Jeff D. Byers

537 total citations
47 papers, 400 citations indexed

About

Jeff D. Byers is a scholar working on Electrical and Electronic Engineering, Biomedical Engineering and Surfaces, Coatings and Films. According to data from OpenAlex, Jeff D. Byers has authored 47 papers receiving a total of 400 indexed citations (citations by other indexed papers that have themselves been cited), including 35 papers in Electrical and Electronic Engineering, 16 papers in Biomedical Engineering and 12 papers in Surfaces, Coatings and Films. Recurrent topics in Jeff D. Byers's work include Advancements in Photolithography Techniques (33 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Nanofabrication and Lithography Techniques (8 papers). Jeff D. Byers is often cited by papers focused on Advancements in Photolithography Techniques (33 papers), Electron and X-Ray Spectroscopy Techniques (11 papers) and Nanofabrication and Lithography Techniques (8 papers). Jeff D. Byers collaborates with scholars based in United States, Bulgaria and Israel. Jeff D. Byers's co-authors include Chris A. Mack, John S. Petersen, C. Grant Willson, John L. Sturtevant, Robert Furstenberg, Christopher A. Kendziora, Michael R. Papantonakis, Daniel A. Miller, R. Andrew McGill and Mark D. Smith and has published in prestigious journals such as Biophysical Journal, Nature Physics and AIP Advances.

In The Last Decade

Jeff D. Byers

47 papers receiving 342 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Jeff D. Byers United States 12 285 148 97 48 38 47 400
Scott Halle United States 13 306 1.1× 74 0.5× 92 0.9× 144 3.0× 182 4.8× 59 521
Timothy F. Crimmins United States 9 122 0.4× 101 0.7× 25 0.3× 28 0.6× 162 4.3× 13 324
R. J. Winfield Ireland 12 129 0.5× 140 0.9× 20 0.2× 36 0.8× 130 3.4× 31 320
Xiaoyun Pu China 12 269 0.9× 113 0.8× 12 0.1× 38 0.8× 163 4.3× 58 390
Guo Xia China 11 89 0.3× 123 0.8× 20 0.2× 41 0.9× 32 0.8× 40 337
A. Wig United States 13 218 0.8× 241 1.6× 36 0.4× 24 0.5× 235 6.2× 26 499
Steven A. Henck United States 14 206 0.7× 221 1.5× 66 0.7× 79 1.6× 254 6.7× 26 647
Swetha Kamlapurkar United States 16 653 2.3× 120 0.8× 22 0.2× 108 2.3× 209 5.5× 39 756
William P. Acker United States 12 138 0.5× 108 0.7× 9 0.1× 61 1.3× 168 4.4× 22 445

Countries citing papers authored by Jeff D. Byers

Since Specialization
Citations

This map shows the geographic impact of Jeff D. Byers's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Jeff D. Byers with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Jeff D. Byers more than expected).

Fields of papers citing papers by Jeff D. Byers

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Jeff D. Byers. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Jeff D. Byers. The network helps show where Jeff D. Byers may publish in the future.

Co-authorship network of co-authors of Jeff D. Byers

This figure shows the co-authorship network connecting the top 25 collaborators of Jeff D. Byers. A scholar is included among the top collaborators of Jeff D. Byers based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Jeff D. Byers. Jeff D. Byers is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Byers, Jeff D., Ruben Schupp, Z. Mazzotta, et al.. (2021). The spectrum of a 1- μ m-wavelength-driven tin microdroplet laser-produced plasma source in the 5.5–265.5 nm wavelength range. AIP Advances. 11(12). 9 indexed citations
2.
Byers, Jeff D.. (2017). The physics of data. Nature Physics. 13(8). 718–719. 9 indexed citations
3.
Kendziora, Christopher A., et al.. (2015). Infrared photothermal imaging spectroscopy for detection of trace explosives on surfaces. Applied Optics. 54(31). F129–F129. 26 indexed citations
4.
Kendziora, Christopher A., R. Andrew McGill, Robert Furstenberg, et al.. (2015). Detecting traces of explosives. SPIE Newsroom. 3 indexed citations
5.
Kendziora, Christopher A., Robert Furstenberg, Michael R. Papantonakis, et al.. (2015). Detection of trace explosives on relevant substrates using a mobile platform for photothermal infrared imaging spectroscopy (PT-IRIS). Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9467. 94672R–94672R. 5 indexed citations
6.
Emmert, J. T., et al.. (2014). Propagation of Forecast Errors from the Sun to LEO Trajectories: How Does Drag Uncertainty Affect Conjunction Frequency?. Advanced Maui Optical and Space Surveillance Technologies Conference. 10 indexed citations
7.
Raphael, Marc P., Joseph A. Christodoulides, James B. Delehanty, James P. Long, & Jeff D. Byers. (2014). Quantitative Imaging of Protein Secretions from Single Cells in Real Time. Biophysical Journal. 106(2). 607a–607a. 2 indexed citations
8.
Byers, Jeff D., et al.. (2008). Continuing 193nm optical lithography for 32nm imaging and beyond. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6924. 69242I–69242I. 1 indexed citations
9.
Zimmerman, Paul, Bryan J. Rice, Jeff D. Byers, et al.. (2007). Status of High-Index Materials for Generation-Three 193nm Immersion Lithography. Journal of Photopolymer Science and Technology. 20(5). 643–650. 12 indexed citations
10.
Bunday, Benjamin, et al.. (2007). SEM metrology for advanced lithographies. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 6518. 65182B–65182B. 6 indexed citations
11.
Mack, Chris A. & Jeff D. Byers. (2003). New model for focus-exposure data analysis. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 5038. 396–396. 13 indexed citations
12.
Smith, Mark D., Jeff D. Byers, & Chris A. Mack. (2002). Comparison between the process windows calculated with full and simplified resist models. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 4691. 1199–1199. 8 indexed citations
13.
Hung, Raymond, Shintaro Yamada, Mark Somervell, et al.. (2000). Polymers for 157-nm photoresist applications: a progress report. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 365–365. 19 indexed citations
14.
Yamada, Shintaro, et al.. (2000). Design and study of aqueous processable positive-tone photoresists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 569–569. 2 indexed citations
15.
Byers, Jeff D., Will Conley, Raymond Hung, et al.. (2000). 157 nm resist materials: Progress report. Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena. 18(6). 3396–3401. 23 indexed citations
16.
Padmanaban, Munirathna, et al.. (2000). Application of photodecomposable base concept to 193-nm resists. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3999. 1136–1136. 1 indexed citations
17.
Sundararajan, Narayan, Kenji Ogino, Suresh Valiyaveettil, et al.. (1999). Block copolymers as additives: a route to enhanced resist performance. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3678. 78–78. 2 indexed citations
18.
Okoroanyanwu, Uzodinma, et al.. (1998). Improving the performance of 193-nm photoresists based on alicyclic polymers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 3333. 425–425. 16 indexed citations
19.
Petersen, John S. & Jeff D. Byers. (1996). Examination of isolated and grouped feature bias in positive-acting chemically amplified resist systems. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2724. 163–163. 11 indexed citations
20.
Petersen, John S., Chris A. Mack, James W. Thackeray, et al.. (1995). <title>Characterization and modeling of a positive-acting chemically amplified resist</title>. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 2438. 153–166. 22 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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