David De Roest
Impact in
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- Copper Interconnects and Reliability
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- Semiconductor materials and devices
- Electromagnetic Compatibility and Noise Suppression
- Thin-Film Transistor Technologies
- 3D IC and TSV technologies
- Integrated Circuits and Semiconductor Failure Analysis
Papers in
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- Semiconductor materials and devices 35
- Electromagnetic Compatibility and Noise Suppression 14
- 3D IC and TSV technologies 9
- Microwave and Dielectric Measurement Techniques 6
- Integrated Circuits and Semiconductor Failure Analysis 5
- Advancements in Photolithography Techniques 4
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- Copper Interconnects and Reliability 29
- Co-authors
- Mikhaı̈l R. Baklanov (13 shared papers)Patrick Verdonck (12 shared papers)P. Maršík (6 shared papers)Gerald Beyer (12 shared papers)Karen Maex (24 shared papers)Bart Nauwelaers (17 shared papers)Naoto Tsuji (2 shared papers)Els Van Besien (5 shared papers)
- Journals
- Microelectronic Engineering (8 papers)Japanese Journal of Applied Physics (7 papers)Thin Solid Films (2 papers)IEEE Electron Device Letters (2 papers)Semiconductor Science and Technology (1 paper)
- Partner nations
- BelgiumUnited StatesCzechia
In The Last Decade
David De Roest
50 papers receiving 339 citations
Peers
Comparison fields: 5 of 26
- Electronic, Optical and Magnetic Materials 227
- Electrical and Electronic Engineering 306
- Mechanics of Materials 113
- Ceramics and Composites 20
- Materials Chemistry 60
Countries citing papers authored by David De Roest
This map shows the geographic impact of David De Roest's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by David De Roest with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites David De Roest more than expected).
Fields of papers citing papers by David De Roest
This network shows the impact of papers produced by David De Roest. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by David De Roest. The network helps show where David De Roest may publish in the future.
Co-authors
The 25 scholars most cited alongside David De Roest, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.
All Works
Showing the 20 most-cited of 53 papers — load more, or switch the sort, to bring in the rest.
| # | Work | ||
|---|---|---|---|
| 1 | 2007 | 47 | |
| 2 | 2010 | 43 | |
| 3 | 2011 | 35 | |
| 4 | 2007 | 26 | |
| 5 | 2011 | 25 | |
| 6 | 2001 | 13 | |
| 7 | 2008 | 11 | |
| 8 | 2017 | 11 | |
| 9 | 2015 | 11 | |
| 10 | 2003 | 10 | |
| 11 | 2002 | 8 | |
| 12 | 2001 | 8 | |
| 13 | 2011 | 7 | |
| 14 | 2010 | 6 | |
| 15 | 2012 | 6 | |
| 16 | 2002 | 6 | |
| 17 | 2009 | 6 | |
| 18 | 2009 | 5 | |
| 19 | 2010 | 5 | |
| 20 | 2009 | 5 |
About David De Roest
David De Roest is a scholar working on Electrical and Electronic Engineering, Electronic, Optical and Magnetic Materials, Mechanics of Materials, Atomic and Molecular Physics, and Optics and Surfaces, Coatings and Films, having authored 53 papers that have together received 349 indexed citations. Recurring topics across this work include Semiconductor materials and devices (35 papers), Copper Interconnects and Reliability (29 papers), Metal and Thin Film Mechanics (15 papers), Electromagnetic Compatibility and Noise Suppression (14 papers), 3D IC and TSV technologies (9 papers), Microwave and Dielectric Measurement Techniques (6 papers), Integrated Circuits and Semiconductor Failure Analysis (5 papers) and Advancements in Photolithography Techniques (4 papers). The work is most often cited by research in Electronic, Optical and Magnetic Materials (227 citations), Electrical and Electronic Engineering (306 citations), Mechanics of Materials (113 citations), Ceramics and Composites (20 citations) and Materials Chemistry (60 citations). David De Roest has collaborated with scholars based in Belgium, United States and Czechia. Frequent co-authors include Mikhaı̈l R. Baklanov, Patrick Verdonck, P. Maršík, Gerald Beyer, Karen Maex, Bart Nauwelaers, Naoto Tsuji, Els Van Besien, Adam Urbanowicz and Zsolt Tökei. Their work appears in journals such as Microelectronic Engineering, Japanese Journal of Applied Physics, Thin Solid Films, IEEE Electron Device Letters and Semiconductor Science and Technology.
Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.