Carl E. Larson

1.0k total citations
51 papers, 841 citations indexed

About

Carl E. Larson is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, Carl E. Larson has authored 51 papers receiving a total of 841 indexed citations (citations by other indexed papers that have themselves been cited), including 43 papers in Electrical and Electronic Engineering, 21 papers in Biomedical Engineering and 9 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in Carl E. Larson's work include Advancements in Photolithography Techniques (36 papers), Nanofabrication and Lithography Techniques (16 papers) and Semiconductor materials and devices (12 papers). Carl E. Larson is often cited by papers focused on Advancements in Photolithography Techniques (36 papers), Nanofabrication and Lithography Techniques (16 papers) and Semiconductor materials and devices (12 papers). Carl E. Larson collaborates with scholars based in United States and Netherlands. Carl E. Larson's co-authors include Thomas H. Baum, Robert L. Jackson, William D. Hinsberg, Gregory M. Wallraff, Phillip J. Brock, John A. Hoffnagle, Frances A. Houle, Scott Reynolds, Martha I. Sanchez and Christopher J. Smart and has published in prestigious journals such as Applied Physics Letters, Chemistry of Materials and Journal of The Electrochemical Society.

In The Last Decade

Carl E. Larson

50 papers receiving 776 citations

Author Peers

Peers are selected by citation overlap in the author's most active subfields. citations · hero ref

Author Last Decade Papers Cites
Carl E. Larson 570 297 203 176 142 51 841
Phillip J. Brock 495 0.9× 170 0.6× 169 0.8× 206 1.2× 54 0.4× 35 657
Paul Zimmerman 897 1.6× 409 1.4× 61 0.3× 244 1.4× 93 0.7× 92 1.3k
Fabrizio Evangelista 517 0.9× 337 1.1× 83 0.4× 428 2.4× 113 0.8× 20 905
C. Gonzalez 227 0.4× 161 0.5× 206 1.0× 346 2.0× 138 1.0× 34 742
Andrew O. F. Jones 443 0.8× 115 0.4× 137 0.7× 374 2.1× 90 0.6× 32 814
Lionel Patrone 583 1.0× 412 1.4× 152 0.7× 568 3.2× 66 0.5× 44 1.1k
Anne Hémeryck 481 0.8× 160 0.5× 85 0.4× 504 2.9× 31 0.2× 63 898
Carol R. Jones 154 0.3× 108 0.4× 96 0.5× 119 0.7× 255 1.8× 18 634
K. Piyakis 232 0.4× 127 0.4× 128 0.6× 262 1.5× 26 0.2× 22 562
R. P. Pezzi 437 0.8× 57 0.2× 83 0.4× 226 1.3× 67 0.5× 41 649

Countries citing papers authored by Carl E. Larson

Since Specialization
Citations

This map shows the geographic impact of Carl E. Larson's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Carl E. Larson with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Carl E. Larson more than expected).

Fields of papers citing papers by Carl E. Larson

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Carl E. Larson. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Carl E. Larson. The network helps show where Carl E. Larson may publish in the future.

Co-authorship network of co-authors of Carl E. Larson

This figure shows the co-authorship network connecting the top 25 collaborators of Carl E. Larson. A scholar is included among the top collaborators of Carl E. Larson based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Carl E. Larson. Carl E. Larson is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Yamaguchi, Yoshikazu, Tsutomu Shimokawa, Greg Breyta, et al.. (2014). Spin-on organic hardmask for topo-patterned substrate. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9051. 905115–905115. 5 indexed citations
2.
Wallraff, Gregory M., Carl E. Larson, Greg Breyta, et al.. (2006). The effect of photoresist/topcoat properties on defect formation in immersion lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6153. 61531M–61531M. 7 indexed citations
3.
Sooriyakumaran, Ratnam, Carl E. Larson, Phillip J. Brock, et al.. (2004). 193-nm negative resist based on acid-catalyzed elimination of polar molecules. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 71–71.
4.
Larson, Carl E., et al.. (2004). Optimized acid release underlayers for 157-nm lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5376. 1174–1174. 1 indexed citations
5.
Nguyen, Cattien V., Ramsey Stevens, Jabulani R. Barber, et al.. (2002). Carbon nanotube scanning probe for surface profiling of DUV and 193-nm photoresist pattern. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4689. 58–58. 2 indexed citations
6.
Wallraff, Gregory M., Carl E. Larson, Nicolette Fender, et al.. (2002). Characterization and acid diffusion measurements of new strong acid photoacid generators. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 160–160. 6 indexed citations
7.
Nguyen, Cattien V., Ramsey Stevens, Jabulani R. Barber, et al.. (2002). Carbon nanotube scanning probe for profiling of deep-ultraviolet and 193 nm photoresist patterns. Applied Physics Letters. 81(5). 901–903. 56 indexed citations
8.
Varanasi, Pushkara R., George M. Jordhamo, Arpan P. Mahorowala, et al.. (2001). IBM 193-nm bilayer resist: materials, lithographic performance, and optimization. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 50–50. 5 indexed citations
9.
Fender, Nicolette, Phillip J. Brock, Sarunya Bangsaruntip, et al.. (2001). Characterization of new aromatic polymers for 157-nm photoresist applications. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 417–417. 5 indexed citations
10.
Hinsberg, William D., Frances A. Houle, Martha I. Sanchez, et al.. (2000). Effect of resist components on image spreading during postexposure bake of chemically amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 148–148. 46 indexed citations
11.
Sooriyakumaran, Ratnam, Phillip J. Brock, Carl E. Larson, et al.. (2000). 193-nm positive-tone bilayer resist based on norbornene-maleic anhydride copolymers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 1171–1171. 3 indexed citations
12.
Larson, Carl E., et al.. (2000). Amine control for DUV lithography: identifying hidden sources. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 699–699. 3 indexed citations
13.
Allen, Robert D., Hiroshi Itô, Thomas I. Wallow, et al.. (1999). Cyclic Olefin Resist Polymers and Polymerizations for Improved Etch Resistance.. Journal of Photopolymer Science and Technology. 12(3). 501–507. 3 indexed citations
14.
Wallraff, Gregory M., Carl E. Larson, Ratnam Sooriyakumaran, et al.. (1998). Etch Selectivity of 4SiMA:Hydroxystyrene Based Copolymers. Silicon Chemistry for Bilayer Resist Systems.. Journal of Photopolymer Science and Technology. 11(4). 673–679. 3 indexed citations
15.
Allen, Robert D., Carl E. Larson, Thomas I. Wallow, et al.. (1997). The Influence of Photoacid Structure on the Design and Performance of 1 93-nm Resists.. Journal of Photopolymer Science and Technology. 10(3). 503–510. 5 indexed citations
16.
Baum, Thomas H., Carl E. Larson, & Nigel P. Hacker. (1994). Poly(1,4-phenyleneazine N,N-dioxide): A Recyclable Material for a Solventless Laser-Imageable Resist Process. Chemistry of Materials. 6(11). 1978–1981. 5 indexed citations
17.
Allen, Robert D., Quan P. Ly, Gregory M. Wallraff, et al.. (1993). <title>New chemistry in the design of chemically amplified positive resists</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 1925. 246–256. 2 indexed citations
18.
Reynolds, Scott, et al.. (1991). Chemical vapor deposition of copper from 1,5-cyclooctadiene copper(I) hexafluoroacetylacetonate. Applied Physics Letters. 59(18). 2332–2334. 95 indexed citations
19.
Baum, Thomas H., Carl E. Larson, & Robert L. Jackson. (1988). Laser-Induced Chemical Vapor Deposition of High Purity Aluminum. MRS Proceedings. 129. 2 indexed citations
20.
Larson, Carl E., Thomas H. Baum, & Robert L. Jackson. (1986). Chemical Vapor Deposition of Gold. MRS Proceedings. 75. 5 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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