Oliver D. Patterson

794 total citations
61 papers, 579 citations indexed

About

Oliver D. Patterson is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, Oliver D. Patterson has authored 61 papers receiving a total of 579 indexed citations (citations by other indexed papers that have themselves been cited), including 54 papers in Electrical and Electronic Engineering, 35 papers in Surfaces, Coatings and Films and 13 papers in Industrial and Manufacturing Engineering. Recurrent topics in Oliver D. Patterson's work include Integrated Circuits and Semiconductor Failure Analysis (46 papers), Electron and X-Ray Spectroscopy Techniques (35 papers) and Advancements in Photolithography Techniques (32 papers). Oliver D. Patterson is often cited by papers focused on Integrated Circuits and Semiconductor Failure Analysis (46 papers), Electron and X-Ray Spectroscopy Techniques (35 papers) and Advancements in Photolithography Techniques (32 papers). Oliver D. Patterson collaborates with scholars based in United States, Germany and Switzerland. Oliver D. Patterson's co-authors include D.M. Divan, Deepak Divan, Pramod P. Khargonekar, Julie Lee, Deborah A. Ryan, D. Mocuta, Cheng Lei, H. Xiao, Jon Lee and Vijayan N. Nair and has published in prestigious journals such as Journal of The Electrochemical Society, IEEE Transactions on Power Electronics and IEEE Transactions on Semiconductor Manufacturing.

In The Last Decade

Oliver D. Patterson

55 papers receiving 533 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Oliver D. Patterson United States 11 538 156 58 52 44 61 579
Kazuyoshi Sugihara Japan 10 250 0.5× 62 0.4× 6 0.1× 156 3.0× 28 0.6× 41 339
Mircea Dusa Netherlands 14 635 1.2× 221 1.4× 48 0.8× 270 5.2× 50 1.1× 109 710
Carlos Fonseca United States 10 247 0.5× 59 0.4× 24 0.4× 93 1.8× 13 0.3× 38 276
K. Wyatt United States 12 466 0.9× 9 0.1× 20 0.3× 35 0.7× 47 1.1× 26 515
G. Owen United States 9 228 0.4× 106 0.7× 11 0.2× 127 2.4× 71 1.6× 32 329
Tomoyuki Matsuyama Japan 9 237 0.4× 47 0.3× 22 0.4× 155 3.0× 57 1.3× 55 288
Jin Choi South Korea 11 315 0.6× 68 0.4× 24 0.4× 257 4.9× 20 0.5× 65 378
James Word United States 10 288 0.5× 55 0.4× 66 1.1× 115 2.2× 44 1.0× 61 313
Amit Kumar Gupta India 14 1.0k 1.9× 10 0.1× 5 0.1× 41 0.8× 31 0.7× 59 1.1k
В.А. Ващенко United States 15 864 1.6× 7 0.0× 4 0.1× 15 0.3× 14 0.3× 100 908

Countries citing papers authored by Oliver D. Patterson

Since Specialization
Citations

This map shows the geographic impact of Oliver D. Patterson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Oliver D. Patterson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Oliver D. Patterson more than expected).

Fields of papers citing papers by Oliver D. Patterson

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Oliver D. Patterson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Oliver D. Patterson. The network helps show where Oliver D. Patterson may publish in the future.

Co-authorship network of co-authors of Oliver D. Patterson

This figure shows the co-authorship network connecting the top 25 collaborators of Oliver D. Patterson. A scholar is included among the top collaborators of Oliver D. Patterson based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Oliver D. Patterson. Oliver D. Patterson is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Zhao, Shuo, Xuedong Liu, Kevin Chou, et al.. (2020). Multi-beam Inspection (MBI) development progress and applications. 11–11. 4 indexed citations
2.
Patterson, Oliver D., et al.. (2020). Creative Use of Vector Scan for Efficient SRAM Inspection. 1–5. 2 indexed citations
3.
Patterson, Oliver D., et al.. (2019). Special Section on the 2017 SEMI Advanced Semiconductor Manufacturing Conference. IEEE Transactions on Semiconductor Manufacturing. 32(1). 3–6.
4.
5.
Chou, Kevin, et al.. (2019). Multiple beam inspection (MBI) for 7nm node and beyond: technologies and applications. 61–61. 6 indexed citations
6.
Babich, Katherina, et al.. (2018). A multi-factorial approach for middle-of-line design rule validation and optimization in 22FDX®. 10148. 244–248. 2 indexed citations
7.
Patterson, Oliver D., et al.. (2018). Shortest path CD measurement using contour extraction. 313–319. 2 indexed citations
8.
Bunday, Benjamin, et al.. (2017). In-line E-beam metrology and defect inspection: industry reflections, hybrid E-beam opportunities, recommendations and predictions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10145. 101450R–101450R. 9 indexed citations
9.
Patterson, Oliver D., et al.. (2016). In-line characterization of EDRAM for a FINFET technology using VC inspection. 278–284. 7 indexed citations
10.
Patterson, Oliver D., et al.. (2015). Special Section on the 2014 SEMI Advanced Semiconductor Manufacturing Conference. IEEE Transactions on Semiconductor Manufacturing. 28(4). 445–447. 1 indexed citations
11.
Ryan, Deborah A., et al.. (2015). Application of E-beam hot spot inspection for early detection of systematic patterning problems to a FinFET technology. Journal of Micro/Nanolithography MEMS and MOEMS. 14(2). 21106–21106. 1 indexed citations
12.
Patterson, Oliver D., et al.. (2013). Detection of Sub-Design Rule Physical Defects Using E-Beam Inspection. IEEE Transactions on Semiconductor Manufacturing. 26(4). 476–481. 11 indexed citations
13.
Patterson, Oliver D., et al.. (2010). High Volume and Fast Turnaround Automated Inline TEM Sample Preparation for Manufacturing Process Monitoring. Proceedings - International Symposium for Testing and Failure Analysis. 30415. 102–107. 2 indexed citations
14.
Gribelyuk, M., et al.. (2008). A New Method of Wafer Level Plan View TEM Sample Preparation by DualBeam. Proceedings - International Symposium for Testing and Failure Analysis. 30910. 168–171. 3 indexed citations
15.
Patterson, Oliver D., et al.. (2006). Detection of Resistive Shorts and Opens using Voltage Contrast Inspection. 327–333. 16 indexed citations
16.
Patterson, Oliver D., et al.. (2005). In-Line Voltage Contrast Inspection of Ungrounded Chain Test Structures for Timely and Detailed Characterization of Contact and Via Yield Loss. Proceedings - International Symposium for Testing and Failure Analysis. 30880. 401–406. 3 indexed citations
17.
Patterson, Oliver D., et al.. (2004). Attack and resolution of a major product-specific systematic yield loss problem. 461–466. 4 indexed citations
18.
Patterson, Oliver D., et al.. (2003). Methodology for feedback variable selection for control of semiconductor manufacturing processes-part 2: application to reactive ion etching. IEEE Transactions on Semiconductor Manufacturing. 16(4). 588–597. 4 indexed citations
19.
Hunt, Victor J., et al.. (1993). Decoupled flux control for molecular beam epitaxy. IEEE Transactions on Semiconductor Manufacturing. 6(4). 348–356.
20.
Patterson, Oliver D. & D.M. Divan. (1991). Pseudo-resonant full bridge DC/DC converter. IEEE Transactions on Power Electronics. 6(4). 671–678. 202 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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