Emily Gallagher

726 total citations
72 papers, 482 citations indexed

About

Emily Gallagher is a scholar working on Electrical and Electronic Engineering, Surfaces, Coatings and Films and Industrial and Manufacturing Engineering. According to data from OpenAlex, Emily Gallagher has authored 72 papers receiving a total of 482 indexed citations (citations by other indexed papers that have themselves been cited), including 67 papers in Electrical and Electronic Engineering, 45 papers in Surfaces, Coatings and Films and 17 papers in Industrial and Manufacturing Engineering. Recurrent topics in Emily Gallagher's work include Advancements in Photolithography Techniques (63 papers), Electron and X-Ray Spectroscopy Techniques (44 papers) and Integrated Circuits and Semiconductor Failure Analysis (23 papers). Emily Gallagher is often cited by papers focused on Advancements in Photolithography Techniques (63 papers), Electron and X-Ray Spectroscopy Techniques (44 papers) and Integrated Circuits and Semiconductor Failure Analysis (23 papers). Emily Gallagher collaborates with scholars based in Belgium, United States and Netherlands. Emily Gallagher's co-authors include Ivan Pollentier, Marina Y. Timmermans, Cedric Huyghebaert, Gregory McIntyre, Christoph Adelmann, Karen Badger, Houman Zahedmanesh, R. Jonckheere, Alfred Wagner and Eric Hendrickx and has published in prestigious journals such as ACS Applied Materials & Interfaces, IEEE Transactions on Semiconductor Manufacturing and Journal of Micro/Nanolithography MEMS and MOEMS.

In The Last Decade

Emily Gallagher

70 papers receiving 462 citations

Peers — A (Enhanced Table)

Peers by citation overlap · career bar shows stage (early→late) cites · hero ref

Name h Career Trend Papers Cites
Emily Gallagher Belgium 13 437 260 69 68 67 72 482
Naoya Hayashi Japan 11 438 1.0× 208 0.8× 30 0.4× 29 0.4× 165 2.5× 132 526
Hye-Keun Oh South Korea 9 368 0.8× 156 0.6× 27 0.4× 14 0.2× 191 2.9× 147 485
Yunfei Deng United States 13 389 0.9× 151 0.6× 39 0.6× 29 0.4× 112 1.7× 54 577
Frieda Van Roey Belgium 12 403 0.9× 191 0.7× 37 0.5× 13 0.2× 159 2.4× 45 463
Han-Ku Cho South Korea 9 381 0.9× 141 0.5× 45 0.7× 22 0.3× 140 2.1× 111 421
Jan Mulkens Netherlands 13 401 0.9× 127 0.5× 28 0.4× 22 0.3× 218 3.3× 47 467
П. А. Тодуа Russia 14 272 0.6× 378 1.5× 31 0.4× 37 0.5× 62 0.9× 67 455
Mark D. Smith United States 11 411 0.9× 208 0.8× 12 0.2× 11 0.2× 127 1.9× 65 429
Ki‐Ho Baik United States 10 399 0.9× 96 0.4× 28 0.4× 15 0.2× 177 2.6× 90 435
Norio Saitou Japan 9 292 0.7× 119 0.5× 53 0.8× 8 0.1× 140 2.1× 58 351

Countries citing papers authored by Emily Gallagher

Since Specialization
Citations

This map shows the geographic impact of Emily Gallagher's research. It shows the number of citations coming from papers published by authors working in each country. You can also color the map by specialization and compare the number of citations received by Emily Gallagher with the expected number of citations based on a country's size and research output (numbers larger than one mean the country cites Emily Gallagher more than expected).

Fields of papers citing papers by Emily Gallagher

Since Specialization
Physical SciencesHealth SciencesLife SciencesSocial Sciences

This network shows the impact of papers produced by Emily Gallagher. Nodes represent research fields, and links connect fields that are likely to share authors. Colored nodes show fields that tend to cite the papers produced by Emily Gallagher. The network helps show where Emily Gallagher may publish in the future.

Co-authorship network of co-authors of Emily Gallagher

This figure shows the co-authorship network connecting the top 25 collaborators of Emily Gallagher. A scholar is included among the top collaborators of Emily Gallagher based on the total number of citations received by their joint publications. Widths of edges represent the number of papers authors have co-authored together. Node borders signify the number of papers an author published with Emily Gallagher. Emily Gallagher is excluded from the visualization to improve readability, since they are connected to all nodes in the network.

All Works

20 of 20 papers shown
1.
Gallagher, Emily, Lars‐Åke Ragnarsson, & Cédric Rolin. (2024). Sustainable Semiconductor Manufacturing: The Role of Lithography. IEEE Transactions on Semiconductor Manufacturing. 37(4). 440–444. 1 indexed citations
2.
Gallagher, Emily. (2024). Sustainable semiconductor manufacturing with a focus on lithography. 1–1. 1 indexed citations
3.
Wang, Jiahui, et al.. (2024). EUV lithography: LER design, mask, and wafer impact. 15–15.
4.
Kerkhof, Mark van de, Alexander Klein, Emily Gallagher, et al.. (2023). EUV pellicle scanner integration for N2 nodes and beyond. 21–21. 9 indexed citations
5.
Gallagher, Emily, et al.. (2023). Sustainable semiconductor manufacturing: lessons for lithography and etch. 31–31. 7 indexed citations
6.
Timmermans, Marina Y., Ivan Pollentier, M. Korytov, et al.. (2021). CNT EUV pellicle tunability and performance in a scanner-like environment. 34–34. 6 indexed citations
7.
Look, Lieve Van, Werner Gillijns, & Emily Gallagher. (2021). Impact of mask corner rounding on pitch 40 nm contact hole variability. 998405. 48–48. 3 indexed citations
8.
Look, Lieve Van, et al.. (2019). Evaluation of local CD and placement distribution on EUV mask and its impact on wafer. 27–27. 3 indexed citations
9.
Gallagher, Emily, et al.. (2019). CNT EUV pellicle: balancing options (Conference Presentation). 33–33. 3 indexed citations
10.
Melvin, Lawrence S., et al.. (2019). Impact of EUV absorber variations on wafer patterning. 10583. 19–19. 1 indexed citations
11.
Tian, Qing, et al.. (2018). E-beam based EUV mask characterization for studying mask induced wafer effects. 31–31. 2 indexed citations
12.
Timmermans, Marina Y., Marina Mariano, Ivan Pollentier, et al.. (2018). Free-standing carbon nanotube films for extreme ultraviolet pellicle application. Journal of Micro/Nanolithography MEMS and MOEMS. 17(4). 1–1. 15 indexed citations
13.
Pollentier, Ivan, et al.. (2016). EUV lithography imaging using novel pellicle membranes. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9776. 977620–977620. 24 indexed citations
14.
Gallagher, Emily, et al.. (2014). Learning from native defects on EUV mask blanks. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 9256. 92560K–92560K. 10 indexed citations
15.
Badger, Karen, et al.. (2013). Evaluation of non-actinic EUV mask inspection and defect printability on multiple EUV mask absorbers. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8701. 870114–870114. 5 indexed citations
16.
McIntyre, Gregory, et al.. (2013). Through-focus EUV multilayer defect repair with nanomachining. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8679. 86791I–86791I. 12 indexed citations
17.
Fujita, Yuki, et al.. (2013). Using pattern shift to avoid blank defects during EUVL mask fabrication. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 8701. 870112–870112. 14 indexed citations
18.
HIGUCHI, Masaru, et al.. (2008). Exploring new metrology for complex photomask patterns. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71222S–71222S. 1 indexed citations
19.
Gallagher, Emily, Karen Badger, Jaione Tirapu-Azpiroz, et al.. (2008). Wafer plane inspection evaluated for photomask production. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71221B–71221B. 5 indexed citations
20.
Badger, Karen, et al.. (2008). Impact of the OMOG substrate on 32 nm mask OPC inspectability, defect sensitivity, and mask design rule restrictions. Proceedings of SPIE, the International Society for Optical Engineering/Proceedings of SPIE. 7122. 71220A–71220A. 7 indexed citations

Rankless uses publication and citation data sourced from OpenAlex, an open and comprehensive bibliographic database. While OpenAlex provides broad and valuable coverage of the global research landscape, it—like all bibliographic datasets—has inherent limitations. These include incomplete records, variations in author disambiguation, differences in journal indexing, and delays in data updates. As a result, some metrics and network relationships displayed in Rankless may not fully capture the entirety of a scholar's output or impact.

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