Denis Shamiryan
- Electrical and Electronic Engineering top 2%
- Electronic, Optical and Magnetic Materials top 1%
- Materials Chemistry top 5%
- Mechanics of Materials top 1%
- Biomedical Engineering top 10%
- Co-authors
- Karen MaexMikhaı̈l R. BaklanovZ. Sh. YanovitskayaSywert BrongersmaFrancesca IacopiThomas AbellAdam UrbanowiczS. Vanhaelemeersch
- Topics
- Semiconductor materials and devices (76 papers)Copper Interconnects and Reliability (48 papers)Metal and Thin Film Mechanics (32 papers)
- Cited by
- Electronic, Optical and Magnetic MaterialsCeramics and CompositesElectrical and Electronic Engineering
- Partner nations
- BelgiumUnited StatesRussia
In The Last Decade
Denis Shamiryan
85 papers receiving 3.2k citations
Hit Papers
Peers
Comparison fields: 5 of 71
- Electrical and Electronic Engineering 2.4k
- Electronic, Optical and Magnetic Materials 1.8k
- Materials Chemistry 1.1k
- Mechanics of Materials 992
- Biomedical Engineering 477
Countries citing papers authored by Denis Shamiryan
This map shows the geographic impact of Denis Shamiryan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Denis Shamiryan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Denis Shamiryan more than expected).
Fields of papers citing papers by Denis Shamiryan
This network shows the impact of papers produced by Denis Shamiryan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Denis Shamiryan. The network helps show where Denis Shamiryan may publish in the future.
Co-authorship network of co-authors of Denis Shamiryan
This figure shows the co-authorship network connecting the top 25 collaborators of Denis Shamiryan. A scholar is included among the top collaborators of Denis Shamiryan based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Denis Shamiryan. Denis Shamiryan is excluded from the visualization to improve readability, since they are connected to all nodes in the network.
All Works
| # | Work | Indexed citations |
|---|---|---|
| 1 | 1 | |
| 2 | 243 | |
| 3 | 11 | |
| 4 | 1 | |
| 5 | Mechanism of k-value Reduction of PECVD Low-k Films Treated with He/H2 Ash Plasma | 2 |
| 6 | Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curing | 1 |
| 7 | 25 | |
| 8 | 3 | |
| 9 | 7 | |
| 10 | 1 | |
| 11 | 3 | |
| 12 | 16 | |
| 13 | Influence of crystallographic orientation on etch properties of TiN | 1 |
| 14 | 3 | |
| 15 | 319 | |
| 16 | 3 | |
| 17 | 1 | |
| 18 | Precursor penetration and sealing for CVD SiCOH low k dielectric during atomic layer deposition of WCN barrier | 1 |
| 19 | 6 | |
| 20 | 81 |
About Denis Shamiryan
Denis Shamiryan is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Mechanics of Materials, having authored 94 papers that have together received 3.3k indexed citations. Recurring topics across this work include Semiconductor materials and devices (76 papers), Copper Interconnects and Reliability (48 papers) and Metal and Thin Film Mechanics (32 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (1.8k citations), Ceramics and Composites (254 citations) and Electrical and Electronic Engineering (2.4k citations). Denis Shamiryan has collaborated with scholars based in Belgium, United States and Russia. Frequent co-authors include Karen Maex, Mikhaı̈l R. Baklanov, Z. Sh. Yanovitskaya, Sywert Brongersma, Francesca Iacopi, Thomas Abell, Adam Urbanowicz, S. Vanhaelemeersch, Werner Boullart and Т. В. Рахимова. Their work appears in journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Materials Today.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.