William J. Durand

2.2k total citations · 1 hit paper
21 papers, 2.0k citations indexed

About

William J. Durand is a scholar working on Materials Chemistry, Organic Chemistry and Electrical and Electronic Engineering. According to data from OpenAlex, William J. Durand has authored 21 papers receiving a total of 2.0k indexed citations (citations by other indexed papers that have themselves been cited), including 19 papers in Materials Chemistry, 9 papers in Organic Chemistry and 9 papers in Electrical and Electronic Engineering. Recurrent topics in William J. Durand's work include Block Copolymer Self-Assembly (17 papers), Advanced Polymer Synthesis and Characterization (9 papers) and Machine Learning in Materials Science (5 papers). William J. Durand is often cited by papers focused on Block Copolymer Self-Assembly (17 papers), Advanced Polymer Synthesis and Characterization (9 papers) and Machine Learning in Materials Science (5 papers). William J. Durand collaborates with scholars based in United States, Denmark and Belgium. William J. Durand's co-authors include Jens K. Nørskov, Andrew A. Peterson, Frank Abild‐Pedersen, Felix Studt, C. Grant Willson, Christopher J. Ellison, Michael J. Maher, Gregory Blachut, Christopher M. Bates and Søren Dahl and has published in prestigious journals such as Science, Chemistry of Materials and Macromolecules.

In The Last Decade

William J. Durand

20 papers receiving 2.0k citations

Hit Papers

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What are hit papers?

Hit papers significantly outperform the citation benchmark for their cohort. A paper qualifies if it has ≥500 total citations, achieves ≥1.5× the top-1% citation threshold for papers in the same subfield and year (this is the minimum needed to enter the top 1%, not the average within it), or reaches the top citation threshold in at least one of its specific research topics.

The importance of surface morphology in controlling the selectivity of polycrystalline copper for CO2 electroreduction

2011 610 citations Wei Tang, Andrew A. Peterson et al. Physical Chemistry Chemical Physics profile →

Peers

Countries citing papers authored by William J. Durand

Since Specialization

Citations

This map shows the geographic impact of William J. Durand's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by William J. Durand with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites William J. Durand more than expected).

Fields of papers citing papers by William J. Durand

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by William J. Durand. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by William J. Durand. The network helps show where William J. Durand may publish in the future.

Co-authorship network of co-authors of William J. Durand

This figure shows the co-authorship network connecting the top 25 collaborators of William J. Durand. A scholar is included among the top collaborators of William J. Durand based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with William J. Durand. William J. Durand is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Plasma and photon interactions with organosilicon polymers for directed self-assembly patterning applications 2016 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·(unknown), Stephen M. Sirard, William J. Durand, Gregory Blachut, (unknown), (unknown), Christopher J. Ellison, C. Grant Willson, David B. Graves	11
2	A Hybrid Chemo-/Grapho-Epitaxial Alignment Strategy for Defect Reduction in Sub-10 nm Directed Self-Assembly of Silicon-Containing Block Copolymers 2016 ·Chemistry of Materials ·Gregory Blachut, Stephen M. Sirard, Michael J. Maher, Yusuke Asano, (unknown), Austin P. Lane, William J. Durand, Christopher M. Bates, (unknown), Roel Gronheid, (unknown), Christopher J. Ellison, C. Grant Willson	27
3	Pattern Transfer of Sub-10 nm Features via Tin-Containing Block Copolymers 2016 ·ACS Macro Letters ·Michael J. Maher, (unknown), Stephen M. Sirard, (unknown), Christopher M. Bates, (unknown), Gregory Blachut, Austin P. Lane, William J. Durand, Matthew C. Carlson, (unknown), Christopher J. Ellison, C. Grant Willson	24
4	Interactions between plasma and block copolymers used in directed self-assembly patterning 2016 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Stephen M. Sirard, (unknown), (unknown), William J. Durand, Michael J. Maher, (unknown), Gregory Blachut, Dustin W. Janes, Yusuke Asano, (unknown), (unknown), David B. Graves, Christopher J. Ellison, C. Grant Willson	8
5	Plasma etch of block copolymers for lithography 2016 ·SPIE Newsroom ·Stephen M. Sirard, (unknown), (unknown), William J. Durand, Michael J. Maher, (unknown), Gregory Blachut, Dustin W. Janes, Yusuke Asano, (unknown), (unknown), David B. Graves, Chris Ellison, Grant Willson	2
6	Directed self assembly of block copolymers using chemical patterns with sidewall guiding lines, backfilled with random copolymer brushes 2015 ·Soft Matter ·(unknown), William J. Durand, Christopher J. Ellison, C. Grant Willson, Venkat Ganesan	18
7	Directed Self-Assembly of Silicon-Containing Block Copolymer Thin Films 2015 ·ACS Applied Materials & Interfaces ·Michael J. Maher, Charles Rettner, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, William J. Durand, Christopher J. Ellison, Daniel P. Sanders, Joy Cheng, C. Grant Willson	68
8	Experimental and Modeling Study of Domain Orientation in Confined Block Copolymer Thin Films 2015 ·Macromolecules ·William J. Durand, Matthew C. Carlson, Michael J. Maher, Gregory Blachut, (unknown), (unknown), Venkat Ganesan, Christopher J. Ellison, C. Grant Willson	34
9	Interfacial Layers with Photoswitching Surface Energy for Block Copolymer Alignment and Directed Self-Assembly 2015 ·Journal of Photopolymer Science and Technology ·Michael J. Maher, Christopher M. Bates, William J. Durand, Gregory Blachut, Dustin W. Janes, Joy Cheng, Daniel P. Sanders, C. Grant Willson, Christopher J. Ellison	4
10	A Study of Tin-containing Block Copolymers 2014 ·Journal of Photopolymer Science and Technology ·(unknown), Gregory Blachut, Christopher M. Bates, Michael J. Maher, (unknown), Stephen M. Sirard, William J. Durand, Christopher J. Ellison, C. Grant Willson	5
11	Photopatternable Interfaces for Block Copolymer Lithography 2014 ·ACS Macro Letters ·Michael J. Maher, Christopher M. Bates, Gregory Blachut, Matthew C. Carlson, Jeffrey L. Self, Dustin W. Janes, William J. Durand, Austin P. Lane, Christopher J. Ellison, C. Grant Willson	50
12	Interfacial Design for Block Copolymer Thin Films 2014 ·Chemistry of Materials ·Michael J. Maher, Christopher M. Bates, Gregory Blachut, Stephen M. Sirard, Jeffrey L. Self, Matthew C. Carlson, Leon M. Dean, Julia D. Cushen, William J. Durand, (unknown), Christopher J. Ellison, C. Grant Willson	99
13	Design of high‐χ block copolymers for lithography 2014 ·Journal of Polymer Science Part A Polymer Chemistry ·William J. Durand, Gregory Blachut, Michael J. Maher, Stephen M. Sirard, (unknown), Matthew C. Carlson, Yusuke Asano, Sunshine X. Zhou, Austin P. Lane, Christopher M. Bates, Christopher J. Ellison, C. Grant Willson	138
14	Polarity-switching Top Coats for Silicon-containing Block Copolymer Orientation Control 2013 ·Journal of Photopolymer Science and Technology ·Christopher M. Bates, Michael J. Maher, (unknown), Leon M. Dean, Julia D. Cushen, William J. Durand, (unknown), (unknown), Christopher J. Ellison, C. Grant Willson	4
15	Block Copolymer Orientation Control Using a Top-Coat Surface Treatment 2012 ·Journal of Photopolymer Science and Technology ·Takehiro Seshimo, Christopher M. Bates, Leon M. Dean, Julia D. Cushen, William J. Durand, Michael J. Maher, Christopher J. Ellison, C. Grant Willson	14
16	Self-aligned patterning on a flexible substrate using a dual-tone, thermally activated photoresist 2012 ·Journal of Vacuum Science & Technology B Nanotechnology and Microelectronics Materials Processing Measurement and Phenomena ·(unknown), Brandon Rawlings, (unknown), Daniel J. Hellebusch, William J. Durand, C. Grant Willson	1
17	Polarity-Switching Top Coats Enable Orientation of Sub–10-nm Block Copolymer Domains 2012 ·Science ·Christopher M. Bates, Takehiro Seshimo, Michael J. Maher, William J. Durand, Julia D. Cushen, Leon M. Dean, Gregory Blachut, Christopher J. Ellison, C. Grant Willson	344
18	The importance of surface morphology in controlling the selectivity of polycrystalline copper for CO2 electroreduction breakdown → 2011 ·Physical Chemistry Chemical Physics ·Wei Tang, Andrew A. Peterson, Ana Sofía Varela, Zarko P. Jovanov, Lone Bech, William J. Durand, Søren Dahl, Jens K. Nørskov, Ib Chorkendorff	610
19	Structure effects on the energetics of the electrochemical reduction of CO2 by copper surfaces 2011 ·Surface Science ·William J. Durand, Andrew A. Peterson, Felix Studt, Frank Abild‐Pedersen, Jens K. Nørskov	491
20	Fundamental study of optical threshold layer approach towards double exposure lithography 2009 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·(unknown), (unknown), (unknown), (unknown), (unknown), (unknown), Toshiyuki Ogata, William J. Durand, (unknown), (unknown), Steffen Jockusch, Paul Zimmerman, Nicholas J. Turro, C. Grant Willson	1

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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