Ivan Ciofi
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- Copper Interconnects and Reliability 74
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- Semiconductor materials and devices 67
- Electronic Packaging and Soldering Technologies 17
- Integrated Circuits and Semiconductor Failure Analysis 15
- 3D IC and TSV technologies 11
- Advancements in Semiconductor Devices and Circuit Design 10
- Hardware and Architecture top 10%
- Mechanics of Materials top 10%
- Metal and Thin Film Mechanics 11
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- Semiconductor materials and interfaces 10
- Co-authors
- Zsolt TökeiKristof CroesMikhaı̈l R. BaklanovZs. TôkeiChristopher J. WilsonOlalla Varela PedreiraRogier BaertG. Groeseneken
- Cited by
- Electronic, Optical and Magnetic MaterialsElectrical and Electronic EngineeringHardware and Architecture
- Journals
- IEEE Transactions on Electron Devices (8 papers)Microelectronic Engineering (6 papers)Journal of Applied Physics (4 papers)
- Partner nations
- BelgiumUnited StatesSwitzerland
In The Last Decade
Ivan Ciofi
83 papers receiving 989 citations
Peers
Comparison fields: 5 of 43
- Electronic, Optical and Magnetic Materials 553
- Electrical and Electronic Engineering 885
- Hardware and Architecture 47
- Mechanics of Materials 118
- Atomic and Molecular Physics, and Optics 131
Countries citing papers authored by Ivan Ciofi
This map shows the geographic impact of Ivan Ciofi's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Ivan Ciofi with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Ivan Ciofi more than expected).
Fields of papers citing papers by Ivan Ciofi
This network shows the impact of papers produced by Ivan Ciofi. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Ivan Ciofi. The network helps show where Ivan Ciofi may publish in the future.
Co-authorship network
The 25 scholars most cited alongside Ivan Ciofi, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
| # | Work | ||
|---|---|---|---|
| 1 | 2025 | 0 | |
| 2 | 2025 | 0 | |
| 3 | 2024 | 1 | |
| 4 | 2023 | 0 | |
| 5 | 2023 | 2 | |
| 6 | 2020 | 3 | |
| 7 | 2019 | 4 | |
| 8 | 2017 | 50 | |
| 9 | 2017 | 5 | |
| 10 | 2016 | 17 | |
| 11 | 2016 | 5 | |
| 12 | 2015 | 7 | |
| 13 | 2015 | 6 | |
| 14 | 2015 | 40 | |
| 15 | 2015 | 3 | |
| 16 | Cryogenic etching reduces plasma-induced damage of ultralow-k dielectrics | 2014 | 2 |
| 17 | 2014 | 4 | |
| 18 | 2012 | 21 | |
| 19 | 2007 | 8 | |
| 20 | 2004 | 1 |
About Ivan Ciofi
Ivan Ciofi is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering, Hardware and Architecture, Mechanics of Materials and Surfaces, Coatings and Films, having authored 88 papers that have together received 1.0k indexed citations. Recurring topics across this work include Copper Interconnects and Reliability (74 papers), Semiconductor materials and devices (67 papers), Electronic Packaging and Soldering Technologies (17 papers), Integrated Circuits and Semiconductor Failure Analysis (15 papers), 3D IC and TSV technologies (11 papers), Metal and Thin Film Mechanics (11 papers), Semiconductor materials and interfaces (10 papers) and Advancements in Semiconductor Devices and Circuit Design (10 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (553 citations), Electrical and Electronic Engineering (885 citations), Hardware and Architecture (47 citations), Mechanics of Materials (118 citations) and Atomic and Molecular Physics, and Optics (131 citations). Ivan Ciofi has collaborated with scholars based in Belgium, United States and Switzerland. Frequent co-authors include Zsolt Tökei, Kristof Croes, Mikhaı̈l R. Baklanov, Zs. Tôkei, Christopher J. Wilson, Olalla Varela Pedreira, Rogier Baert, G. Groeseneken, Philippe Roussel and J. Bömmels. Their work appears in journals such as IEEE Transactions on Electron Devices, Microelectronic Engineering, Journal of Applied Physics, Japanese Journal of Applied Physics and Microelectronics Reliability.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.