars based in United States, Bulgaria and Japan. Frequent co-authors include David B. Mitzi, Zhengtao Xu, Patrick R. L. Malenfant, J. Rosner, Christos Dimitrakopoulos, C. Grant Willson, Patrick W. DeHaven, Roger F. Sinta, Jean M. J. Fréchet and Jeffrey D. Byers. Their work appears in journals such as Advanced Materials, Chemistry of Materials and Journal of Materials Chemistry.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.