S. Vanhaelemeersch

889 citations

60 papers · 680 indexed · h-index 13

Co-authors: Mikhaı̈l R. Baklanov Karen Maex Denis Shamiryan Jozef Peeters Werner Boullart Herbert Struyf Zs. Tôkei Gerald Beyer
Topics: Semiconductor materials and devices (46 papers)Copper Interconnects and Reliability (34 papers)Metal and Thin Film Mechanics (14 papers)
Cited by: Electronic, Optical and Magnetic Materials Electrical and Electronic Engineering Mechanics of Materials
Journals: Journal of Applied Physics Journal of The Electrochemical Society Langmuir
Partner nations: Belgium United States Netherlands

In The Last Decade

S. Vanhaelemeersch

56 papers receiving 660 citations

Peers

Countries citing papers authored by S. Vanhaelemeersch

Since Specialization

Citations

This map shows the geographic impact of S. Vanhaelemeersch's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by S. Vanhaelemeersch with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites S. Vanhaelemeersch more than expected).

Fields of papers citing papers by S. Vanhaelemeersch

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by S. Vanhaelemeersch. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by S. Vanhaelemeersch. The network helps show where S. Vanhaelemeersch may publish in the future.

Co-authorship network of co-authors of S. Vanhaelemeersch

This figure shows the co-authorship network connecting the top 25 collaborators of S. Vanhaelemeersch. A scholar is included among the top collaborators of S. Vanhaelemeersch based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with S. Vanhaelemeersch. S. Vanhaelemeersch is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	Novel patterning shrink technique enabling sub-50 nm trench and contact integration 2007 ·S. Demuynck,Zs. Tôkei,Chao Zhao,Jean‐François de Marneffe,Herbert Struyf,Werner Boullart,(unknown),L. Carbonell,N. Heylen,Jan Vaes,Gerald Beyer,S. Vanhaelemeersch,Reza Sadjadi,(unknown),(unknown),(unknown),(unknown),(unknown),Elizabeth G. Pavel,(unknown)	1
2	A novel plasma-assisted shrink process to enlarge process windows of narrow trenches and contacts for 45-nm node applications and beyond 2007 ·Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Maaike Op de Beeck,Janko Versluijs,Zsolt Tökei,S. Demuynck,Jean‐François de Marneffe,Werner Boullart,S. Vanhaelemeersch,(unknown),(unknown),Elizabeth G. Pavel,Reza Sadjadi,Jisoo Kim	4
3	Influence of crystallographic orientation on etch properties of TiN 2006 ·Lirias (KU Leuven) ·(unknown),Denis Shamiryan,Vasile Paraschiv,Werner Boullart,Stefan De Gendt,S. Vanhaelemeersch	1
4	Effect of Surfactant as Additive in Wet Clean Solutions on Properties of Low-k Materials 2006 ·Electrochemical and Solid-State Letters ·Quoc Toan Le,(unknown),Mikhaı̈l R. Baklanov,(unknown),Werner Boullart,S. Vanhaelemeersch	2
5	Low-damage damascene patterning of SiOC(H) low-k dielectrics 2005 ·Herbert Struyf,(unknown),J. Van Olmen,Francesca Iacopi,Olivier Richard,Youssef Travaly,M. Van Hove,Werner Boullart,S. Vanhaelemeersch	4
6	Removal of Plasma-Modified Low-k Layer Using Dilute HF: Influence of Concentration 2005 ·Electrochemical and Solid-State Letters ·Quoc Toan Le,Mikhaı̈l R. Baklanov,(unknown),Ammar Azioune,Herbert Struyf,Werner Boullart,J. J. Pireaux,S. Vanhaelemeersch	32
7	Influence of oxide hard mask on profiles of sub-100 nm Si and SiGe gates 2005 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Denis Shamiryan,Vasile Paraschiv,S. Locorotondo,S. Beckx,Werner Boullart,S. Vanhaelemeersch	2
8	HF Based Solutions for HfO<sub>2</sub> Removal; Effect of pH and Temperature on HfO<sub>2</sub>: SiO<sub>2</sub> Etch Selectivity 2005 ·Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Vasile Paraschiv,Martine Claes,Mikhaı̈l R. Baklanov,Werner Boullart,Stefan De Gendt,S. Vanhaelemeersch	0
9	Plasma Modification of Porous Low-k Dielectrics 2004 ·Electrochemical and Solid-State Letters ·Quoc Toan Le,Caroline M. Whelan,Herbert Struyf,H. Bender,Thierry Conard,Sywert Brongersma,Werner Boullart,S. Vanhaelemeersch,Karen Maex	12
10	Low-k materials etch and strip optimization for sub 0.25 μm technology 2003 ·(unknown),William D. Gray,M. Van Hove,Erik Rosseel,Herbert Struyf,(unknown),S. Vanhaelemeersch,Karen Maex	1
11	Resist Strip and Cu Diffusion Barrier Etch in Cu BEOL Integration Schemes in a Mattson Highlands<sup>TM</sup> Chamber 2003 ·Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·G. Mannaert,(unknown),M. Schmidt,(unknown),(unknown),Michele Stucchi,Thierry Conard,S. Vanhaelemeersch,Werner Boullart	1
12	Process Optimization and Integration of Trimethylsilane-Deposited α-SiC:H and α-SiCO:H Dielectric Thin Films for Damascene Processing 2003 ·Journal of The Electrochemical Society ·William D. Gray,Mark J. Loboda,(unknown),Herbert Struyf,Muriel Lepage,M. Van Hove,R. A. Donaton,Erik Sleeckx,Michele Stucchi,(unknown),Tian Gao,Werner Boullart,(unknown),Mireille Maenhoudt,S. Vanhaelemeersch,(unknown),Karen Maex	11
13	Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films 2002 ·R. A. Donaton,Francesca Iacopi,Mikhaı̈l R. Baklanov,Denis Shamiryan,(unknown),Herbert Struyf,Muriel Lepage,Marc Meuris,M. Van Hove,William D. Gray,(unknown),David De Roest,S. Vanhaelemeersch,Karen Maex	3
14	Reduction of plasma process-induced damage during gate poly etching by using a SiO/sub 2/ hard mask 2002 ·(unknown),(unknown),G. Groeseneken,S. Vanhaelemeersch	1
15	Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film 2002 ·Microelectronic Engineering ·Youssef Travaly,B. Eyckens,(unknown),A. Rothschild,Quoc Toan Le,Sywert Brongersma,Ivan Ciofi,Herbert Struyf,Yoshiaki Furukawa,Michele Stucchi,Marc Schaekers,H. Bender,Erik Rosseel,S. Vanhaelemeersch,Karen Maex,F. Gaillard,(unknown),(unknown)	2
16	Optimization of etching and stripping chemistries for Z3MS/sup TM/ Low-k 2001 ·Muriel Lepage,Denis Shamiryan,Mikhaı̈l R. Baklanov,Herbert Struyf,G. Mannaert,S. Vanhaelemeersch,(unknown),(unknown)	6
17	Characterization of Cu surface cleaning by hydrogen plasma 2001 ·Journal of Vacuum Science & Technology B Microelectronics and Nanometer Structures Processing Measurement and Phenomena ·Mikhaı̈l R. Baklanov,Denis Shamiryan,Zs. Tôkei,Gerald Beyer,T. Conard,S. Vanhaelemeersch,Karen Maex	81
18	High Q inductor add-on module in thick Cu/SiLK/sup TM/ single damascene 2001 ·S. Jenei,Stefaan Decoutere,Gillis Winderickx,Herbert Struyf,Zsolt Tökei,I. Vervoort,(unknown),Patrick Jaenen,L. Carbonell,Brice De Jaeger,R. A. Donaton,S. Vanhaelemeersch,Karen Maex,Bart Nauwelaers	17
19	Characterisation of plasma etch releted residues formed on top of ECD Cu films 1999 ·Mikhaı̈l R. Baklanov,Thierry Conard,(unknown),S. Vanhaelemeersch,D.R. Holmes,Karen Maex	1
20	Post-Etch Cleaning after Dry Etching the Emitter Windows to Improve the Bipolar Characteristics in a 0.5μm BiCMOS Process 1994 ·European Solid-State Device Research Conference ·Stefaan Decoutere,S. Vanhaelemeersch,L. Deferm,(unknown),(unknown)	1

About S. Vanhaelemeersch

S. Vanhaelemeersch is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Mechanics of Materials, having authored 60 papers that have together received 680 indexed citations. Recurring topics across this work include Semiconductor materials and devices (46 papers), Copper Interconnects and Reliability (34 papers) and Metal and Thin Film Mechanics (14 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (374 citations), Electrical and Electronic Engineering (533 citations) and Mechanics of Materials (204 citations). S. Vanhaelemeersch has collaborated with scholars based in Belgium, United States and Netherlands. Frequent co-authors include Mikhaı̈l R. Baklanov, Karen Maex, Denis Shamiryan, Jozef Peeters, Werner Boullart, Herbert Struyf, Zs. Tôkei, Gerald Beyer, T. Conard and Quoc Toan Le. Their work appears in journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Langmuir.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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