Warren Montgomery

592 total citations
34 papers, 463 citations indexed

About

Warren Montgomery is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Biomedical Engineering. According to data from OpenAlex, Warren Montgomery has authored 34 papers receiving a total of 463 indexed citations (citations by other indexed papers that have themselves been cited), including 31 papers in Electrical and Electronic Engineering, 19 papers in Surfaces, Coatings and Films and 7 papers in Biomedical Engineering. Recurrent topics in Warren Montgomery's work include Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Warren Montgomery is often cited by papers focused on Advancements in Photolithography Techniques (31 papers), Integrated Circuits and Semiconductor Failure Analysis (18 papers) and Electron and X-Ray Spectroscopy Techniques (14 papers). Warren Montgomery collaborates with scholars based in United States, Australia and United Kingdom. Warren Montgomery's co-authors include Huixiong Dai, Chris Bencher, Yong Mei Chen, Karen Petrillo, Thomas I. Wallow, Yayi Wei, Robert L. Brainard, Obert R. Wood, Chiew-Seng Koay and Craig Higgins and has published in prestigious journals such as Journal of Polymer Science Part A Polymer Chemistry, Microelectronic Engineering and Journal of Micro/Nanolithography MEMS and MOEMS.

In The Last Decade

Warren Montgomery

33 papers receiving 405 citations

Peers

Countries citing papers authored by Warren Montgomery

Since Specialization

Citations

This map shows the geographic impact of Warren Montgomery's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Warren Montgomery with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Warren Montgomery more than expected).

Fields of papers citing papers by Warren Montgomery

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Warren Montgomery. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Warren Montgomery. The network helps show where Warren Montgomery may publish in the future.

Co-authorship network of co-authors of Warren Montgomery

This figure shows the co-authorship network connecting the top 25 collaborators of Warren Montgomery. A scholar is included among the top collaborators of Warren Montgomery based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Warren Montgomery. Warren Montgomery is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

#	Work	Indexed citations
1	Irresistible Materials multi-trigger resist: the journey towards high volume manufacturing readiness 2017 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Warren Montgomery, (unknown), (unknown), John R. Roth, Alex P. G. Robinson	6
2	Optical critical dimension metrology for directed self-assembly assisted contact hole shrink 2016 ·Journal of Micro/Nanolithography MEMS and MOEMS ·(unknown), (unknown), Erik R. Hosler, Vimal Kamineni, (unknown), (unknown), (unknown), (unknown), (unknown), Prasanna Khare, Warren Montgomery, Alain C. Diebold	19
3	Evaluation of novel processing approaches to improve extreme ultraviolet (EUV) photoresist pattern quality 2015 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), (unknown), Mark Neisser, K. D. Cummings, Warren Montgomery, Takashi Saitō, (unknown), (unknown), (unknown), Andrew Metz, Vinayak Rastogi	3
4	Static and dynamic photoresist shrinkage effects in EUV photoresists 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Benjamin Bunday, (unknown), Warren Montgomery, (unknown)	5
5	Aqueous developable dual switching photoresists for nanolithography 2012 ·Journal of Polymer Science Part A Polymer Chemistry ·Lan Chen, (unknown), Han‐Hao Cheng, Bruce W. Smith, Peng Xie, Warren Montgomery, Andrew K. Whittaker, Idriss Blakey	20
6	Optimization of low-diffusion EUV resist for linewidth roughness and pattern collapse on various substrates 2012 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·James W. Thackeray, James F. Cameron, Michael Wagner, (unknown), (unknown), Warren Montgomery, (unknown), John J. Biafore, (unknown), (unknown)	3
7	The SEMATECH Berkeley MET: extending EUV learning down to 16nm half pitch 2011 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Christopher N. Anderson, (unknown), Paul Denham, Simi George, Kenneth A. Goldberg, Michael Jones, (unknown), Thomas I. Wallow, Warren Montgomery, Patrick Naulleau	4
8	Using synchrotron light to accelerate EUV resist and mask materials learning 2011 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Patrick Naulleau, Christopher N. Anderson, (unknown), Paul Denham, Simi George, Kenneth A. Goldberg, (unknown), (unknown), (unknown), Iacopo Mochi, Warren Montgomery, (unknown), Tom Wallow	2
9	Non-chemically amplified resists for 193-nm immersion lithography: influence of absorbance on performance 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Lan Chen, (unknown), (unknown), Bruce W. Smith, Warren Montgomery, Paul Zimmerman, Idriss Blakey, Andrew K. Whittaker	5
10	Characterization of promising resist platforms for sub-30-nm HP manufacturability and EUV CAR extendibility study 2010 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Jacque H. Georger, (unknown), (unknown), Frank Goodwin, Stefan Wurm, (unknown), Warren Montgomery, (unknown), (unknown), Patrick Naulleau	16
11	22-nm Half-pitch extreme ultraviolet node development at the SEMATECH Berkeley microfield exposure tool 2009 ·Microelectronic Engineering ·Patrick Naulleau, Christopher N. Anderson, (unknown), Paul Denham, Simi George, Kenneth A. Goldberg, Michael Goldstein, (unknown), (unknown), (unknown), (unknown), Bruno La Fontaine, Andy Ma, Warren Montgomery, (unknown), (unknown), Tom Wallow, Stefan Wurm	26
12	Pushing extreme ultraviolet lithography development beyond 22 nm half pitch 2009 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Patrick Naulleau, Christopher N. Anderson, (unknown), Paul Denham, Simi George, Kenneth A. Goldberg, Michael Goldstein, (unknown), (unknown), (unknown), Bruno La Fontaine, Warren Montgomery, Tom Wallow	6
13	Reflection control for line features of multiple pitches at hyper NA 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Michael Wagner, Warren Montgomery, (unknown), Stewart A. Robertson	2
14	22nm half-pitch patterning by CVD spacer self alignment double patterning (SADP) 2008 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Chris Bencher, Yong Mei Chen, Huixiong Dai, Warren Montgomery, (unknown)	101
15	Are extreme ultraviolet resists ready for the 32nm node? 2007 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Karen Petrillo, Yayi Wei, Robert L. Brainard, Gregory Denbeaux, Darı́o L. Goldfarb, Chiew-Seng Koay, (unknown), Warren Montgomery, (unknown), Thomas I. Wallow, Obert R. Wood	5
16	Immersion lithography defectivity analysis at DUV inspection wavelength 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), Doron Meshulach, (unknown), Junho Yeo, (unknown), (unknown), Christian Schwarz, (unknown), Warren Montgomery	2
17	Implementation and characterization of a DUV raster-scanned mask pattern generation system 2002 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), Warren Montgomery	2
18	<title>Shot-size reduction of photoresist formulations</title> 1995 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Wayne M. Moreau, (unknown), (unknown), (unknown), Warren Montgomery, (unknown), (unknown), (unknown)	2
19	Ultrasensitive chemically amplified resist systems 1991 ·Microelectronic Engineering ·Harbans S. Sachdev, William R. Brunsvold, (unknown), Warren Montgomery, Wayne M. Moreau, (unknown), (unknown), Willard E. Conley	4
20	Sensitivity enhancers for chemically amplified resists 1990 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·William R. Brunsvold, (unknown), Warren Montgomery, Wayne M. Moreau, Harbans S. Sachdev, (unknown)	6

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact