Paul Zimmerman

1.6k total citations
92 papers, 1.3k citations indexed

About

Paul Zimmerman is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Paul Zimmerman has authored 92 papers receiving a total of 1.3k indexed citations (citations by other indexed papers that have themselves been cited), including 70 papers in Electrical and Electronic Engineering, 38 papers in Biomedical Engineering and 20 papers in Surfaces, Coatings and Films. Recurrent topics in Paul Zimmerman's work include Advancements in Photolithography Techniques (44 papers), Nanofabrication and Lithography Techniques (27 papers) and Semiconductor materials and devices (22 papers). Paul Zimmerman is often cited by papers focused on Advancements in Photolithography Techniques (44 papers), Nanofabrication and Lithography Techniques (27 papers) and Semiconductor materials and devices (22 papers). Paul Zimmerman collaborates with scholars based in United States, Belgium and Australia. Paul Zimmerman's co-authors include David M. Hercules, Christopher K. Ober, Nicholas J. Turro, Marc Heyns, C. Grant Willson, Emmanuel P. Giannelis, Marc Meuris, Will Conley, Markos Trikeriotis and Brice De Jaeger and has published in prestigious journals such as Science, Journal of the American Chemical Society and Advanced Materials.

In The Last Decade

Paul Zimmerman

89 papers receiving 1.2k citations

Peers

Countries citing papers authored by Paul Zimmerman

Since Specialization

Citations

This map shows the geographic impact of Paul Zimmerman's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Paul Zimmerman with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Paul Zimmerman more than expected).

Fields of papers citing papers by Paul Zimmerman

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Paul Zimmerman. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Paul Zimmerman. The network helps show where Paul Zimmerman may publish in the future.

Co-authorship network of co-authors of Paul Zimmerman

This figure shows the co-authorship network connecting the top 25 collaborators of Paul Zimmerman. A scholar is included among the top collaborators of Paul Zimmerman based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Paul Zimmerman. Paul Zimmerman is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Response to Emily Hammer’s article: “Multi-centric, Marsh-based urbanism at the early Mesopotamian city of Lagash (Tell al Hiba, Iraq)” 2023 ·Journal of Anthropological Archaeology ·Holly Pittman, (unknown), (unknown), Paul Zimmerman, (unknown), Liviu Giosan	0
2	Development of an inorganic photoresist for DUV, EUV, and electron beam imaging 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Markos Trikeriotis, Woo Jin Bae, Evan L. Schwartz, (unknown), Neal Lafferty, Peng Xie, Bruce W. Smith, Paul Zimmerman, Christopher K. Ober, Emmanuel P. Giannelis	52
3	Adiabatic ring opening in tethered naphthalene and anthracene cycloadducts 2010 ·Photochemical & Photobiological Sciences ·Arun Kumar Sundaresan, Steffen Jockusch, Yongjun Li, (unknown), Steven M. Banik, Paul Zimmerman, James M. Blackwell, Robert Bristol, Nicholas J. Turro	4
4	Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Lan Chen, (unknown), (unknown), Bruce W. Smith, Warren Montgomery, Paul Zimmerman, Idriss Blakey, Andrew K. Whittaker	5
5	High refractive index and high transparency HfO2 nanocomposites for next generation lithography 2010 ·Journal of Materials Chemistry ·Woo Jin Bae, Markos Trikeriotis, Jing Sha, Evan L. Schwartz, Robert Rodriguez, Paul Zimmerman, Emmanuel P. Giannelis, Christopher K. Ober	59
6	High-index nanocomposite photoresist for 193-nm lithography 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Woo Jin Bae, (unknown), Robert Rodriguez, (unknown), (unknown), Christopher K. Ober, Emmanuel P. Giannelis, Paul Zimmerman	4
7	High refractive index nanoparticle fluids for 193-nm immersion lithography 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Markos Trikeriotis, Robert Rodriguez, (unknown), Aristides Bakandritsos, Woo Jin Bae, Paul Zimmerman, Christopher K. Ober, Emmanuel P. Giannelis	5
8	Fundamental study of optical threshold layer approach towards double exposure lithography 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Toshiyuki Ogata, William J. Durand, (unknown), (unknown), Steffen Jockusch, Paul Zimmerman, Nicholas J. Turro, C. Grant Willson	1
9	Non-CA resists for 193 nm immersion lithography: effects of chemical structure on sensitivity 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Idriss Blakey, Lan Chen, (unknown), (unknown), (unknown), (unknown), Paul Zimmerman, Andrew K. Whittaker	9
10	Development of an operational high refractive index resist for 193nm immersion lithography 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Paul Zimmerman, Jeffrey D. Byers, (unknown), Bryan J. Rice, Christopher K. Ober, Emmanuel P. Giannelis, Robert Rodriguez, Dongyan Wang, Andrew K. Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu	10
11	Options for high index fluids for third generation 193i lithography 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Seth Kruger, (unknown), Shaozhong Zhang, (unknown), Eric Block, Paul Zimmerman, Robert L. Brainard	3
12	Status of High-Index Materials for Generation-Three 193nm Immersion Lithography 2007 ·Journal of Photopolymer Science and Technology ·Paul Zimmerman, (unknown), Bryan J. Rice, Jeff D. Byers, Nicholas J. Turro, Xuegong Lei, Juan López‐Gejo, (unknown), (unknown), (unknown), (unknown), Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu	12
13	Outlook for potential third-generation immersion fluids 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Juan López‐Gejo, Joy T. Kunjappu, Junli Zhou, Bruce W. Smith, Paul Zimmerman, Will Conley, Nicholas J. Turro	7
14	Atomic Layer Deposition of HfO2 on (100) and (110) Oriented Silicon Surfaces 2007 ·ECS Transactions ·Laura Nyns, (unknown), Lindsey Hall, Annelies Delabie, Marc Heyns, Sven Van Elshocht, Chris Vinckier, Paul Zimmerman, Stefan De Gendt	1
15	High performance Ge pMOS devices using a Si-compatible process flow 2006 ·Paul Zimmerman, G. Nicholas, Brice De Jaeger, B. Kaczer, A. Stesmans, (unknown), D.P. Brunco, Frederik Leys, Matty Caymax, Gillis Winderickx, Karl Opsomer, Marc Meuris, Marc Heyns	86
16	Enhanced Performance of PMOS MUGFET via Integration of Conformal Plasma-Doped Source/Drain Extensions 2006 ·D. Lenoble, (unknown), A. De Keersgieter, (unknown), Nadine Collaert, R. Rooyackers, S. Brus, Paul Zimmerman, M. W. Goodwin, Danielle Vanhaeren, Wilfried Vandervorst, Svetlana Radovanov, (unknown), Christophe Cardinaud, S. Biesemans, T. Skotnicki, M. Jurczak	17
17	Tall triple-gate devices with TiN/HfO/sub 2/ gate stack 2005 ·Nadine Collaert, M. Demand, Isabelle Ferain, J. G. Lisoni, (unknown), Paul Zimmerman, (unknown), T. Schram, G. Mannaert, M. W. Goodwin, Jacob C. Hooker, (unknown), (unknown), (unknown), Stefan De Gendt, Werner Boullart, M. Jurczak, S. Biesemans	38
18	Dissolution Inhibitors for 157 nm Lithography: A Progress Report. 2002 ·Journal of Photopolymer Science and Technology ·Will Conley, Daniel A. Miller, (unknown), Brian C. Trinque, (unknown), Takashi Chiba, Paul Zimmerman, Ralph R. Dammel, (unknown), C. Grant Willson	9
19	Direct analysis of filter paper blood specimens for identification of Smith-Lemli-Opitz syndrome using time-of-flight secondary ion mass spectrometry 1997 ·American Journal of Medical Genetics ·Paul Zimmerman, David M. Hercules, Edwin W. Naylor	28
20	Direct quantitation of alkyl ketene dimers using time-of-flight secondary ion mass spectrometry 1995 ·Analytical Chemistry ·Paul Zimmerman, David M. Hercules, (unknown)	11

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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