Neal Lafferty
- Electrical and Electronic Engineering
- Biomedical Engineering
- Surfaces, Coatings and Films top 5%
- Materials Chemistry
- Electronic, Optical and Magnetic Materials
- Co-authors
- Bruce W. SmithMarkos TrikeriotisPaul ZimmermanEmmanuel P. GiannelisChristopher K. OberEvan L. SchwartzKafai LaiPeng Xie
- Topics
- Advancements in Photolithography Techniques (35 papers)Integrated Circuits and Semiconductor Failure Analysis (11 papers)Nanofabrication and Lithography Techniques (10 papers)
- Journals
- Journal of Micro/Nanolithography MEMS and MOEMSJournal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and PhenomenaSymposium on VLSI Technology
- Partner nations
- United StatesBelgiumHungary
In The Last Decade
Neal Lafferty
38 papers receiving 353 citations
Peers
Comparison fields: 5 of 39
- Electrical and Electronic Engineering 293
- Biomedical Engineering 155
- Surfaces, Coatings and Films 129
- Materials Chemistry 68
- Electronic, Optical and Magnetic Materials 25
Countries citing papers authored by Neal Lafferty
This map shows the geographic impact of Neal Lafferty's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Neal Lafferty with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Neal Lafferty more than expected).
Fields of papers citing papers by Neal Lafferty
This network shows the impact of papers produced by Neal Lafferty. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Neal Lafferty. The network helps show where Neal Lafferty may publish in the future.
Co-authorship network of co-authors of Neal Lafferty
This figure shows the co-authorship network connecting the top 25 collaborators of Neal Lafferty. A scholar is included among the top collaborators of Neal Lafferty based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Neal Lafferty. Neal Lafferty is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 1 | |
| 2 | 3 | |
| 3 | 5 | |
| 4 | 12 | |
| 5 | 5 | |
| 6 | 5 | |
| 7 | 1 | |
| 8 | 19 | |
| 9 | 4 | |
| 10 | 23 | |
| 11 | Design of embedded memory and logic based on pattern constructs | 12 |
| 12 | 52 | |
| 13 | 1 | |
| 14 | 3 | |
| 15 | 2 | |
| 16 | 28 | |
| 17 | 17 | |
| 18 | 12 | |
| 19 | 7 | |
| 20 | 15 |
About Neal Lafferty
Neal Lafferty is a scholar working on Surfaces, Coatings and Films, Electrical and Electronic Engineering and Biomedical Engineering, having authored 42 papers that have together received 368 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (35 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers) and Nanofabrication and Lithography Techniques (10 papers). The work is most often cited by research in Surfaces, Coatings and Films (129 citations), Electrical and Electronic Engineering (293 citations) and Biomedical Engineering (155 citations). Neal Lafferty has collaborated with scholars based in United States, Belgium and Hungary. Frequent co-authors include Bruce W. Smith, Markos Trikeriotis, Paul Zimmerman, Emmanuel P. Giannelis, Christopher K. Ober, Evan L. Schwartz, Kafai Lai, Peng Xie, Lars W. Liebmann and Chi‐Chun Liu. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena and Symposium on VLSI Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.