Jeffrey D. Byers

1.7k total citations
46 papers, 1.4k citations indexed

About

Jeffrey D. Byers is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Atomic and Molecular Physics, and Optics. According to data from OpenAlex, Jeffrey D. Byers has authored 46 papers receiving a total of 1.4k indexed citations (citations by other indexed papers that have themselves been cited), including 34 papers in Electrical and Electronic Engineering, 18 papers in Biomedical Engineering and 9 papers in Atomic and Molecular Physics, and Optics. Recurrent topics in Jeffrey D. Byers's work include Advancements in Photolithography Techniques (28 papers), Nanofabrication and Lithography Techniques (13 papers) and Spectroscopy and Quantum Chemical Studies (8 papers). Jeffrey D. Byers is often cited by papers focused on Advancements in Photolithography Techniques (28 papers), Nanofabrication and Lithography Techniques (13 papers) and Spectroscopy and Quantum Chemical Studies (8 papers). Jeffrey D. Byers collaborates with scholars based in United States, Canada and Belgium. Jeffrey D. Byers's co-authors include Janice M. Hicks, Teresa Petralli-Mallow, C. Grant Willson, Uzodinma Okoroanyanwu, Tsutomu Shimokawa, Jean M. J. Fréchet, Chris A. Mack, David R. Medeiros, James M. Grichnik and Robert E. Clark and has published in prestigious journals such as The Journal of Chemical Physics, Physical review. B, Condensed matter and Chemistry of Materials.

In The Last Decade

Jeffrey D. Byers

44 papers receiving 1.3k citations

Peers

Countries citing papers authored by Jeffrey D. Byers

Since Specialization

Citations

This map shows the geographic impact of Jeffrey D. Byers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jeffrey D. Byers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jeffrey D. Byers more than expected).

Fields of papers citing papers by Jeffrey D. Byers

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jeffrey D. Byers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jeffrey D. Byers. The network helps show where Jeffrey D. Byers may publish in the future.

Co-authorship network of co-authors of Jeffrey D. Byers

This figure shows the co-authorship network connecting the top 25 collaborators of Jeffrey D. Byers. A scholar is included among the top collaborators of Jeffrey D. Byers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jeffrey D. Byers. Jeffrey D. Byers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Re: An unusual migratory polycyclic eruption after administration of prostaglandin E in a neonate 2017 ·JAAD Case Reports ·Lee Wheless, (unknown), (unknown), Jeffrey D. Byers	4
2	Development of an operational high refractive index resist for 193nm immersion lithography 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Paul Zimmerman, Jeffrey D. Byers, (unknown), Bryan J. Rice, Christopher K. Ober, Emmanuel P. Giannelis, Robert Rodriguez, Dongyan Wang, Andrew K. Whittaker, Idriss Blakey, Lan Chen, Bronwin Dargaville, Heping Liu	10
3	Double Exposure Materials: Simulation Study of Feasibility 2007 ·Journal of Photopolymer Science and Technology ·Jeffrey D. Byers, (unknown), (unknown), Paul Zimmerman, Nicholas J. Turro, C. Grant Willson	20
4	Electron beam based modification of lithographic materials and the impact on critical dimensional metrology 2006 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Herschel M. Marchman, Gian F. Lorusso, (unknown), L. Grella, Zhiqiang Luo, Jeffrey D. Byers, (unknown), (unknown), (unknown), (unknown), Gert Storms, Leonardus H. A. Leunissen	6
5	Methods for benchmarking photolithography simulators: part III 2005 ·Mark D. Smith, (unknown), Jeffrey D. Byers, Chris A. Mack	0
6	Methods for benchmarking photolithography simulators: part III 2005 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Mark D. Smith, (unknown), Jeffrey D. Byers, Chris A. Mack	2
7	Modeling of reactive soluble ARCs and photoresist-ARC interaction 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·John J. Biafore, Mark Neisser, (unknown), Jeffrey D. Byers, (unknown), (unknown)	7
8	Understanding the role of base quenchers in photoresists 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Timothy B. Michaelson, (unknown), Adam R. Pawloski, Jeffrey D. Byers, (unknown), C. Grant Willson	14
9	The impact of mask topography on binary reticles at the 65-nm node 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Mark D. Smith, Jeffrey D. Byers, Chris A. Mack	3
10	Using Interdigitated Electrodes for Measuring Photoacid Generator Kinetics in Chemically Amplified Resists 2004 ·Journal of The Electrochemical Society ·(unknown), Jeffrey D. Byers, Clifford L. Henderson	5
11	Lumped parameter model for chemically amplified resists 2004 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jeffrey D. Byers, Mark D. Smith, Chris A. Mack	6
12	Automatic calibration of lithography simulation parameters using multiple data sets 2002 ·Microelectronic Engineering ·Jeffrey D. Byers, Chris A. Mack, (unknown), (unknown)	8
13	157 nm Resist Materials: A Progress Report. 2000 ·Journal of Photopolymer Science and Technology ·Takashi Chiba, Raymond Hung, Shintaro Yamada, Brian C. Trinque, (unknown), (unknown), (unknown), (unknown), Andrew C. Jamison, (unknown), Mark Somervell, Jeffrey D. Byers, Will Conley, C. Grant Willson	32
14	Study of resolution limits due to intrinsic bias in chemically amplified photoresists 1999 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·(unknown), M. D. Stewart, Hoang V. Tran, (unknown), David R. Medeiros, T. Cao, Jeffrey D. Byers, Stephen E. Webber, (unknown)	51
15	Integration considerations for 193nm photoresists 1999 ·Microelectronic Engineering ·Martin McCallum, Kim Dean, Jeffrey D. Byers	1
16	Improvement of Post-Exposure Delay Stability in Alicyclic ArF Excimer Photoresists 1999 ·Journal of Photopolymer Science and Technology ·(unknown), (unknown), (unknown), Timo Rager, Shintaro Yamada, Jeffrey D. Byers, Patrick J. Paniez, (unknown), (unknown), Pierre-Olivier Sassoulas, C. Grant Willson	4
17	KIT Expression Reveals a Population of Precursor Melanocytes in Human Skin 1996 ·Journal of Investigative Dermatology ·James M. Grichnik, (unknown), James A. Burch, Jeffrey D. Byers, (unknown), Robert E. Clark, Christopher R. Shea	88
18	Consequences of chirality in second-order non-linear spectroscopy at surfaces 1994 ·Faraday Discussions ·Janice M. Hicks, Teresa Petralli-Mallow, Jeffrey D. Byers	52
19	Circular dichroism spectroscopy at interfaces: a surface second harmonic generation study 1993 ·The Journal of Physical Chemistry ·Teresa Petralli-Mallow, (unknown), Jeffrey D. Byers, (unknown), Janice M. Hicks	256
20	The complex CD44 transcriptional unit: Alternative splicing of three internal exons generates the epithelial form of CD44 1992 ·Biochemical and Biophysical Research Communications ·David L. Cooper, Graeme J. Dougherty, Horng‐Jyh Harn, (unknown), (unknown), Jeffrey D. Byers, (unknown), G.N. Phillips, Narayana R. Isola	69

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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