S. Vanhaelemeersch

889 citations

60 papers · 680 indexed · h-index 13

Electronic, Optical and Magnetic Materials top 10%
- Copper Interconnects and Reliability 34
Electrical and Electronic Engineering top 10%
- Semiconductor materials and devices 46
- Advancements in Photolithography Techniques 8
- Advancements in Semiconductor Devices and Circuit Design 8
- Integrated Circuits and Semiconductor Failure Analysis 5
- Plasma Diagnostics and Applications 5
Mechanics of Materials top 5%
- Metal and Thin Film Mechanics 14
Ceramics and Composites
Surfaces, Coatings and Films
Biomedical Engineering
- Advanced Surface Polishing Techniques 8

Co-authors: Mikhaı̈l R. Baklanov Karen Maex Denis Shamiryan Jozef Peeters Werner Boullart Herbert Struyf Zs. Tôkei Gerald Beyer
Cited by: Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering Mechanics of Materials
Journals: Journal of Applied Physics (2 papers)Journal of The Electrochemical Society (3 papers)Langmuir (1 paper)
Partner nations: Belgium United States Netherlands

In The Last Decade

S. Vanhaelemeersch

56 papers receiving 660 citations

Peers

Countries citing papers authored by S. Vanhaelemeersch

Since Specialization

Citations

This map shows the geographic impact of S. Vanhaelemeersch's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Vanhaelemeersch with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Vanhaelemeersch more than expected).

Fields of papers citing papers by S. Vanhaelemeersch

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Vanhaelemeersch. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Vanhaelemeersch. The network helps show where S. Vanhaelemeersch may publish in the future.

Co-authorship network

The 25 scholars most cited alongside S. Vanhaelemeersch, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with S. Vanhaelemeersch Line = papers co-authored together S. Vanhaelemeersch links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	Novel patterning shrink technique enabling sub-50 nm trench and contact integration S. Demuynck,Zs. Tôkei,Chao Zhao,Jean‐François de Marneffe,Herbert Struyf,Werner Boullart,M. Op de Beeck,L. Carbonell,N. Heylen,Jan Vaes,Gerald Beyer,S. Vanhaelemeersch,Reza Sadjadi,Helen Zhu,Peter Cirigliano,J.S. Kim,Johan Vertommen,B. Coenegrachts,Elizabeth G. Pavel,Amulya Athayde	2007	1
2	A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Maaike Op de Beeck,Janko Versluijs,Zsolt Tökei,S. Demuynck,Jean‐François de Marneffe,Werner Boullart,S. Vanhaelemeersch,Helen Zhu,Peter Cirigliano,Elizabeth G. Pavel,Reza Sadjadi,Jisoo Kim	2007	4
3	Influence of crystallographic orientation on etch properties of TiN Lirias (KU Leuven) ·Dries Dictus,Denis Shamiryan,Vasile Paraschiv,Werner Boullart,Stefan De Gendt,S. Vanhaelemeersch	2006	1
4	Effect of Surfactant as Additive in Wet Clean Solutions on Properties of Low-k Materials Electrochemical and Solid-State Letters ·Quoc Toan Le,V. Jeannot,Mikhaı̈l R. Baklanov,Rudi Vanderheyden,Werner Boullart,S. Vanhaelemeersch	2006	2
5	Low-damage damascene patterning of SiOC(H) low-k dielectrics Herbert Struyf,D. Hendrickx,J. Van Olmen,Francesca Iacopi,Olivier Richard,Youssef Travaly,M. Van Hove,Werner Boullart,S. Vanhaelemeersch	2005	4
6	Removal of Plasma-Modified Low-k Layer Using Dilute HF: Influence of Concentration Electrochemical and Solid-State Letters ·Quoc Toan Le,Mikhaı̈l R. Baklanov,E. Kesters,Ammar Azioune,Herbert Struyf,Werner Boullart,J. J. Pireaux,S. Vanhaelemeersch	2005	32
7	Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Denis Shamiryan,Vasile Paraschiv,S. Locorotondo,S. Beckx,Werner Boullart,S. Vanhaelemeersch	2005	2
8	HF Based Solutions for HfO<sub>2</sub> Removal; Effect of pH and Temperature on HfO<sub>2</sub>: SiO<sub>2</sub> Etch Selectivity Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Vasile Paraschiv,Martine Claes,Mikhaı̈l R. Baklanov,Werner Boullart,Stefan De Gendt,S. Vanhaelemeersch	2005	0
9	Plasma Modification of Porous Low-k Dielectrics Electrochemical and Solid-State Letters ·Quoc Toan Le,Caroline M. Whelan,Herbert Struyf,H. Bender,Thierry Conard,Sywert Brongersma,Werner Boullart,S. Vanhaelemeersch,Karen Maex	2004	12
10	Low-k materials etch and strip optimization for sub 0.25 μm technology Tianzhi Gao,William D. Gray,M. Van Hove,Erik Rosseel,Herbert Struyf,H. Meynen,S. Vanhaelemeersch,Karen Maex	2003	1
11	Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson Highlands<sup>TM</sup> Chamber Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·G. Mannaert,Marc van Cauwenberghe,M. Schmidt,Jan Van Aelst,D. Hendrickx,Michele Stucchi,Thierry Conard,S. Vanhaelemeersch,Werner Boullart	2003	1
12	Process Optimization and Integration of Trimethylsilane-Deposited α-SiC:H and α-SiCO:H Dielectric Thin Films for Damascene Processing Journal of The Electrochemical Society ·William D. Gray,Mark J. Loboda,J. N. Bremmer,Herbert Struyf,Muriel Lepage,M. Van Hove,R. A. Donaton,Erik Sleeckx,Michele Stucchi,Filip Lanckmans,Tian Gao,Werner Boullart,B. Coenegrachts,Mireille Maenhoudt,S. Vanhaelemeersch,H. Meynen,Karen Maex	2003	11
13	Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films R. A. Donaton,Francesca Iacopi,Mikhaı̈l R. Baklanov,Denis Shamiryan,B. Coenegrachts,Herbert Struyf,Muriel Lepage,Marc Meuris,M. Van Hove,William D. Gray,H. Meynen,David De Roest,S. Vanhaelemeersch,Karen Maex	2002	3
14	Reduction of plasma process-induced damage during gate poly etching by using a SiO/sub 2/ hard mask H.C. Lee,M. Creusen,G. Groeseneken,S. Vanhaelemeersch	2002	1
15	Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film Microelectronic Engineering ·Youssef Travaly,B. Eyckens,L. Carbonel,A. Rothschild,Quoc Toan Le,Sywert Brongersma,Ivan Ciofi,Herbert Struyf,Yoshiaki Furukawa,Michele Stucchi,Marc Schaekers,H. Bender,Erik Rosseel,S. Vanhaelemeersch,Karen Maex,F. Gaillard,L. Van Autryve,Patrick Rabinzohn	2002	2
16	Optimization of etching and stripping chemistries for Z3MS/sup TM/ Low-k Muriel Lepage,Denis Shamiryan,Mikhaı̈l R. Baklanov,Herbert Struyf,G. Mannaert,S. Vanhaelemeersch,Ken Weidner,H. Meynen	2001	6
17	Characterization of Cu surface cleaning by hydrogen plasma Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Mikhaı̈l R. Baklanov,Denis Shamiryan,Zs. Tôkei,Gerald Beyer,T. Conard,S. Vanhaelemeersch,Karen Maex	2001	81
18	High Q inductor add-on module in thick Cu/SiLK/sup TM/ single damascene S. Jenei,Stefaan Decoutere,Gillis Winderickx,Herbert Struyf,Zsolt Tökei,I. Vervoort,Ingrid Vos,Patrick Jaenen,L. Carbonell,Brice De Jaeger,R. A. Donaton,S. Vanhaelemeersch,Karen Maex,Bart Nauwelaers	2001	17
19	Characterisation of plasma etch releted residues formed on top of ECD Cu films Mikhaı̈l R. Baklanov,Thierry Conard,Filip Lanckmans,S. Vanhaelemeersch,D.R. Holmes,Karen Maex	1999	1
20	Post-Etch Cleaning after Dry Etching the Emitter Windows to Improve the Bipolar Characteristics in a 0.5μm BiCMOS Process European Solid-State Device Research Conference ·Stefaan Decoutere,S. Vanhaelemeersch,L. Deferm,F. Vleugels,G. Vancuyck	1994	1

About S. Vanhaelemeersch

S. Vanhaelemeersch is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Mechanics of Materials, having authored 60 papers that have together received 680 indexed citations. Recurring topics across this work include Semiconductor materials and devices (46 papers), Copper Interconnects and Reliability (34 papers), Metal and Thin Film Mechanics (14 papers), Advancements in Photolithography Techniques (8 papers), Advanced Surface Polishing Techniques (8 papers), Advancements in Semiconductor Devices and Circuit Design (8 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers) and Plasma Diagnostics and Applications (5 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (374 citations), Electrical and Electronic Engineering (533 citations) and Mechanics of Materials (204 citations). S. Vanhaelemeersch has collaborated with scholars based in Belgium, United States and Netherlands. Frequent co-authors include Mikhaı̈l R. Baklanov, Karen Maex, Denis Shamiryan, Jozef Peeters, Werner Boullart, Herbert Struyf, Zs. Tôkei, Gerald Beyer, T. Conard and Quoc Toan Le. Their work appears in journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Langmuir.

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