Quoc Toan Le

2.3k citations

101 papers · 1.8k indexed · h-index 21

Polymers and Plastics top 5%
- Conducting polymers and applications 8
Electrical and Electronic Engineering top 2%
- Semiconductor materials and devices 64
- Organic Electronics and Photovoltaics 12
- Advancements in Photolithography Techniques 9
- Organic Light-Emitting Diodes Research 8
Electronic, Optical and Magnetic Materials top 5%
- Copper Interconnects and Reliability 68
Surfaces, Coatings and Films top 5%
- Surface Modification and Superhydrophobicity 6
Materials Chemistry top 10%
Mechanics of Materials
- Metal and Thin Film Mechanics 25

Co-authors: Yongli Gao Eric Forsythe Lewis J. Rothberg Frank Nüesch Li Yan M. G. Mason Mikhaı̈l R. Baklanov Jean‐Jacques Pireaux
Cited by: Polymers and Plastics Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials
Journals: The Journal of Chemical Physics (1 paper)Applied Physics Letters (3 papers)Journal of Applied Physics (5 papers)
Partner nations: Belgium United States Germany

In The Last Decade

Quoc Toan Le

90 papers receiving 1.8k citations

Peers

Countries citing papers authored by Quoc Toan Le

Since Specialization

Citations

This map shows the geographic impact of Quoc Toan Le's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Quoc Toan Le with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Quoc Toan Le more than expected).

Fields of papers citing papers by Quoc Toan Le

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Quoc Toan Le. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Quoc Toan Le. The network helps show where Quoc Toan Le may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Quoc Toan Le, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Quoc Toan Le Line = papers co-authored together Quoc Toan Le links everyone, so they are left out of the graph.

All Works

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20 of 20 papers shown

#	Work
1	A Cleaning Method for Post-Etch Ruthenium Residue Removal Using UV and Liquid Chemical Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·Teppei Nakano,Quoc Toan Le,Hikaru Kawarazaki,Takayoshi Tanaka,Efrain Altamirano Sánchez	2023	0
2	Formation and Wet Removal of Organic and Titanium-Containing Residues on Patterned TiN/Porous Low-k Structure ECS Journal of Solid State Science and Technology ·Quoc Toan Le,E. Kesters,Frank Holsteyns	2018	1
3	Feasibility study of fully self aligned vias for 5nm node BEOL Gayle Murdoch,J. Bömmels,Christopher J. Wilson,Khashayar Babaei Gavan,Quoc Toan Le,Zsolt Tökei,William F. Clark	2017	27
4	Influence of external cooling on the femtosecond laser ablation of dentin Lasers in Medical Science ·Quoc Toan Le,R. Vilar,Caroline Bertrand	2017	11
5	UV-induced modification of fluorocarbon for improvement of subsequent wet removal Microelectronic Engineering ·Quoc Toan Le,Ihsan Simms,Huan Yue,I. M. Brown,E. Kesters,Guy Vereecke,Herbert Struyf,Stefan De Gendt	2013	2
6	An environment friendly wet strip process for 193nm lithography patterning in BEOL applications Microelectronic Engineering ·Guy Vereecke,E. Kesters,Quoc Toan Le,M. Claes,Marcel Lux,Herbert Struyf,Robert Carleer,Peter Adriaensens	2012	2
7	Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma Japanese Journal of Applied Physics ·Quoc Toan Le,Johan Keldermans,Nicolò Chiodarelli,Els Kesters,Marcel Lux,Martine Claes,Guy Vereecke	2008	10
8	An investigation of ultra low-k dielectrics with high thermal stability for integration in memory devices Microelectronic Engineering ·Eun Suk Hong,S. Demuynck,Quoc Toan Le,Mikhaı̈l R. Baklanov,L. Carbonell,M. Van Hove,H. Meynen	2007	3
9	Scaling down thickness of ULK materials for 65nm node and below and its effect on electrical performance Microelectronic Engineering ·S. Frühauf,Cameliu Himcinschi,M. Rennau,K. Schulze,Stefan E. Schulz,M. Friedrich,Thomas Geßner,Dietrich R. T. Zahn,Quoc Toan Le,Rudy Caluwaerts	2005	1
10	Removal of Plasma-Modified Low-k Layer Using Dilute HF: Influence of Concentration Electrochemical and Solid-State Letters ·Quoc Toan Le,Mikhaı̈l R. Baklanov,E. Kesters,Ammar Azioune,Herbert Struyf,Werner Boullart,J. J. Pireaux,S. Vanhaelemeersch	2005	32
11	Plasma Modification of Porous Low-k Dielectrics Electrochemical and Solid-State Letters ·Quoc Toan Le,Caroline M. Whelan,Herbert Struyf,H. Bender,Thierry Conard,Sywert Brongersma,Werner Boullart,S. Vanhaelemeersch,Karen Maex	2004	12
12	Dependence of the minimal PVD TA(N) sealing thickness on the porosity of Zirkon™ LK dielectric films Microelectronic Engineering ·Francesca Iacopi,C Zistl,Christiane Jehoul,Zs. Tôkei,Quoc Toan Le,Abhishek Das,Chris Sullivan,Gregory Prokopowicz,Dana Gronbeck,Michael Gallagher,Jeff Calvert,Karen Maex	2002	13
13	Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film Microelectronic Engineering ·Youssef Travaly,B. Eyckens,L. Carbonel,A. Rothschild,Quoc Toan Le,Sywert Brongersma,Ivan Ciofi,Herbert Struyf,Yoshiaki Furukawa,Michele Stucchi,Marc Schaekers,H. Bender,Erik Rosseel,S. Vanhaelemeersch,Karen Maex,F. Gaillard,L. Van Autryve,Patrick Rabinzohn	2002	2
14	Morphology and Current–Voltage Characteristics of Nanostructured Pentacene Thin Films Probed by Atomic Force Microscopy Journal of Nanoscience and Nanotechnology ·Serkan Zorba,Quoc Toan Le,Nicholas J. Watkins,Lei Yan,Yongli Gao	2001	6
15	Interfacial chemistry of Alq3 and LiF with reactive metals Journal of Applied Physics ·M. G. Mason,C. W. Tang,L. S. Hung,Pratap Raychaudhuri,J. Madathil,D. J. Giesen,Li Yan,Quoc Toan Le,Yongli Gao,S.-T. Lee,Liang‐Sheng Liao,Laifei Cheng,W. R. Salaneck,D. A. dos Santos,Jean‐Luc Brédas	2001	298
16	X-ray photoelectron spectroscopy and atomic force microscopy investigation of stability mechanism of tris-(8-hydroxyquinoline) aluminum-based light-emitting devices Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Quoc Toan Le,F. M. Avendano,Eric Forsythe,Yan Li,Yongli Gao,C. W. Tang	1999	13
17	Photoemission study of the interface between phenyl diamine and treated indium–tin–oxide Applied Physics Letters ·Quoc Toan Le,Frank Nüesch,Lewis J. Rothberg,Eric Forsythe,Yongli Gao	1999	67
18	Analysis of titanium dental implants after failure of osseointegration: Combined histological, electron microscopy, and X-ray photoelectron spectroscopy approach Journal of Biomedical Materials Research ·A. Arys,C. Philippart,N Dourov,Yun He,Quoc Toan Le,J. J. Pireaux	1998	58
19	XPS study of the PET film surface modified by CO2 plasma: effects of the plasma parameters and ageing Journal of Adhesion Science and Technology ·Quoc Toan Le,Jean‐Jacques Pireaux,R. Caudano	1997	34
20	Ammonia plasma treatment to tailor PET polymer surface chemistry for biomedical applications Polymer preprints ·Christophe Girardeaux,Caroline Lefèbvre,Quoc Toan Le,Jean‐Jacques Pireaux,R. Caudano	1995	8

About Quoc Toan Le

Quoc Toan Le is a scholar working on Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films and Electrical and Electronic Engineering, having authored 101 papers that have together received 1.8k indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (68 papers), Semiconductor materials and devices (64 papers), Metal and Thin Film Mechanics (25 papers), Organic Electronics and Photovoltaics (12 papers), Advancements in Photolithography Techniques (9 papers), Conducting polymers and applications (8 papers), Organic Light-Emitting Diodes Research (8 papers) and Surface Modification and Superhydrophobicity (6 papers). The work is most often cited by research in Polymers and Plastics (415 citations), Electrical and Electronic Engineering (1.5k citations) and Electronic, Optical and Magnetic Materials (459 citations). Quoc Toan Le has collaborated with scholars based in Belgium, United States and Germany. Frequent co-authors include Yongli Gao, Eric Forsythe, Lewis J. Rothberg, Frank Nüesch, Li Yan, M. G. Mason, Mikhaı̈l R. Baklanov, Jean‐Jacques Pireaux, J. J. Pireaux and Chak Wah Tang. Their work appears in journals such as The Journal of Chemical Physics, Applied Physics Letters and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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