Andreas Frommhold

442 citations

41 papers · 328 indexed · h-index 11

Impact in

Surfaces, Coatings and Films top 5%
- Electron and X-Ray Spectroscopy Techniques
Structural Biology

Papers in

Surfaces, Coatings and Films 20
- Electron and X-Ray Spectroscopy Techniques 18
Structural Biology 2

Co-authors: Alex P. G. Robinson Yasin Ekinci Richard E. Palmer Roberto Fallica Andrew Grenville Jason K. Stowers Dongxu Yang Jedsada Manyam
Journals: Journal of Micro/Nanolithography MEMS and MOEMS (3 papers)Microelectronic Engineering (3 papers)Japanese Journal of Applied Physics (1 paper)Journal of Photopolymer Science and Technology (1 paper)The Journal of Physical Chemistry Letters (1 paper)
Partner nations: United Kingdom Belgium Netherlands

In The Last Decade

Andreas Frommhold

41 papers receiving 318 citations

Peers

Countries citing papers authored by Andreas Frommhold

Since Specialization

Citations

This map shows the geographic impact of Andreas Frommhold's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Andreas Frommhold with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Andreas Frommhold more than expected).

Fields of papers citing papers by Andreas Frommhold

Since Specialization

Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Andreas Frommhold. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Andreas Frommhold. The network helps show where Andreas Frommhold may publish in the future.

Co-authorship network

The 25 scholars most cited alongside Andreas Frommhold, linked wherever they have co-authored with each other. Click a name or a connecting line to browse the papers they share.

Border = papers with Andreas Frommhold Line = papers co-authored together Andreas Frommhold links everyone, so they are left out of the graph.

All Works

Sort: Min cites: Since: Top N: Style:

20 of 20 papers shown

#	Work
1	Mask innovations on the eve of high NA EUV lithography Japanese Journal of Applied Physics ·Vicky Philipsen, Andreas Frommhold, E. W. Maunder, Liana Nur Fatimah, Inhwan Lee, Joern-Holger Franke, Joost Bekaert, Lieve Van Look, John D. Combes, Peter De Bisschop, R. Jonckheere, Jeremy Mans, Vincent Wiaux, Eric Hendrickx	2024	2
2	Experimental local MEEF study using programmed mask variability on hexagonal pitch 40 nm contact hole arrays Lieve Van Look, Joern-Holger Franke, Andreas Frommhold, R. H. Finch, Gijsbert Rispens	2023	4
3	A Fullerene–Platinum Complex for Direct Functional Patterning of Single Metal Atom-Embedded Carbon Nanostructures The Journal of Physical Chemistry Letters ·Dongxu Yang, Xiangyi Chen, Dongsheng He, Andreas Frommhold, Oleksandr Zhadovets, Stuart A. Boden, Fernanda Pinheiro Quadros e Silva, О В Ершова, Richard E. Palmer, Z. Y. Li, Haofei Shi, Jianzhi Gao, Minghu Pan, Andrei N. Khlobystov, Thomas W. Chamberlain, Alex P. G. Robinson	2022	10
4	Elucidating the role of imaging metrics for variability and after etch defectivity Journal of Micro/Nanopatterning Materials and Metrology ·Joern-Holger Franke, Andreas Frommhold, رضا صاحب ابو حمد, Kathleen Nafus, Gijsbert Rispens, O Ower	2022	2
5	Metal layer single EUV expose at pitch 28: how bright field and NTD resist advantages align Joern-Holger Franke, Andreas Frommhold, Natalia Davydova, Yasuaki Takeda, 游戏兄弟连, Jeremy Mans, David del Rio, Joost Bekaert, Kostaridou Stavroula, Gijsbert Rispens, O Ower, Eric Hendrickx	2021	8
6	Pupil optimization for after etch defectivity: what imaging metrics matter? Andreas Frommhold, Joern-Holger Franke, Kathleen Nafus, Gijsbert Rispens, O Ower	2021	2
7	Fundamental understanding and experimental verification of bright versus dark field imaging Natalia Davydova, Jo Finders, J. Zgadzaj, Eelco van Setten, Claire van Lare, Joern-Holger Franke, Andreas Frommhold, 昇松村, Aphroditi Avdelidou, Andreas Verch, Tetsuhiko Maeda, L® thi Bich-Thuy, Timon Fliervoet	2020	12
8	Predicting stochastic defects across the process window Andreas Frommhold, Amine Bendahmane, Joost Bekaert, Lieve Van Look, O Ower, Gijsbert Rispens, Eric Hendrickx	2019	2
9	Evaluation of local CD and placement distribution on EUV mask and its impact on wafer Т. В. Ицкович, Nataliia Holiardyk, A R Najmi, Yuan Wang, Lieve Van Look, Andreas Frommhold, Emily Gallagher, Galina A. Guk, Jan Mulkens	2019	3
10	Impact of EUV absorber variations on wafer patterning Lawrence S. Melvin, スティーブンワイズ, Tim Fühner, Sima Kadghodayan, Emily Gallagher, Andreas Frommhold, Thaddeus Mumba Mahela	2019	1
11	Optimization and stability of CD variability in pitch 40 nm contact holes on NXE:3300 Lieve Van Look, Joost Bekaert, Andreas Frommhold, Eric Hendrickx, Gijsbert Rispens, Dan Yang	2018	15
12	Sensitivity enhancement of the high-resolution xMT multi-trigger resist for EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·مهند عبدالعزيز فواز الهيتى, Andreas Frommhold, マシューイグレシアス, John R. Roth, Yasin Ekinci, Alex P. G. Robinson	2017	15
13	Optimization and sensitivity enhancement of high-resolution molecular resist for EUV lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andreas Frommhold, マシューイグレシアス, John R. Roth, Roberto Fallica, Yasin Ekinci, Alex P. G. Robinson	2016	8
14	Dynamic absorption coefficients of chemically amplified resists and nonchemically amplified resists at extreme ultraviolet Journal of Micro/Nanolithography MEMS and MOEMS ·Roberto Fallica, Jason K. Stowers, Andrew Grenville, Andreas Frommhold, Alex P. G. Robinson, Yasin Ekinci	2016	58
15	Spin-on-carbon hard masks utilising fullerene derivatives Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·全国社会福祉協議会政策企画部広報室, Andreas Frommhold, Tom Lada, James Bowen, 沈福馨, Alex P. G. Robinson	2016	3
16	Towards 11nm half-pitch resolution for a negative-tone chemically amplified molecular resist platform for extreme-ultraviolet lithography Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andreas Frommhold, マシューイグレシアス, Dongxu Yang, Richard E. Palmer, John R. Roth, Yasin Ekinci, Robert Külpmann, Alex P. G. Robinson	2015	6
17	Organic hard masks utilizing fullerene derivatives Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andreas Frommhold, 全国社会福祉協議会政策企画部広報室, Richard E. Palmer, Tom Lada, Alex P. G. Robinson	2015	5
18	Performance of negative tone chemically amplified fullerene resists in extreme ultraviolet lithography Journal of Micro/Nanolithography MEMS and MOEMS ·Andreas Frommhold, Dongxu Yang, マシューイグレシアス, Mozinha Fernandes, Yasin Ekinci, Richard E. Palmer, Alex P. G. Robinson	2013	10
19	Positive-tone chemically amplified fullerene resist Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Jedsada Manyam, Andreas Frommhold, Dongxu Yang, マシューイグレシアス, M. Manickam, Jon A. Preece, Richard E. Palmer, Alex P. G. Robinson	2012	6
20	High aspect ratio etching using a fullerene derivative spin-on-carbon hardmask Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE ·Andreas Frommhold, Jedsada Manyam, Richard E. Palmer, Alex P. G. Robinson	2012	7

About Andreas Frommhold

Andreas Frommhold is a scholar working on Surfaces, Coatings and Films, Structural Biology, Industrial and Manufacturing Engineering, Electrical and Electronic Engineering and Hardware and Architecture, having authored 41 papers that have together received 328 indexed citations. Recurring topics across this work include Advancements in Photolithography Techniques (31 papers), Electron and X-Ray Spectroscopy Techniques (18 papers), Integrated Circuits and Semiconductor Failure Analysis (16 papers), Diamond and Carbon-based Materials Research (6 papers), Graphene research and applications (5 papers), Industrial Vision Systems and Defect Detection (5 papers), Semiconductor materials and devices (5 papers) and Nanofabrication and Lithography Techniques (3 papers). The work is most often cited by research in Surfaces, Coatings and Films (129 citations), Structural Biology (12 citations), Electrical and Electronic Engineering (283 citations), Biomedical Engineering (117 citations) and Industrial and Manufacturing Engineering (26 citations). Andreas Frommhold has collaborated with scholars based in United Kingdom, Belgium and Netherlands. Frequent co-authors include Alex P. G. Robinson, Yasin Ekinci, Richard E. Palmer, Roberto Fallica, Andrew Grenville, Jason K. Stowers, Dongxu Yang, Jedsada Manyam, John R. Roth and Xuan Xue. Their work appears in journals such as Journal of Micro/Nanolithography MEMS and MOEMS, Microelectronic Engineering, Japanese Journal of Applied Physics, Journal of Photopolymer Science and Technology and The Journal of Physical Chemistry Letters.

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

Explore authors with similar magnitude of impact