Denis Shamiryan

3.9k citations
94 papers · 3.3k indexed · 1 hit paper · h-index 25

Denis Shamiryan

85 papers receiving 3.2k citations

Hit Papers

Low dielectric constant materials for microelectronics1.4k20032026201020184008001.2k

Peers

Denis Shamiryan
Comparison fields: 5 of 71
  • Electronic, Optical and Magnetic Materials 1.8k
  • Ceramics and Composites 254
  • Electrical and Electronic Engineering 2.4k
  • Mechanics of Materials 992
  • Materials Chemistry 1.1k
Replace Norihiko Kamata with:
Norihiko Kamata Japan
Z. Sh. Yanovitskaya Russia
Jenh‐Yih Juang Taiwan
Peter Mascher Canada
Jürgen W. Gerlach Germany
Travis J. Anderson United States
T. G. Holesinger United States
Vanya Darakchieva Sweden
R. D. Vispute United States
Tadashi Shiosaki Japan
Denis Shamiryan relative to Norihiko Kamata Japan Norihiko Kamata's profile →
Citations per field
00.5×2.9×
Norihiko Kamata · 1×
Citations per year

Countries citing papers authored by Denis Shamiryan

Since Specialization
Citations

This map shows the geographic impact of Denis Shamiryan's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Denis Shamiryan with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Denis Shamiryan more than expected).

Fields of papers citing papers by Denis Shamiryan

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Denis Shamiryan. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Denis Shamiryan. The network helps show where Denis Shamiryan may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Denis Shamiryan, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Denis Shamiryan Line = papers co-authored together Denis Shamiryan links everyone, so they are left out of the graph.

All Works

20 of 20 papers shown
#Work
1 20171
2 2013243
3 201111
4 20111
5
Mechanism of k-value Reduction of PECVD Low-k Films Treated with He/H2 Ash Plasma
20102
6
Fabrication of porogen residue free ultra low-k PECVD material by subsequent H2-afterglow plasma treatment and UV curing
20101
7 201025
8 20103
9 20107
10 20091
11 20093
12 200816
13
Influence of crystallographic orientation on etch properties of TiN
20061
14 20053
15 2004319
16 20023
17 20021
18
Precursor penetration and sealing for CVD SiCOH low k dielectric during atomic layer deposition of WCN barrier
20021
19 20016
20 200181

About Denis Shamiryan

Denis Shamiryan is a scholar working on Electronic, Optical and Magnetic Materials, Electrical and Electronic Engineering and Mechanics of Materials, having authored 94 papers that have together received 3.3k indexed citations. Recurring topics across this work include Semiconductor materials and devices (76 papers), Copper Interconnects and Reliability (48 papers), Metal and Thin Film Mechanics (32 papers), Advancements in Semiconductor Devices and Circuit Design (18 papers), Integrated Circuits and Semiconductor Failure Analysis (11 papers), Advancements in Photolithography Techniques (8 papers), Plasma Diagnostics and Applications (8 papers) and Silicon and Solar Cell Technologies (7 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (1.8k citations), Ceramics and Composites (254 citations) and Electrical and Electronic Engineering (2.4k citations). Denis Shamiryan has collaborated with scholars based in Belgium, United States and Russia. Frequent co-authors include Karen Maex, Mikhaı̈l R. Baklanov, Z. Sh. Yanovitskaya, Sywert Brongersma, Francesca Iacopi, Thomas Abell, Adam Urbanowicz, S. Vanhaelemeersch, Werner Boullart and Т. В. Рахимова. Their work appears in journals such as Journal of Applied Physics, Journal of The Electrochemical Society and Materials Today.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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