R. A. Donaton

570 total citations
35 papers, 337 citations indexed

About

R. A. Donaton is a scholar working on Electrical and Electronic Engineering, Atomic and Molecular Physics, and Optics and Electronic, Optical and Magnetic Materials. According to data from OpenAlex, R. A. Donaton has authored 35 papers receiving a total of 337 indexed citations (citations by other indexed papers that have themselves been cited), including 28 papers in Electrical and Electronic Engineering, 22 papers in Atomic and Molecular Physics, and Optics and 13 papers in Electronic, Optical and Magnetic Materials. Recurrent topics in R. A. Donaton's work include Semiconductor materials and interfaces (20 papers), Semiconductor materials and devices (16 papers) and Copper Interconnects and Reliability (12 papers). R. A. Donaton is often cited by papers focused on Semiconductor materials and interfaces (20 papers), Semiconductor materials and devices (16 papers) and Copper Interconnects and Reliability (12 papers). R. A. Donaton collaborates with scholars based in Belgium, United States and Japan. R. A. Donaton's co-authors include Karen Maex, F. Cardon, Christophe Detavernier, R.L. Van Meirhaeghe, G. Langouche, H. Bender, A. Vantomme, A. St. Amour, James C. Sturm and Herbert Struyf and has published in prestigious journals such as Physical review. B, Condensed matter, Applied Physics Letters and Journal of Applied Physics.

In The Last Decade

R. A. Donaton

32 papers receiving 327 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
R. A. Donaton Belgium 11 275 244 71 47 36 35 337
Yasuhiko Nakayama Japan 12 313 1.1× 329 1.3× 150 2.1× 51 1.1× 42 1.2× 39 433
E. Luckowski United States 9 309 1.1× 164 0.7× 47 0.7× 31 0.7× 19 0.5× 23 324
Gérard Guillot France 10 274 1.0× 136 0.6× 139 2.0× 79 1.7× 39 1.1× 50 370
Akimasa Kinoshita Japan 12 375 1.4× 128 0.5× 48 0.7× 43 0.9× 15 0.4× 40 407
C.K. Williams United States 7 252 0.9× 200 0.8× 73 1.0× 22 0.5× 32 0.9× 10 307
弘之 松波 3 393 1.4× 97 0.4× 122 1.7× 79 1.7× 24 0.7× 5 450
D. B. Aldrich United States 8 212 0.8× 245 1.0× 127 1.8× 21 0.4× 17 0.5× 18 294
Mitsushi Suzuno Japan 12 299 1.1× 353 1.4× 142 2.0× 29 0.6× 23 0.6× 20 377
J.H. Mazur United States 7 266 1.0× 224 0.9× 98 1.4× 26 0.6× 51 1.4× 19 351
D. K. Sadana United States 12 421 1.5× 193 0.8× 109 1.5× 19 0.4× 55 1.5× 36 455

Countries citing papers authored by R. A. Donaton

Since Specialization
Citations

This map shows the geographic impact of R. A. Donaton's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by R. A. Donaton with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites R. A. Donaton more than expected).

Fields of papers citing papers by R. A. Donaton

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by R. A. Donaton. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by R. A. Donaton. The network helps show where R. A. Donaton may publish in the future.

Co-authorship network of co-authors of R. A. Donaton

This figure shows the co-authorship network connecting the top 25 collaborators of R. A. Donaton. A scholar is included among the top collaborators of R. A. Donaton based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with R. A. Donaton. R. A. Donaton is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Gray, William D., Mark J. Loboda, Herbert Struyf, et al.. (2003). Process Optimization and Integration of Trimethylsilane-Deposited α-SiC:H and α-SiCO:H Dielectric Thin Films for Damascene Processing. Journal of The Electrochemical Society. 150(7). G404–G404. 11 indexed citations
2.
Donaton, R. A., Karen Maex, Herbert Struyf, et al.. (2003). Critical issues in the integration of copper and low-k dielectrics. 511. 262–264. 1 indexed citations
3.
Donaton, R. A., Francesca Iacopi, Mikhaı̈l R. Baklanov, et al.. (2002). Physical and electrical characterization of silsesquioxane-based ultra-low k dielectric films. 93–95. 3 indexed citations
4.
Roest, David De, R. A. Donaton, Michele Stucchi, Karen Maex, & Bart Nauwelaers. (2001). Simulations and measurements of capacitance in dielectric stacks and consequences for integration. Microelectronic Engineering. 55(1-4). 29–35. 2 indexed citations
5.
Shaffer, Edward O., David Price, R. A. Donaton, et al.. (2001). Integration of a low permittivity spin-on embedded hardmask for Cu/SiLK resin dual damascene. 60–62. 2 indexed citations
6.
Jenei, S., Stefaan Decoutere, Gillis Winderickx, et al.. (2001). High Q inductor add-on module in thick Cu/SiLK/sup TM/ single damascene. 107–109. 17 indexed citations
7.
Donaton, R. A., Mireille Maenhoudt, Ivan Pollentier, et al.. (2001). Integration of Cu and low-k dielectrics: effect of hard mask and dry etch on electrical performance of damascene structures. Microelectronic Engineering. 55(1-4). 277–283. 12 indexed citations
8.
Bender, H. & R. A. Donaton. (2000). Focused Ion Beam Analysis of Low-K Dielectrics. Proceedings - International Symposium for Testing and Failure Analysis. 30842. 397–405. 1 indexed citations
9.
Baturina, T. I., Z. D. Kvon, R. A. Donaton, et al.. (2000). Mesoscopic SNS junctions on the basis of superconducting PtSi films. Physica B Condensed Matter. 284-288. 1860–1861. 1 indexed citations
10.
Donaton, R. A., Erik Sleeckx, Marc Schaekers, et al.. (2000). Characterization and Integration in Cu Damascene Structures of AURORA, an Inorganic Low-k Dielectric. MRS Proceedings. 612. 1 indexed citations
11.
Iacopi, Francesca, R. A. Donaton, Herbert Struyf, et al.. (2000). Studies on XLK film characterization and integration in copper damascene processes. 287–293. 1 indexed citations
12.
Kvon, Z. D., T. I. Baturina, R. A. Donaton, et al.. (2000). Proximity effects and Andreev reflection in a mesoscopic SNS junction with perfect NS interfaces. Physical review. B, Condensed matter. 61(17). 11340–11343. 10 indexed citations
13.
Detavernier, Christophe, et al.. (1999). CoSi 2 formation in the presence of interfacial silicon oxide. Applied Physics Letters. 74(20). 2930–2932. 31 indexed citations
14.
Donaton, R. A.. (1999). New Technique for Forming Continuous, Smooth, and Uniform Ultrathin (3 nm) PtSi Layers. Electrochemical and Solid-State Letters. 2(4). 195–195. 9 indexed citations
15.
Detavernier, Christophe, et al.. (1998). Ballistic electron emission microscopy study of barrier height inhomogeneities introduced in Au/n-Si Schottky contacts by a HF pretreatment. Journal of Applied Physics. 84(6). 3226–3231. 77 indexed citations
16.
Donaton, R. A., H. Bender, Kris Baert, et al.. (1998). New Approaches for Formation of Ultra-Thin PtSi Layers for Infrared Applications. MRS Proceedings. 514. 2 indexed citations
17.
Donaton, R. A., H. Bender, Kris Baert, et al.. (1997). Formation of ultra-thin PtSi layers with a 2-step silicidation process. Microelectronic Engineering. 37-38. 507–514. 10 indexed citations
18.
Donaton, R. A., Sabine Kolodinski, Matty Caymax, et al.. (1995). Formation of CoSi2 on strained Si0.8Ge0.2 using a sacrificial Si layer. Applied Surface Science. 91(1-4). 77–81. 7 indexed citations
19.
Bender, H., Ph. Roussel, Sabine Kolodinski, et al.. (1995). Characterization of Ultra-Thin PtSi Films for Infrared Detectors. MRS Proceedings. 402. 2 indexed citations
20.
Larsen, K. Kyllesbech, et al.. (1994). Electronic transport in metallic iron disilicide. Physical review. B, Condensed matter. 50(19). 14200–14211. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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