Greg Breyta

994 total citations
21 papers, 771 citations indexed

About

Greg Breyta is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Greg Breyta has authored 21 papers receiving a total of 771 indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Electrical and Electronic Engineering, 10 papers in Biomedical Engineering and 3 papers in Surfaces, Coatings and Films. Recurrent topics in Greg Breyta's work include Advancements in Photolithography Techniques (18 papers), Nanofabrication and Lithography Techniques (10 papers) and Semiconductor materials and devices (5 papers). Greg Breyta is often cited by papers focused on Advancements in Photolithography Techniques (18 papers), Nanofabrication and Lithography Techniques (10 papers) and Semiconductor materials and devices (5 papers). Greg Breyta collaborates with scholars based in United States, Japan and Netherlands. Greg Breyta's co-authors include Charles T. Black, Ricardo Ruiz, K.W. Guarini, J. Y. Cheng, Yifan Zhang, Matthew Colburn, H.-C. Kim, Hiroshi Itô, Tad Hogg and Isaac L. Chuang and has published in prestigious journals such as Physical Review Letters, Macromolecules and IBM Journal of Research and Development.

In The Last Decade

Greg Breyta

21 papers receiving 745 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Greg Breyta United States 10 368 339 249 186 132 21 771
C. Wächter Germany 16 156 0.4× 482 1.4× 220 0.9× 108 0.6× 92 0.7× 43 993
A. Sindona Italy 16 415 1.1× 170 0.5× 189 0.8× 56 0.3× 123 0.9× 68 832
Akira Fujimoto Japan 14 220 0.6× 329 1.0× 140 0.6× 104 0.6× 52 0.4× 96 714
Seng-Tiong Ho United States 14 235 0.6× 468 1.4× 152 0.6× 79 0.4× 61 0.5× 42 804
Hikaru Nomura Japan 15 144 0.4× 257 0.8× 99 0.4× 43 0.2× 34 0.3× 94 814
Manish K. Mundra United States 8 525 1.4× 53 0.2× 220 0.9× 78 0.4× 40 0.3× 8 838
Pai‐Yi Hsiao Taiwan 15 139 0.4× 162 0.5× 251 1.0× 47 0.3× 116 0.9× 59 645
Seng‐Tiong Ho United States 14 122 0.3× 590 1.7× 168 0.7× 40 0.2× 94 0.7× 76 824
A. Andreev Austria 17 344 0.9× 853 2.5× 214 0.9× 84 0.5× 13 0.1× 57 1.1k
Jonathan J. Foley United States 20 590 1.6× 274 0.8× 324 1.3× 76 0.4× 22 0.2× 46 1.3k

Countries citing papers authored by Greg Breyta

Since Specialization
Citations

This map shows the geographic impact of Greg Breyta's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Greg Breyta with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Greg Breyta more than expected).

Fields of papers citing papers by Greg Breyta

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Greg Breyta. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Greg Breyta. The network helps show where Greg Breyta may publish in the future.

Co-authorship network of co-authors of Greg Breyta

This figure shows the co-authorship network connecting the top 25 collaborators of Greg Breyta. A scholar is included among the top collaborators of Greg Breyta based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Greg Breyta. Greg Breyta is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yamaguchi, Yoshikazu, Tsutomu Shimokawa, Greg Breyta, et al.. (2014). Spin-on organic hardmask for topo-patterned substrate. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9051. 905115–905115. 5 indexed citations
2.
Murakami, Satoru, Yoshikazu Yamaguchi, Tsutomu Shimokawa, et al.. (2012). Investigation of pattern wiggling for spin-on organic hardmask materials. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8325. 83250T–83250T. 8 indexed citations
3.
Silva, Anuja De, Linda K. Sundberg, Ratnam Sooriyakumaran, et al.. (2011). Hexafluoroalcohol (HFA) containing molecular resist materials for high-resolution lithographic applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7972. 79721Z–79721Z. 1 indexed citations
4.
Black, Charles T., Ricardo Ruiz, Greg Breyta, et al.. (2007). Polymer self assembly in semiconductor microelectronics. IBM Journal of Research and Development. 51(5). 605–633. 345 indexed citations
5.
Allen, A. D., Greg Breyta, P. J. Brock, et al.. (2006). Fundamental Properties of Fluoroalcohol-Methacrylate Polymers for use in 193nm Lithography. Journal of Photopolymer Science and Technology. 19(5). 569–572. 7 indexed citations
6.
Black, Charles T., K.W. Guarini, Greg Breyta, et al.. (2006). Highly porous silicon membrane fabrication using polymer self-assembly. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 24(6). 3188–3191. 39 indexed citations
7.
Wallraff, Gregory M., Carl E. Larson, Greg Breyta, et al.. (2006). The effect of photoresist/topcoat properties on defect formation in immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61531M–61531M. 7 indexed citations
8.
Steffen, Matthias, Wim van Dam, Tad Hogg, Greg Breyta, & Isaac L. Chuang. (2003). Experimental Implementation of an Adiabatic Quantum Optimization Algorithm. Physical Review Letters. 90(6). 67903–67903. 120 indexed citations
9.
Itô, Hiroshi, G. M. Wallraff, Nicolette Fender, et al.. (2001). Development of 157 nm positive resists. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 19(6). 2678–2684. 29 indexed citations
10.
Itô, Hiroshi, G. M. Wallraff, Nicolette Fender, et al.. (2001). Novel Fluoropolymers for Use in 157nm Lithography.. Journal of Photopolymer Science and Technology. 14(4). 583–593. 28 indexed citations
11.
Itô, Hiroshi, et al.. (2000). Monomer Reactivities and Kinetics in Radical Copolymerization of Hydroxystyrene Derivatives and tert-Butyl (Meth)acrylate. Macromolecules. 33(14). 5080–5089. 19 indexed citations
12.
Allen, Robert D., Thomas I. Wallow, Carl E. Larson, et al.. (1998). Platform-Dependent Properties of 193nm Single Layer Resists.. Journal of Photopolymer Science and Technology. 11(3). 475–479. 3 indexed citations
13.
Wallraff, Gregory M., Carl E. Larson, Ratnam Sooriyakumaran, et al.. (1998). Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems.. Journal of Photopolymer Science and Technology. 11(4). 673–679. 3 indexed citations
14.
Itô, Hiroshi, et al.. (1997). Dissolution Kinetics and PAG Interaction of Phenolic Resins in Chemically Amplified Resists.. Journal of Photopolymer Science and Technology. 10(3). 397–407. 20 indexed citations
15.
Itô, Hiroshi, et al.. (1996). Lithographic Feasibility of ESCAP Beyond Quarter Micron.. Journal of Photopolymer Science and Technology. 9(4). 557–572. 2 indexed citations
16.
Hofer, Donald C., Robert D. Allen, G. M. Wallraff, et al.. (1996). 193nm Photoresist R&D The Risk & Challenge. Journal of Photopolymer Science and Technology. 9(3). 387–398. 7 indexed citations
17.
Allen, Robert D., Ratnam Sooriyakumaran, G. M. Wallraff, et al.. (1996). Progress in 193 nm Positive Resists.. Journal of Photopolymer Science and Technology. 9(3). 465–474. 19 indexed citations
18.
Ito, Hiroshi, et al.. (1995). Annealing concept for the design of environmentally stable chemical amplification resists.. Journal of Photopolymer Science and Technology. 8(4). 505–518. 7 indexed citations
19.
Itô, Hiroshi, et al.. (1994). Environmentally stable chemical amplification positive resist: principle, chemistry, contamination resistance, and lithographic feasibility.. Journal of Photopolymer Science and Technology. 7(3). 433–447. 77 indexed citations
20.
Wallraff, G. M., Robert D. Allen, William D. Hinsberg, et al.. (1993). Single-layer chemically amplified photoresists for 193-nm lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 11(6). 2783–2788. 20 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by C. Wächter Breakdown of academic impact, for papers by A. Sindona Breakdown of academic impact, for papers by Akira Fujimoto Breakdown of academic impact, for papers by Seng-Tiong Ho Breakdown of academic impact, for papers by Hikaru Nomura Breakdown of academic impact, for papers by Manish K. Mundra Breakdown of academic impact, for papers by Pai‐Yi Hsiao Breakdown of academic impact, for papers by Seng‐Tiong Ho Breakdown of academic impact, for papers by A. Andreev Breakdown of academic impact, for papers by Jonathan J. Foley
Rankless by CCL
2026