Neal Lafferty

491 total citations
42 papers, 368 citations indexed

About

Neal Lafferty is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Neal Lafferty has authored 42 papers receiving a total of 368 indexed citations (citations by other indexed papers that have themselves been cited), including 38 papers in Electrical and Electronic Engineering, 21 papers in Biomedical Engineering and 13 papers in Surfaces, Coatings and Films. Recurrent topics in Neal Lafferty's work include Advancements in Photolithography Techniques (35 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers) and Nanofabrication and Lithography Techniques (10 papers). Neal Lafferty is often cited by papers focused on Advancements in Photolithography Techniques (35 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers) and Nanofabrication and Lithography Techniques (10 papers). Neal Lafferty collaborates with scholars based in United States, Belgium and Hungary. Neal Lafferty's co-authors include Bruce W. Smith, Markos Trikeriotis, Paul Zimmerman, Emmanuel P. Giannelis, Christopher K. Ober, Evan L. Schwartz, Kafai Lai, Peng Xie, Lars W. Liebmann and Chi‐Chun Liu and has published in prestigious journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena and Symposium on VLSI Technology.

In The Last Decade

Neal Lafferty

38 papers receiving 353 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Neal Lafferty United States 11 293 155 129 68 25 42 368
Han-Ku Cho South Korea 9 381 1.3× 140 0.9× 141 1.1× 45 0.7× 24 1.0× 111 421
Mireille Maenhoudt Belgium 12 419 1.4× 211 1.4× 105 0.8× 42 0.6× 61 2.4× 47 457
Frieda Van Roey Belgium 12 403 1.4× 159 1.0× 191 1.5× 37 0.5× 14 0.6× 45 463
Warren Montgomery United States 10 409 1.4× 186 1.2× 187 1.4× 32 0.5× 19 0.8× 34 463
Daniel Corliss United States 8 212 0.7× 72 0.5× 73 0.6× 107 1.6× 18 0.7× 23 311
Ki‐Ho Baik United States 10 399 1.4× 177 1.1× 96 0.7× 28 0.4× 21 0.8× 90 435
Joo-Tae Moon South Korea 8 311 1.1× 127 0.8× 42 0.3× 147 2.2× 45 1.8× 68 382
Chris Bencher United States 10 361 1.2× 173 1.1× 65 0.5× 168 2.5× 30 1.2× 22 442
Alessandro Vaglio Pret Belgium 12 389 1.3× 98 0.6× 184 1.4× 23 0.3× 14 0.6× 64 408
Huixiong Dai United States 10 388 1.3× 206 1.3× 76 0.6× 205 3.0× 23 0.9× 33 498

Countries citing papers authored by Neal Lafferty

Since Specialization
Citations

This map shows the geographic impact of Neal Lafferty's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Neal Lafferty with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Neal Lafferty more than expected).

Fields of papers citing papers by Neal Lafferty

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Neal Lafferty. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Neal Lafferty. The network helps show where Neal Lafferty may publish in the future.

Co-authorship network of co-authors of Neal Lafferty

This figure shows the co-authorship network connecting the top 25 collaborators of Neal Lafferty. A scholar is included among the top collaborators of Neal Lafferty based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Neal Lafferty. Neal Lafferty is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
2.
Lafferty, Neal, et al.. (2023). EUV full-chip curvilinear mask options for logic via and metal patterning. 18–18. 3 indexed citations
3.
Fenger, Germain, Vicky Philipsen, Neal Lafferty, et al.. (2018). Enabling enhanced EUV lithographic performance using advanced SMO, OPC, and RET. 21–21. 5 indexed citations
4.
Chen, Ao, et al.. (2017). Enhanced OPC recipe coverage and early hotspot detection through automated layout generation and analysis. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 10147. 101470R–101470R. 12 indexed citations
5.
Ma, Yuansheng, J. Andres Torres, James Word, et al.. (2015). Directed self-assembly graphoepitaxy template generation with immersion lithography. Journal of Micro/Nanolithography MEMS and MOEMS. 14(3). 31216–31216. 5 indexed citations
6.
Lafferty, Neal, et al.. (2015). Practical DTCO through design/patterning exploration. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9427. 942710–942710. 5 indexed citations
7.
Lafferty, Neal, et al.. (2015). RET selection on state-of-the-art NAND flash. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9426. 94260L–94260L. 1 indexed citations
8.
Lai, Kafai, Chi‐Chun Liu, Jed W. Pitera, et al.. (2013). Computational aspects of optical lithography extension by directed self-assembly. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8683. 868304–868304. 19 indexed citations
9.
Huang, Wenbin, Daniel Morris, Neal Lafferty, et al.. (2012). <title>Local loops for robust inter-layer routing at sub-20 nm nodes</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8327. 83270D–83270D. 4 indexed citations
10.
Liu, Chi‐Chun, Jed W. Pitera, Neal Lafferty, et al.. (2012). Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8323. 83230X–83230X. 23 indexed citations
11.
Morris, Daniel, Kaushik Vaidyanathan, Neal Lafferty, et al.. (2011). Design of embedded memory and logic based on pattern constructs. Symposium on VLSI Technology. 104–105. 12 indexed citations
12.
Trikeriotis, Markos, Woo Jin Bae, Evan L. Schwartz, et al.. (2010). Development of an inorganic photoresist for DUV, EUV, and electron beam imaging. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7639. 76390E–76390E. 52 indexed citations
13.
Lafferty, Neal, et al.. (2010). Metamaterials for enhancement of DUV lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7640. 76402W–76402W. 1 indexed citations
14.
Lafferty, Neal, et al.. (2007). On the quality of measured optical aberration coefficients using phase wheel monitor. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 65203T–65203T. 3 indexed citations
15.
Lafferty, Neal, et al.. (2007). Mask enhancement using an evanescent wave effect. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6520. 652041–652041. 2 indexed citations
16.
Smith, Bruce W., et al.. (2006). Evanescent wave imaging in optical lithography. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6154. 61540A–61540A. 28 indexed citations
17.
Lafferty, Neal, et al.. (2005). Immersion lithography fluids for high NA 193 nm lithography. 59–59. 17 indexed citations
18.
Lafferty, Neal, et al.. (2004). Immersion microlithography at 193 nm with a Talbot prism interferometer. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5377. 1573–1573. 12 indexed citations
19.
Smith, Bruce W., et al.. (2004). Hyper NA water immersion lithography at 193nm and 248nm. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 22(6). 3439–3443. 7 indexed citations
20.
Smith, Bruce W., et al.. (2004). Approaching the numerical aperture of water immersion lithography at 193-nm. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 15 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact

Breakdown of academic impact, for papers by Han-Ku Cho Breakdown of academic impact, for papers by Mireille Maenhoudt Breakdown of academic impact, for papers by Frieda Van Roey Breakdown of academic impact, for papers by Warren Montgomery Breakdown of academic impact, for papers by Daniel Corliss Breakdown of academic impact, for papers by Ki‐Ho Baik Breakdown of academic impact, for papers by Joo-Tae Moon Breakdown of academic impact, for papers by Chris Bencher Breakdown of academic impact, for papers by Alessandro Vaglio Pret Breakdown of academic impact, for papers by Huixiong Dai
Rankless by CCL
2026