Brian C. Trinque

435 total citations
22 papers, 355 citations indexed

About

Brian C. Trinque is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Brian C. Trinque has authored 22 papers receiving a total of 355 indexed citations (citations by other indexed papers that have themselves been cited), including 18 papers in Electrical and Electronic Engineering, 10 papers in Biomedical Engineering and 5 papers in Surfaces, Coatings and Films. Recurrent topics in Brian C. Trinque's work include Advancements in Photolithography Techniques (17 papers), Nanofabrication and Lithography Techniques (10 papers) and Electron and X-Ray Spectroscopy Techniques (5 papers). Brian C. Trinque is often cited by papers focused on Advancements in Photolithography Techniques (17 papers), Nanofabrication and Lithography Techniques (10 papers) and Electron and X-Ray Spectroscopy Techniques (5 papers). Brian C. Trinque collaborates with scholars based in United States and Bulgaria. Brian C. Trinque's co-authors include C. Grant Willson, Takashi Chiba, Will Conley, Raymond Hung, Shintaro Yamada, Hoang V. Tran, Darı́o L. Goldfarb, Eric K. Lin, Wen‐Li Wu and Ronald L. Jones and has published in prestigious journals such as Science, Macromolecules and Journal of Polymer Science Part B Polymer Physics.

In The Last Decade

Brian C. Trinque

22 papers receiving 327 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Brian C. Trinque United States 10 219 183 84 52 43 22 355
Raymond Hung United States 14 276 1.3× 144 0.8× 121 1.4× 31 0.6× 41 1.0× 33 442
W. Groh Germany 6 184 0.8× 61 0.3× 48 0.6× 25 0.5× 129 3.0× 8 375
Zebo Zhang China 11 182 0.8× 85 0.5× 37 0.4× 14 0.3× 26 0.6× 41 427
W. Olejniczak Poland 11 122 0.6× 54 0.3× 32 0.4× 13 0.3× 31 0.7× 34 322
A. Wolf Germany 9 79 0.4× 129 0.7× 13 0.2× 21 0.4× 33 0.8× 12 277
Yit‐Yian Lua United States 12 225 1.0× 126 0.7× 13 0.2× 27 0.5× 12 0.3× 16 361
Anuja De Silva United States 12 395 1.8× 213 1.2× 53 0.6× 130 2.5× 29 0.7× 47 501
G. Amiard France 11 124 0.6× 71 0.4× 27 0.3× 9 0.2× 15 0.3× 32 388
Osamu Morimoto Japan 10 73 0.3× 43 0.2× 94 1.1× 4 0.1× 27 0.6× 33 373
H. Fujimura Japan 11 122 0.6× 81 0.4× 27 0.3× 27 0.5× 19 0.4× 39 337

Countries citing papers authored by Brian C. Trinque

Since Specialization
Citations

This map shows the geographic impact of Brian C. Trinque's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Brian C. Trinque with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Brian C. Trinque more than expected).

Fields of papers citing papers by Brian C. Trinque

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Brian C. Trinque. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Brian C. Trinque. The network helps show where Brian C. Trinque may publish in the future.

Co-authorship network of co-authors of Brian C. Trinque

This figure shows the co-authorship network connecting the top 25 collaborators of Brian C. Trinque. A scholar is included among the top collaborators of Brian C. Trinque based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Brian C. Trinque. Brian C. Trinque is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Ito, Hiroshi, Brian C. Trinque, Paul H. Kasai, & C. Grant Willson. (2008). Penultimate effect in radical copolymerization of 2‐trifluoromethylacrylates. Journal of Polymer Science Part A Polymer Chemistry. 46(5). 1559–1565. 6 indexed citations
2.
Dickey, Michael D., et al.. (2004). Vinyl ethers in ultraviolet curable formulations for step and flash imprint lithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(1). 131–135. 45 indexed citations
3.
Jones, Ronald L., Tengjiao Hu, Eric K. Lin, et al.. (2004). Formation of deprotected fuzzy blobs in chemically amplified resists. Journal of Polymer Science Part B Polymer Physics. 42(17). 3063–3069. 6 indexed citations
4.
Willson, C. Grant & Brian C. Trinque. (2003). The Evolution of Materials for the Photolithographic Process. Journal of Photopolymer Science and Technology. 16(4). 621–627. 19 indexed citations
5.
Conley, Will, et al.. (2003). Negative photoresist for 157-nm microlithography: a progress report. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 622–622. 2 indexed citations
6.
Sharif, Iqbal, Darryl D. DesMarteau, Larry R. Ford, et al.. (2003). Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 33–33. 2 indexed citations
7.
Burns, Sean, et al.. (2003). Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 1063–1063. 9 indexed citations
8.
Jones, Ronald L., Tengjiao Hu, Vivek M. Prabhu, et al.. (2003). Deprotection volume characteristics and line-edge morphology in chemcially amplified resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5039. 1031–1031. 1 indexed citations
9.
Conley, Will, Daniel A. Miller, Brian C. Trinque, et al.. (2002). Dissolution Inhibitors for 157 nm Lithography: A Progress Report.. Journal of Photopolymer Science and Technology. 15(4). 613–617. 9 indexed citations
10.
Tran, Hoang V., Raymond Hung, Takashi Chiba, et al.. (2002). Metal-Catalyzed Vinyl Addition Polymers for 157 nm Resist Applications. 2. Fluorinated Norbornenes:  Synthesis, Polymerization, and Initial Imaging Results. Macromolecules. 35(17). 6539–6549. 52 indexed citations
11.
Lin, Eric K., Christopher L. Soles, Darı́o L. Goldfarb, et al.. (2002). Direct Measurement of the Reaction Front in Chemically Amplified Photoresists. Science. 297(5580). 372–375. 66 indexed citations
12.
Trinque, Brian C., Takashi Chiba, Raymond Hung, et al.. (2002). Advances in resists for 157-nm microlithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 58–58. 6 indexed citations
13.
Lin, Eric K., Christopher L. Soles, Darı́o L. Goldfarb, et al.. (2002). Measurement of the spatial evolution of the deprotection reaction front with nanometer resolution using neutron reflectometry. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 313–313. 1 indexed citations
14.
Trinque, Brian C., Takashi Chiba, Raymond Hung, et al.. (2002). Recent advances in resists for 157 nm microlithography. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 20(2). 531–536. 11 indexed citations
15.
Willson, C. Grant, Brian C. Trinque, Takashi Chiba, et al.. (2002). The Design of Resist Materials for 157nm Lithography.. Journal of Photopolymer Science and Technology. 15(4). 583–590. 24 indexed citations
16.
Conley, Will, Brian C. Trinque, Daniel A. Miller, et al.. (2002). Negative photoresist for 157-nm microlithography; a progress report. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4690. 94–94. 2 indexed citations
17.
Hung, Raymond, Hoang V. Tran, Brian C. Trinque, et al.. (2001). Resist materials for 157-nm microlithography: an update. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4345. 385–385. 15 indexed citations
18.
Byers, Jeff D., Will Conley, Raymond Hung, et al.. (2000). 157 nm resist materials: Progress report. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3396–3401. 23 indexed citations
19.
Chiba, Takashi, Raymond Hung, Shintaro Yamada, et al.. (2000). 157 nm Resist Materials: A Progress Report.. Journal of Photopolymer Science and Technology. 13(4). 657–664. 32 indexed citations
20.
Trinque, Brian C., et al.. (1998). REVIEWVijay  Krishna, ed.Raj Krishna: Selected Writings. Delhi: Oxford University Press, 1995. Pp. x+1484. $13.00 (cloth).. Economic Development and Cultural Change. 47(1). 228–231. 1 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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