Quoc Toan Le

2.3k citations

101 papers · 1.8k indexed · h-index 21

Electrical and Electronic Engineering top 2%
Materials Chemistry top 10%
Electronic, Optical and Magnetic Materials top 5%
Polymers and Plastics top 5%
Mechanics of Materials top 5%

Co-authors: Yongli Gao Eric Forsythe Lewis J. Rothberg Frank Nüesch Li Yan M. G. Mason Mikhaı̈l R. Baklanov Jean‐Jacques Pireaux
Topics: Copper Interconnects and Reliability (68 papers)Semiconductor materials and devices (64 papers)Metal and Thin Film Mechanics (25 papers)
Cited by: Polymers and Plastics Electrical and Electronic Engineering Electronic, Optical and Magnetic Materials
Journals: The Journal of Chemical Physics Applied Physics Letters Journal of Applied Physics
Partner nations: Belgium United States Germany

In The Last Decade

Quoc Toan Le

90 papers receiving 1.8k citations

Peers

Countries citing papers authored by Quoc Toan Le

Since Specialization

Citations

This map shows the geographic impact of Quoc Toan Le's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Quoc Toan Le with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Quoc Toan Le more than expected).

Fields of papers citing papers by Quoc Toan Le

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Quoc Toan Le. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Quoc Toan Le. The network helps show where Quoc Toan Le may publish in the future.

Co-authorship network of co-authors of Quoc Toan Le

This figure shows the co-authorship network connecting the top 25 collaborators of Quoc Toan Le. A scholar is included among the top collaborators of Quoc Toan Le based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Quoc Toan Le. Quoc Toan Le is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

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20 of 20 papers shown

#	Work	Indexed citations
1	A Cleaning Method for Post-Etch Ruthenium Residue Removal Using UV and Liquid Chemical 2023 ·Diffusion and defect data, solid state data. Part B, Solid state phenomena/Solid state phenomena ·(unknown),Quoc Toan Le,(unknown),(unknown),Efrain Altamirano Sánchez	0
2	Formation and Wet Removal of Organic and Titanium-Containing Residues on Patterned TiN/Porous Low-k Structure 2018 ·ECS Journal of Solid State Science and Technology ·Quoc Toan Le,(unknown),Frank Holsteyns	1
3	Feasibility study of fully self aligned vias for 5nm node BEOL 2017 ·Gayle Murdoch,J. Bömmels,Christopher J. Wilson,(unknown),Quoc Toan Le,Zsolt Tökei,William F. Clark	27
4	Influence of external cooling on the femtosecond laser ablation of dentin 2017 ·Lasers in Medical Science ·Quoc Toan Le,R. Vilar,Caroline Bertrand	11
5	UV-induced modification of fluorocarbon for improvement of subsequent wet removal 2013 ·Microelectronic Engineering ·Quoc Toan Le,(unknown),Huan Yue,I. M. Brown,(unknown),Guy Vereecke,Herbert Struyf,Stefan De Gendt	2
6	An environment friendly wet strip process for 193nm lithography patterning in BEOL applications 2012 ·Microelectronic Engineering ·Guy Vereecke,(unknown),Quoc Toan Le,(unknown),Marcel Lux,Herbert Struyf,Robert Carleer,Peter Adriaensens	2
7	Alternative Photoresist Removal Process to Minimize Damage of Low-k Material Induced by Ash Plasma 2008 ·Japanese Journal of Applied Physics ·Quoc Toan Le,(unknown),Nicolò Chiodarelli,(unknown),Marcel Lux,Martine Claes,Guy Vereecke	10
8	An investigation of ultra low-k dielectrics with high thermal stability for integration in memory devices 2007 ·Microelectronic Engineering ·(unknown),S. Demuynck,Quoc Toan Le,Mikhaı̈l R. Baklanov,L. Carbonell,M. Van Hove,(unknown)	3
9	Scaling down thickness of ULK materials for 65nm node and below and its effect on electrical performance 2005 ·Microelectronic Engineering ·(unknown),Cameliu Himcinschi,(unknown),(unknown),Stefan E. Schulz,M. Friedrich,Thomas Geßner,Dietrich R. T. Zahn,Quoc Toan Le,(unknown)	1
10	Removal of Plasma-Modified Low-k Layer Using Dilute HF: Influence of Concentration 2005 ·Electrochemical and Solid-State Letters ·Quoc Toan Le,Mikhaı̈l R. Baklanov,(unknown),Ammar Azioune,Herbert Struyf,Werner Boullart,J. J. Pireaux,S. Vanhaelemeersch	32
11	Plasma Modification of Porous Low-k Dielectrics 2004 ·Electrochemical and Solid-State Letters ·Quoc Toan Le,Caroline M. Whelan,Herbert Struyf,H. Bender,Thierry Conard,Sywert Brongersma,Werner Boullart,S. Vanhaelemeersch,Karen Maex	12
12	Dependence of the minimal PVD TA(N) sealing thickness on the porosity of Zirkon™ LK dielectric films 2002 ·Microelectronic Engineering ·Francesca Iacopi,(unknown),(unknown),Zs. Tôkei,Quoc Toan Le,Abhishek Das,(unknown),Gregory Prokopowicz,(unknown),Michael Gallagher,(unknown),Karen Maex	13
13	Impact of material/process interactions on the properties of a porous CVD-O3 low-k dielectric film 2002 ·Microelectronic Engineering ·Youssef Travaly,B. Eyckens,(unknown),A. Rothschild,Quoc Toan Le,Sywert Brongersma,Ivan Ciofi,Herbert Struyf,Yoshiaki Furukawa,Michele Stucchi,Marc Schaekers,H. Bender,Erik Rosseel,S. Vanhaelemeersch,Karen Maex,F. Gaillard,(unknown),(unknown)	2
14	Morphology and Current–Voltage Characteristics of Nanostructured Pentacene Thin Films Probed by Atomic Force Microscopy 2001 ·Journal of Nanoscience and Nanotechnology ·Serkan Zorba,Quoc Toan Le,Nicholas J. Watkins,Lei Yan,Yongli Gao	6
15	Interfacial chemistry of Alq3 and LiF with reactive metals 2001 ·Journal of Applied Physics ·M. G. Mason,C. W. Tang,L. S. Hung,Pratap Raychaudhuri,J. Madathil,(unknown),Li Yan,Quoc Toan Le,Yongli Gao,(unknown),Liang‐Sheng Liao,Laifei Cheng,W. R. Salaneck,D. A. dos Santos,Jean‐Luc Brédas	298
16	X-ray photoelectron spectroscopy and atomic force microscopy investigation of stability mechanism of tris-(8-hydroxyquinoline) aluminum-based light-emitting devices 1999 ·Journal of Vacuum Science & Technology A Vacuum Surfaces and Films ·Quoc Toan Le,(unknown),Eric Forsythe,Yan Li,Yongli Gao,C. W. Tang	13
17	Photoemission study of the interface between phenyl diamine and treated indium–tin–oxide 1999 ·Applied Physics Letters ·Quoc Toan Le,Frank Nüesch,Lewis J. Rothberg,Eric Forsythe,Yongli Gao	67
18	Analysis of titanium dental implants after failure of osseointegration: Combined histological, electron microscopy, and X-ray photoelectron spectroscopy approach 1998 ·Journal of Biomedical Materials Research ·(unknown),(unknown),N Dourov,Yun He,Quoc Toan Le,J. J. Pireaux	58
19	XPS study of the PET film surface modified by CO2 plasma: effects of the plasma parameters and ageing 1997 ·Journal of Adhesion Science and Technology ·Quoc Toan Le,Jean‐Jacques Pireaux,R. Caudano	34
20	Ammonia plasma treatment to tailor PET polymer surface chemistry for biomedical applications 1995 ·Polymer preprints ·(unknown),(unknown),Quoc Toan Le,Jean‐Jacques Pireaux,R. Caudano	8

About Quoc Toan Le

Quoc Toan Le is a scholar working on Electronic, Optical and Magnetic Materials, Surfaces, Coatings and Films and Electrical and Electronic Engineering, having authored 101 papers that have together received 1.8k indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (68 papers), Semiconductor materials and devices (64 papers) and Metal and Thin Film Mechanics (25 papers). The work is most often cited by research in Polymers and Plastics (415 citations), Electrical and Electronic Engineering (1.5k citations) and Electronic, Optical and Magnetic Materials (459 citations). Quoc Toan Le has collaborated with scholars based in Belgium, United States and Germany. Frequent co-authors include Yongli Gao, Eric Forsythe, Lewis J. Rothberg, Frank Nüesch, Li Yan, M. G. Mason, Mikhaı̈l R. Baklanov, Jean‐Jacques Pireaux, J. J. Pireaux and Chak Wah Tang. Their work appears in journals such as The Journal of Chemical Physics, Applied Physics Letters and Journal of Applied Physics.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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