David E. Seeger

936 citations

43 papers · 714 indexed · h-index 14

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques 17
Computational Mechanics top 5%
- Laser Material Processing Techniques 5
Ophthalmology top 5%
Electrical and Electronic Engineering top 10%
- Advancements in Photolithography Techniques 27
- 3D IC and TSV technologies 7
- Advanced MEMS and NEMS Technologies 4
- Integrated Circuits and Semiconductor Failure Analysis 4
Physical and Theoretical Chemistry top 10%
Biomedical Engineering
- Advanced Surface Polishing Techniques 4
- Nanofabrication and Lithography Techniques 4

Co-authors: Bodil Braren R. W. Dreyfus R. Srinivasan Jerome A. Berson L. M. HADEL Karen Petrillo Hiroshi Itô Ratnam Sooriyakumaran
Cited by: Surfaces, Coatings and Films Computational Mechanics Ophthalmology
Journals: Microelectronic Engineering (6 papers)Journal of the American Chemical Society (4 papers)IBM Journal of Research and Development (2 papers)
Partner nations: United States Germany

In The Last Decade

David E. Seeger

42 papers receiving 659 citations

Peers

Countries citing papers authored by David E. Seeger

Since Specialization

Citations

This map shows the geographic impact of David E. Seeger's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David E. Seeger with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David E. Seeger more than expected).

Fields of papers citing papers by David E. Seeger

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by David E. Seeger. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David E. Seeger. The network helps show where David E. Seeger may publish in the future.

Co-authorship network

The 25 scholars most cited alongside David E. Seeger, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with David E. Seeger Line = papers co-authored together David E. Seeger links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Extension of 248-nm optical lithography: a thin film imaging approach Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Qinghuang Lin,Alberto Iaconi,Timothy A. Brunner,陈锦耀,Hansjörg Mühlen,Najem El Mahjoub El Garhia,John P. Simons,Karen Petrillo,Katherina Babich,David E. Seeger,Marie Angelopoulos,Ratnam Sooriyakumaran,Gregory M. Wallraff,Donald C. Hofer	1998	6
2	Electron-beam, X-ray, EUV, and ion-beam submicrometer lithographies for manufacturing VI : 11-13 March 1996, Santa Clara, California SPIE eBooks ·David E. Seeger,Wakabayashi Hitomi	1996	1
3	<title>Nonchemically amplified positive photoresist for synchrotron radiation x-ray lithography</title> Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·María José Ponce Andrade,Ari Aviram,David E. Seeger,Will Conley,William R. Brunsvold	1995	1
4	Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility. Journal of Photopolymer Science and Technology ·Hiroshi Itô,Greg Breyta,Thorvald Sørensen,Ratnam Sooriyakumaran,Karen Petrillo,David E. Seeger	1994	77
5	Fabrication of high performance 512Kb SRAMs in 0.25 μm CMOS technology using x-ray lithography Microelectronic Engineering ·R. Viswanathan,David E. Seeger,A. A. Bright,T. Bucelot,Andrew Pomerene,Karen Petrillo,Patricia G. Blauner,P. Agnello,J. M. Warlaumont,Tatiana Lobastova,D. Patel	1994	1
6	Effect of photo acid generator concentration on the process latitude of a chemically amplified resist Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Karen Petrillo,Andrew Pomerene,NIUYan-bing,David E. Seeger,Thorvald Sørensen,Gregory Breyta,Hiroshi Itô	1994	3
7	0.25-μm lithography development using positive mode top surface imaging photoresist Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Najem El Mahjoub El Garhia,John P. Simons,David E. Seeger,Nobuo KAMADA	1994	6
8	Optimization of ESCAP photoresist for x-ray lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andrew Pomerene,Karen Petrillo,David E. Seeger,Hiroshi Itô,Gregory Breyta,Donald C. Hofer	1994	2
9	Fabrication of high performance 512K static-random access memories in 0.25 μm complementary metal–oxide semiconductor technology using x-ray lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Ramya Viswanathan,David E. Seeger,A. A. Bright,T. Bucelot,Andrew Pomerene,Karen Petrillo,Patricia G. Blauner,P. Agnello,J. M. Warlaumont,Tatiana Lobastova,D. Patel	1993	20
10	Resist materials and processes for X-ray lithography IBM Journal of Research and Development ·David E. Seeger	1993	3
11	Positive mode silylation process characterization Microelectronic Engineering ·Douglas Charles La Tulipe,Andrew Pomerene,John P. Simons,David E. Seeger	1992	7
12	Single layer chemically amplified resist processes for device fabrication by x-ray lithography Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·David E. Seeger,R. Viswanathan,C. D. Blair,Jeffrey D. Gelorme,Will Conley	1992	1
13	A 0.5 &mu;m fully scaled two-level metal fully planarized interconnect structure fabricated with X-ray lithography D. Moy,Jill Mary Gordon,David E. Seeger,J. P. Silverman,Chunhua Hu,F. B. Kaufman,Fang,M. Jaso,Teresa Figueiredo	1990	2
14	Importance of adsorption in ion beam induced deposition of carbon Applied Physics Letters ·P. A. Buckley,David E. Seeger	1990	1
15	Exposure characteristics of high-resolution negative resists Journal of Vacuum Science & Technology B Microelectronics Processing and Phenomena ·Martin Garber,Shalom J. Wind,David E. Seeger	1990	17
16	Fully scaled 0.5μm MOS circuits by synchrotron radiation X-ray lithography: Mask fabrication and chraterization Microelectronic Engineering ·R. Viswanathan,R. E. Acosta,David E. Seeger,Hu Fan,A.D. Wilson,I. Babich,José R. Maldonado,J. M. Warlaumont,黃恒棟,أسيل سعيد جبرين الحسنات,Trevor Sarratt,И. Р. Гилязова	1989	2
17	X-ray transmission through low atomic number particles Microelectronic Engineering ·Chih,David E. Seeger,J. L. Mauer	1989	4
18	Synthesis of two bis-m-quinomethanes. An experimental study of connectivity effects on the equal-parity criterion for low-spin ground states in alternant non-Kekule molecules Journal of the American Chemical Society ·David E. Seeger,Paul M. Lahti,Angelo R. Rossi,Jerome A. Berson	1986	40
19	Comparative study of the photochemistry of the cutting (etching) of a synthetic polymer and bovine cornea by excimer laser radiation Conference on Lasers and Electro-Optics ·R. Srinivasan,Bodil Braren,David E. Seeger,Stephen L. Trokel,Ronald R. Krueger	1985	2
20	Quintet ground state of a non-Kekule tetraradical 3,6-dimethyleneanthracenyl-1,7-dioxy Journal of the American Chemical Society ·David E. Seeger,Jerome A. Berson	1983	15

About David E. Seeger

David E. Seeger is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Computational Mechanics, having authored 43 papers that have together received 714 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (27 papers), Electron and X-Ray Spectroscopy Techniques (17 papers), 3D IC and TSV technologies (7 papers), Laser Material Processing Techniques (5 papers), Advanced Surface Polishing Techniques (4 papers), Advanced MEMS and NEMS Technologies (4 papers), Integrated Circuits and Semiconductor Failure Analysis (4 papers) and Nanofabrication and Lithography Techniques (4 papers). The work is most often cited by research in Surfaces, Coatings and Films (96 citations), Computational Mechanics (194 citations) and Ophthalmology (76 citations). David E. Seeger has collaborated with scholars based in United States and Germany. Frequent co-authors include Bodil Braren, R. W. Dreyfus, R. Srinivasan, Jerome A. Berson, L. M. HADEL, Karen Petrillo, Hiroshi Itô, Ratnam Sooriyakumaran, Greg Breyta and Edwin F. Hilinski. Their work appears in journals such as Microelectronic Engineering, Journal of the American Chemical Society, IBM Journal of Research and Development, Journal of Photopolymer Science and Technology and Applied Physics Letters.

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